JP6496026B2 - 配線基板および電子装置 - Google Patents
配線基板および電子装置 Download PDFInfo
- Publication number
- JP6496026B2 JP6496026B2 JP2017531129A JP2017531129A JP6496026B2 JP 6496026 B2 JP6496026 B2 JP 6496026B2 JP 2017531129 A JP2017531129 A JP 2017531129A JP 2017531129 A JP2017531129 A JP 2017531129A JP 6496026 B2 JP6496026 B2 JP 6496026B2
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- Japan
- Prior art keywords
- wiring board
- conductive layer
- insulating layer
- electronic element
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
本発明の1つの態様に係る配線基板は、上面が平坦な板状の絶縁層と、前記絶縁層の上面に設けられた、前記絶縁層の外縁と間を空けて配置された導電層とを有している。前記導電層は、前記絶縁層の外縁に沿って外周が盛り上がった周縁領域と、前記周縁領域の内側に存在する中央領域と、当該中央領域に前記周縁領域の高さ位置まで盛り上がった線状部とを有する。前記導電層の上面に設けられた、前記導電層を覆った第2絶縁層が設けられている。
図1〜図5および図11〜図12を参照して本発明の第1の実施形態における電子装置21、および配線基板1について説明する。本実施形態における電子装置21は、配線基板1と電子素子10と蓋体とを有している。なお、図2、図4については蓋体を省略している。また、図1〜図4では、本実施形態の上面図または断面図の一例を示している。また図5では図1および図3に示す本実施形態の要部Bの拡大図を示している。また、図11および図12では本実施形態の配線基板を製作する方法の一例を示している。また、図1〜図5においては、内層に見える部分を点線で、また導電層4が凸になった部分(断面視で盛り上がった部分)をドットのハッチで示している。
次に、本発明の第2の実施形態による配線基板1について、図6および図7を参照しつつ説明する。また、図6および図7においては、内層に見える部分を点線で、また導電層4が凸になった部分(断面視で盛り上がった部分)をドットのハッチで示している。
次に、本発明の第3の実施形態による配線基板1について、図8を参照しつつ説明する。また、図8においては、内層に見える部分を点線で、また導電層4が凸になった部分(断面視で盛り上がった部分)をドットのハッチで示している。
次に、本発明の第4の実施形態による配線基板1について、図9を参照しつつ説明する。また、また、図9は本実施形態の要部、つまり中央領域4dの拡大図であり、周縁領域4cは省略している。
次に、本発明の第5の実施形態による配線基板1について、図10を参照しつつ説明する。また、図10は本実施形態の要部、つまり中央領域4dの拡大図であり、周縁領域4cは省略している。本実施形態における配線基板1において、第4の実施形態の配線基板1と異なる点は、2つの導電層4が向かい合うように設けられている点である。
2・・・・基体
2a・・・基部
2b・・・枠部
3・・・・パッド
4・・・・導電層
4a・・・線状部
4c・・・周縁領域
4d・・・中央領域
5・・・・絶縁層
5a・・・第2絶縁層
6・・・・第2導電層
6a・・・第2線状部
7・・・・第3導電層
7a・・・第3線状部
8・・・・平坦化膜
8a・・・平坦化膜線状部
10・・・電子素子
13・・・接続部材
21・・・電子装置
41・・・工程途中の電子素子実装用基板
42・・・セラミックグリーンシート
44・・・第1導体インク
45・・・第2導体インク
46・・・マスク
46a・・マスク開口部
46b・・マスク閉口部
Claims (9)
- 上面が平坦な板状の絶縁層と、
前記絶縁層の上面に設けられた、前記絶縁層の外縁と間を空けて配置された導電層であって、前記絶縁層の外縁に沿って外周が盛り上がった周縁領域と、前記周縁領域の内側に存在する中央領域と、当該中央領域に前記周縁領域の高さ位置まで盛り上がった線状部とを有する、導電層と、を備えており、
前記線状部は前記絶縁層の中心部から外側に向かって放射状に延びていることを特徴とする配線基板。 - 上面が平坦な板状の絶縁層と、
前記絶縁層の上面に設けられた、前記絶縁層の外縁と間を空けて配置された導電層であって、前記絶縁層の外縁に沿って外周が盛り上がった周縁領域と、前記周縁領域の内側に存在する中央領域と、当該中央領域に前記周縁領域の高さ位置まで盛り上がった線状部とを有する、導電層と、を備えており、
前記導電層の上面に設けられた、前記導電層を覆った第2絶縁層が設けられていることを特徴とする配線基板。 - 前記配線基板は電子素子が実装される電子素子実装部を有しており、
前記線状部は前記電子素子実装部内に少なくとも2ヵ所以上に設けられており、当該線状部同士は間を空けて設けられていることを特徴とする
請求項1または請求項2に記載の配線基板。 - 前記配線基板は矩形状であり、
前記線状部は上面視で前記配線基板の各4辺に沿った、前記線状部同士が繋がった枠状であることを特徴とする
請求項2に記載の配線基板。 - 前記導電層は、前記配線基板の表面に設けられていることを特徴とする
請求項1乃至請求項4のいずれかに記載の配線基板。 - 前記第2絶縁層上には、前記導電層における前記周縁領域の最上部および前記線状部の最上部と重ならない箇所に、上方に向かって盛り上がった第2導電層が設けられていることを特徴とする
請求項2に記載の配線基板。 - 前記導電層上には、前記導電層における前記周縁領域の最上部および前記線状部の最上部と重なる箇所に、上方に窪んだ第3導電層が設けられていることを特徴とする請求項2に記載の配線基板。
- 前記導電層上には、前記導電層における前記周縁領域の最上部および前記線状部の最上部と重なる箇所に、上方に窪んだ平坦化膜が設けられていることを特徴とする請求項2に記載の配線基板。
- 請求項1乃至請求項8のいずれかに記載の配線基板と、
前記配線基板の上面に実装された電子素子と、を備え、
前記電子素子は、前記線状部と重なる位置に実装されていることを特徴とする電子装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2015148744 | 2015-07-28 | ||
JP2015148744 | 2015-07-28 | ||
PCT/JP2016/070629 WO2017018212A1 (ja) | 2015-07-28 | 2016-07-13 | 配線基板および電子装置 |
Publications (2)
Publication Number | Publication Date |
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JPWO2017018212A1 JPWO2017018212A1 (ja) | 2018-04-12 |
JP6496026B2 true JP6496026B2 (ja) | 2019-04-03 |
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