JP6688875B2 - 組成物、膜、硬化膜、光学センサおよび膜の製造方法 - Google Patents

組成物、膜、硬化膜、光学センサおよび膜の製造方法 Download PDF

Info

Publication number
JP6688875B2
JP6688875B2 JP2018505362A JP2018505362A JP6688875B2 JP 6688875 B2 JP6688875 B2 JP 6688875B2 JP 2018505362 A JP2018505362 A JP 2018505362A JP 2018505362 A JP2018505362 A JP 2018505362A JP 6688875 B2 JP6688875 B2 JP 6688875B2
Authority
JP
Japan
Prior art keywords
group
composition
resin
mass
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018505362A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2017159190A1 (ja
Inventor
哲志 宮田
哲志 宮田
貴規 田口
貴規 田口
祐継 室
祐継 室
秀知 高橋
秀知 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of JPWO2017159190A1 publication Critical patent/JPWO2017159190A1/ja
Application granted granted Critical
Publication of JP6688875B2 publication Critical patent/JP6688875B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
JP2018505362A 2016-03-14 2017-02-15 組成物、膜、硬化膜、光学センサおよび膜の製造方法 Active JP6688875B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016049982 2016-03-14
JP2016049982 2016-03-14
PCT/JP2017/005531 WO2017159190A1 (ja) 2016-03-14 2017-02-15 組成物、膜、硬化膜、光学センサおよび膜の製造方法

Publications (2)

Publication Number Publication Date
JPWO2017159190A1 JPWO2017159190A1 (ja) 2018-12-27
JP6688875B2 true JP6688875B2 (ja) 2020-04-28

Family

ID=59851914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018505362A Active JP6688875B2 (ja) 2016-03-14 2017-02-15 組成物、膜、硬化膜、光学センサおよび膜の製造方法

Country Status (3)

Country Link
JP (1) JP6688875B2 (zh)
TW (1) TW201800464A (zh)
WO (1) WO2017159190A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230164671A (ko) 2021-03-31 2023-12-04 미쯔비시 케미컬 주식회사 착색 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 발광성 나노 결정 입자를 포함하는 컬러 필터 및 화상 표시 장치
KR20230166082A (ko) 2021-03-31 2023-12-06 미쯔비시 케미컬 주식회사 착색 감광성 수지 조성물, 경화물, 격벽, 컬러 필터 및 화상 표시 장치

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019065562A1 (ja) * 2017-09-28 2019-04-04 東レ株式会社 感光性樹脂組成物、感光性シート、ならびにそれらの硬化膜、その製造方法、それを用いた中空構造体および電子部品
WO2019176785A1 (ja) * 2018-03-14 2019-09-19 東レ株式会社 ネガ型感光性着色組成物、硬化膜、それを用いたタッチパネル
JP7081337B2 (ja) * 2018-06-27 2022-06-07 Dic株式会社 光硬化性組成物及びその製造方法
JP6962958B2 (ja) * 2019-03-25 2021-11-05 株式会社タムラ製作所 感光性樹脂組成物
US20220348722A1 (en) * 2019-10-03 2022-11-03 Dow Toray Co., Ltd. Uv-curable organopolysiloxane composition and use thereof
EP4130147A4 (en) 2020-03-30 2023-08-09 FUJIFILM Corporation COMPOSITION, FILM AND OPTICAL SENSOR
WO2023054142A1 (ja) 2021-09-29 2023-04-06 富士フイルム株式会社 組成物、樹脂、膜および光センサ
TWI827161B (zh) * 2022-07-26 2023-12-21 台虹科技股份有限公司 鈦黑組合物、聚醯胺酸組合物、聚醯亞胺膜及其層疊體

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4332360B2 (ja) * 2003-02-28 2009-09-16 大日本印刷株式会社 濡れ性パターン形成用塗工液およびパターン形成体の製造方法
WO2009035874A1 (en) * 2007-09-07 2009-03-19 3M Innovative Properties Company Self-assembling antireflective coating comprising surface modified high refractive index nanoparticles
WO2009090867A1 (ja) * 2008-01-15 2009-07-23 Sekisui Chemical Co., Ltd. レジスト材料及び積層体
JP2009251093A (ja) * 2008-04-02 2009-10-29 Konica Minolta Opto Inc 光学用複合材料、及び光学素子
JP5544739B2 (ja) * 2009-03-31 2014-07-09 日立化成株式会社 光反射用熱硬化性樹脂組成物、これを用いた光半導体素子搭載用基板及びその製造方法、並びに光半導体装置
JP2012064928A (ja) * 2010-08-18 2012-03-29 Mitsubishi Chemicals Corp 半導体発光装置用樹脂成形体用材料及び樹脂成形体
JP2012124428A (ja) * 2010-12-10 2012-06-28 Mitsubishi Chemicals Corp 半導体発光装置用樹脂成形体
JP2012185463A (ja) * 2011-02-14 2012-09-27 Sekisui Chem Co Ltd 感光性組成物の製造方法
JP5919903B2 (ja) * 2011-03-31 2016-05-18 三菱化学株式会社 半導体発光装置用パッケージ及び該パッケージを有してなる半導体発光装置並びにそれらの製造方法
JP2014145012A (ja) * 2013-01-28 2014-08-14 Mitsubishi Chemicals Corp 樹脂組成物、波長変換部材、発光装置、ｌｅｄ照明器具、及び光学部材
US9651865B2 (en) * 2013-02-14 2017-05-16 Toray Industries, Inc. Negative-type photosensitive coloring composition, cured film, light-shielding pattern for touch panel, and touch panel manufacturing method
JP2015048446A (ja) * 2013-09-03 2015-03-16 三菱化学株式会社 波長変換部材、発光装置、照明器具、及び、ディスプレイ
JP2016061818A (ja) * 2014-09-16 2016-04-25 東洋インキＳｃホールディングス株式会社 光散乱層用樹脂組成物、光散乱層、および有機エレクトロルミネッセンス装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230164671A (ko) 2021-03-31 2023-12-04 미쯔비시 케미컬 주식회사 착색 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 발광성 나노 결정 입자를 포함하는 컬러 필터 및 화상 표시 장치
KR20230166082A (ko) 2021-03-31 2023-12-06 미쯔비시 케미컬 주식회사 착색 감광성 수지 조성물, 경화물, 격벽, 컬러 필터 및 화상 표시 장치

Also Published As

Publication number Publication date
TW201800464A (zh) 2018-01-01
WO2017159190A1 (ja) 2017-09-21
JPWO2017159190A1 (ja) 2018-12-27

Similar Documents

Publication Publication Date Title
JP6688875B2 (ja) 組成物、膜、硬化膜、光学センサおよび膜の製造方法
JP6692428B2 (ja) 積層体、キット、積層体の製造方法および光学センサ
US10928726B2 (en) Dispersion liquid, composition, film, manufacturing method of film, and dispersant
JP6701324B2 (ja) 組成物、膜、硬化膜、光学センサおよび膜の製造方法
JP6893236B2 (ja) 組成物、膜、光センサおよび分散剤
WO2018180116A1 (ja) 構造体および光センサ
TWI795360B (zh) 硬化膜形成用組成物、硬化膜、彩色濾光片、遮光膜、固體攝像裝置及圖像顯示裝置
US10678131B2 (en) Composition, film, cured film, optical sensor, and method for producing film
JP6717930B2 (ja) 遠赤外線透過性組成物、形成体、積層体、遠赤外線透過フィルタ、固体撮像素子および赤外線カメラ
US11045834B2 (en) Method for producing film
WO2023190567A1 (ja) 遮光膜、固体撮像素子、画像表示装置、赤外線センサ
WO2017163818A1 (ja) 赤外線フィルタ、赤外線センサおよび赤外線フィルタ用組成物

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180830

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190730

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190906

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200204

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200316

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20200331

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20200406

R150 Certificate of patent or registration of utility model

Ref document number: 6688875

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250