JP5547878B2 - 半導体加工方法 - Google Patents
半導体加工方法 Download PDFInfo
- Publication number
- JP5547878B2 JP5547878B2 JP2008170629A JP2008170629A JP5547878B2 JP 5547878 B2 JP5547878 B2 JP 5547878B2 JP 2008170629 A JP2008170629 A JP 2008170629A JP 2008170629 A JP2008170629 A JP 2008170629A JP 5547878 B2 JP5547878 B2 JP 5547878B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- film
- plasma
- resist
- processing method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title claims description 30
- 238000003672 processing method Methods 0.000 title claims description 15
- 239000002184 metal Substances 0.000 claims description 25
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 238000012545 processing Methods 0.000 claims description 17
- 239000004020 conductor Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 31
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 14
- 239000001257 hydrogen Substances 0.000 description 14
- 229910052739 hydrogen Inorganic materials 0.000 description 14
- 239000001301 oxygen Substances 0.000 description 14
- 229910052760 oxygen Inorganic materials 0.000 description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 12
- 239000010410 layer Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 5
- 238000004435 EPR spectroscopy Methods 0.000 description 4
- -1 TaSiN Chemical class 0.000 description 3
- 229910004200 TaSiN Inorganic materials 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000009966 trimming Methods 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910004166 TaN Inorganic materials 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
- H01L21/31138—Etching organic layers by chemical means by dry-etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
- H01L21/02071—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a delineation, e.g. RIE, of conductive layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
- H01L21/28123—Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/495—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4966—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a composite material, e.g. organic material, TiN, MoSi2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/517—Insulating materials associated therewith the insulating material comprising a metallic compound, e.g. metal oxide, metal silicate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
工対象となる半導体素子の断面図である。半導体素子は、図1(a)に示すようにSi基
板101、Si基板101上に順次形成した高誘電率絶縁膜としてのHfSiON膜10
2、仕事関数制御金属の導体膜としてのTiN膜103、電極材料としてのW膜104、キャップとしてのSiN膜105、反射防止膜106を備える。ここで、高誘電率のHfSiON膜102をFETのゲート絶縁膜(high−k膜)として利用し、TiN膜103をメタルゲートとして利用することにより、high−k膜/メタルゲート構造を備えるFETを形成することができる。
図5、6は、第2の実施形態を説明する図である。この例では、水素プラズマによるレジスト除去に際して、シリコン基板(ウエハ)にバイアスを印加することにより処理速度を向上している。
酸素を用いないでレジストを除去するには、前記特許文献1に記載されている方法、すなわち水素原子あるいは水素分子の中性ラジカルを用いる方法がある。しかし、この方法はプラズマを用いる方法よりレジスト除去能力が低く、メタルゲート加工後のレジスト除去では、残渣が出やすくなる。
102 HfSiON膜
103 TiN膜
104 W膜
105 SiN膜
106 反射防止膜
107 レジスト
108 水素イオン
201 プラズマ電源
202 アンテナ
203 窓
204 真空チャンバ
205 試料台
206 ウエハ
207 バイアス電源
208 電磁コイル
301 酸素イオン
302 酸化層
601 TaSiN膜
602 堆積物
701 poly−Si膜
Claims (4)
- HfまたはZrを含む絶縁膜とTi、TaまたはRuを含み前記絶縁膜上に形成された導体膜と前記導体膜上に形成されたレジストとが積層された半導体基板をプラズマを用いて加工する半導体加工方法において、
前記レジストを用いてプラズマにより前記導体膜を65nm以下の寸法に加工し、
前記導体膜の加工後、前記半導体基板にバイアス電力を供給した状態のもとにおける、H 2 ガスとArガスとの混合ガスからなり前記混合ガスの全ガス量に対する前記Arガスの混合割合が50%を超えないプラズマにより、前記レジストの除去と、前記導体膜の側壁に生じる堆積膜の除去と、を行うことを特徴とする半導体加工方法。 - 請求項1記載の半導体加工方法において、
前記H 2 ガスとArガスとの混合ガスは、CF4ガス、CHF3ガス、SF6ガスまたはNF3ガスがさらに混合されることを特徴とする半導体加工方法。 - 請求項1記載の半導体加工方法において、
前記導体膜は仕事関数制御金属からなり、前記導体膜上にはWからなる電極層を備えることを特徴とする半導体加工方法。 - 請求項1記載の半導体加工方法において、
前記バイアス電力は、15W以上80W以下であることを特徴とする半導体加工方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008170629A JP5547878B2 (ja) | 2008-06-30 | 2008-06-30 | 半導体加工方法 |
TW097129876A TWI485771B (zh) | 2008-06-30 | 2008-08-06 | Semiconductor processing methods |
KR1020080080484A KR100981041B1 (ko) | 2008-06-30 | 2008-08-18 | 반도체 가공방법 |
US12/198,222 US8440513B2 (en) | 2008-06-30 | 2008-08-26 | Method of semiconductor processing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008170629A JP5547878B2 (ja) | 2008-06-30 | 2008-06-30 | 半導体加工方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014081175A Division JP2014131086A (ja) | 2014-04-10 | 2014-04-10 | プラズマ処理方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010010573A JP2010010573A (ja) | 2010-01-14 |
JP2010010573A5 JP2010010573A5 (ja) | 2013-04-04 |
JP5547878B2 true JP5547878B2 (ja) | 2014-07-16 |
Family
ID=41447974
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008170629A Expired - Fee Related JP5547878B2 (ja) | 2008-06-30 | 2008-06-30 | 半導体加工方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8440513B2 (ja) |
JP (1) | JP5547878B2 (ja) |
KR (1) | KR100981041B1 (ja) |
TW (1) | TWI485771B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5250476B2 (ja) * | 2009-05-11 | 2013-07-31 | 株式会社日立ハイテクノロジーズ | ドライエッチング方法 |
US9318345B2 (en) * | 2011-10-05 | 2016-04-19 | Globalfoundries Inc. | Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach |
JP6002411B2 (ja) * | 2012-03-28 | 2016-10-05 | 芝浦メカトロニクス株式会社 | Euvマスク製造方法およびeuvマスク製造装置 |
US8853081B2 (en) * | 2012-12-27 | 2014-10-07 | Intermolecular, Inc. | High dose ion-implanted photoresist removal using organic solvent and transition metal mixtures |
JP2014212310A (ja) * | 2013-04-02 | 2014-11-13 | 東京エレクトロン株式会社 | 半導体デバイスの製造方法及び製造装置 |
JP7033912B2 (ja) * | 2017-12-22 | 2022-03-11 | 株式会社Screenホールディングス | 基板処理装置及び基板処理方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3563446B2 (ja) * | 1993-07-16 | 2004-09-08 | 富士通株式会社 | 半導体装置の製造方法 |
JPH1168095A (ja) * | 1997-08-11 | 1999-03-09 | Fujitsu Ltd | 半導体装置の製造方法 |
US5962346A (en) * | 1997-12-29 | 1999-10-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fluorine-doped silicate glass hard mask to improve metal line etching profile |
US6281135B1 (en) * | 1999-08-05 | 2001-08-28 | Axcelis Technologies, Inc. | Oxygen free plasma stripping process |
US6593244B1 (en) * | 2000-09-11 | 2003-07-15 | Applied Materials Inc. | Process for etching conductors at high etch rates |
JP4142664B2 (ja) * | 2001-03-12 | 2008-09-03 | 株式会社ルネサステクノロジ | 半導体集積回路装置の製造方法 |
US6951823B2 (en) * | 2001-05-14 | 2005-10-04 | Axcelis Technologies, Inc. | Plasma ashing process |
US6762130B2 (en) * | 2002-05-31 | 2004-07-13 | Texas Instruments Incorporated | Method of photolithographically forming extremely narrow transistor gate elements |
US20050020856A1 (en) * | 2003-07-24 | 2005-01-27 | The Regents Of The University Of Califorinia | Process for production of acetyl anhydrides and optionally acetic acid from methane and carbon dioxide |
US7799685B2 (en) * | 2003-10-13 | 2010-09-21 | Mattson Technology, Inc. | System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing |
JP2005268312A (ja) * | 2004-03-16 | 2005-09-29 | Semiconductor Leading Edge Technologies Inc | レジスト除去方法及びそれを用いて製造した半導体装置 |
CN102610481B (zh) * | 2004-09-01 | 2016-04-13 | 朗姆研究公司 | 用于增加光阻移除率之装置及等离子体灰化方法 |
US7319074B2 (en) * | 2005-06-13 | 2008-01-15 | United Microelectronics Corp. | Method of defining polysilicon patterns |
US20070037101A1 (en) * | 2005-08-15 | 2007-02-15 | Fujitsu Limited | Manufacture method for micro structure |
JP4854245B2 (ja) * | 2005-09-22 | 2012-01-18 | 東京エレクトロン株式会社 | 半導体装置の製造方法 |
US7642195B2 (en) * | 2005-09-26 | 2010-01-05 | Applied Materials, Inc. | Hydrogen treatment to improve photoresist adhesion and rework consistency |
JP4598639B2 (ja) * | 2005-09-27 | 2010-12-15 | Okiセミコンダクタ株式会社 | 半導体装置の製造方法 |
KR100827435B1 (ko) * | 2006-01-31 | 2008-05-06 | 삼성전자주식회사 | 반도체 소자에서 무산소 애싱 공정을 적용한 게이트 형성방법 |
US7381651B2 (en) * | 2006-03-22 | 2008-06-03 | Axcelis Technologies, Inc. | Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process |
US7691754B2 (en) * | 2006-10-18 | 2010-04-06 | United Microelectronics Corp. | Method for removing photoresist layer and method of forming opening |
US7704888B2 (en) * | 2007-01-23 | 2010-04-27 | Globalfoundries Inc. | Methods for removing photoresist from semiconductor structures having high-k dielectric material layers |
-
2008
- 2008-06-30 JP JP2008170629A patent/JP5547878B2/ja not_active Expired - Fee Related
- 2008-08-06 TW TW097129876A patent/TWI485771B/zh not_active IP Right Cessation
- 2008-08-18 KR KR1020080080484A patent/KR100981041B1/ko not_active IP Right Cessation
- 2008-08-26 US US12/198,222 patent/US8440513B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100981041B1 (ko) | 2010-09-08 |
KR20100003148A (ko) | 2010-01-07 |
TW201001535A (en) | 2010-01-01 |
US8440513B2 (en) | 2013-05-14 |
JP2010010573A (ja) | 2010-01-14 |
US20090325388A1 (en) | 2009-12-31 |
TWI485771B (zh) | 2015-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI458008B (zh) | 用於蝕刻半導體結構之具有脈衝樣品偏壓的脈衝電漿系統 | |
JP5042162B2 (ja) | 半導体加工方法 | |
TWI600083B (zh) | Plasma etching method | |
KR100792018B1 (ko) | 플라즈마에칭방법 | |
JP5547878B2 (ja) | 半導体加工方法 | |
JP7241894B2 (ja) | 窒化ケイ素スペーサーの選択的エッチング中の形状制御を改善する方法 | |
US20040129674A1 (en) | Method and system to enhance the removal of high-k dielectric materials | |
TW201532134A (zh) | 電漿處理方法 | |
JP5250476B2 (ja) | ドライエッチング方法 | |
JP5248063B2 (ja) | 半導体素子加工方法 | |
TW507286B (en) | Method and apparatus for fabricating semiconductor devices | |
KR20180032153A (ko) | 플라스마 처리 방법 | |
TWI837304B (zh) | 電漿處理方法及電漿處理裝置 | |
WO2020195559A1 (ja) | ドライエッチング方法及び半導体デバイスの製造方法 | |
JP2009076711A (ja) | 半導体装置の製造方法 | |
JP5642427B2 (ja) | プラズマ処理方法 | |
KR101133697B1 (ko) | 반도체소자 가공방법 | |
Joubert et al. | Towards new plasma technologies for 22nm gate etch processes and beyond | |
JP5579374B2 (ja) | 半導体加工方法 | |
JP2014131086A (ja) | プラズマ処理方法 | |
JP2021009899A (ja) | 基板処理方法および基板処理装置 | |
JP2008010692A (ja) | ドライエッチング方法 | |
Ha et al. | Aluminum Etch and After-Corrosion Characteristics in am= 0 Helicon Wave Plasma Etcher | |
JP2007251034A (ja) | プラズマ処理方法 | |
JPH04267332A (ja) | 半導体装置の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110511 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120314 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130218 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130305 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130425 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140128 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140410 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20140421 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140513 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140516 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5547878 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |