JP5562848B2 - 情報記録媒体用ガラス基板及び情報記録媒体 - Google Patents
情報記録媒体用ガラス基板及び情報記録媒体 Download PDFInfo
- Publication number
- JP5562848B2 JP5562848B2 JP2010520826A JP2010520826A JP5562848B2 JP 5562848 B2 JP5562848 B2 JP 5562848B2 JP 2010520826 A JP2010520826 A JP 2010520826A JP 2010520826 A JP2010520826 A JP 2010520826A JP 5562848 B2 JP5562848 B2 JP 5562848B2
- Authority
- JP
- Japan
- Prior art keywords
- information recording
- recording medium
- glass
- glass substrate
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims description 72
- 239000000758 substrate Substances 0.000 title claims description 50
- 239000006025 fining agent Substances 0.000 claims description 26
- 238000003426 chemical strengthening reaction Methods 0.000 claims description 18
- 238000005342 ion exchange Methods 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 239000000460 chlorine Substances 0.000 claims description 11
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims description 8
- 239000005354 aluminosilicate glass Substances 0.000 claims description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 6
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 6
- 229910052785 arsenic Inorganic materials 0.000 claims description 6
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 5
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 229910052740 iodine Inorganic materials 0.000 claims description 5
- 239000011630 iodine Substances 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 238000007670 refining Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 34
- 239000006060 molten glass Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 25
- 239000000463 material Substances 0.000 description 10
- 238000004031 devitrification Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000000227 grinding Methods 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 229910001149 41xx steel Inorganic materials 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 229910001415 sodium ion Inorganic materials 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910001414 potassium ion Inorganic materials 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910000943 NiAl Inorganic materials 0.000 description 3
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000005352 clarification Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000008395 clarifying agent Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical class [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 235000010344 sodium nitrate Nutrition 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910003321 CoFe Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/004—Refining agents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
- C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Glass Compositions (AREA)
- Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
Description
60〜75質量%のSiO2と、
5〜18質量%のAl2O3と、
3〜10質量%のLi2Oと、
3〜15質量%のNa2Oと、
0.5〜8質量%のZrO2と、を含有するアルミノシリケートガラスからなる情報記録媒体用ガラス基板において、
As(ヒ素)及びSb(アンチモン)のいずれの元素も含有せず、
SO3(亜硫酸)、F(フッ素)、Cl(塩素)、Br(臭素)及びI(ヨウ素)からなる群の中から選ばれる少なくとも1種を清澄剤として含有し、
前記清澄剤の総量の、前記ZrO2に対するモル比率(前記清澄剤の総量/ZrO2)が、0.05〜0.50の範囲であることを特徴とする情報記録媒体用ガラス基板。
本発明の情報記録媒体用ガラス基板は、ガラス成分全体に対して、60〜75質量%のSiO2と、5〜18質量%のAl2O3と、3〜10質量%のLi2Oと、3〜15質量%のNa2Oと、0.5〜8質量%のZrO2と、を含有するアルミノシリケートガラスからなる。そのため、イオン交換による化学強化処理を施すことが可能であり、高い耐衝撃性や耐振動性を確保することができる。各成分を上記範囲に限定した理由は、以下の通りである。
上述のように、本発明の情報記録媒体用ガラス基板は、所定の清澄剤の働きによって十分に気泡を除去することができるため、製造のために複雑なプロセスや特殊な装置を必要とせず、公知の一般的な製造方法によって製造することができる。
上述の情報記録媒体用ガラス基板に、少なくとも記録層を形成することで情報記録媒体を製造することができる。記録層は特に限定されず、磁気、光、光磁気等の性質を利用した種々の記録層を用いることができるが、特に磁性層を記録層として用いた情報記録媒体(磁気ディスク)の製造に好適である。
Claims (4)
- ガラス成分全体に対して、
60〜75質量%のSiO2と、
5〜18質量%のAl2O3と、
3〜10質量%のLi2Oと、
3〜15質量%のNa2Oと、
0.5〜8質量%のZrO2と、を含有するアルミノシリケートガラスからなる情報記録媒体用ガラス基板において、
As(ヒ素)及びSb(アンチモン)のいずれの元素も含有せず、
SO3(亜硫酸)、F(フッ素)、Cl(塩素)、Br(臭素)及びI(ヨウ素)からなる群の中から選ばれる少なくとも1種を清澄剤として含有し、
前記清澄剤の総量の、前記ZrO2に対するモル比率(前記清澄剤の総量/ZrO2)が、0.05〜0.50の範囲であり、
前記清澄剤の含有量の合計は、ガラス成分全体に対して、1質量%以下であることを特徴とする情報記録媒体用ガラス基板。 - 前記清澄剤は、SO3(亜硫酸)を含むことを特徴とする請求項1に記載の情報記録媒体用ガラス基板。
- イオン交換による化学強化処理が施されていることを特徴とする請求項1又は2に記載の情報記録媒体用ガラス基板。
- 請求項1〜3のうちいずれか1項に記載された情報記録媒体用ガラス基板の上に、記録層を有していることを特徴とする情報記録媒体。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010520826A JP5562848B2 (ja) | 2008-07-14 | 2009-07-03 | 情報記録媒体用ガラス基板及び情報記録媒体 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008182491 | 2008-07-14 | ||
JP2008182491 | 2008-07-14 | ||
JP2010520826A JP5562848B2 (ja) | 2008-07-14 | 2009-07-03 | 情報記録媒体用ガラス基板及び情報記録媒体 |
PCT/JP2009/062187 WO2010007903A1 (ja) | 2008-07-14 | 2009-07-03 | 情報記録媒体用ガラス基板及び情報記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2010007903A1 JPWO2010007903A1 (ja) | 2012-01-05 |
JP5562848B2 true JP5562848B2 (ja) | 2014-07-30 |
Family
ID=41550310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010520826A Active JP5562848B2 (ja) | 2008-07-14 | 2009-07-03 | 情報記録媒体用ガラス基板及び情報記録媒体 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8715841B2 (ja) |
JP (1) | JP5562848B2 (ja) |
WO (1) | WO2010007903A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7484369B2 (ja) * | 2020-04-17 | 2024-05-16 | Agc株式会社 | アルミノシリケートガラス及びその製造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62187140A (ja) * | 1986-02-13 | 1987-08-15 | Asahi Glass Co Ltd | 強化ガラスの製造法 |
JPH0532431A (ja) * | 1991-05-20 | 1993-02-09 | Hoya Corp | 化学強化用ガラス |
JPH05306140A (ja) * | 1992-04-28 | 1993-11-19 | Ohara Inc | 酸化物系ガラスおよび弗素含有系ガラスの製造方法 |
JPH08321034A (ja) * | 1991-05-20 | 1996-12-03 | Hoya Corp | 情報記録用基板および情報記録媒体 |
JPH11314931A (ja) * | 1999-02-04 | 1999-11-16 | Nippon Sheet Glass Co Ltd | 化学強化用ガラス |
JP2000128549A (ja) * | 1998-10-21 | 2000-05-09 | Asahi Glass Co Ltd | 減圧脱泡によるガラスの製造方法 |
WO2007020825A1 (ja) * | 2005-08-15 | 2007-02-22 | Nippon Sheet Glass Company, Limited | ガラス組成物 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6949485B2 (en) * | 2000-06-01 | 2005-09-27 | Asabi Glass Company, Limited | Glass for substrate and glass substrate |
DE10042771B4 (de) * | 2000-08-31 | 2004-02-12 | Schott Glas | Verfahren zur Steuerung und Einstellung des Redoxzustandes von Redox-Läutermitteln in einer Glasschmelze |
DE102004022629B9 (de) * | 2004-05-07 | 2008-09-04 | Schott Ag | Gefloatetes Lithium-Aluminosilikat-Flachglas mit hoher Temperaturbeständigkeit, das chemisch und thermisch vorspannbar ist und dessen Verwendung |
FR2887870B1 (fr) * | 2005-06-30 | 2007-10-05 | Snc Eurokera Soc En Nom Collec | Elaboration de vitroceramiques de beta-quartz et/ou de beta-spodumene, d'articles en de telles vitroceramiques; vitroceramiques, arcticles en lesdites vitroceramiques et verres precurseurs |
ES2306312T3 (es) * | 2006-03-20 | 2008-11-01 | Schott Ag | Vidrio a base de silicato de litio y aluminio ceramizable, que contiene arsenico y antimonio, obtenido por flotacion y detectable optimamente. |
EP2227444B1 (en) * | 2007-11-29 | 2019-02-20 | Corning Incorporated | Glasses having improved toughness and scratch resistance |
JP5053948B2 (ja) * | 2007-12-21 | 2012-10-24 | 株式会社オハラ | 結晶化ガラス |
-
2009
- 2009-07-03 US US13/003,699 patent/US8715841B2/en active Active
- 2009-07-03 JP JP2010520826A patent/JP5562848B2/ja active Active
- 2009-07-03 WO PCT/JP2009/062187 patent/WO2010007903A1/ja active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62187140A (ja) * | 1986-02-13 | 1987-08-15 | Asahi Glass Co Ltd | 強化ガラスの製造法 |
JPH0532431A (ja) * | 1991-05-20 | 1993-02-09 | Hoya Corp | 化学強化用ガラス |
JPH08321034A (ja) * | 1991-05-20 | 1996-12-03 | Hoya Corp | 情報記録用基板および情報記録媒体 |
JPH05306140A (ja) * | 1992-04-28 | 1993-11-19 | Ohara Inc | 酸化物系ガラスおよび弗素含有系ガラスの製造方法 |
JP2000128549A (ja) * | 1998-10-21 | 2000-05-09 | Asahi Glass Co Ltd | 減圧脱泡によるガラスの製造方法 |
JPH11314931A (ja) * | 1999-02-04 | 1999-11-16 | Nippon Sheet Glass Co Ltd | 化学強化用ガラス |
WO2007020825A1 (ja) * | 2005-08-15 | 2007-02-22 | Nippon Sheet Glass Company, Limited | ガラス組成物 |
Also Published As
Publication number | Publication date |
---|---|
WO2010007903A1 (ja) | 2010-01-21 |
US8715841B2 (en) | 2014-05-06 |
US20110111161A1 (en) | 2011-05-12 |
JPWO2010007903A1 (ja) | 2012-01-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5613164B2 (ja) | 情報記録媒体用ガラス基板及び情報記録媒体 | |
US9236077B2 (en) | Glass for use as substrate for information recording medium, substrate for information recording medium and information recording medium, and their production methods | |
JP6055057B2 (ja) | 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体およびそれらの製造方法 | |
JP2004010430A (ja) | ガラス基板 | |
JPWO2011096310A1 (ja) | 情報記録媒体用ガラス基板、情報記録媒体用ガラス基板の製造方法及び情報記録媒体 | |
JP5539872B2 (ja) | 情報記録媒体用ガラス基板及び情報記録媒体 | |
JP4867607B2 (ja) | 情報記録媒体用ガラス基板の製造方法 | |
JP5562848B2 (ja) | 情報記録媒体用ガラス基板及び情報記録媒体 | |
JP5612921B2 (ja) | 情報記録媒体用ガラス基板及び情報記録媒体 | |
JPWO2010007901A1 (ja) | 情報記録媒体用ガラス基板及び情報記録媒体 | |
JP2011088768A (ja) | 情報記録媒体用ガラス基板及び情報記録媒体 | |
JP5755952B2 (ja) | Hdd用ガラス基板の検品・選別方法、hdd用情報記録媒体の製造方法、及びhdd用ガラス基板 | |
JP2011088769A (ja) | 情報記録媒体用ガラス基板及び情報記録媒体 | |
JP5071603B2 (ja) | 磁気情報記録媒体用ガラス基板の製造方法 | |
WO2024053741A1 (ja) | 磁気記録媒体基板用ガラス、磁気記録媒体基板および磁気記録再生装置 | |
WO2024053056A1 (ja) | 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120106 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20120213 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20130418 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130702 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130829 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20140120 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140527 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140611 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5562848 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |