JP7016309B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7016309B2 JP7016309B2 JP2018175432A JP2018175432A JP7016309B2 JP 7016309 B2 JP7016309 B2 JP 7016309B2 JP 2018175432 A JP2018175432 A JP 2018175432A JP 2018175432 A JP2018175432 A JP 2018175432A JP 7016309 B2 JP7016309 B2 JP 7016309B2
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- 239000004065 semiconductor Substances 0.000 title claims description 53
- 239000000758 substrate Substances 0.000 claims description 98
- 239000000463 material Substances 0.000 claims description 18
- 125000006850 spacer group Chemical group 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 description 42
- 230000005684 electric field Effects 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/043—Beam blanking
- H01J2237/0435—Multi-aperture
- H01J2237/0437—Semiconductor substrate
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- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electron Beam Exposure (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
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Description
本実施形態の半導体装置は、複数の第1の貫通孔を有する第1の基板と、第1の基板上に、複数の第1の貫通孔のそれぞれに隣接して設けられた複数の第1の電極と、第1の基板上に、第1の貫通孔のそれぞれに隣接して第1の電極とそれぞれ対向するように設けられた複数の第2の電極と、第1の基板と対向するように設けられ、複数の第1の貫通孔のそれぞれに対向する複数の第2の貫通孔を有し、少なくとも第1の基板との対向面において導電性を有し、第2の電極と電気的に接続された第2の基板と、を備える。
本実施形態の半導体装置は、複数の第1の電極の上に第2の基板の一部が設けられている点で、第1の実施形態の半導体装置と異なっている。ここで、第1の実施形態と重複する点については、記載を省略する。
本実施形態の半導体装置は、第1の基板の貫通孔のアレイ周縁で、第2の基板との対向面に設けられ、導電性を有する第1の接合材と、第2の基板の周縁で、第1の基板との対向面に設けられ、導電性を有する第2の接合材と、第1の接合材と第2の接合材の間に設けられたスペーサと、を備える点で、第1及び第2の実施形態と異なっている。ここで、第1及び第2の実施形態と重複する点については、記載を省略する。
12 第1の貫通孔
14 電源電極(第1の電極)
16 接地電極(第2の電極)
18 突起部
20 第1の基板
32 導電膜
34 第2の貫通孔
36 凹部
40 第2の基板
90 第1の接合材
92 第2の接合材
94 スペーサ
100a 半導体装置(ブランキングアパーチャアレイ)
100b 半導体装置(ブランキングアパーチャアレイ)
100c 半導体装置(ブランキングアパーチャアレイ)
100d 半導体装置(ブランキングアパーチャアレイ)
101 試料
102 電子鏡筒
103 描画室
105 XYステージ
110 マルチビーム
120 電子ビーム
150 電子ビーム描画装置
200 電子ビーム
201 電子銃
202 照明レンズ
203 成型アパーチャアレイ
205 縮小レンズ
206 制限アパーチャ部材
207 対物レンズ
208 主偏向器
209 副偏向器
210 ミラー
Claims (5)
- 複数の第1の貫通孔を有する第1の基板と、
前記第1の基板上に、複数の前記第1の貫通孔のそれぞれに隣接して設けられた複数の第1の電極と、
前記第1の基板上に、前記第1の貫通孔のそれぞれに隣接して前記第1の電極とそれぞれ対向するように設けられた複数の第2の電極と、
前記第1の基板と対向するように設けられ、複数の前記第1の貫通孔のそれぞれに対向する複数の第2の貫通孔と、前記複数の第1の電極のそれぞれに対向する部分に、前記複数の第1の電極の形状のそれぞれにあわせて設けられた複数の凹部と、を有し、少なくとも前記第1の基板との対向面において導電性を有し、前記第2の電極と電気的に接続された第2の基板と、
を備える半導体装置。 - 前記第2の貫通孔の下に前記第1の貫通孔と、前記第1の基板の一部が設けられた請求項1記載の半導体装置。
- 前記第2の貫通孔の開口形状は、前記第1の電極と前記第1の貫通孔の上面形状を合せた形状と略相似形状である請求項1又は請求項2に記載の半導体装置。
- 前記第2の電極と前記第2の基板との間に設けられた突起部をさらに備える請求項3記載の半導体装置。
- 前記第1の基板の貫通孔のアレイ周縁で、前記第2の基板との対向面に設けられ、導電性を有する第1の接合材と、
前記第2の基板の周縁で、前記第1の基板との対向面に設けられ、導電性を有する第2の接合材と、
前記第1の接合材と前記第2の接合材の間に設けられたスペーサと、
を備える請求項1ないし請求項4いずれか一項記載の半導体装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018175432A JP7016309B2 (ja) | 2018-09-19 | 2018-09-19 | 半導体装置 |
TW108128727A TWI776078B (zh) | 2018-09-19 | 2019-08-13 | 半導體裝置 |
US16/547,960 US11189554B2 (en) | 2018-09-19 | 2019-08-22 | Semiconductor device |
KR1020190108715A KR102303434B1 (ko) | 2018-09-19 | 2019-09-03 | 반도체 장치 |
CN201910880521.3A CN110931337B (zh) | 2018-09-19 | 2019-09-18 | 半导体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018175432A JP7016309B2 (ja) | 2018-09-19 | 2018-09-19 | 半導体装置 |
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JP2020047788A JP2020047788A (ja) | 2020-03-26 |
JP7016309B2 true JP7016309B2 (ja) | 2022-02-04 |
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JP2018175432A Active JP7016309B2 (ja) | 2018-09-19 | 2018-09-19 | 半導体装置 |
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US (1) | US11189554B2 (ja) |
JP (1) | JP7016309B2 (ja) |
KR (1) | KR102303434B1 (ja) |
CN (1) | CN110931337B (ja) |
TW (1) | TWI776078B (ja) |
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JP2000164495A (ja) | 1998-11-26 | 2000-06-16 | Advantest Corp | 荷電粒子ビーム露光装置及びそこで使用するブランキング・アパーチャ・アレイ |
JP2006013390A (ja) | 2004-06-29 | 2006-01-12 | Canon Inc | 偏向器、偏向器アレイ、偏向器の作製方法、荷電粒子線露光装置およびデバイス製造方法 |
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JP2014041948A (ja) | 2012-08-23 | 2014-03-06 | Canon Inc | 荷電粒子線レンズアレイ用電極基板とその製造方法、及びこれを用いた露光装置 |
JP2017216338A (ja) | 2016-05-31 | 2017-12-07 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビームのブランキング装置及びマルチ荷電粒子ビーム照射装置 |
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US20200091056A1 (en) | 2020-03-19 |
US11189554B2 (en) | 2021-11-30 |
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KR20200033175A (ko) | 2020-03-27 |
TWI776078B (zh) | 2022-09-01 |
CN110931337A (zh) | 2020-03-27 |
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KR102303434B1 (ko) | 2021-09-23 |
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