JP6917166B2 - ダイシング用粘着テープ、ダイシング用粘着テープの製造方法、および半導体チップの製造方法 - Google Patents
ダイシング用粘着テープ、ダイシング用粘着テープの製造方法、および半導体チップの製造方法 Download PDFInfo
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- JP6917166B2 JP6917166B2 JP2017049564A JP2017049564A JP6917166B2 JP 6917166 B2 JP6917166 B2 JP 6917166B2 JP 2017049564 A JP2017049564 A JP 2017049564A JP 2017049564 A JP2017049564 A JP 2017049564A JP 6917166 B2 JP6917166 B2 JP 6917166B2
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- adhesive tape
- adhesive layer
- dicing
- radiation
- pressure
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
- C09J175/04—Polyurethanes
- C09J175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1806—C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017049564A JP6917166B2 (ja) | 2017-03-15 | 2017-03-15 | ダイシング用粘着テープ、ダイシング用粘着テープの製造方法、および半導体チップの製造方法 |
KR1020180017410A KR102494629B1 (ko) | 2017-03-15 | 2018-02-13 | 다이싱용 점착 테이프, 다이싱용 점착 테이프의 제조 방법, 및 반도체 칩의 제조 방법 |
CN201810200202.9A CN108624250B (zh) | 2017-03-15 | 2018-03-12 | 切割用粘着胶带、切割用粘着胶带的制造方法以及半导体芯片的制造方法 |
TW107108427A TWI761467B (zh) | 2017-03-15 | 2018-03-13 | 切割用黏著膠帶、切割用黏著膠帶之製造方法及半導體晶片之製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017049564A JP6917166B2 (ja) | 2017-03-15 | 2017-03-15 | ダイシング用粘着テープ、ダイシング用粘着テープの製造方法、および半導体チップの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018152529A JP2018152529A (ja) | 2018-09-27 |
JP6917166B2 true JP6917166B2 (ja) | 2021-08-11 |
Family
ID=63681796
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017049564A Active JP6917166B2 (ja) | 2017-03-15 | 2017-03-15 | ダイシング用粘着テープ、ダイシング用粘着テープの製造方法、および半導体チップの製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6917166B2 (ko) |
KR (1) | KR102494629B1 (ko) |
CN (1) | CN108624250B (ko) |
TW (1) | TWI761467B (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111180322B (zh) * | 2018-11-13 | 2022-05-31 | 华邦电子股份有限公司 | 切割晶圆的方法 |
KR102452862B1 (ko) * | 2019-01-25 | 2022-10-12 | 후루카와 덴키 고교 가부시키가이샤 | 반도체 웨이퍼 가공용 자외선 경화형 점착 테이프 및 반도체 칩의 제조 방법과 이 테이프의 사용 방법 |
JP7378230B2 (ja) * | 2019-06-10 | 2023-11-13 | リンテック株式会社 | 粘着シートおよび積層体 |
JP7404007B2 (ja) * | 2019-09-11 | 2023-12-25 | 株式会社ディスコ | ウエーハの加工方法 |
JP7479336B2 (ja) | 2021-08-06 | 2024-05-08 | 古河電気工業株式会社 | 半導体製造工程用搬送テープ |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3410202B2 (ja) * | 1993-04-28 | 2003-05-26 | 日本テキサス・インスツルメンツ株式会社 | ウェハ貼着用粘着シートおよびこれを用いた半導体装置の製造方法 |
JP4620028B2 (ja) * | 2006-10-19 | 2011-01-26 | 日東電工株式会社 | 基板加工用粘着シート |
JP5080831B2 (ja) * | 2007-03-14 | 2012-11-21 | 電気化学工業株式会社 | 電子部品固定用粘着シート及びそれを用いた電子部品の製造方法 |
JP5513734B2 (ja) * | 2008-11-27 | 2014-06-04 | リンテック株式会社 | 接着剤組成物、接着シートおよび半導体装置の製造方法 |
JP5656379B2 (ja) | 2009-03-03 | 2015-01-21 | 日立マクセル株式会社 | ダイシング用粘着フィルム、及び半導体素子の製造方法 |
TW201043674A (en) * | 2009-04-17 | 2010-12-16 | Furukawa Electric Co Ltd | Adhesive thin film and wafer processing tape |
JP5461292B2 (ja) * | 2010-04-28 | 2014-04-02 | 日立マクセル株式会社 | ダイシング用粘着フィルム、及び切断片の製造方法 |
JP5764519B2 (ja) | 2011-03-31 | 2015-08-19 | 古河電気工業株式会社 | ダイシングテープ及び半導体ウエハ加工方法 |
JP2012227232A (ja) * | 2011-04-15 | 2012-11-15 | Denki Kagaku Kogyo Kk | 加工用粘着シート及びそれを用いた板状材料の製造方法 |
JP5855034B2 (ja) * | 2013-02-18 | 2016-02-09 | 古河電気工業株式会社 | 半導体ウェハ加工用粘着テープ及び半導体ウェハの分割方法 |
KR102359829B1 (ko) * | 2014-05-12 | 2022-02-07 | 덴카 주식회사 | 반도체 검사용의 내열성 점착 시트, 및 반도체 검사 방법 |
TWI678409B (zh) * | 2015-01-09 | 2019-12-01 | 日商電化股份有限公司 | 切割膠帶 |
JP6782237B2 (ja) * | 2015-07-24 | 2020-11-11 | デンカ株式会社 | 半導体加工用粘着テープ及びそれを用いた半導体チップ又は半導体部品の製造方法 |
-
2017
- 2017-03-15 JP JP2017049564A patent/JP6917166B2/ja active Active
-
2018
- 2018-02-13 KR KR1020180017410A patent/KR102494629B1/ko active IP Right Grant
- 2018-03-12 CN CN201810200202.9A patent/CN108624250B/zh active Active
- 2018-03-13 TW TW107108427A patent/TWI761467B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR102494629B1 (ko) | 2023-02-02 |
TWI761467B (zh) | 2022-04-21 |
KR20180105568A (ko) | 2018-09-28 |
CN108624250A (zh) | 2018-10-09 |
CN108624250B (zh) | 2021-12-10 |
JP2018152529A (ja) | 2018-09-27 |
TW201840412A (zh) | 2018-11-16 |
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