JP7073767B2 - 炭化珪素半導体装置の製造方法および炭化珪素基板の製造方法 - Google Patents
炭化珪素半導体装置の製造方法および炭化珪素基板の製造方法 Download PDFInfo
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- JP7073767B2 JP7073767B2 JP2018022565A JP2018022565A JP7073767B2 JP 7073767 B2 JP7073767 B2 JP 7073767B2 JP 2018022565 A JP2018022565 A JP 2018022565A JP 2018022565 A JP2018022565 A JP 2018022565A JP 7073767 B2 JP7073767 B2 JP 7073767B2
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- 239000000758 substrate Substances 0.000 title claims description 132
- 239000004065 semiconductor Substances 0.000 title claims description 114
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 91
- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 90
- 238000004519 manufacturing process Methods 0.000 title claims description 67
- 239000010410 layer Substances 0.000 claims description 207
- 238000000034 method Methods 0.000 claims description 58
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 claims description 53
- 229910003468 tantalcarbide Inorganic materials 0.000 claims description 53
- 239000003870 refractory metal Substances 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 238000005498 polishing Methods 0.000 claims description 7
- 238000001039 wet etching Methods 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 239000002344 surface layer Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 46
- 238000005530 etching Methods 0.000 description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 10
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 3
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 3
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 3
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical compound C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910026551 ZrC Inorganic materials 0.000 description 2
- OTCHGXYCWNXDOA-UHFFFAOYSA-N [C].[Zr] Chemical compound [C].[Zr] OTCHGXYCWNXDOA-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
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- 239000013043 chemical agent Substances 0.000 description 1
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- 150000004820 halides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- JAGQSESDQXCFCH-UHFFFAOYSA-N methane;molybdenum Chemical compound C.[Mo].[Mo] JAGQSESDQXCFCH-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- -1 sulfur fluorofluoride Chemical compound 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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Description
実施の形態にかかる炭化珪素(SiC)半導体装置の製造方法について、ドリフト層を、不純物濃度を高めたn型領域3とp型領域4とを基板おもて面に平行な方向(横方向:後述する第2方向Y)に交互に繰り返し配置してなる並列pn層5とした超接合(SJ)半導体装置を作製(製造)する場合を例に説明する。図1は、実施の形態にかかる炭化珪素半導体装置の製造方法の概要を示すフローチャートである。
2 n型バッファ層
3 並列pn層のn型領域
4 並列pn層のp型領域
5 並列pn層
6 p型ベース領域
7 n+型ソース領域
8 ゲート絶縁膜
9 ゲート電極
10 エピタキシャル基板
10' 平坦化後のエピタキシャル基板
11 層間絶縁膜
12 ソース電極
13 ドレイン電極
21 n型エピタキシャル層
21a メサ領域
22 p型エピタキシャル層
31 p型エピタキシャル層が埋め込まれるトレンチの形成時にマスクとして用いる酸化膜(酸化膜マスク)
31a 酸化膜(酸化膜マスク)の開口部
32 レジスト膜
32a レジスト膜の開口部
33 トレンチ
34 TaC膜
35 p型エピタキシャル層の、並列pn層の表面上に突出する部分
d1 トレンチの深さ
t1 n型エピタキシャル層の厚さ
t2 酸化膜(酸化膜マスク)の厚さ
t3 レジスト膜の厚さ
t4 TaC膜の、エピタキシャル基板のおもて面上の部分の厚さ
t5 p型エピタキシャル層の、メサ領域上に堆積される部分の厚さ
w1 レジスト膜の開口部の幅
w2 レジスト膜の、開口部間に残る部分の幅
w3 トレンチの短手方向の幅
w4 メサ領域の短手方向の幅
w11 p型ベース領域の幅
w12 並列pn層のp型領域の幅
X トレンチがエピタキシャル基板のおもて面に平行にストライプ状に延びる方向(第1方向)
Y エピタキシャル基板のおもて面に平行で、かつ第1方向と直交する方向(第2方向)
Z 深さ方向
Claims (12)
- 第1導電型領域と第2導電型領域とを交互に繰り返し配置してなる並列pn層を備えた炭化珪素半導体装置の製造方法であって、
炭化珪素からなる第1導電型の半導体基板の一方の主面から所定深さに達するトレンチを形成し、前記第1導電型領域となる部分を残す第1工程と、
前記半導体基板の一方の主面の、前記トレンチ以外の部分を覆うマスク膜を形成する第2工程と、
前記半導体基板の一方の主面を前記マスク膜で覆った状態で、前記トレンチの内部を前記第2導電型領域となる第2導電型エピタキシャル層で埋め込むことで、前記第1導電型領域と前記第2導電型領域との前記並列pn層を形成する第3工程と、
前記第3工程の後、前記第2導電型エピタキシャル層の、前記半導体基板の一方の主面よりも前記マスク膜側の部分と、前記マスク膜と、を除去することで、前記半導体基板の一方の主面に、前記第1導電型領域と前記第2導電型領域とを前記半導体基板の一方の主面に平行な方向に交互に繰り返した前記並列pn層を露出させる第4工程と、
を含み、
前記第2工程では、前記第2導電型エピタキシャル層のエピタキシャル成長温度以上の耐熱性を有する高融点金属の炭化物で前記マスク膜を形成し、
前記第3工程では、前記マスク膜の上にも前記第2導電型エピタキシャル層を形成し、
前記第4工程では、前記第2導電型エピタキシャル層の、前記半導体基板の一方の主面よりも前記マスク膜側の部分と、前記マスク膜と、を研削して除去し、前記半導体基板の一方の主面に露出した前記並列pn層の表面を研磨することを特徴とする炭化珪素半導体装置の製造方法。 - 前記第2工程では、
前記第1工程の後に、スパッタリング法により前記マスク膜を形成する膜形成工程と、
前記トレンチの内壁上の前記マスク膜を除去して前記トレンチの内壁を露出させ、前記半導体基板の一方の主面の、前記トレンチ以外の部分上にのみ前記マスク膜を残す除去工程と、を行うことを特徴とする請求項1に記載の炭化珪素半導体装置の製造方法。 - 前記除去工程では、前記マスク膜をウエットエッチングすることで、前記トレンチの内壁上の前記マスク膜を除去することを特徴とする請求項2に記載の炭化珪素半導体装置の製造方法。
- 前記第2工程では、前記マスク膜を20nm以上40nm以下の厚さで形成することを特徴とする請求項1~3のいずれか一つに記載の炭化珪素半導体装置の製造方法。
- 前記第4工程の後、前記半導体基板の一方の主面に露出した前記並列pn層の表面層に所定の素子構造を形成することを特徴とする請求項1~4のいずれか一つに記載の炭化珪素半導体装置の製造方法。
- 前記第1工程では、アスペクト比が5以上の前記トレンチを形成することを特徴とする請求項1~5のいずれか一つに記載の炭化珪素半導体装置の製造方法。
- 前記第1工程の前に、炭化珪素からなる出発基板の上に、第1導電型エピタキシャル層を積層して前記半導体基板を作製する工程をさらに含み、
前記第1工程では、前記第1導電型エピタキシャル層に前記トレンチを形成し、前記第1導電型領域となる部分を残すことを特徴とする請求項1~6のいずれか一つに記載の炭化珪素半導体装置の製造方法。 - 前記第2工程では、前記マスク膜として、炭化タンタル膜を形成することを特徴とする請求項1~7のいずれか一つに記載の炭化珪素半導体装置の製造方法。
- 炭化珪素からなる第1導電型の半導体基板に、第1導電型領域と第2導電型領域とを主面に平行な方向に交互に繰り返し配置してなる並列pn層を備えた炭化珪素基板の製造方法であって、
前記半導体基板の一方の主面から所定深さに達するトレンチを形成し、前記第1導電型領域となる部分を残す第1工程と、
前記半導体基板の一方の主面の、前記トレンチ以外の部分を覆うマスク膜を形成する第2工程と、
前記半導体基板の一方の主面を前記マスク膜で覆った状態で、前記トレンチの内部を前記第2導電型領域となる第2導電型エピタキシャル層で埋め込むことで、前記第1導電型領域と前記第2導電型領域との前記並列pn層を形成する第3工程と、
前記第3工程の後、前記第2導電型エピタキシャル層の、前記半導体基板の一方の主面よりも前記マスク膜側の部分と、前記マスク膜と、を除去することで、前記半導体基板の一方の主面に、前記第1導電型領域と前記第2導電型領域とを前記半導体基板の一方の主面に平行な方向に交互に繰り返した前記並列pn層を露出させる第4工程と、
を含み、
前記第2工程では、前記第2導電型エピタキシャル層のエピタキシャル成長温度以上の耐熱性を有する高融点金属の炭化物で前記マスク膜を形成し、
前記第3工程では、前記マスク膜の上にも前記第2導電型エピタキシャル層を形成し、
前記第4工程では、前記第2導電型エピタキシャル層の、前記半導体基板の一方の主面よりも前記マスク膜側の部分と、前記マスク膜と、を研削して除去し、前記半導体基板の一方の主面に露出した前記並列pn層の表面を研磨することを特徴とする炭化珪素基板の製造方法。 - 前記第2工程では、
前記第1工程の後に、スパッタリング法により前記マスク膜を形成する膜形成工程と、
前記トレンチの内壁上の前記マスク膜を除去して前記トレンチの内壁を露出させ、前記半導体基板の一方の主面の、前記トレンチ以外の部分上にのみ前記マスク膜を残す除去工程と、を行うことを特徴とする請求項9に記載の炭化珪素基板の製造方法。 - 前記除去工程では、前記マスク膜をウエットエッチングすることで、前記トレンチの内壁上の前記マスク膜を除去することを特徴とする請求項10に記載の炭化珪素基板の製造方法。
- 前記第2工程では、前記マスク膜として、炭化タンタル膜を形成することを特徴とする請求項9~11のいずれか一つに記載の炭化珪素基板の製造方法。
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