JP6251825B2 - リソグラフィ装置、及び基板を搬送する方法 - Google Patents
リソグラフィ装置、及び基板を搬送する方法 Download PDFInfo
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Description
本出願は、2014年6月16日に出願された欧州出願第14172626.5号、2014年7月25日に出願された欧州出願第14178554.3号、及び2014年12月18日に出願された欧州出願第14198779.2号の利益を主張し、その全体が本明細書に援用される。
Claims (15)
- パターンを形成するよう液体を介して放射ビームで基板が露光される露光プロセスのために基板を支持するよう構成された基板テーブルと、
露光後に基板をハンドリングするための露光後ハンドリングモジュールであって、複数の基板をそれぞれ保管ユニットの基板収容ユニットに保管するよう構成された保管ユニットを備える露光後ハンドリングモジュールと、
基板を前記基板テーブルから基板アンロード経路に沿って前記露光後ハンドリングモジュールへと搬送するよう構成された基板ハンドリングロボットと、
基板の表面から液体を能動的に除去するよう構成された乾燥ステーションと、を備え、
前記乾燥ステーションは、前記保管ユニットに配置されているリソグラフィ装置。 - 前記露光後ハンドリングモジュールは、基板ハンドラである請求項1に記載のリソグラフィ装置。
- 前記基板ハンドリングロボットは、位置決め部と、前記位置決め部と連結しているホルダと、を備え、前記ホルダは、基板を保持するよう構成され、前記位置決め部は、前記ホルダが前記基板テーブル上の基板を保持するロボットアンロード位置と、前記ホルダが前記露光後ハンドリングモジュール内に基板を保持するロボットハンドリング位置との間を移動するよう構成されている請求項1または2に記載のリソグラフィ装置。
- 前記露光後ハンドリングモジュールは、前記基板ハンドリングロボットに関連したパラメータを計測するよう構成された少なくとも1つの基板ハンドラセンサを備え、前記少なくとも1つの基板ハンドラセンサが前記基板アンロード経路に配置されている請求項1から3のいずれかに記載のリソグラフィ装置。
- 前記乾燥ステーションは、基板の表面から液体を能動的に除去するよう構成された乾燥ステーションアーム及び基板の表面に平行な回転平面を通って前記乾燥ステーションアームを回転させるよう構成された回転機の形をとる請求項1から4のいずれかに記載のリソグラフィ装置。
- 基板を回転させるよう構成された基板ターンテーブルをさらに備え、前記乾燥ステーションは、基板が前記基板ターンテーブルで回転するとき乾燥ステーションアームが基板の表面から液体を能動的に除去するよう構成されるように前記基板ターンテーブルの半径にわたり延在する乾燥ステーションアームの形をとる請求項1から5のいずれかに記載のリソグラフィ装置。
- 前記乾燥ステーションは、前記基板テーブルから基板がアンロードされる基板アンロード位置の近傍に配置されている請求項1から6のいずれかに記載のリソグラフィ装置。
- 前記乾燥ステーションは、前記乾燥ステーションが基板の表面から液体を能動的に除去する乾燥位置と、非乾燥位置との間を基板に対し上下に前記乾燥ステーションに移動させるよう構成された乾燥ステーションアクチュエータを備える請求項1から7のいずれかに記載のリソグラフィ装置。
- 前記乾燥ステーションは、ガスナイフ、ウォーターバス、及び液体の連続流れのうち1つ又は複数を備える請求項1から8のいずれかに記載のリソグラフィ装置。
- リソグラフィ装置において基板を搬送する方法であって、
パターンを形成するよう液体を介して放射ビームで基板が露光される露光プロセスのために基板を支持することと、
露光後に基板をハンドリングするための露光後ハンドリングモジュールであって、複数の基板をそれぞれ保管ユニットの基板収容ユニットに保管するよう構成された保管ユニットを備える露光後ハンドリングモジュールへと、基板を基板アンロード経路に沿って搬送することと、
基板の表面から液体を能動的に除去することと、を備え、
能動的な液体の除去が前記保管ユニットにおいて行われる方法。 - 前記露光後ハンドリングモジュールは、基板ハンドリングロボットに関連したパラメータを計測するよう構成された少なくとも1つの基板ハンドラセンサを備え、前記少なくとも1つの基板ハンドラセンサが前記基板アンロード経路に配置されている請求項10に記載の基板を搬送する方法。
- 基板の表面から液体を能動的に除去するよう基板の表面に平行な回転平面を通って乾燥ステーションアームを回転させることをさらに備える請求項10または11に記載の基板を搬送する方法。
- 基板を回転させることを備え、前記能動的な液体の除去は、基板が回転するとき乾燥ステーションアームが基板の表面から液体を能動的に除去するよう基板ターンテーブルの半径にわたり延在する乾燥ステーションアームによって行われる請求項10から12のいずれかに記載の基板を搬送する方法。
- 前記能動的な液体の除去を行う乾燥ステーションに、乾燥ステーションが基板の表面から液体を能動的に除去する乾燥位置と、非乾燥位置との間を基板に対し上下に移動させることをさらに備える請求項10から13のいずれかに記載の基板を搬送する方法。
- 前記能動的な液体の除去が、ガスナイフ、ウォーターバス、及び液体の連続流れのうち1つ又は複数を用いて行われる請求項10から14のいずれかに記載の基板を搬送する方法。
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