JP5933921B2 - ガラス製造プロセスにおいてガス状含有物を減少させる方法 - Google Patents
ガラス製造プロセスにおいてガス状含有物を減少させる方法 Download PDFInfo
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- JP5933921B2 JP5933921B2 JP2010502094A JP2010502094A JP5933921B2 JP 5933921 B2 JP5933921 B2 JP 5933921B2 JP 2010502094 A JP2010502094 A JP 2010502094A JP 2010502094 A JP2010502094 A JP 2010502094A JP 5933921 B2 JP5933921 B2 JP 5933921B2
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- 238000000034 method Methods 0.000 title claims description 46
- 238000005816 glass manufacturing process Methods 0.000 title claims description 13
- 239000011521 glass Substances 0.000 claims description 149
- 229910052760 oxygen Inorganic materials 0.000 claims description 102
- 239000001301 oxygen Substances 0.000 claims description 102
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 101
- 239000000156 glass melt Substances 0.000 claims description 87
- 239000007789 gas Substances 0.000 claims description 77
- 239000006060 molten glass Substances 0.000 claims description 61
- 238000002844 melting Methods 0.000 claims description 57
- 230000008018 melting Effects 0.000 claims description 57
- 239000006025 fining agent Substances 0.000 claims description 54
- 238000001816 cooling Methods 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 3
- 239000000155 melt Substances 0.000 description 63
- 239000004071 soot Substances 0.000 description 47
- 238000004519 manufacturing process Methods 0.000 description 24
- 238000005352 clarification Methods 0.000 description 21
- 239000000203 mixture Substances 0.000 description 21
- 229910052785 arsenic Inorganic materials 0.000 description 18
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 18
- 229910052756 noble gas Inorganic materials 0.000 description 17
- 229910006404 SnO 2 Inorganic materials 0.000 description 14
- 230000036961 partial effect Effects 0.000 description 13
- 230000002829 reductive effect Effects 0.000 description 13
- 230000004927 fusion Effects 0.000 description 12
- 238000010309 melting process Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 238000005187 foaming Methods 0.000 description 7
- 229910052734 helium Inorganic materials 0.000 description 7
- 238000007499 fusion processing Methods 0.000 description 6
- 239000001307 helium Substances 0.000 description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 229910001887 tin oxide Inorganic materials 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000005587 bubbling Effects 0.000 description 5
- 238000002485 combustion reaction Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 238000007496 glass forming Methods 0.000 description 4
- 238000003303 reheating Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 238000010923 batch production Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000006063 cullet Substances 0.000 description 3
- 238000003280 down draw process Methods 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
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- 238000000465 moulding Methods 0.000 description 3
- 150000002835 noble gases Chemical class 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000011819 refractory material Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 231100000331 toxic Toxicity 0.000 description 3
- 230000002588 toxic effect Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005056 compaction Methods 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000005485 electric heating Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000002241 glass-ceramic Substances 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 2
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 2
- 230000033764 rhythmic process Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 230000009102 absorption Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000008395 clarifying agent Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000012803 melt mixture Substances 0.000 description 1
- 238000004554 molding of glass Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000009103 reabsorption Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052851 sillimanite Inorganic materials 0.000 description 1
- 238000003283 slot draw process Methods 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/18—Stirring devices; Homogenisation
- C03B5/193—Stirring devices; Homogenisation using gas, e.g. bubblers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/23—Cooling the molten glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/235—Heating the glass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Description
14,114 溶融装置
18,118 溶融ガラス
20,120 冷却容器
22,122 清澄容器
26,126 撹拌室
30,130 ボウル
38,138 成形容器
40,140 ガラス板
Claims (4)
- ガラス製造プロセスにおいてガス状含有物を減少させる方法であって、
第1の容器内においてバッチ材料を1550℃以上の第1の温度T1で溶融して、スズを含む少なくとも1つの清澄剤を含む溶融ガラスを形成し、
第2の容器内において前記溶融ガラスを1515℃および1555℃の間でありT1より少なくとも100℃低い第2の温度T2まで冷却する工程であって、前記溶融ガラスは前記第2の容器内で自由表面を有し、
前記第2の容器内において前記溶融ガラスを第2の温度T2で少なくとも20分間維持し、
第3の容器内において前記溶融ガラスを1630℃および1670℃の間でありT1より高い第3の温度T3まで加熱し、
前記第3の容器内において前記溶融ガラスを第3の温度T3で少なくとも15分間維持し、
前記溶融ガラスをガラス物品に成形する、
各工程を有してなり、
前記溶融ガラスを冷却する工程中に前記ガラス溶融物に酸素含有ガスが積極的に加えられないことを特徴とする方法。 - ガラス物品を成形する方法であって、
第1の容器内でバッチ材料を1550℃以上の第1の温度T1で溶融して、溶融ガラスを形成する工程であって、前記溶融ガラスが少なくとも1種類の多価清澄剤を含むものである工程、
前記第1の容器と流体連通した第2の容器内で前記溶融ガラスを1515℃および1555℃の間でありT1より少なくとも100℃低い第2の温度T2まで冷却する工程であって、前記溶融ガラスは前記第2の容器内で自由表面を有し、
前記第2の容器内において前記溶融ガラスを第2の温度T2で少なくとも20分間維持する工程、
前記第2の容器と流体連通した第3の容器内で前記溶融ガラスを1630℃および1670℃の間でありT1より高い第3の温度T3まで加熱する工程、
前記第3の容器内において前記溶融ガラスを第3の温度T3で少なくとも15分間維持する工程、
前記溶融ガラスをガラス物品に成形する工程、
を有してなり、
前記溶融ガラスを冷却する工程中に前記ガラス溶融物に酸素含有ガスが積極的に加えられないことを特徴とする方法。 - 温度T1、T2およびT3が独立して制御されることを特徴とする請求項2記載の方法。
- 前記第3の容器が白金を含むことを特徴とする請求項2記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/732,463 | 2007-04-03 | ||
US11/732,463 US7854144B2 (en) | 2005-07-28 | 2007-04-03 | Method of reducing gaseous inclusions in a glass making process |
PCT/US2008/004023 WO2008123942A1 (en) | 2007-04-03 | 2008-03-27 | Method of reducing gaseous inclusions in a glass making process |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015112976A Division JP6052826B2 (ja) | 2007-04-03 | 2015-06-03 | ガラス製造プロセスにおいてガス状含有物を減少させる方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010523457A JP2010523457A (ja) | 2010-07-15 |
JP5933921B2 true JP5933921B2 (ja) | 2016-06-15 |
Family
ID=39512723
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010502094A Active JP5933921B2 (ja) | 2007-04-03 | 2008-03-27 | ガラス製造プロセスにおいてガス状含有物を減少させる方法 |
JP2015112976A Active JP6052826B2 (ja) | 2007-04-03 | 2015-06-03 | ガラス製造プロセスにおいてガス状含有物を減少させる方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015112976A Active JP6052826B2 (ja) | 2007-04-03 | 2015-06-03 | ガラス製造プロセスにおいてガス状含有物を減少させる方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7854144B2 (ja) |
EP (1) | EP2132147A1 (ja) |
JP (2) | JP5933921B2 (ja) |
KR (1) | KR101296484B1 (ja) |
CN (1) | CN101679090B (ja) |
TW (1) | TWI387568B (ja) |
WO (1) | WO2008123942A1 (ja) |
Families Citing this family (34)
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WO2007004683A1 (ja) * | 2005-07-06 | 2007-01-11 | Asahi Glass Company, Limited | 無アルカリガラスの製造方法および無アルカリガラス板 |
DE202009018723U1 (de) | 2008-02-26 | 2012-11-20 | Corning Inc. | Läutermittel für Silikatgläser |
WO2009115725A2 (fr) * | 2008-03-03 | 2009-09-24 | Saint-Gobain Glass France | Procede d'elaboration de verre |
US20090320525A1 (en) * | 2008-06-26 | 2009-12-31 | William Weston Johnson | Method of bubbling a gas into a glass melt |
US20100199721A1 (en) * | 2008-11-12 | 2010-08-12 | Keisha Chantelle Ann Antoine | Apparatus and method for reducing gaseous inclusions in a glass |
US8695378B2 (en) * | 2008-11-26 | 2014-04-15 | Corning Incorporated | Apparatus for making glass and methods |
TWI494283B (zh) * | 2010-02-25 | 2015-08-01 | Corning Inc | 製造玻璃物件之設備及方法 |
DE102010023176B4 (de) * | 2010-06-09 | 2013-02-21 | Schott Ag | Verfahren zur Herstellung von Klarglas oder klarem Ziehglas unter Verwendung eines speziellen Läuterverfahrens |
JP5002731B2 (ja) * | 2010-09-30 | 2012-08-15 | AvanStrate株式会社 | ガラス板製造方法 |
KR101411139B1 (ko) * | 2011-03-31 | 2014-06-23 | 아반스트레이트코리아 주식회사 | 유리판의 제조 방법 |
TWI567036B (zh) * | 2011-03-31 | 2017-01-21 | Avanstrate Inc | Manufacture of glass plates |
JP5769574B2 (ja) * | 2011-09-30 | 2015-08-26 | AvanStrate株式会社 | ガラス板の製造方法 |
CN103168009B (zh) * | 2011-10-11 | 2015-09-02 | 安瀚视特控股株式会社 | 玻璃板的制造方法 |
CN104724908B (zh) * | 2011-10-11 | 2018-05-01 | 安瀚视特控股株式会社 | 玻璃板的制造方法 |
DE102012100233B4 (de) * | 2012-01-12 | 2014-05-15 | Schott Ag | Hochtransmittive Gläser mit hoher Solarisationsbeständigkeit, ihre Verwendung und Verfahren zu ihrer Herstellung |
DE102012202696B4 (de) | 2012-02-22 | 2015-10-15 | Schott Ag | Verfahren zur Herstellung von Gläsern und Glaskeramiken, Glas und Glaskeramik und deren Verwendung |
DE102012202695B4 (de) | 2012-02-22 | 2015-10-22 | Schott Ag | Verfahren zur Herstellung von Gläsern und Glaskeramiken, LAS-Glas und LAS-Glaskeramiken und deren Verwendung |
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TWI387568B (zh) | 2013-03-01 |
US7854144B2 (en) | 2010-12-21 |
JP2010523457A (ja) | 2010-07-15 |
EP2132147A1 (en) | 2009-12-16 |
CN101679090B (zh) | 2014-09-24 |
WO2008123942A1 (en) | 2008-10-16 |
US20070175241A1 (en) | 2007-08-02 |
JP6052826B2 (ja) | 2016-12-27 |
KR20100016118A (ko) | 2010-02-12 |
KR101296484B1 (ko) | 2013-08-13 |
JP2015214477A (ja) | 2015-12-03 |
CN101679090A (zh) | 2010-03-24 |
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