JP7436212B2 - ウエーハ加工方法、及びウエーハ加工装置 - Google Patents
ウエーハ加工方法、及びウエーハ加工装置 Download PDFInfo
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- JP7436212B2 JP7436212B2 JP2020000452A JP2020000452A JP7436212B2 JP 7436212 B2 JP7436212 B2 JP 7436212B2 JP 2020000452 A JP2020000452 A JP 2020000452A JP 2020000452 A JP2020000452 A JP 2020000452A JP 7436212 B2 JP7436212 B2 JP 7436212B2
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- Prior art keywords
- wafer
- laser beam
- shock wave
- beam irradiation
- condenser
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- 238000003672 processing method Methods 0.000 title claims description 14
- 230000035939 shock Effects 0.000 claims description 56
- 230000001066 destructive effect Effects 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 18
- 230000006378 damage Effects 0.000 claims description 16
- 230000001678 irradiating effect Effects 0.000 claims description 10
- 239000007788 liquid Substances 0.000 description 63
- 230000003287 optical effect Effects 0.000 description 14
- 230000008569 process Effects 0.000 description 14
- 239000011521 glass Substances 0.000 description 11
- 238000003384 imaging method Methods 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 239000013307 optical fiber Substances 0.000 description 4
- 238000002679 ablation Methods 0.000 description 3
- 230000001902 propagating effect Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 2
- 230000000644 propagated effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0665—Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
Description
H1=(a12+Pz2)1/2
H2=(a22+Pz2)1/2
H3=(a32+Pz2)1/2
H4=(a42+Pz2)1/2
(H1-H2)/V=t1
(H2-H3)/V=t2
(H3-H4)/V=t3
波長 :355nm~1064nm
繰り返し周波数 :50kHz
平均出力 :10W~100W
パルス幅 :100ps以下
波長 :355nm~1064nm
繰り返し周波数 :50kHz
平均出力 :10W~100W
パルス幅 :100ps以下
3:基台
4:保持手段
21:X軸方向可動板
22:Y軸方向可動板
25:チャックテーブル
25a:保持面
27:クランプ
6:第一のレーザー光線照射手段
61:発振器
62:波長別遅延手段
64:リング生成手段
641、642:アキシコンレンズ
643:回折格子
67:第一の集光器
671:集光レンズ
7:撮像手段
8A:第二のレーザー光線照射手段
81:発振器
84a:第二の集光器
841a:集光レンズ
842a:ガラス板
843a:レーザー光線導入部
844a:液体導入口
845a:開口部
85a:楕円ドーム
851a:液体の層
P2:第一の焦点
P3:第二の焦点
87:開放部
8B:第三のレーザー光線照射手段
84b:第三の集光器
841b:集光レンズ
842b:ガラス板
85b:ドーム部材
851b:液体の層
852:下部空間
844b:液体導入口
8C:レーザー光線照射手段(第三のレーザー光線照射手段の変形例)
84c:第四の集光器
844c:液体導入口
85c:半球体
85d:球面
85e:平坦面
851c:液体の層
10:ウエーハ
10a:表面
10b:裏面
12:デバイス
12’:デバイスチップ
14:分割予定ライン
30:移動手段
31:X軸方向送り手段
32:Y軸方向送り手段
37:枠体
37a:垂直壁部
37b:水平壁部
70:分割装置
71:フレーム保持部材
72:クランプ
73:拡張ドラム
90:液体供給手段
92:配管
Claims (2)
- ウエーハを個々のチップに分割するウエーハ加工方法であって、
保持手段にウエーハを保持する保持工程と、該保持手段に保持されたウエーハに衝撃波の集束点を位置付けて分割すべき領域に破壊層を形成する破壊層形成工程と、
該破壊層を起点としてウエーハを個々のチップに分割する分割工程と、
を含み構成され、
該破壊層形成工程は、パルスレーザー光線を照射する第一のレーザー光線照射手段により1パルス当たりのレーザー光線を波長毎に時間差を持ったリング状に形成し、該リング状に形成されたパルスレーザー光線をウエーハに照射して分割すべき領域に衝撃波を生成して集束点を形成し、該第一のレーザー光線照射手段によって該時間差を調整することにより該衝撃波の集束点の位置を設定するウエーハ加工方法。 - ウエーハを個々のチップに分割するウエーハ加工装置であって、
ウエーハを保持する保持手段と、該保持手段に保持されたウエーハに衝撃波の集束点を位置付けて分割すべき領域に破壊層を形成する破壊層形成手段と、を含み構成され、
該破壊層形成手段は、
パルスレーザー光線を照射する第一のレーザー光線照射手段であり、該第一のレーザー光線照射手段により1パルス当たりのレーザー光線が波長毎に時間差を持ったリング状に形成され、該リング状に形成されたパルスレーザー光線がウエーハに照射されて分割すべき領域に衝撃波を生成して集束点を形成し、該第一のレーザー光線照射手段によって該時間差が調整されることにより該衝撃波の集束点の位置が設定されるウエーハ加工装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020000452A JP7436212B2 (ja) | 2020-01-06 | 2020-01-06 | ウエーハ加工方法、及びウエーハ加工装置 |
TW109145547A TW202127530A (zh) | 2020-01-06 | 2020-12-22 | 晶圓加工方法、及晶圓加工裝置 |
KR1020200182004A KR20210088422A (ko) | 2020-01-06 | 2020-12-23 | 웨이퍼 가공 방법 및 웨이퍼 가공 장치 |
CN202110008119.3A CN113078108A (zh) | 2020-01-06 | 2021-01-05 | 晶片加工方法和晶片加工装置 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2020000452A JP7436212B2 (ja) | 2020-01-06 | 2020-01-06 | ウエーハ加工方法、及びウエーハ加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021111640A JP2021111640A (ja) | 2021-08-02 |
JP7436212B2 true JP7436212B2 (ja) | 2024-02-21 |
Family
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Family Applications (1)
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JP2020000452A Active JP7436212B2 (ja) | 2020-01-06 | 2020-01-06 | ウエーハ加工方法、及びウエーハ加工装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7436212B2 (ja) |
KR (1) | KR20210088422A (ja) |
CN (1) | CN113078108A (ja) |
TW (1) | TW202127530A (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000061414A (ja) | 1998-08-20 | 2000-02-29 | Shimada Phys & Chem Ind Co Ltd | 洗浄装置および洗浄方法 |
JP2007313549A (ja) | 2006-05-29 | 2007-12-06 | Toshiba Corp | 衝撃波発生装置、表面処理方法、非破壊検査方法および治療方法 |
JP2009166103A (ja) | 2008-01-17 | 2009-07-30 | Laser System:Kk | レーザ割断方法およびレーザ加工装置 |
JP2017221977A (ja) | 2013-08-02 | 2017-12-21 | ロフィン−ジナール テクノロジーズ インコーポレイテッド | 透明材料の内部でレーザーフィラメンテーションを実行する方法および装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10305420A (ja) | 1997-03-04 | 1998-11-17 | Ngk Insulators Ltd | 酸化物単結晶からなる母材の加工方法、機能性デバイスの製造方法 |
JP5513272B2 (ja) | 2010-06-15 | 2014-06-04 | 株式会社ディスコ | チャックテーブルに保持された被加工物の高さ位置計測装置およびレーザー加工機 |
-
2020
- 2020-01-06 JP JP2020000452A patent/JP7436212B2/ja active Active
- 2020-12-22 TW TW109145547A patent/TW202127530A/zh unknown
- 2020-12-23 KR KR1020200182004A patent/KR20210088422A/ko active Search and Examination
-
2021
- 2021-01-05 CN CN202110008119.3A patent/CN113078108A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000061414A (ja) | 1998-08-20 | 2000-02-29 | Shimada Phys & Chem Ind Co Ltd | 洗浄装置および洗浄方法 |
JP2007313549A (ja) | 2006-05-29 | 2007-12-06 | Toshiba Corp | 衝撃波発生装置、表面処理方法、非破壊検査方法および治療方法 |
JP2009166103A (ja) | 2008-01-17 | 2009-07-30 | Laser System:Kk | レーザ割断方法およびレーザ加工装置 |
JP2017221977A (ja) | 2013-08-02 | 2017-12-21 | ロフィン−ジナール テクノロジーズ インコーポレイテッド | 透明材料の内部でレーザーフィラメンテーションを実行する方法および装置 |
Also Published As
Publication number | Publication date |
---|---|
CN113078108A (zh) | 2021-07-06 |
KR20210088422A (ko) | 2021-07-14 |
TW202127530A (zh) | 2021-07-16 |
JP2021111640A (ja) | 2021-08-02 |
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