JP6103507B2 - 結像光学系 - Google Patents
結像光学系 Download PDFInfo
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- JP6103507B2 JP6103507B2 JP2014165998A JP2014165998A JP6103507B2 JP 6103507 B2 JP6103507 B2 JP 6103507B2 JP 2014165998 A JP2014165998 A JP 2014165998A JP 2014165998 A JP2014165998 A JP 2014165998A JP 6103507 B2 JP6103507 B2 JP 6103507B2
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
- G02B21/04—Objectives involving mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
実施例(1)
物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(7;31)であって、
2つの視野(4,8)の一方に最も近く隣接して隣接ミラーと呼ばれる第1のミラー(M5)から離間し、結像光学系(7;31)内で該隣接ミラー(M5)の配列平面と光学的に共役な平面に配置された変形可能な更に別のミラー(M3)を有する、
ことを特徴とする結像光学系(7;31)。
実施例(2)
物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(7;31)であって、
2つの視野(4,8)の一方に最も近く隣接する隣接ミラーのミラー(M5)の支持体(21)が、他のミラー(M1からM4,M6)のうちの少なくとも1つの支持体(22)の材料の弾性率の少なくとも2倍大きい弾性率を有する材料で作られる、
ことを特徴とする結像光学系(7;31)。
実施例(3)
前記隣接ミラー(M5)は、少なくとも150GPaの弾性率を有する材料から作られることを特徴とする実施例(2)に記載の結像光学系。
実施例(4)
前記隣接ミラー(M5)は、炭化珪素で作られることを特徴とする実施例(3)に記載の結像光学系。
実施例(5)
前記隣接ミラー(M5)から離間し、かつ変形可能ミラー(M3)を有することを特徴とする実施例(2)から実施例(4)のいずれか1項に記載の結像光学系。
実施例(6)
前記変形可能ミラー(M3)は、結像光学系(7)内で前記隣接ミラー(M5)の前記配列平面に光学的に共役な平面に配置されることを特徴とする実施例(5)に記載の結像光学系。
実施例(7)
結像光学系(7;31)が前記隣接ミラー(M5)に加えて有する前記ミラー(M1からM4,M6)は、最大で1×10-7m/m/Kである熱膨張係数を有する材料から構成されることを特徴とする実施例(2)から実施例(4)のいずれか1項に記載の結像光学系。
実施例(8)
厳密に6つのミラー(M1からM6)を特徴とする実施例(1)から実施例(5)のいずれか1項に記載の結像光学系。
実施例(9)
前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称非球面によって説明することができる面として構成されることを特徴とする実施例(1)から実施例(5)のいずれか1項に記載の結像光学系。
実施例(10)
前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称関数によって説明することができない自由曲面として構成されることを特徴とする実施例(1)から実施例(5)のいずれか1項に記載の結像光学系。
実施例(11)
前記ミラー(M5,M6)の少なくとも1つが、結像光(3)が通過するための貫通開口部(18,19)を有することを特徴とする実施例(1)から実施例(5)のいずれか1項に記載の結像光学系。
実施例(12)
マイクロリソグラフィのための投影露光系であって、
実施例(1)から実施例(11)のいずれか1項に記載の結像光学系(7;31)を有し、
照明及び結像光(3)のための光源(2)を有し、
前記照明光(2)を前記結像光学系(7;31)の物体視野(4)へ誘導するための光学照明系(6)を有する、
ことを特徴とする投影露光系。
実施例(13)
前記光学照明系(6)の瞳ファセットミラー(29)が、前記結像光学系(31)の入射瞳平面(30)に配置されることを特徴とする実施例(12)に記載の投影露光系。
実施例(14)
微細構造構成要素を生成する方法であって、
レチクル(10)及びウェーハ(11)を準備する段階と、
実施例(12)又は実施例(13)に記載の投影露光系を用いて、前記レチクル(10)上の構造を前記ウェーハ(11)の感光層上に投影する段階と、
前記ウェーハ(11)上に微細構造を生成する段階と、
を有することを特徴とする方法。
5 物体平面
21 支持体
30 入射瞳平面
31 結像光学系
32 接続軸
Claims (8)
- 物体平面(5)の物体視野(4)を像平面(9)の像視野(8)内に結像する複数のミラー(M1からM6)を有する結像光学系(7;31)であって、
2つの視野(4,8)の一方に最も近く隣接して隣接ミラーと呼ばれる第1のミラー(M5)から離間し、結像光学系(7;31)内で該隣接ミラー(M5)の配列平面と光学的に共役な平面に配置された変形可能な更に別のミラー(M3)を有する、
ことを特徴とする結像光学系(7;31)。 - 厳密に6つのミラー(M1からM6)を有することを特徴とする請求項1に記載の結像光学系。
- 前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称非球面によって説明することができる面として構成されることを特徴とする請求項1に記載の結像光学系。
- 前記ミラー(M1からM6)の反射面の少なくとも1つが、回転対称関数によって説明することができない自由曲面として構成されることを特徴とする請求項1に記載の結像光学系。
- 前記ミラー(M5,M6)の少なくとも1つが、結像光(3)が通過するための貫通開口部(18,19)を有することを特徴とする請求項1に記載の結像光学系。
- マイクロリソグラフィのための投影露光系であって、
請求項1から請求項5のいずれか1項に記載の結像光学系(7;31)を有し、
照明及び結像光(3)のための光源(2)を有し、
前記照明光(2)を前記結像光学系(7;31)の物体視野(4)へ誘導するための照明光学系(6)を有する、
ことを特徴とする投影露光系。 - 前記照明光学系(6)の瞳ファセットミラー(29)が、前記結像光学系(31)の入射瞳平面(30)に配置されることを特徴とする請求項6に記載の投影露光系。
- 微細構造構成要素を生成する方法であって、
レチクル(10)及びウェーハ(11)を準備する段階と、
請求項6又は請求項7に記載の投影露光系を用いて、前記レチクル(10)上の構造を前記ウェーハ(11)の感光層上に投影する段階と、
前記ウェーハ(11)上に微細構造を生成する段階と、
を有することを特徴とする方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US9568908P | 2008-09-10 | 2008-09-10 | |
US61/095,689 | 2008-09-10 | ||
DE102008046699.9 | 2008-09-10 | ||
DE102008046699.9A DE102008046699B4 (de) | 2008-09-10 | 2008-09-10 | Abbildende Optik |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011526392A Division JP5600680B2 (ja) | 2008-09-10 | 2009-08-26 | 結像光学系 |
Publications (2)
Publication Number | Publication Date |
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JP2015029107A JP2015029107A (ja) | 2015-02-12 |
JP6103507B2 true JP6103507B2 (ja) | 2017-03-29 |
Family
ID=41650870
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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JP2011526392A Expired - Fee Related JP5600680B2 (ja) | 2008-09-10 | 2009-08-26 | 結像光学系 |
JP2014165998A Active JP6103507B2 (ja) | 2008-09-10 | 2014-08-18 | 結像光学系 |
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Application Number | Title | Priority Date | Filing Date |
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JP2011526392A Expired - Fee Related JP5600680B2 (ja) | 2008-09-10 | 2009-08-26 | 結像光学系 |
Country Status (7)
Country | Link |
---|---|
US (2) | US8873122B2 (ja) |
JP (2) | JP5600680B2 (ja) |
KR (1) | KR101656539B1 (ja) |
CN (2) | CN102150068B (ja) |
DE (1) | DE102008046699B4 (ja) |
TW (1) | TWI497219B (ja) |
WO (1) | WO2010028748A1 (ja) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008046699B4 (de) | 2008-09-10 | 2014-03-13 | Carl Zeiss Smt Gmbh | Abbildende Optik |
DE102009045163B4 (de) | 2009-09-30 | 2017-04-06 | Carl Zeiss Smt Gmbh | Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage |
KR101383479B1 (ko) * | 2010-04-22 | 2014-04-08 | 칼 짜이스 에스엠티 게엠베하 | 이미징 옵틱스 및 이러한 이미징 옵틱스를 가지는 마이크로리소그래피를 위한 투영 노광 장치 |
KR102002269B1 (ko) * | 2010-07-30 | 2019-07-19 | 칼 짜이스 에스엠티 게엠베하 | Euv 노광 장치 |
DE102011080649A1 (de) * | 2010-09-24 | 2012-03-29 | Carl Zeiss Smt Gmbh | Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102010041623A1 (de) * | 2010-09-29 | 2012-03-29 | Carl Zeiss Smt Gmbh | Spiegel |
DE102011006468B4 (de) | 2011-03-31 | 2014-08-28 | Carl Zeiss Smt Gmbh | Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern |
WO2013118615A1 (ja) | 2012-02-06 | 2013-08-15 | 株式会社ニコン | 反射結像光学系、露光装置、およびデバイス製造方法 |
KR20130092843A (ko) * | 2012-02-13 | 2013-08-21 | 삼성전자주식회사 | 빛의 인텐시티를 컨트롤할 수 있는 컨트롤 모듈 미러를 갖는 반사형 포토리소그래피 설비 |
DE102012212757A1 (de) * | 2012-07-20 | 2014-01-23 | Carl Zeiss Smt Gmbh | Verfahren zum betreiben einer mikrolithographischen projektionsbelichtungsanlage |
EP2898370B1 (en) * | 2012-09-21 | 2020-07-15 | ASML Netherlands B.V. | Lithographic method and apparatus |
US9746654B2 (en) * | 2013-05-08 | 2017-08-29 | Ohio State Innovation Foundation | Optical delay elements created from variations of the robert cell |
JP6295517B2 (ja) * | 2013-05-15 | 2018-03-20 | 凸版印刷株式会社 | 反射型マスクブランク及び反射型マスク |
US8755114B1 (en) | 2013-06-14 | 2014-06-17 | Computer Power Supply, Inc. | Apparatus for aiding manual, mechanical alignment of optical equipment |
DE102013219986A1 (de) * | 2013-10-02 | 2015-04-02 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
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JP5600680B2 (ja) | 2014-10-01 |
CN102150068A (zh) | 2011-08-10 |
US8873122B2 (en) | 2014-10-28 |
KR20110053273A (ko) | 2011-05-19 |
DE102008046699A1 (de) | 2010-03-11 |
WO2010028748A1 (en) | 2010-03-18 |
US20110165522A1 (en) | 2011-07-07 |
TW201015235A (en) | 2010-04-16 |
CN102150068B (zh) | 2015-07-08 |
JP2012502490A (ja) | 2012-01-26 |
TWI497219B (zh) | 2015-08-21 |
KR101656539B1 (ko) | 2016-09-09 |
CN102937742A (zh) | 2013-02-20 |
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