JP5600680B2 - 結像光学系 - Google Patents
結像光学系 Download PDFInfo
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- JP5600680B2 JP5600680B2 JP2011526392A JP2011526392A JP5600680B2 JP 5600680 B2 JP5600680 B2 JP 5600680B2 JP 2011526392 A JP2011526392 A JP 2011526392A JP 2011526392 A JP2011526392 A JP 2011526392A JP 5600680 B2 JP5600680 B2 JP 5600680B2
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
- G02B21/04—Objectives involving mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
また、本願発明には、以下の実施形態が、考えられる。
(1)
物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(7;31)であって、
2つの視野(4,8)の一方に最も近く隣接して隣接ミラーと呼ばれる第1のミラー(M5)から離間し、結像光学系(7;31)内で該隣接ミラー(M5)の配列平面と光学的に共役な平面に配置された変形可能な更に別のミラー(M3)を有する、
ことを特徴とする結像光学系(7;31)。
(2)
物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(7;31)であって、
2つの視野(4,8)の一方に最も近く隣接する隣接ミラーのミラー(M5)の支持体(21)が、他のミラー(M1からM4,M6)のうちの少なくとも1つの支持体(22)の材料の弾性率の少なくとも2倍大きい弾性率を有する材料で作られる、
ことを特徴とする結像光学系(7;31)。
(3)
前記隣接ミラー(M5)は、少なくとも150GPaの弾性率を有する材料から作られることを特徴とする(2)に記載の結像光学系。
(4)
前記隣接ミラー(M5)は、炭化珪素で作られることを特徴とする請求項(3)に記載の結像光学系。
(5)
前記隣接ミラー(M5)から離間し、かつ変形可能ミラー(M3)を有することを特徴とする請求項(2)から請求項(4)のいずれか1項に記載の結像光学系。
(6)
前記変形可能ミラー(M3)は、結像光学系(7)内で前記隣接ミラー(M5)の前記配列平面に光学的に共役な平面に配置されることを特徴とする(5)に記載の結像光学系。
(7)
結像光学系(7;31)が前記隣接ミラー(M5)に加えて有する前記ミラー(M1からM4,M6)は、最大で1×10-7m/m/Kである熱膨張係数を有する材料から構成されることを特徴とする(2)から(6)のいずれか1項に記載の結像光学系。
5 物体平面
21 支持体
30 入射瞳平面
31 結像光学系
32 接続軸
Claims (9)
- 物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(31)であって、
物体平面(5)に対して垂直であり、かつ空間的に物体視野(4)に最も近く隣接するミラー(M2)の幾何学的中心点を通じて延びる接続軸(32)上で、該物体視野(4)に最も近く隣接する該ミラー(M2)が、結像光学系(31)の入射瞳平面(30)の間隔(B)よりも大きい該物体視野(4)からの間隔(A)で配置され、該瞳平面(30)は、該物体視野(4)から該物体視野(4)の上流の結像光(3)のビーム経路に位置する、
ことを特徴とする結像光学系(31)。 - 物体平面(5)上で反射された結像光(3)のビーム経路内で物体視野(4)の上流に位置する入射瞳平面(30)を有し、
前記物体平面(5)に対して垂直であり、かつ入射瞳の幾何学的中心点を通じて延びる接続軸(32)を有し、
前記接続軸(32)と前記入射瞳平面(30)の交点(C)が、前記物体視野(4)の下流の前記結像光(3)の前記ビーム経路における中心物体視野点の主ビーム(33)と該接続軸(32)との第1の交点(D)よりも前記物体平面(5)に近く、
ミラー(M5,M6)の少なくとも一方が、結像光(3)が通過するための貫通開口部(18,19)を有する、
ことを特徴とする請求項1に記載の結像光学系(31)。 - 厳密に6つのミラー(M1からM6)を特徴とする請求項1又は請求項2に記載の結像光学系。
- 前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称非球面によって説明することができる面として構成されることを特徴とする請求項1から請求項3のいずれか1項に記載の結像光学系。
- 前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称関数によって説明することができない自由曲面として構成されることを特徴とする請求項1から請求項4のいずれか1項に記載の結像光学系。
- 前記ミラー(M5,M6)の少なくとも1つが、結像光(3)が通過するための貫通開口部(18,19)を有することを特徴とする請求項1又は請求項3から請求項5のいずれか1項に記載の結像光学系。
- マイクロリソグラフィのための投影露光系であって、
請求項1から請求項6のいずれか1項に記載の結像光学系(7;31)を有し、
照明及び結像光(3)のための光源(2)を有し、
前記照明光(2)を前記結像光学系(7;31)の物体視野(4)へ誘導するための光学照明系(6)を有する、
ことを特徴とする投影露光系。 - 前記光学照明系(6)の瞳ファセットミラー(29)が、前記結像光学系(31)の入射瞳平面(30)に配置されることを特徴とする請求項7に記載の投影露光系。
- 微細構造構成要素を生成する方法であって、
レチクル(10)及びウェーハ(11)を準備する段階と、
請求項7又は請求項8に記載の投影露光系を用いて、前記レチクル(10)上の構造を前記ウェーハ(11)の感光層上に投影する段階と、
前記ウェーハ(11)上に微細構造を生成する段階と、
を有することを特徴とする方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US9568908P | 2008-09-10 | 2008-09-10 | |
US61/095,689 | 2008-09-10 | ||
DE102008046699.9 | 2008-09-10 | ||
DE102008046699.9A DE102008046699B4 (de) | 2008-09-10 | 2008-09-10 | Abbildende Optik |
PCT/EP2009/006171 WO2010028748A1 (en) | 2008-09-10 | 2009-08-26 | Imaging optical system |
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JP2014165998A Division JP6103507B2 (ja) | 2008-09-10 | 2014-08-18 | 結像光学系 |
Publications (2)
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JP2012502490A JP2012502490A (ja) | 2012-01-26 |
JP5600680B2 true JP5600680B2 (ja) | 2014-10-01 |
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JP2011526392A Expired - Fee Related JP5600680B2 (ja) | 2008-09-10 | 2009-08-26 | 結像光学系 |
JP2014165998A Active JP6103507B2 (ja) | 2008-09-10 | 2014-08-18 | 結像光学系 |
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JP2014165998A Active JP6103507B2 (ja) | 2008-09-10 | 2014-08-18 | 結像光学系 |
Country Status (7)
Country | Link |
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US (2) | US8873122B2 (ja) |
JP (2) | JP5600680B2 (ja) |
KR (1) | KR101656539B1 (ja) |
CN (2) | CN102150068B (ja) |
DE (1) | DE102008046699B4 (ja) |
TW (1) | TWI497219B (ja) |
WO (1) | WO2010028748A1 (ja) |
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DE102008046699B4 (de) | 2008-09-10 | 2014-03-13 | Carl Zeiss Smt Gmbh | Abbildende Optik |
DE102009045163B4 (de) | 2009-09-30 | 2017-04-06 | Carl Zeiss Smt Gmbh | Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage |
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US20150022799A1 (en) | 2015-01-22 |
US9195145B2 (en) | 2015-11-24 |
DE102008046699B4 (de) | 2014-03-13 |
JP2015029107A (ja) | 2015-02-12 |
CN102150068A (zh) | 2011-08-10 |
US8873122B2 (en) | 2014-10-28 |
KR20110053273A (ko) | 2011-05-19 |
DE102008046699A1 (de) | 2010-03-11 |
WO2010028748A1 (en) | 2010-03-18 |
US20110165522A1 (en) | 2011-07-07 |
TW201015235A (en) | 2010-04-16 |
CN102150068B (zh) | 2015-07-08 |
JP2012502490A (ja) | 2012-01-26 |
JP6103507B2 (ja) | 2017-03-29 |
TWI497219B (zh) | 2015-08-21 |
KR101656539B1 (ko) | 2016-09-09 |
CN102937742A (zh) | 2013-02-20 |
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