JP5896572B2 - 基板プラズマ処理方法 - Google Patents
基板プラズマ処理方法 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32412—Plasma immersion ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- Spectroscopy & Molecular Physics (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Description
本開示は、添付図面に図示する実施形態例を参照しつつ詳細に説明した。本開示はさまざまな実施形態および例に基づき説明したが、本教示内容は開示した実施形態に限定されるものではない。逆に、本開示は、当業者が想到するであろうさまざまな変更例、変形例および均等例を含むものである。当業者であれば、本明細書の教示内容に基づき、他の利用分野と同様に、さらなる実施例、変形例および実施形態が存在することを認めるであろう。これらについても、本明細書で説明する本開示の範囲内であるとする。例えば、本開示に係るプラズマ処理方法は任意の種類のプラズマ源と共に利用され得るものと理解されたい。
Claims (24)
- 基板にプラズマ処理を施す方法であって、
イオン化エネルギーが互いに異なる第1の種および第2の種を含む供給ガスをプラズマ源に近接して導入する段階と、
少なくとも、第1のパルス期間において第1の電力レベルを持ち、第2のパルス期間において第2の電力レベルを持つマルチレベルRF電力波形を前記プラズマ源に供給する段階と、
前記第1のパルス期間において前記供給ガスのうち前記第1の種をイオン化する段階と、
前記第2のパルス期間において前記第2の種をイオン化する段階と、
前記第1のパルス期間において前記基板にバイアスを供給する段階と
を備え、
前記第2の電力レベルは、前記第1の電力レベルよりも高く、
前記第1の電力レベルは、前記第1の種をイオン化するのに必要な電力レベルよりは高いが、前記第2の種をイオン化するために必要な別の電力レベルよりは低く、
前記供給ガスは、前記第1のパルス期間および前記第2のパルス期間の両方の期間に導入される
方法。 - 前記第2のパルス期間において前記基板にバイアスを供給する段階をさらに備える請求項1に記載の方法。
- 前記第2の電力レベルは、前記基板にバイアスがかかっていない場合に印加される請求項1に記載の方法。
- 前記第1の種は、処理種を含む請求項1に記載の方法。
- 前記処理種は、Se、および、P、B、Ge、Si、NおよびAsのうち少なくとも1つを含み、
前記第2の種は、H、C、O、He、NeおよびArのうち少なくとも1つを含む請求項4に記載の方法。 - 前記処理種は、前記基板をエッチングするエッチャントである請求項5に記載の方法。
- 前記第2のパルス期間のうち少なくとも一部において前記基板にバイアスをかける段階をさらに備える
請求項1に記載の方法。 - 前記第1のパルス期間において前記処理種の第1のイオンを前記基板に対して選択的に方向付ける段階と、
前記第2のパルス期間において前記基板に向けて前記第2の種の不活性種の第2のイオンを方向付ける段階と
をさらに備える請求項4から6のいずれか一項に記載の方法。 - 前記第2の電力レベルは、前記プラズマを安定化させるのに十分なRF電力レベルである請求項1に記載の方法。
- 前記RF電力波形は、第3のパルス期間において、第3の電力レベルをさらに含み、
前記第3の電力レベルは、前記第1及び第2の電力レベルよりも低く、
前記第3のパルス期間は、前記第2のパルス期間より後であり、
前記基板は、前記第3のパルス期間においてバイアスされない
請求項1に記載の方法。 - 基板を処理する方法であって、
第1の種および第2の種を含む供給ガスをプラズマ源の近傍に導入する段階と、
第1の期間において第1の電力レベルを前記プラズマ源に印加して前記第1の種を選択的にイオン化する段階と、
第2の期間において前記プラズマ源に第2の電力レベルを印加して前記第2の種をイオン化する段階と、
前記第1の期間において基板に向けて前記第1の種のイオンを方向付ける段階とを備え、
前記第1の種は、前記第2の種よりもイオン化エネルギーが低く、
前記第1の電力レベルは、前記第1の種をイオン化するために必要な電力レベルよりは高いが、前記第2の種をイオン化するために必要な別の電力レベルよりは低く、
前記第2の電力レベルは、前記第2の種をイオン化するために必要な前記別の電力レベルよりも高く、
前記第1の種および前記第2の種を含む前記供給ガスが、前記第1の期間および前記第2の期間の両方の期間に導入される方法。 - 前記第2の期間において前記基板に向けて前記第2の種のイオンを方向付ける段階をさらに備える請求項11に記載の方法。
- 前記第1の期間において前記第1の種のイオンを前記基板に注入する段階と、
前記第2の期間において前記第2の種のイオンを前記基板に注入する段階と
をさらに備える請求項12に記載の方法。 - 前記第1の種は、P、B、Ge、Si、N、Se、およびAsのうち少なくとも1つを含み、
前記第2の種は、H、C、O、He、NeおよびArのうち少なくとも1つを含む請求項13に記載の方法。 - 前記第1の期間において前記基板にバイアスをかける段階と、
前記第2の期間において前記基板にバイアスをかける段階と
をさらに備える請求項12に記載の方法。 - 前記第2の期間において前記基板にバイアスをかけることなく前記第1の期間において前記基板にバイアスをかける段階をさらに備える請求項11に記載の方法。
- 第3の期間において、第3の電力レベルを供給する段階をさらに含み、
前記第3の電力レベルは、前記第1及び第2の電力レベルよりも低く、
前記第3の期間は、前記第2の期間より後であり、
前記第3の期間において、イオンが前記基板に向けられない
請求項11に記載の方法。 - 基板に近接して配置されているプラズマ源と、前記プラズマ源に電気結合されているRF電源と、前記基板に電気結合されているバイアス電源とを備える装置で基板にプラズマ処理を施す方法であって、
少なくとも第1の種および第2の種を含む供給ガスを前記プラズマ源の近傍に導入する段階と、
第1の期間において第1の電力レベルを持ち、第2の期間において第2の電力レベルを持ち、第3の期間において第3の電力レベルを持つRF波形を前記RF電源で生成する段階と、
少なくとも前記第1の期間および前記第2の期間において前記プラズマ源に前記RF波形を印加してプラズマを生成する段階と、
第1のバイアスレベルおよび第2のバイアスレベルを持つバイアス波形を前記バイアス電源で生成する段階と、
前記バイアス波形を前記基板に印加して、前記プラズマから前記基板へ向けてイオンを方向付ける段階と
を備え、
前記第2の電力レベルは、前記第1の電力レベルよりも高く、前記第3の電力レベルは、前記第1の電力レベル及び第2の電力レベルよりも低く、
前記第2の期間は、前記第1の期間より後であり、前記第3の期間は、前記第2の期間より後であり、
前記第2のバイアスレベルは、前記第1のバイアスレベルよりも負の方向に高い方法。 - 前記第1のバイアスレベルは、前記第1の期間において、前記基板に印加される請求項18に記載の方法。
- 前記第2のバイアスレベルは、前記第2の期間の後に、前記基板に印加される請求項18に記載の方法。
- 前記第2のバイアスレベルは、前記第2の期間において、前記基板に印加される請求項18に記載の方法。
- 前記第2のバイアスレベルは、前記第1の期間において、前記基板に印加される請求項21に記載の方法。
- 前記第1のバイアスレベルは、前記第3の期間において、前記基板に印加される請求項18に記載の方法。
- 前記プラズマは、前記第3の期間において、消滅させない請求項23に記載の方法。
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Application Number | Priority Date | Filing Date | Title |
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US35395310P | 2010-06-11 | 2010-06-11 | |
US61/353,953 | 2010-06-11 | ||
US13/157,005 US9123509B2 (en) | 2007-06-29 | 2011-06-09 | Techniques for plasma processing a substrate |
US13/157,005 | 2011-06-09 | ||
PCT/US2011/040206 WO2011156813A1 (en) | 2010-06-11 | 2011-06-13 | Techniques for plasma processing a substrate |
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JP2013535074A JP2013535074A (ja) | 2013-09-09 |
JP2013535074A5 JP2013535074A5 (ja) | 2014-04-10 |
JP5896572B2 true JP5896572B2 (ja) | 2016-03-30 |
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US (1) | US9123509B2 (ja) |
JP (1) | JP5896572B2 (ja) |
KR (1) | KR101811364B1 (ja) |
CN (1) | CN103109342B (ja) |
TW (1) | TWI562226B (ja) |
WO (1) | WO2011156813A1 (ja) |
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US20090004836A1 (en) * | 2007-06-29 | 2009-01-01 | Varian Semiconductor Equipment Associates, Inc. | Plasma doping with enhanced charge neutralization |
US9767988B2 (en) | 2010-08-29 | 2017-09-19 | Advanced Energy Industries, Inc. | Method of controlling the switched mode ion energy distribution system |
US11615941B2 (en) | 2009-05-01 | 2023-03-28 | Advanced Energy Industries, Inc. | System, method, and apparatus for controlling ion energy distribution in plasma processing systems |
US20110039034A1 (en) * | 2009-08-11 | 2011-02-17 | Helen Maynard | Pulsed deposition and recrystallization and tandem solar cell design utilizing crystallized/amorphous material |
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