JP7454646B2 - 高磁気誘導方向性ケイ素鋼およびその製造方法 - Google Patents
高磁気誘導方向性ケイ素鋼およびその製造方法 Download PDFInfo
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- JP7454646B2 JP7454646B2 JP2022505654A JP2022505654A JP7454646B2 JP 7454646 B2 JP7454646 B2 JP 7454646B2 JP 2022505654 A JP2022505654 A JP 2022505654A JP 2022505654 A JP2022505654 A JP 2022505654A JP 7454646 B2 JP7454646 B2 JP 7454646B2
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Description
方向性ケイ素鋼は、ゴス集合組織(Goss texture)を有する粒子で構成されている、電力および国防産業において不可欠な軟質磁性材料である。そのゴス集合組織は、ミラー指数で{110}<001>として表される。粒子の{110}結晶面は、圧延面に平行であり、粒子の<001>結晶方位は圧延方向に平行である。すなわち、方向性ケイ素鋼は、方向性磁場下で最も良い容易な磁化性能を有し、結晶磁気異方性を最大限に活用して、多結晶材料の最も良い磁気特性を実現する。電力変圧器または送電変圧器の鉄心が方向性ケイ素鋼で作られているとき、その非常に高い磁気誘導および非常に低い鉄損により、材料および電気エネルギーは、指向性磁場の動作条件下で大幅に節約することができる。鉄損P17/50および磁気誘導B8は、通常、方向性ケイ素鋼の磁気性能レベルを特徴づけるために使用され、ここで、P17/50は、最大磁気誘導強度が1.7Tであり周波数が50Hzであるときの試験片1kgあたりの鉄損を表し;B8は、800A/mの磁場強度に対応する磁気誘導強度を表す。
この開示の目的の1つは、高磁気誘導方向性ケイ素鋼を提供することである。ケイ素鋼の化学組成を設計することにより、二次抑制剤の量が確保され、一次抑制剤の析出形態がより微細でより分散し、一次粒子サイズがより均一であり、次いで一次粒子サイズと二次再結晶中の抑制剤との間の高水準の一致が達成された。結果として、最終的に得られた高磁気誘導ケイ素鋼の完成品は、鋭いゴス集合組織および優れた磁気特性を有し、製造コストをさらに低下させることができた。
Si:2.0~4.0%;
C:0.03~0.07%;
Al:0.015~0.035%;
N:0.003~0.010%;
Nb:0.0010~0.0500%;並びに
Feおよび不可避の不純物である残部
を含む高磁気誘導方向性ケイ素鋼を提供する。
Si:本明細書において記載される高磁気誘導方向性ケイ素鋼においては、Siは、抵抗率を増加させ、鉄損を低下させることができる、方向性ケイ素鋼の基本元素である。Siの質量パーセントが2.0%未満の場合、抵抗率が下がり、方向性ケイ素鋼の渦電流損失が効果的に低下しない;しかしながら、Siの質量パーセントが4.0%超の場合、Siは、粒界に沿って偏析する傾向を有し、これは、鋼板の脆性を増加させ圧延性を劣化させるだけでなく、再結晶構造および抑制剤を不安定にし、不完全な二次再結晶をもたらす。上記の理由に基づいて、本開示の高磁気誘導方向性ケイ素鋼において定義されるSiの質量パーセントは、2.0~4.0%の範囲中である。
(1)製錬および鋳造;
(2)スラブの加熱;
(3)熱間圧延;
(4)冷間圧延;
(5)脱炭素および焼鈍;
(6)窒化処理;
(7)MgOコーティング適用;
(8)高温焼鈍;並びに
(9)絶縁コーティング、調質圧延および焼鈍
の工程を含み、
ここで、高磁気誘導方向性ケイ素鋼は、該製造方法によって得られ、14~22μmの平均一次粒子サイズおよび1.8より大きい一次粒子サイズ変動係数を有し、該一次粒子サイズ変動係数=
本明細書において記載される高磁気誘導方向性ケイ素鋼およびその製造方法は、添付の図面および特定の実施例を参照して、以下でさらに説明および記載される。しかしながら、本開示は、それらに限定されない。
1.平均一次粒子サイズおよび一次粒子サイズの標準偏差
平均一次粒子サイズおよび平均一次粒子サイズの標準偏差は、以下のように決定した:一次粒子サイズの金属板を得た後、平均一次粒子サイズおよび平均一次粒子サイズの標準偏差を、面積法分析を通して得た。
P17/50およびB8は、国家標準GB/T 3655に従って、「電気鋼板(ストリップ)の磁気特性をエプスタインフレームで測定する方法」を使用して取得した。
実施例A1~A11の高磁気誘導方向性ケイ素鋼および比較例B1~B7の比較ケイ素鋼は、表1に示す配合に従い、以下の工程に従って製造した:
(2)スラブの加熱:スラブを1150℃以下で200分間加熱する;
(3)熱間圧延:スラブを2.3mmの厚さに熱間圧延する;
(4)焼鈍:熱間圧延スラブを1120℃の温度で170秒間焼鈍し、次いで冷却する;
(5)冷間圧延:87.4%の冷間圧延圧下率で0.29mmの完成品の厚さに冷間圧延する;
(7)窒化処理:浸透窒素含有量を131~210ppmの範囲中に設定する;
(8)MgOコーティング適用:鋼スラブ上にMgOコーティングを適用する;
(9)高温焼鈍:1200℃の温度で25時間、100%H2の雰囲気下で高温精製焼鈍を実施する;並びに
(10)絶縁コーティング適用、調質圧延および焼鈍:巻き戻し後、絶縁コーティングを適用し、熱間延伸、調質圧延および焼鈍を実施し、高磁気誘導方向性ケイ素鋼を得る。
表3を参照し、実施例A12~A14の高磁気誘導方向性ケイ素鋼および比較例B8~B13の比較ケイ素鋼の特定の製造工程は、以下のとおりであった:
(2)スラブの加熱:スラブを1150℃以下で210分間加熱する;
(3)熱間圧延:スラブを2.6mmの厚さに熱間圧延する;
(4)焼鈍:熱間圧延スラブを1120℃の温度で190秒間焼鈍し、次いで冷却する;
(5)冷間圧延:89.6%の冷間圧延圧下率で0.27mmの完成品の厚さに冷間圧延する;
(7)窒化処理:浸透窒素含有量を138~173ppmの範囲中に設定する;
(8)MgOコーティング適用:鋼スラブ上にMgOコーティングを適用する;
(9)高温焼鈍:1200℃の温度で25時間、100%H2の雰囲気下で高温精製焼鈍を実施する;並びに
(10)絶縁コーティング適用、調質圧延および焼鈍:巻き戻し後、絶縁コーティングを適用し、熱間延伸、調質圧延および焼鈍を実施し、方向性ケイ素鋼の完成品を得る。
表4を参照し、実施例A15~A18の高磁気誘導方向性ケイ素鋼および比較例B14~B17の比較ケイ素鋼の特定の製造工程は、以下のとおりであった:
(2)スラブの加熱:表4において示すパラメーターに従ってスラブを加熱する;
(3)熱間圧延:スラブを2.4mmの厚さに熱間圧延する;
(4)焼鈍:熱間圧延スラブを1100℃の温度で150秒間焼鈍し、次いで冷却する;
(5)冷間圧延:87.9%の冷間圧延圧下率で0.29mmの完成品の厚さに冷間圧延する;
(7)窒化処理:浸透窒素含有量を146~186ppmの範囲中に設定する;
(8)MgOコーティング適用:鋼スラブ上にMgOコーティングを適用する;
(9)高温焼鈍:1200℃の温度で20時間、100%H2の雰囲気下で高温精製焼鈍を実施する;並びに
(10)絶縁コーティング適用、調質圧延および焼鈍:巻き戻し後、絶縁コーティングを適用し、熱間延伸、調質圧延および焼鈍を実施し、方向性ケイ素鋼の完成品を得る。
表5を参照し、実施例A19~A22の高磁気誘導方向性ケイ素鋼および比較例B18~B21の比較ケイ素鋼の特定の製造工程は、以下のとおりであった:
(2)スラブの加熱:スラブを1120℃以下で210分間加熱する;
(3)熱間圧延:スラブを2.5mmの厚さに熱間圧延する;
(4)焼鈍:表5において示す温度および時間に従って熱間圧延スラブを焼鈍し、次いで冷却する;
(5)冷間圧延:90.8%の冷間圧延圧下率で0.23mmの完成品の厚さに冷間圧延する;
(7)窒化処理:浸透窒素含有量を133~182ppmの範囲中に設定する;
(8)MgOコーティング適用:鋼スラブ上にMgOコーティングを適用する;
(9)高温焼鈍:1210℃の温度で20時間、100%H2の雰囲気下で高温精製焼鈍を実施する;並びに
(10)絶縁コーティング適用、調質圧延および焼鈍:巻き戻し後、絶縁コーティングを適用し、熱間延伸、調質圧延および焼鈍を実施し、方向性ケイ素鋼の完成品を得る。
表6を参照し、実施例A23~A30の高磁気誘導方向性ケイ素鋼および比較例B22~B33の比較ケイ素鋼の特定の製造工程は、以下のとおりであった:
(2)スラブの加熱:スラブを1120℃以下で210分間加熱する;
(3)熱間圧延:スラブを2.6mmの厚さに熱間圧延する;
(4)焼鈍:熱間圧延スラブを1100℃の温度で160秒間焼鈍し、次いで冷却する;
(5)冷間圧延:91.2%の冷間圧延圧下率で0.23mmの完成品の厚さに冷間圧延する;
(7)窒化処理:浸透窒素含有量を134~196ppmの範囲中に設定する;
(8)MgOコーティング適用:鋼スラブ上にMgOコーティングを適用する;
(9)高温焼鈍:表6において示す温度および時間に従って、100%H2の雰囲気下で高温精製焼鈍を実施する;並びに
(10)絶縁コーティング適用、調質圧延および焼鈍:巻き戻し後、絶縁コーティングを適用し、熱間延伸、調質圧延および焼鈍を実施し、方向性ケイ素鋼の完成品を得る。
表7を参照し、実施例A31~A33の高磁気誘導方向性ケイ素鋼および比較例B34~B37の比較ケイ素鋼の特定の製造工程は、以下のとおりであった:
(2)スラブの加熱:スラブを1100℃以下で180分間加熱する;
(3)熱間圧延:スラブを2.3mmの厚さに熱間圧延する;
(4)冷間圧延:87.0%の冷間圧延圧下率で0.30mmの完成品の厚さに冷間圧延する;
(5)脱炭素および焼鈍:表7において示すプロセスパラメーターに従って脱炭素および焼鈍を実施して、鋼スラブ中の[C]含有量を30ppm以下に減少させる。
(7)MgOコーティング適用:鋼スラブ上にMgOコーティングを適用する;
(8)高温焼鈍:1200℃の温度で20時間、100%H2の雰囲気下で高温精製焼鈍を実施する;並びに
(9)絶縁コーティング適用、調質圧延および焼鈍:巻き戻し後、絶縁コーティングを適用し、熱間延伸、調質圧延および焼鈍を実施し、方向性ケイ素鋼の完成品を得る。
Claims (8)
- 方向性ケイ素鋼の製造方法であって:
(1)製錬および鋳造;
(2)スラブの加熱、ここで該スラブは質量パーセントで以下の化学元素:Si:2.0~4.0%、C:0.03~0.07%、Al:0.015~0.035%、N:0.003~0.010%、Nb:0.0010~0.0500%;必要に応じてMn:0.05~0.20%、P:0.01~0.08%、Cr:0.05~0.40%、Sn:0.03~0.30%およびCu:0.01~0.40%の少なくとも1つ;並びにFeおよび不可避の不純物である残部からなり、該不可避の不純物の中でS≦0.0050%、V≦0.0050%およびTi≦0.0050%;
(3)熱間圧延;
(4)冷間圧延;
(5)脱炭素および焼鈍;
(6)窒化処理;
(7)MgOコーティング適用;
(8)高温焼鈍;並びに
(9)絶縁コーティング適用
の工程を含む(ここで、該方向性ケイ素鋼は、該製造方法によって得られ、14~22μmの平均一次粒子サイズおよび1.8より大きい一次粒子サイズ変動係数を有し;該一次粒子サイズ変動係数=
である)、製造方法。 - 工程(2)において、スラブについての加熱温度および加熱時間がそれぞれ1050~1250℃および300分未満であることを特徴とする、請求項1に記載の製造方法。
- 工程(4)において、冷間圧延が85%以上の圧下率を有することを特徴とする、請求項1に記載の製造方法。
- 工程(5)において、脱炭素および焼鈍についての温度および時間がそれぞれ800~900℃および90~170秒であることを特徴とする、請求項1に記載の製造方法。
- 工程(6)において、浸透窒素含有量が50~260ppmであることを特徴とする、請求項1に記載の製造方法。
- 工程(8)において、高温焼鈍についての温度および時間がそれぞれ1050~1250℃および15~40時間であることを特徴とする、請求項1に記載の製造方法。
- 製造方法がまた、工程(3)と工程(4)との間に熱間圧延スラブ焼鈍工程を含み、ここで、熱間圧延スラブ焼鈍についての温度および時間がそれぞれ850~1150℃および30~200秒であることを特徴とする、請求項1に記載の製造方法。
- ケイ素鋼が(0.28+2.5×t)W/kg以下の鉄損P 17/50 (ここで、tは、mmでのシートの厚さを表す);および1.93T以上の磁気誘導B 8 を有する、請求項1から7のいずれか一項に記載の製造方法。
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