JP7075302B2 - 光学装置、投影光学系、露光装置、および物品の製造方法 - Google Patents

光学装置、投影光学系、露光装置、および物品の製造方法 Download PDF

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Publication number
JP7075302B2
JP7075302B2 JP2018138013A JP2018138013A JP7075302B2 JP 7075302 B2 JP7075302 B2 JP 7075302B2 JP 2018138013 A JP2018138013 A JP 2018138013A JP 2018138013 A JP2018138013 A JP 2018138013A JP 7075302 B2 JP7075302 B2 JP 7075302B2
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Japan
Prior art keywords
optical element
optical
convex mirror
unit
guide
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Active
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JP2018138013A
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English (en)
Japanese (ja)
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JP2020016708A (ja
Inventor
雄吾 柴田
淳生 遠藤
直人 布施
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018138013A priority Critical patent/JP7075302B2/ja
Priority to KR1020190084912A priority patent/KR102500506B1/ko
Priority to CN201910647791.XA priority patent/CN110750034B/zh
Publication of JP2020016708A publication Critical patent/JP2020016708A/ja
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Publication of JP7075302B2 publication Critical patent/JP7075302B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2018138013A 2018-07-23 2018-07-23 光学装置、投影光学系、露光装置、および物品の製造方法 Active JP7075302B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018138013A JP7075302B2 (ja) 2018-07-23 2018-07-23 光学装置、投影光学系、露光装置、および物品の製造方法
KR1020190084912A KR102500506B1 (ko) 2018-07-23 2019-07-15 광학 장치, 투영 광학계, 노광 장치 및 물품의 제조 방법
CN201910647791.XA CN110750034B (zh) 2018-07-23 2019-07-18 光学装置、投影光学***、曝光装置以及物品的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018138013A JP7075302B2 (ja) 2018-07-23 2018-07-23 光学装置、投影光学系、露光装置、および物品の製造方法

Publications (2)

Publication Number Publication Date
JP2020016708A JP2020016708A (ja) 2020-01-30
JP7075302B2 true JP7075302B2 (ja) 2022-05-25

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JP2018138013A Active JP7075302B2 (ja) 2018-07-23 2018-07-23 光学装置、投影光学系、露光装置、および物品の製造方法

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JP (1) JP7075302B2 (ko)
KR (1) KR102500506B1 (ko)
CN (1) CN110750034B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114527579B (zh) * 2022-03-16 2024-02-02 苏州凌云光工业智能技术有限公司 一种光机装调装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016109741A (ja) 2014-12-02 2016-06-20 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法
JP6226570B2 (ja) 2013-06-03 2017-11-08 三菱電機株式会社 スイッチギヤ

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2881363B2 (ja) * 1993-02-02 1999-04-12 キヤノン株式会社 平行移動装置およびレンズ移動装置
JP3427428B2 (ja) * 1993-07-21 2003-07-14 株式会社ニコン 光学素子の位置調整装置及び投影露光装置
JPH07307270A (ja) * 1994-05-13 1995-11-21 Canon Inc 投影倍率調整装置及びそれを有する投影露光装置
JP2007256703A (ja) * 2006-03-24 2007-10-04 Nikon Corp 調整方法、この調整方法を用いて製造された鏡筒及びこの鏡筒を備えているカメラ
JP2013219089A (ja) * 2012-04-04 2013-10-24 Canon Inc 光学系、露光装置、およびデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6226570B2 (ja) 2013-06-03 2017-11-08 三菱電機株式会社 スイッチギヤ
JP2016109741A (ja) 2014-12-02 2016-06-20 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法

Also Published As

Publication number Publication date
KR102500506B1 (ko) 2023-02-16
CN110750034B (zh) 2022-07-15
CN110750034A (zh) 2020-02-04
JP2020016708A (ja) 2020-01-30
KR20200011018A (ko) 2020-01-31

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