JP6987914B2 - 変調光源を備える光学計測ツール - Google Patents
変調光源を備える光学計測ツール Download PDFInfo
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- JP6987914B2 JP6987914B2 JP2020053692A JP2020053692A JP6987914B2 JP 6987914 B2 JP6987914 B2 JP 6987914B2 JP 2020053692 A JP2020053692 A JP 2020053692A JP 2020053692 A JP2020053692 A JP 2020053692A JP 6987914 B2 JP6987914 B2 JP 6987914B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
- G01N2021/213—Spectrometric ellipsometry
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Lasers (AREA)
Description
Claims (7)
- 照明ビームを生成するよう構成された変調可能な励起源と、
所定量のガスを収容するバルブを有するプラズマセルと、
前記照明ビームを成形し、前記所定量のガス内にプラズマを維持するために、前記変調可能な励起源からの前記照明ビームを前記所定量のガス内に合焦させるよう構成された光学素子の組と、
前記プラズマセルから放射された広帯域照明を試料の表面に向ける照明光学系の組と、
集光光学系の組と、
試料の表面から発する照明の少なくとも一部を検出するよう構成された検出器であって、前記集光光学系の組は前記試料の前記表面からの照明を前記検出器に向けるよう構成された検出器と、
前記変調可能な励起源に通信可能に接続された励起制御システムであって、前記プラズマセル内に収容された前記プラズマ内に時変性を与えるために前記変調可能な励起源の駆動電流を、その下限を非ゼロ電流とし、かつ、選択された変調周波数で変調するよう構成され、前記検出器からの出力が所望の出力となるまで前記変調周波数をスイープ制御する励起制御システムを備える光学計測ツール。 - 前記変調可能な励起光源は、1つ以上のレーザーを備える、請求項1に記載の光学計測ツール。
- 前記時変性は、熱分布である、請求項1に記載の光学計測ツール。
- 前記光学計測ツールは、臨界次元計測、薄膜計測、およびオーバーレイ計測の少なくとも1つを実行するよう構成される、請求項1に記載の光学計測ツール。
- 前記検出器は、CCDアレイ、CMOSアレイ、一次元フォトダイオードアレイ、および二次元フォトダイオードアレイの少なくとも1つを備える、請求項1に記載の光学計測ツール。
- 前記検出器は、前記励起制御システムと同期する、請求項1に記載の光学計測ツール。
- 前記変調可能な励起源からの照明の1つ以上のスペクトル特徴を監視するよう構成され、さらに前記1つ以上のスペクトル特徴を示す信号を前記励起制御システムへ伝送するよう構成されたスペクトル監視システムをさらに備える、請求項1に記載の光学計測ツール。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021195409A JP2022033129A (ja) | 2011-10-11 | 2021-12-01 | 変調光源を備える光学計測ツール |
JP2023176441A JP2023183421A (ja) | 2011-10-11 | 2023-10-12 | 変調光源を備える光学計測ツール |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US201161545965P | 2011-10-11 | 2011-10-11 | |
US61/545,965 | 2011-10-11 | ||
US13/648,768 US9400246B2 (en) | 2011-10-11 | 2012-10-10 | Optical metrology tool equipped with modulated illumination sources |
US13/648,768 | 2012-10-10 | ||
JP2018074068A JP2018105891A (ja) | 2011-10-11 | 2018-04-06 | 変調光源を備える光学計測ツール |
Related Parent Applications (1)
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JP2018074068A Division JP2018105891A (ja) | 2011-10-11 | 2018-04-06 | 変調光源を備える光学計測ツール |
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JP2021195409A Division JP2022033129A (ja) | 2011-10-11 | 2021-12-01 | 変調光源を備える光学計測ツール |
Publications (2)
Publication Number | Publication Date |
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JP2020128984A JP2020128984A (ja) | 2020-08-27 |
JP6987914B2 true JP6987914B2 (ja) | 2022-01-05 |
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Family Applications (5)
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JP2014535873A Active JP6322141B2 (ja) | 2011-10-11 | 2012-10-11 | 変調光源を備える光学計測ツール |
JP2018074068A Pending JP2018105891A (ja) | 2011-10-11 | 2018-04-06 | 変調光源を備える光学計測ツール |
JP2020053692A Active JP6987914B2 (ja) | 2011-10-11 | 2020-03-25 | 変調光源を備える光学計測ツール |
JP2021195409A Pending JP2022033129A (ja) | 2011-10-11 | 2021-12-01 | 変調光源を備える光学計測ツール |
JP2023176441A Pending JP2023183421A (ja) | 2011-10-11 | 2023-10-12 | 変調光源を備える光学計測ツール |
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JP2014535873A Active JP6322141B2 (ja) | 2011-10-11 | 2012-10-11 | 変調光源を備える光学計測ツール |
JP2018074068A Pending JP2018105891A (ja) | 2011-10-11 | 2018-04-06 | 変調光源を備える光学計測ツール |
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JP2021195409A Pending JP2022033129A (ja) | 2011-10-11 | 2021-12-01 | 変調光源を備える光学計測ツール |
JP2023176441A Pending JP2023183421A (ja) | 2011-10-11 | 2023-10-12 | 変調光源を備える光学計測ツール |
Country Status (7)
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US (4) | US9400246B2 (ja) |
EP (1) | EP2766693B1 (ja) |
JP (5) | JP6322141B2 (ja) |
KR (2) | KR101964951B1 (ja) |
CN (1) | CN103930749B (ja) |
TW (1) | TWI567371B (ja) |
WO (1) | WO2013055906A1 (ja) |
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