JP5899033B2 - 歪みのないtemの非点収差補正 - Google Patents
歪みのないtemの非点収差補正 Download PDFInfo
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- JP5899033B2 JP5899033B2 JP2012088781A JP2012088781A JP5899033B2 JP 5899033 B2 JP5899033 B2 JP 5899033B2 JP 2012088781 A JP2012088781 A JP 2012088781A JP 2012088781 A JP2012088781 A JP 2012088781A JP 5899033 B2 JP5899033 B2 JP 5899033B2
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- Prior art keywords
- astigmatism
- corrector
- astigmatism corrector
- sample
- objective lens
- Prior art date
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- 201000009310 astigmatism Diseases 0.000 title claims description 176
- 238000003384 imaging method Methods 0.000 claims description 38
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000001514 detection method Methods 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 12
- 230000005284 excitation Effects 0.000 claims description 10
- 230000008859 change Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000000694 effects Effects 0.000 description 8
- 238000010894 electron beam technology Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000021715 photosynthesis, light harvesting Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005430 electron energy loss spectroscopy Methods 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1532—Astigmatism
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Microscoopes, Condenser (AREA)
Description
102 光軸
104 レンズ
106 非点収差補正器
108 非点収差補正器
200 光軸
202 荷電粒子源
204 位置合わせコイル
206 ビーム制限アパーチャ
208 収束光学系
210 試料
212 試料ホルダ
214 対物レンズ
216 結像光学系
218 検出系
220 覗き窓
222 ヒンジ
224 検出系
226 筐体
228 真空管
230 真空ポンプ
250 第1非点収差補正器
252 第2非点収差補正器
254 第3非点収差補正器
301 主光線
302 主光線
304 第1中間像
306 回折レンズ
Claims (5)
- 荷電粒子ビームを放出する荷電粒子源を備える荷電粒子装置であって、
当該装置内では、前記ビームが進行する方向に従って、収束光学系、試料位置、対物レンズ、結像光学系、及び検出系と続き、
前記対物レンズと検出系との間には、前記検出系上で試料を結像するときの非点収差を減少させるために第1非点収差補正器が設けられ、かつ、前記検出系上で回折面が結像されるときの非点収差を減少させるために第2非点収差補正器が設けられ、前記対物レンズと検出系との間に第3非点収差補正器が設けられ、その結果、直線歪みを減少させる第3の自由度が生成されることを特徴する、装置。 - 前記第1非点収差補正器、前記第2非点収差補正器、及び、前記第3非点収差補正器が、前記対物レンズと結像光学系との間に設けられ、
その結果、前記第1非点収差補正器、前記第2非点収差補正器、及び、前記第3非点収差補正器の励起は、前記結像光学系の設定が変更されたときにも、変更される必要がない、
請求項1に記載の装置。 - ユーザーインターフェースを有する制御装置を備える請求項1又は2に記載の装置であって、
前記ユーザーインターフェースは、前記第1非点収差補正器、前記第2非点収差補正器、及び、前記第3非点収差補正器を制御する制御を示し、
前記制御は、結像に係る非点収差、回折に係る非点収差、及び直線歪みに係る非点収差が、互いに独立して制御されるように、前記第1非点収差補正器、前記第2非点収差補正器、及び、前記第3非点収差補正器を制御する、
装置。 - 透過型電子顕微鏡又は走査透過型電子顕微鏡である、請求項1乃至3のいずれかに記載の装置。
- 請求項1乃至4のいずれかに記載の装置の使用方法であって:
前記試料を結像するときの非点収差を減少させるように前記第1非点収差補正器を励起する手順;
前記回折面が結像されるときの非点収差を減少させるように前記第2非点収差補正器を励起する手順;及び、
直線歪みを減少させるように前記第3非点収差補正器を励起する手順;
を有することを特徴とする方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP11162275.9 | 2011-04-13 | ||
EP11162275.9A EP2511936B1 (en) | 2011-04-13 | 2011-04-13 | Distortion free stigmation of a TEM |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012221958A JP2012221958A (ja) | 2012-11-12 |
JP5899033B2 true JP5899033B2 (ja) | 2016-04-06 |
Family
ID=44483767
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012088781A Active JP5899033B2 (ja) | 2011-04-13 | 2012-04-09 | 歪みのないtemの非点収差補正 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8569693B2 (ja) |
EP (1) | EP2511936B1 (ja) |
JP (1) | JP5899033B2 (ja) |
CN (1) | CN102737933B (ja) |
Families Citing this family (13)
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EP2584584A1 (en) | 2011-10-19 | 2013-04-24 | FEI Company | Method for adjusting a STEM equipped with an aberration corrector |
EP2704177B1 (en) | 2012-09-04 | 2014-11-26 | Fei Company | Method of investigating and correcting aberrations in a charged-particle lens system |
EP2966668B1 (en) | 2014-07-10 | 2016-10-12 | Fei Company | Method of calibrating a scanning transmission charged-particle microscope |
MA39558B1 (fr) | 2014-07-22 | 2020-03-31 | Intelligent Virus Imaging Inc | Procédé pour correction automatique de l'astigmatisme |
US9928989B2 (en) | 2014-07-22 | 2018-03-27 | Intelligent Virus Imaging Inc. | Method for automatic correction of astigmatism |
US9978557B2 (en) | 2016-04-21 | 2018-05-22 | Fei Company | System for orienting a sample using a diffraction pattern |
JP6783124B2 (ja) * | 2016-11-28 | 2020-11-11 | 日本電子株式会社 | 走査透過電子顕微鏡および画像生成方法 |
CN107796837B (zh) * | 2017-10-09 | 2019-10-29 | 南京大学 | 一种成像装置、成像方法及成像*** |
US10522323B2 (en) * | 2018-04-05 | 2019-12-31 | Fei Company | Electron energy loss spectroscopy with adjustable energy resolution |
EP3591685A1 (en) * | 2018-07-06 | 2020-01-08 | FEI Company | Electron microscope with improved imaging resolution |
US11211223B1 (en) * | 2020-08-25 | 2021-12-28 | Fei Company | System and method for simultaneous phase contrast imaging and electron energy-loss spectroscopy |
US20220328284A1 (en) * | 2021-03-31 | 2022-10-13 | Fei Company | Method to correct first order astigmatism and first order distortion in multi-beam scanning electron microscopes |
WO2023028979A1 (en) * | 2021-09-03 | 2023-03-09 | Yangtze Memory Technologies Co., Ltd. | Method for tilting characterization by microscopy |
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-
2011
- 2011-04-13 EP EP11162275.9A patent/EP2511936B1/en active Active
-
2012
- 2012-04-09 JP JP2012088781A patent/JP5899033B2/ja active Active
- 2012-04-13 US US13/446,908 patent/US8569693B2/en active Active
- 2012-04-13 CN CN201210107945.4A patent/CN102737933B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP2012221958A (ja) | 2012-11-12 |
US20130062520A1 (en) | 2013-03-14 |
EP2511936B1 (en) | 2013-10-02 |
US8569693B2 (en) | 2013-10-29 |
EP2511936A1 (en) | 2012-10-17 |
CN102737933B (zh) | 2016-01-20 |
CN102737933A (zh) | 2012-10-17 |
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