JPS5377465A - Boron deposition method - Google Patents

Boron deposition method

Info

Publication number
JPS5377465A
JPS5377465A JP15580176A JP15580176A JPS5377465A JP S5377465 A JPS5377465 A JP S5377465A JP 15580176 A JP15580176 A JP 15580176A JP 15580176 A JP15580176 A JP 15580176A JP S5377465 A JPS5377465 A JP S5377465A
Authority
JP
Japan
Prior art keywords
deposition method
boron
boron deposition
core tube
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15580176A
Other languages
Japanese (ja)
Other versions
JPS5538046B2 (en
Inventor
Nobuo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP15580176A priority Critical patent/JPS5377465A/en
Publication of JPS5377465A publication Critical patent/JPS5377465A/en
Publication of JPS5538046B2 publication Critical patent/JPS5538046B2/ja
Granted legal-status Critical Current

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  • Led Devices (AREA)

Abstract

PURPOSE: To obtain a layer resistance without scattering by generating an oxidizable atmosphere in a core tube after mixing H2 gas of a prescribed quantity besides led-in carrier gas and burning when nitride boron and a semiconductor substrate are provided in the core tube to deposit boron on the substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP15580176A 1976-12-20 1976-12-20 Boron deposition method Granted JPS5377465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15580176A JPS5377465A (en) 1976-12-20 1976-12-20 Boron deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15580176A JPS5377465A (en) 1976-12-20 1976-12-20 Boron deposition method

Publications (2)

Publication Number Publication Date
JPS5377465A true JPS5377465A (en) 1978-07-08
JPS5538046B2 JPS5538046B2 (en) 1980-10-02

Family

ID=15613733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15580176A Granted JPS5377465A (en) 1976-12-20 1976-12-20 Boron deposition method

Country Status (1)

Country Link
JP (1) JPS5377465A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56169322A (en) * 1980-05-30 1981-12-26 Fujikura Ltd Selective diffusion of boron into silicon

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4847769A (en) * 1971-10-18 1973-07-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4847769A (en) * 1971-10-18 1973-07-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56169322A (en) * 1980-05-30 1981-12-26 Fujikura Ltd Selective diffusion of boron into silicon

Also Published As

Publication number Publication date
JPS5538046B2 (en) 1980-10-02

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