JP6934407B2 - 加工装置 - Google Patents

加工装置 Download PDF

Info

Publication number
JP6934407B2
JP6934407B2 JP2017226530A JP2017226530A JP6934407B2 JP 6934407 B2 JP6934407 B2 JP 6934407B2 JP 2017226530 A JP2017226530 A JP 2017226530A JP 2017226530 A JP2017226530 A JP 2017226530A JP 6934407 B2 JP6934407 B2 JP 6934407B2
Authority
JP
Japan
Prior art keywords
user terminal
processing
operator
setting screen
control unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017226530A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019096175A (ja
Inventor
香一 牧野
香一 牧野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Priority to JP2017226530A priority Critical patent/JP6934407B2/ja
Priority to KR1020180136367A priority patent/KR102510829B1/ko
Priority to TW107141768A priority patent/TWI791685B/zh
Priority to CN201811404217.3A priority patent/CN109860075B/zh
Publication of JP2019096175A publication Critical patent/JP2019096175A/ja
Application granted granted Critical
Publication of JP6934407B2 publication Critical patent/JP6934407B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Numerical Control (AREA)
  • User Interface Of Digital Computer (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2017226530A 2017-11-27 2017-11-27 加工装置 Active JP6934407B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017226530A JP6934407B2 (ja) 2017-11-27 2017-11-27 加工装置
KR1020180136367A KR102510829B1 (ko) 2017-11-27 2018-11-08 가공 장치
TW107141768A TWI791685B (zh) 2017-11-27 2018-11-23 加工裝置
CN201811404217.3A CN109860075B (zh) 2017-11-27 2018-11-23 加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017226530A JP6934407B2 (ja) 2017-11-27 2017-11-27 加工装置

Publications (2)

Publication Number Publication Date
JP2019096175A JP2019096175A (ja) 2019-06-20
JP6934407B2 true JP6934407B2 (ja) 2021-09-15

Family

ID=66844969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017226530A Active JP6934407B2 (ja) 2017-11-27 2017-11-27 加工装置

Country Status (4)

Country Link
JP (1) JP6934407B2 (ko)
KR (1) KR102510829B1 (ko)
CN (1) CN109860075B (ko)
TW (1) TWI791685B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7275824B2 (ja) * 2019-05-09 2023-05-18 村田機械株式会社 工作機械システム
JP7446136B2 (ja) * 2020-03-26 2024-03-08 東京エレクトロン株式会社 制御システム、制御方法、及び基板処理装置

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2735448B2 (ja) * 1992-12-15 1998-04-02 三菱電機株式会社 Idカード及びそれを用いた半導体製造システム
JP4500402B2 (ja) * 2000-03-09 2010-07-14 キヤノン株式会社 ファインダー装置及びそれを用いた光学機器
JP2007109967A (ja) * 2005-10-14 2007-04-26 Tokyo Electron Ltd 半導体処理装置
KR101132291B1 (ko) * 2008-03-18 2012-04-05 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 장치 및 기판 처리 시스템
US8509954B2 (en) * 2009-08-21 2013-08-13 Allure Energy, Inc. Energy management system and method
JP5678468B2 (ja) * 2010-05-06 2015-03-04 株式会社リコー 画像処理システム及び動作管理方法
JP2011255472A (ja) * 2010-06-10 2011-12-22 Disco Corp 加工装置
JP2012000701A (ja) 2010-06-15 2012-01-05 Disco Corp 加工装置
US9142122B2 (en) * 2010-11-25 2015-09-22 Panasonic Intellectual Property Corporation Of America Communication device for performing wireless communication with an external server based on information received via near field communication
JP2014010745A (ja) 2012-07-02 2014-01-20 Disco Abrasive Syst Ltd 加工装置
JP2014063423A (ja) * 2012-09-24 2014-04-10 Disco Abrasive Syst Ltd 加工装置
JP6098232B2 (ja) * 2013-03-01 2017-03-22 大日本印刷株式会社 店舗支援システム、携帯端末、通信装置、およびプログラム
JP5935771B2 (ja) * 2013-07-30 2016-06-15 ブラザー工業株式会社 レーザ加工システム
JP5907624B2 (ja) * 2013-09-13 2016-04-26 シャープ株式会社 情報処理装置
DE102013220865A1 (de) * 2013-10-15 2015-04-16 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Verfahren und System zum Fernbedienen einer Werkzeugmaschine mittels eines mobilen Kommunikationsgeräts
JP6206099B2 (ja) * 2013-11-05 2017-10-04 セイコーエプソン株式会社 画像表示システム、画像表示システムを制御する方法、および、頭部装着型表示装置
JP6382554B2 (ja) * 2014-03-31 2018-08-29 パナソニック デバイスSunx株式会社 レーザ加工装置
KR20160016579A (ko) * 2014-07-31 2016-02-15 삼성전자주식회사 특정 영역에서 애플리케이션을 실행하는 휴대 단말 및 그 방법
JP6149822B2 (ja) * 2014-08-21 2017-06-21 コニカミノルタ株式会社 情報処理システム、情報処理装置、携帯端末装置およびプログラム
DE102014217880A1 (de) 2014-09-08 2016-03-10 Robert Bosch Gmbh Anordnung und Verfahren zu deren Betrieb
CN105527845A (zh) * 2014-10-20 2016-04-27 上海本星电子科技有限公司 一种智能家居控制***以及智能控制软件***
TW201618928A (zh) * 2014-11-24 2016-06-01 弘訊科技股份有限公司 射出成形設備
JP6194876B2 (ja) * 2014-12-12 2017-09-13 コニカミノルタ株式会社 画像処理装置、その制御方法、およびプログラム
WO2016199251A1 (ja) * 2015-06-10 2016-12-15 三菱電機ビルテクノサービス株式会社 設備保守管理システム、設備保守装置及びプログラム
JP6575326B2 (ja) * 2015-11-27 2019-09-18 コニカミノルタ株式会社 画像形成システム、画像形成装置およびプログラム
JP6661354B2 (ja) * 2015-12-04 2020-03-11 キヤノン株式会社 通信装置及び制御方法
JP2019125736A (ja) 2018-01-18 2019-07-25 株式会社Kokusai Electric 基板処理システム、半導体装置の製造方法、基板処理装置、プログラム

Also Published As

Publication number Publication date
CN109860075A (zh) 2019-06-07
TWI791685B (zh) 2023-02-11
KR102510829B1 (ko) 2023-03-15
KR20190062191A (ko) 2019-06-05
CN109860075B (zh) 2023-10-03
TW201925936A (zh) 2019-07-01
JP2019096175A (ja) 2019-06-20

Similar Documents

Publication Publication Date Title
US11494754B2 (en) Methods for locating an antenna within an electronic device
US8625796B1 (en) Method for facilitating authentication using proximity
KR101714873B1 (ko) 컨텍스트 기반 데이터 액세스 제어
EP3229165B1 (en) Controlling access to application data
CN107103245B (zh) 文件的权限管理方法及装置
CN115118522A (zh) 账户访问恢复***、方法和装置
US9740846B2 (en) Controlling user access to electronic resources without password
CN105335642B (zh) 图片的处理方法及处理***
US10298556B2 (en) Systems and methods for secure storage and management of credentials and encryption keys
WO2012170489A2 (en) Situation aware security system and method for mobile devices
JP6934407B2 (ja) 加工装置
CN107533624B (zh) 检测和防止设备的非法使用
KR101318170B1 (ko) 태블릿장비를 이용한 자료공유시스템 및 그 제어방법
JP2018097524A (ja) 操作者識別システム
JP2007316962A (ja) 作業者管理方法、これに用いる情報処理装置及び作業者端末、プログラム
US9699657B2 (en) File encryption, decryption and accessvia near field communication
EP3203369B1 (en) Image forming apparatus, print control method, and computer-readable recording medium encoded with print control program
KR101745390B1 (ko) 데이터 유출 방지장치 및 그 방법
KR101603988B1 (ko) 상황인식 서비스 시스템
WO2016193176A1 (en) A remotely protected electronic device
US20170265078A1 (en) File encryption, decryption and accessvia near field communication
KR20160135864A (ko) Nfc 태그 관리 시스템 및 관리 방법
KR20070033601A (ko) 탈착감지 epp 패드
JP5920946B2 (ja) 加入者認証モジュールの不正使用防止装置および不正使用防止方法ならびに通信端末
KR20030070284A (ko) 독립형 지문인식 모듈 및 독립형 지문인식 모듈의 보안 방법

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200914

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210630

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20210803

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210823

R150 Certificate of patent or registration of utility model

Ref document number: 6934407

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150