JP5612921B2 - 情報記録媒体用ガラス基板及び情報記録媒体 - Google Patents
情報記録媒体用ガラス基板及び情報記録媒体 Download PDFInfo
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- JP5612921B2 JP5612921B2 JP2010146046A JP2010146046A JP5612921B2 JP 5612921 B2 JP5612921 B2 JP 5612921B2 JP 2010146046 A JP2010146046 A JP 2010146046A JP 2010146046 A JP2010146046 A JP 2010146046A JP 5612921 B2 JP5612921 B2 JP 5612921B2
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- 239000011521 glass Substances 0.000 title claims description 82
- 239000000758 substrate Substances 0.000 title claims description 56
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 21
- 238000003426 chemical strengthening reaction Methods 0.000 claims description 18
- 239000006025 fining agent Substances 0.000 claims description 13
- 238000005342 ion exchange Methods 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 229910052684 Cerium Inorganic materials 0.000 claims description 8
- 229910052718 tin Inorganic materials 0.000 claims description 8
- 239000005354 aluminosilicate glass Substances 0.000 claims description 7
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 6
- 229910052785 arsenic Inorganic materials 0.000 claims description 6
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000011572 manganese Substances 0.000 claims description 6
- 239000010955 niobium Substances 0.000 claims description 6
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 5
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 4
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 35
- 239000006060 molten glass Substances 0.000 description 25
- 238000000034 method Methods 0.000 description 24
- 230000008569 process Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 238000004031 devitrification Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000000227 grinding Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 229910001149 41xx steel Inorganic materials 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 238000005352 clarification Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 229910001415 sodium ion Inorganic materials 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910001414 potassium ion Inorganic materials 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910000943 NiAl Inorganic materials 0.000 description 3
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical class [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 235000010344 sodium nitrate Nutrition 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910003321 CoFe Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Glass Compositions (AREA)
- Magnetic Record Carriers (AREA)
Description
60〜75質量%のSiO2と、
5〜18質量%のAl2O3と、
3〜10質量%のLi2Oと、
3〜15質量%のNa2Oと、
0.5〜8質量%のZrO2と、を含有するアルミノシリケートガラスからなる、レーザーによる加工をされることなく記録層が形成されて情報記録媒体となる情報記録媒体用ガラス基板において、
As(ヒ素)及びSb(アンチモン)のいずれの元素も含有せず、
Sn(スズ)、V(バナジウム)、Mn(マンガン)、Ce(セリウム)、Ni(ニッケル)、Nb(ニオブ)、Mo(モリブテン)、Ta(タンタル)、Bi(ビスマス)またはSn及びCe(セリウム)を多価元素として含有し、
前記多価元素の総量の、前記Al2O3に対するモル比率(前記多価元素の総量/Al2O3)が、0.02〜0.20の範囲であることを特徴とする情報記録媒体用ガラス基板。
本発明の情報記録媒体用ガラス基板は、ガラス成分全体に対して、60〜75質量%のSiO2と、5〜18質量%のAl2O3と、3〜10質量%のLi2Oと、3〜15質量%のNa2Oと、0.5〜8質量%のZrO2と、を含有するアルミノシリケートガラスからなる。そのため、イオン交換による化学強化処理を施すことが可能であり、高い耐衝撃性や耐振動性を確保することができる。各成分を上記範囲に限定した理由は、以下の通りである。
上述のように、本発明の情報記録媒体用ガラス基板は、所定の清澄剤の働きによって十分に気泡を除去することができるため、製造のために複雑なプロセスや特殊な装置を必要とせず、公知の一般的な製造方法によって製造することができる。
上述の情報記録媒体用ガラス基板に、少なくとも記録層を形成することで情報記録媒体を製造することができる。記録層は特に限定されず、磁気、光、光磁気等の性質を利用した種々の記録層を用いることができるが、特に磁性層を記録層として用いた情報記録媒体(磁気ディスク)の製造に好適である。
Claims (6)
- ガラス成分全体に対して、
60〜75質量%のSiO2と、
5〜18質量%のAl2O3と、
3〜10質量%のLi2Oと、
3〜15質量%のNa2Oと、
0.5〜8質量%のZrO2と、を含有するアルミノシリケートガラスからなる、レーザーによる加工をされることなく記録層が形成されて情報記録媒体となる情報記録媒体用ガラス基板において、
As(ヒ素)及びSb(アンチモン)のいずれの元素も含有せず、
Sn(スズ)、V(バナジウム)、Mn(マンガン)、Ce(セリウム)、Ni(ニッケル)、Nb(ニオブ)、Mo(モリブテン)、Ta(タンタル)、Bi(ビスマス)またはSn及びCe(セリウム)を多価元素として含有し、
前記多価元素の総量の、前記Al2O3に対するモル比率(前記多価元素の総量/Al2O3)が、0.02〜0.20の範囲であることを特徴とする情報記録媒体用ガラス基板。
但し、ZrO2、TiO2、La2O3,Nb2 O 5,HfO2を合計で0.1〜5質量%含む情報記録媒体用ガラス基板を除く。 - 前記多価元素を、それぞれ下記の酸化物に換算した場合の含有量の合計は、ガラス成分全体に対して、1質量%以下であることを特徴とする請求項1に記載の情報記録媒体用ガラス基板。
但し、SnはSnO2に、CeはCeO2に、VはV 2 O 5 に、MnはMnO 2 に、NiはNi 2 O 3 に、NbはNb 2 O 5 に、MoはMoO 3 に、TaはTa 2 O 5 に、BiはBi 2 O 3 に、それぞれ換算する。 - 前記多価元素は、酸化物、水酸化物又は炭酸塩からなる清澄剤として添加されたものであることを特徴とする請求項1または2に記載の情報記録媒体用ガラス基板。
- ZrO2の含有率が、6.7質量%以上であることを特徴とする請求項1から3のうちいずれか1項に記載の情報記録媒体用ガラス基板。
- イオン交換による化学強化処理が施されていることを特徴とする請求項1から4のうちいずれか1項に記載の情報記録媒体用ガラス基板。
- 請求項1から5のうちいずれか1項に記載された情報記録媒体用ガラス基板の上に、記録層を有していることを特徴とする情報記録媒体。
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JP2010146046A JP5612921B2 (ja) | 2008-07-14 | 2010-06-28 | 情報記録媒体用ガラス基板及び情報記録媒体 |
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JP2008182490 | 2008-07-14 | ||
JP2008182490 | 2008-07-14 | ||
JP2010146046A JP5612921B2 (ja) | 2008-07-14 | 2010-06-28 | 情報記録媒体用ガラス基板及び情報記録媒体 |
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JP2010260788A JP2010260788A (ja) | 2010-11-18 |
JP5612921B2 true JP5612921B2 (ja) | 2014-10-22 |
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JP2010146046A Expired - Fee Related JP5612921B2 (ja) | 2008-07-14 | 2010-06-28 | 情報記録媒体用ガラス基板及び情報記録媒体 |
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Country Status (3)
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US (1) | US8518565B2 (ja) |
JP (2) | JPWO2010007902A1 (ja) |
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US9156725B2 (en) * | 2012-05-30 | 2015-10-13 | Corning Incorporated | Down-drawable chemically strengthened glass for information storage devices |
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JP2837134B2 (ja) | 1991-05-20 | 1998-12-14 | ホーヤ株式会社 | 情報記録用基板および情報記録媒体 |
US5273834A (en) | 1993-01-25 | 1993-12-28 | Corning Incorporated | Discs for memory storage devices |
JPH1029832A (ja) | 1996-05-17 | 1998-02-03 | Ishizuka Glass Co Ltd | レーザーテクスチャ加工に適したガラス材料及びそれを用いた磁気ディスク用ガラス基板 |
JP4075161B2 (ja) | 1998-10-21 | 2008-04-16 | 旭硝子株式会社 | 減圧脱泡によるガラスの製造方法 |
EP1038845B1 (en) | 1999-03-25 | 2003-10-29 | Central Glass Company, Limited | Glass composition, ion exchange strengthened glass article produced from same and process for its production |
JP3573649B2 (ja) * | 1999-03-25 | 2004-10-06 | セントラル硝子株式会社 | プレス成形用ガラスおよび情報記録媒体用基板ガラス |
JP4785274B2 (ja) * | 2001-05-29 | 2011-10-05 | 日本板硝子株式会社 | ガラス物品およびそれを用いた磁気記録媒体用ガラス基板 |
JP4530618B2 (ja) | 2002-09-27 | 2010-08-25 | コニカミノルタオプト株式会社 | ガラス組成物及びガラス基板 |
JP2005060215A (ja) * | 2003-07-29 | 2005-03-10 | Nippon Electric Glass Co Ltd | ディスプレイ用ガラス基板及びその製造方法 |
DE102004022629B9 (de) * | 2004-05-07 | 2008-09-04 | Schott Ag | Gefloatetes Lithium-Aluminosilikat-Flachglas mit hoher Temperaturbeständigkeit, das chemisch und thermisch vorspannbar ist und dessen Verwendung |
JP4756856B2 (ja) * | 2004-12-15 | 2011-08-24 | AvanStrate株式会社 | ガラス組成物およびその製造方法 |
WO2007004683A1 (ja) * | 2005-07-06 | 2007-01-11 | Asahi Glass Company, Limited | 無アルカリガラスの製造方法および無アルカリガラス板 |
TWI327559B (en) * | 2005-12-08 | 2010-07-21 | Corning Inc | Method of eliminating blisters in a glass making process |
DE502006007025D1 (de) * | 2006-03-20 | 2010-07-08 | Schott Ag | Lithium-Aluminium-Silikatglas mit kurzen Keramisierungszeiten |
CN101410333A (zh) * | 2006-03-27 | 2009-04-15 | 旭硝子株式会社 | 玻璃的制造方法 |
JP5068258B2 (ja) * | 2006-06-08 | 2012-11-07 | Hoya株式会社 | 情報記録媒体用ガラス基板および情報記録媒体とそれらの製造方法 |
JP5074042B2 (ja) * | 2007-01-10 | 2012-11-14 | Hoya株式会社 | 情報記録媒体基板用素材、情報記録媒体基板、情報記録媒体それぞれの製造方法 |
JP4567713B2 (ja) * | 2007-01-24 | 2010-10-20 | Hoya株式会社 | 光学ガラスおよび光学素子 |
EP2227444B1 (en) * | 2007-11-29 | 2019-02-20 | Corning Incorporated | Glasses having improved toughness and scratch resistance |
JP5053948B2 (ja) * | 2007-12-21 | 2012-10-24 | 株式会社オハラ | 結晶化ガラス |
US20100126225A1 (en) * | 2008-11-25 | 2010-05-27 | Josh Ding | Method for homogenizing a glass melt |
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2009
- 2009-07-03 WO PCT/JP2009/062186 patent/WO2010007902A1/ja active Application Filing
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US8518565B2 (en) | 2013-08-27 |
US20110111263A1 (en) | 2011-05-12 |
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