JP6911003B2 - 素子アレイの製造方法と特定素子の除去方法 - Google Patents
素子アレイの製造方法と特定素子の除去方法 Download PDFInfo
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- JP6911003B2 JP6911003B2 JP2018234755A JP2018234755A JP6911003B2 JP 6911003 B2 JP6911003 B2 JP 6911003B2 JP 2018234755 A JP2018234755 A JP 2018234755A JP 2018234755 A JP2018234755 A JP 2018234755A JP 6911003 B2 JP6911003 B2 JP 6911003B2
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Description
そこで、基板上に等間隔で形成した微小な発光ダイオード素子を選択的に剥離して、他の基板に対して素子を転写する技術が提案されている(たとえば特許文献1参照)。
粘着性シートの粘着層の表面に、所定の配列で素子が並べられた前記粘着性シートを準備する工程と、
所定の配列で並べられた素子の内、特定の素子にレーザを照射し、前記特定の素子を前記粘着シートから除去する工程と、
前記粘着シートの表面に付着してある所定配列の素子を、直接または間接的に実装用基板上に転写する工程と、を有する。
素子形成用基板上に、前記素子を所定の配列で作り込む工程と、
前記素子形成用基板上に作り込まれた所定の配列の前記素子を、前記粘着性シートの粘着層の表面に転写する工程と、をさらに有してもよい。
粘着性シートの粘着層の表面に、所定の配列で素子が並べられた前記粘着性シートを準備する工程と、
所定の配列で並べられた素子の内、特定の素子にレーザを照射し、前記特定の素子を前記粘着シートから除去し、前記粘着シートの表面には、その他の素子を残す工程と、を有する。
レーザ照射によって素子23aに加わるエネルギーが、素子23aと粘着層の界面に到達し、そのエネルギーが物理的な応力として粘着層と素子23aとの粘着を剥がす形で加わるためと考えられる。あるいは、レーザ照射によって素子23aに加わるエネルギーが直接素子に及ぼす外力として作用することとなり、その外力によって素子23aが剥がされることが考えられる。
20… 特定素子の除去装置
22… 基板(粘着シート)
22a… 基板本体
22b… 粘着層
23… 素子
23a… 特定の素子
24… 基板ステージ
25… 素子形成用基板
26… Z軸移動テーブル
26a… 設置台
28… Y軸移動ベース
29… レール
30… レーザ照射器具
32… レーザ出射部
34… 撮像装置
40… 回収機構
42… 気体吹付機構
50… 基板取り付け装置
52… 基板吸着器具
54… 回動ロッド
56… 支持ロッド
58… Y軸移動ブロック
59… レール
60… 仮置き台
L… レーザ光
La… 照射範囲
Y1… 処理位置
Y2… 取付位置
Y3… 受け渡し位置
Claims (9)
- 粘着性シートの粘着層の表面に、所定の配列で素子を並べて付着させる工程と、
所定の配列で並べられた素子の内、特定の素子にレーザを照射し、前記特定の素子を前記粘着性シートから除去する工程と、
前記特定の素子を前記粘着性シートから除去した空の位置で、前記粘着性シートの前記粘着層の表面に、前記特定の素子とは別の良品な素子を付着させる工程と、
前記粘着性シートの表面に付着してある所定配列の素子を、直接または間接的に実装用基板上に転写する工程と、
を有する素子アレイの製造方法。 - 素子形成用基板上に、前記素子を所定の配列で作り込む工程と、
前記素子形成用基板上に作り込まれた所定の配列の前記素子を、前記粘着性シートの粘着層の表面に転写する工程と、をさらに有する請求項1に記載の素子アレイの製造方法。 - 前記素子形成用基板上に作り込まれた所定の配列の前記素子を、それぞれ検査する工程をさらに有する請求項2に記載の素子アレイの製造方法。
- 前記粘着性シートの粘着層の表面に所定の配列で並べられた素子を、それぞれ検査する工程をさらに有する請求項1〜3のいずれかに記載の素子アレイの製造方法。
- 不良と判定された前記特定の素子には、当該特定の素子の平面形状に合わせた角型スポット形状の照射範囲で、前記レーザが照射される請求項3または4に記載の素子アレイの製造方法。
- 不良と判定された前記特定の素子には、当該特定の素子の平面形状の全体を含む範囲で、前記レーザが照射される請求項3〜5のいずれかに記載の素子アレイの製造方法。
- 不良と判定された前記特定の素子には、3ショット以内のショット数で、前記レーザが照射されることにより、不良と判定された前記特定の素子を前記粘着性シートから弾き飛ばせるように、前記レーザの出力と波長が選択してある請求項3〜6のいずれかに記載の素子アレイの製造方法。
- 前記レーザの波長が532nm以下である請求項7に記載の素子アレイの製造方法。
- 前記素子が表示素子である請求項1〜8のいずれかに記載の素子アレイの製造方法。
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