JPS52119867A - Formation of fine pattern - Google Patents

Formation of fine pattern

Info

Publication number
JPS52119867A
JPS52119867A JP3660476A JP3660476A JPS52119867A JP S52119867 A JPS52119867 A JP S52119867A JP 3660476 A JP3660476 A JP 3660476A JP 3660476 A JP3660476 A JP 3660476A JP S52119867 A JPS52119867 A JP S52119867A
Authority
JP
Japan
Prior art keywords
fine pattern
formation
regist
element material
electronic beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3660476A
Other languages
Japanese (ja)
Other versions
JPS5824936B2 (en
Inventor
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3660476A priority Critical patent/JPS5824936B2/en
Publication of JPS52119867A publication Critical patent/JPS52119867A/en
Publication of JPS5824936B2 publication Critical patent/JPS5824936B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

PURPOSE: To apply an electronic beam regist on a pattern formed in a heavy element material and then X-ray on the heavy element material so that an electronic beam regist may be selectively exposed by means of a generated secondary electron and a fine pattern obtained.
COPYRIGHT: (C)1977,JPO&Japio
JP3660476A 1976-03-31 1976-03-31 How to form fine patterns Expired JPS5824936B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3660476A JPS5824936B2 (en) 1976-03-31 1976-03-31 How to form fine patterns

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3660476A JPS5824936B2 (en) 1976-03-31 1976-03-31 How to form fine patterns

Publications (2)

Publication Number Publication Date
JPS52119867A true JPS52119867A (en) 1977-10-07
JPS5824936B2 JPS5824936B2 (en) 1983-05-24

Family

ID=12474389

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3660476A Expired JPS5824936B2 (en) 1976-03-31 1976-03-31 How to form fine patterns

Country Status (1)

Country Link
JP (1) JPS5824936B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143869A (en) * 1981-03-03 1982-09-06 Nippon Telegr & Teleph Corp <Ntt> Manufacture of field-effect transistor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143869A (en) * 1981-03-03 1982-09-06 Nippon Telegr & Teleph Corp <Ntt> Manufacture of field-effect transistor

Also Published As

Publication number Publication date
JPS5824936B2 (en) 1983-05-24

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