JP7108492B2 - 保護部材形成装置 - Google Patents
保護部材形成装置 Download PDFInfo
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- JP7108492B2 JP7108492B2 JP2018147525A JP2018147525A JP7108492B2 JP 7108492 B2 JP7108492 B2 JP 7108492B2 JP 2018147525 A JP2018147525 A JP 2018147525A JP 2018147525 A JP2018147525 A JP 2018147525A JP 7108492 B2 JP7108492 B2 JP 7108492B2
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- wafer
- protective member
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- liquid resin
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- 230000001681 protective effect Effects 0.000 title claims description 65
- 239000011347 resin Substances 0.000 claims description 74
- 229920005989 resin Polymers 0.000 claims description 74
- 239000007788 liquid Substances 0.000 claims description 47
- 239000002390 adhesive tape Substances 0.000 claims description 45
- 239000000853 adhesive Substances 0.000 claims description 10
- 230000001070 adhesive effect Effects 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 158
- 238000000034 method Methods 0.000 description 11
- 239000000428 dust Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000003892 spreading Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/02—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/02307—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a liquid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
また、粘着テープにおけるウェーハに密着される部分を、接着剤を備えないテープ基材とすることにより、粘着テープをウェーハから剥がすことが容易となる。
カセット収容本体104は、上下方向に2段の収容スペース2a,2bを有する。上段の収容スペース2aには、保護部材が形成される前のウェーハWが複数収容されたカセット3aが配設されている。下段の収容スペース2bには、保護部材が形成されたウェーハWが複数収容されるカセット3bが配設されている。
ステージ20は、フィルム12を保持する円形のフィルム保持面21と、フィルム保持面21の外周に形成されたリング状の凸部22とを備えている。フィルム保持面21に保持されたフィルム12の上面に、樹脂が滴下される。ステージ20は、凸部22の内側の領域に液状樹脂を溜めて、凸部22の外側に液状樹脂が飛散することを抑制するように構成されている。フィルム保持面21は、たとえば石英ガラスによって形成されている。フィルム保持面21には、吸引源に接続された複数の吸引孔が形成されている(ともに図示せず)。フィルム保持面21は、自身に載置されたフィルム12を下方から吸引保持するように構成される。
その後、硬化手段70が、所定の厚みを有するように拡張された液状樹脂44に向けて、ガラス製のステージ20を介して、紫外光を照射する。その結果、液状樹脂44が硬化して、液状樹脂44からなる所定の厚みの保護部材45が、ウェーハWの下面Wbに形成される。
なお、粘着テープSは、厚みが30μm~100μmで、材質がポリオレフィンで形成される。また、接着剤Gを有していないのでウェーハWの下面Wbに粘着テープSを貼着(密着)させるには、粘着テープSをローラで押し付けるか、粘着テープSに向かってエアノズルからエアを吹き付ける。
103:支持ベース、104:カセット収容本体、
W:ウェーハ、Wa:ウェーハの上面、Wb:ウェーハの下面,F:リングフレーム、
S:粘着テープ、G:接着剤、W1:ワークセット
4:第1ウェーハ搬送手段、5:第2ウェーハ搬送手段、
10:フィルム供給手段、12:フィルム、20:ステージ、21:フィルム保持面、
22:凸部、30:フィルム載置手段、31:アーム部、32:クランプ部、
40:樹脂供給手段、41:樹脂供給ノズル、41a:供給口、42:ディスペンサ、
43:接続管、44:液状樹脂、45:保護部材、
50:保持手段、51:支持構造、52:保持テーブル、52a:ウェーハ保持面、
53:吸引路、54:基台、55:ピン、55a:隙間、56:環状壁、58:吸引源、
60:拡張手段、61:ボールネジ、62:モータ、63:ガイドレール、
64:昇降板、65:ナット部、
70:硬化手段
Claims (2)
- リングフレームと、該リングフレームの開口を塞ぎ、該リングフレームに貼着された粘着テープと、該粘着テープにおける該開口の内部に貼着されたウェーハとで構成される被加工物の該ウェーハの上面を吸引保持する被加工物保持面を有する保持テーブルと、
該被加工物保持面に対向して配設され、シートの下面を保持するステージと、
該ステージに保持された該シートの上面に液状樹脂を供給する樹脂供給手段と、
該保持テーブルを該ステージに接近する方向に移動させることによって、該被加工物保持面に吸引保持された該ウェーハの下面に貼着された該粘着テープの下面で該シートの上面の該液状樹脂を押し拡げる拡張手段と、
押し拡げられた該液状樹脂を硬化して保護部材を形成する硬化手段と、
を備える保護部材形成装置であって、
該保持テーブルは、
平板状の基台と、
該基台の下面に、下方向に立設される複数のピンと、
該複数の該ピンを囲繞し、該ピンの先端と同じ高さの下面を有する環状壁と、
該基台を貫通し該環状壁の内側を吸引源に連通する吸引路と、を備える、
保護部材形成装置。 - 該粘着テープは、該リングフレームに貼着するリング状の接着剤を備え、該粘着テープにおける該接着剤を備えないテープ基材を該ウェーハに密着させる請求項1記載の保護部材形成装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018147525A JP7108492B2 (ja) | 2018-08-06 | 2018-08-06 | 保護部材形成装置 |
CN201910649051.XA CN110802509B (zh) | 2018-08-06 | 2019-07-18 | 保护部件形成装置 |
US16/527,692 US10916459B2 (en) | 2018-08-06 | 2019-07-31 | Protective member forming apparatus |
DE102019211426.1A DE102019211426A1 (de) | 2018-08-06 | 2019-07-31 | Ausbildungsvorrichtung für ein Schutzelement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018147525A JP7108492B2 (ja) | 2018-08-06 | 2018-08-06 | 保護部材形成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020024976A JP2020024976A (ja) | 2020-02-13 |
JP7108492B2 true JP7108492B2 (ja) | 2022-07-28 |
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JP2018147525A Active JP7108492B2 (ja) | 2018-08-06 | 2018-08-06 | 保護部材形成装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10916459B2 (ja) |
JP (1) | JP7108492B2 (ja) |
CN (1) | CN110802509B (ja) |
DE (1) | DE102019211426A1 (ja) |
Families Citing this family (5)
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JP2022020286A (ja) * | 2020-07-20 | 2022-02-01 | 株式会社ディスコ | 保護部材形成装置で用いるシート、及び保護部材形成方法 |
JP7475232B2 (ja) | 2020-07-22 | 2024-04-26 | 株式会社ディスコ | 保護部材形成装置 |
JP2022131436A (ja) * | 2021-02-26 | 2022-09-07 | 日本電産サンキョー株式会社 | 産業用ロボット |
EP4333026A1 (en) * | 2021-05-26 | 2024-03-06 | Disco Corporation | Adhesive sheet for backgrinding, semiconductor wafer manufacturing method, and substrate sheet |
CN117378035A (zh) * | 2021-05-26 | 2024-01-09 | 株式会社迪思科 | 背面研磨用粘着片及半导体晶圆的制造方法、基材片 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004014603A (ja) | 2002-06-04 | 2004-01-15 | Ngk Spark Plug Co Ltd | 吸着用チャック |
WO2017036512A1 (en) | 2015-08-31 | 2017-03-09 | Karl Heinz Priewasser | Method of processing wafer and protective sheeting for use in this method |
JP2017224670A (ja) | 2016-06-14 | 2017-12-21 | 株式会社ディスコ | 保護部材形成装置 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2800188B2 (ja) * | 1988-07-20 | 1998-09-21 | 株式会社ニコン | 基板吸着装置 |
WO2006103918A1 (ja) * | 2005-03-28 | 2006-10-05 | Matsushita Electric Industrial Co., Ltd. | フリップチップ実装体とフリップチップ実装方法及びフリップチップ実装装置 |
CN101176200B (zh) * | 2005-05-17 | 2010-11-03 | 松下电器产业株式会社 | 倒装片安装方法、倒装片安装装置及倒装片安装体 |
JP2010062269A (ja) * | 2008-09-02 | 2010-03-18 | Three M Innovative Properties Co | ウェーハ積層体の製造方法、ウェーハ積層体製造装置、ウェーハ積層体、支持層剥離方法、及びウェーハの製造方法 |
JP2014175541A (ja) * | 2013-03-11 | 2014-09-22 | Disco Abrasive Syst Ltd | ウェーハ貼着方法 |
JP6602702B2 (ja) | 2016-03-15 | 2019-11-06 | 株式会社ディスコ | 保護部材形成装置 |
JP6641209B2 (ja) | 2016-03-22 | 2020-02-05 | 株式会社ディスコ | 保護部材形成装置 |
JP6730879B2 (ja) * | 2016-08-18 | 2020-07-29 | 株式会社ディスコ | 剥離方法及び剥離装置 |
JP7233883B2 (ja) * | 2018-10-30 | 2023-03-07 | 株式会社ディスコ | 保護部材の形成方法 |
JP7184458B2 (ja) * | 2018-11-06 | 2022-12-06 | 株式会社ディスコ | 金属膜付き半導体デバイスの製造方法 |
-
2018
- 2018-08-06 JP JP2018147525A patent/JP7108492B2/ja active Active
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2019
- 2019-07-18 CN CN201910649051.XA patent/CN110802509B/zh active Active
- 2019-07-31 US US16/527,692 patent/US10916459B2/en active Active
- 2019-07-31 DE DE102019211426.1A patent/DE102019211426A1/de active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004014603A (ja) | 2002-06-04 | 2004-01-15 | Ngk Spark Plug Co Ltd | 吸着用チャック |
WO2017036512A1 (en) | 2015-08-31 | 2017-03-09 | Karl Heinz Priewasser | Method of processing wafer and protective sheeting for use in this method |
JP2017224670A (ja) | 2016-06-14 | 2017-12-21 | 株式会社ディスコ | 保護部材形成装置 |
Also Published As
Publication number | Publication date |
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US10916459B2 (en) | 2021-02-09 |
DE102019211426A1 (de) | 2020-02-06 |
CN110802509B (zh) | 2023-07-21 |
US20200043754A1 (en) | 2020-02-06 |
JP2020024976A (ja) | 2020-02-13 |
CN110802509A (zh) | 2020-02-18 |
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