JP5307785B2 - 真空排気システム - Google Patents
真空排気システム Download PDFInfo
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- JP5307785B2 JP5307785B2 JP2010265405A JP2010265405A JP5307785B2 JP 5307785 B2 JP5307785 B2 JP 5307785B2 JP 2010265405 A JP2010265405 A JP 2010265405A JP 2010265405 A JP2010265405 A JP 2010265405A JP 5307785 B2 JP5307785 B2 JP 5307785B2
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- 238000001816 cooling Methods 0.000 claims description 173
- 238000000034 method Methods 0.000 abstract description 28
- 230000008569 process Effects 0.000 abstract description 12
- 239000007789 gas Substances 0.000 description 87
- 239000000758 substrate Substances 0.000 description 72
- 238000010438 heat treatment Methods 0.000 description 52
- 230000008929 regeneration Effects 0.000 description 37
- 238000011069 regeneration method Methods 0.000 description 37
- 239000010408 film Substances 0.000 description 30
- 238000012545 processing Methods 0.000 description 23
- 239000001307 helium Substances 0.000 description 21
- 229910052734 helium Inorganic materials 0.000 description 21
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 21
- 238000012546 transfer Methods 0.000 description 18
- 238000005265 energy consumption Methods 0.000 description 16
- 238000005057 refrigeration Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000000126 substance Substances 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 230000020169 heat generation Effects 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000001172 regenerating effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
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- 238000010992 reflux Methods 0.000 description 1
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- 238000004904 shortening Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B9/00—Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
- F04B37/16—Means for nullifying unswept space
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B9/00—Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point
- F25B9/14—Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point characterised by the cycle used, e.g. Stirling cycle
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2400/00—General features or devices for refrigeration machines, plants or systems, combined heating and refrigeration systems or heat-pump systems, i.e. not limited to a particular subgroup of F25B
- F25B2400/06—Several compression cycles arranged in parallel
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2600/00—Control issues
- F25B2600/02—Compressor control
- F25B2600/025—Compressor control by controlling speed
- F25B2600/0253—Compressor control by controlling speed with variable speed
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B30/00—Energy efficient heating, ventilation or air conditioning [HVAC]
- Y02B30/70—Efficient control or regulation technologies, e.g. for control of refrigerant flow, motor or heating
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Control Of Positive-Displacement Pumps (AREA)
Description
前記複数の真空排気ポンプに繋がれた圧縮機と、
前記圧縮機から共通の圧力の高圧のガスが前記複数の真空排気ポンプの冷凍機に供給される流路である高圧配管と、
前記複数の真空排気ポンプの冷凍機から低圧のガスが前記圧縮機に還流する流路である低圧配管と、
前記回数に応じて、前記高圧配管の内圧と前記低圧配管の内圧との圧力差を変化させることが出来る制御手段と、を備え、
全ての真空排気ポンプが前記通常運転を行い、且つ、前記全ての真空排気ポンプの前記回数が前記所定の範囲内であるとき、前記複数の真空排気ポンプのうち少なくとも1台は、
前記回数が前記所定の範囲内に収まる範囲で、前記圧縮機で生成される前記高圧配管内と前記低圧配管内とのガスの圧力差を減少させるように動作することを特徴とする。
Claims (3)
- 第一冷却ステージ部を含み、前記第一冷却ステージ部を冷却する冷凍機と、前記第一冷却ステージ部の温度を測定する第一温度センサとを有し、冷却を行う通常運転時において、前記第一温度センサの測定した温度が所定の温度範囲より高いときは前記冷凍機内で高圧状態と低圧状態が単位時間内に繰り返される回数を増大させ、前記第一温度センサの測定した温度が前記所定の温度範囲より低いときは前記回数を減少させ、前記第一温度センサの測定した温度が前記所定の温度範囲内のときは前記回数を所定の範囲内に維持する複数の真空排気ポンプと、
前記複数の真空排気ポンプに繋がれた圧縮機と、
前記圧縮機から共通の圧力の高圧のガスが前記複数の真空排気ポンプの冷凍機に供給される流路である高圧配管と、
前記複数の真空排気ポンプの冷凍機から低圧のガスが前記圧縮機に還流する流路である低圧配管と、
前記回数に応じて、前記高圧配管の内圧と前記低圧配管の内圧との圧力差を変化させることが出来る制御手段と、を備え、
全ての真空排気ポンプが前記通常運転を行い、且つ、前記全ての真空排気ポンプの前記回数が前記所定の範囲内であるとき、前記複数の真空排気ポンプのうち少なくとも1台は、
前記回数が前記所定の範囲内に収まる範囲で、前記圧縮機で生成される前記高圧配管内と前記低圧配管内とのガスの圧力差を減少させるように動作することを特徴とする真空排気システム。 - 前記複数の真空排気ポンプは、クライオトラップを含んでいることを特徴とする請求項1に記載の真空排気システム。
- 前記複数の真空排気ポンプは、クライオポンプを含んでいることを特徴とする請求項1に記載の真空排気システム。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010265405A JP5307785B2 (ja) | 2008-09-30 | 2010-11-29 | 真空排気システム |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008253916 | 2008-09-30 | ||
JP2008253916 | 2008-09-30 | ||
JP2008253919 | 2008-09-30 | ||
JP2008253919 | 2008-09-30 | ||
JP2010265405A JP5307785B2 (ja) | 2008-09-30 | 2010-11-29 | 真空排気システム |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010513558A Division JP4642156B2 (ja) | 2008-09-30 | 2009-09-29 | 真空排気システム、真空排気システムの運転方法、冷凍機、冷凍機の運転方法、基板処理装置、電子デバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011043164A JP2011043164A (ja) | 2011-03-03 |
JP5307785B2 true JP5307785B2 (ja) | 2013-10-02 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010513558A Active JP4642156B2 (ja) | 2008-09-30 | 2009-09-29 | 真空排気システム、真空排気システムの運転方法、冷凍機、冷凍機の運転方法、基板処理装置、電子デバイスの製造方法 |
JP2010265405A Active JP5307785B2 (ja) | 2008-09-30 | 2010-11-29 | 真空排気システム |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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JP2010513558A Active JP4642156B2 (ja) | 2008-09-30 | 2009-09-29 | 真空排気システム、真空排気システムの運転方法、冷凍機、冷凍機の運転方法、基板処理装置、電子デバイスの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20110147198A1 (ja) |
JP (2) | JP4642156B2 (ja) |
KR (1) | KR101279184B1 (ja) |
CN (1) | CN102165192B (ja) |
WO (1) | WO2010038415A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101143800B1 (ko) * | 2008-09-30 | 2012-05-11 | 캐논 아네르바 가부시키가이샤 | 진공 배기 시스템, 기판 처리 장치, 전자 디바이스의 제조 방법, 진공 배기 시스템의 운전 방법 |
JP5738174B2 (ja) * | 2011-12-27 | 2015-06-17 | 住友重機械工業株式会社 | クライオポンプシステム、極低温システム、圧縮機ユニットの制御装置及びその制御方法 |
JP5808691B2 (ja) * | 2012-02-23 | 2015-11-10 | 住友重機械工業株式会社 | クライオポンプ、及びクライオポンプの再生方法 |
JP5868224B2 (ja) * | 2012-03-07 | 2016-02-24 | 住友重機械工業株式会社 | クライオポンプシステム、クライオポンプシステムの運転方法、及び圧縮機ユニット |
KR101919888B1 (ko) * | 2012-06-11 | 2018-11-19 | 엘지전자 주식회사 | 약진공 알고리즘에 의한 냉장고 야채실 신선보관 구조 및 이를 이용한 신선보관방법 |
JP6067423B2 (ja) * | 2013-03-04 | 2017-01-25 | 住友重機械工業株式会社 | 極低温冷凍装置、クライオポンプ、核磁気共鳴画像装置、及び極低温冷凍装置の制御方法 |
CN103389188B (zh) * | 2013-07-16 | 2016-06-22 | 上海实路真空技术工程有限公司 | 一种用于绝热气瓶漏率检测的检漏装置和检漏方法 |
JP2015098844A (ja) | 2013-11-20 | 2015-05-28 | 住友重機械工業株式会社 | クライオポンプシステム、及びクライオポンプシステムの運転方法 |
JP6351525B2 (ja) * | 2015-03-04 | 2018-07-04 | 住友重機械工業株式会社 | クライオポンプシステム、クライオポンプ制御装置、及びクライオポンプ再生方法 |
KR101949426B1 (ko) | 2017-05-23 | 2019-02-18 | 한국알박크라이오(주) | 크라이오 펌프를 위한 컴프레서 장치 및 그 제어 방법 |
KR101971827B1 (ko) * | 2018-04-17 | 2019-04-23 | 캐논 톡키 가부시키가이샤 | 진공 장치, 진공 시스템, 디바이스 제조 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR101943268B1 (ko) * | 2018-04-26 | 2019-01-28 | 캐논 톡키 가부시키가이샤 | 진공 시스템, 기판 반송 시스템, 전자 디바이스의 제조 장치 및 전자 디바이스의 제조 방법 |
WO2020049915A1 (ja) * | 2018-09-03 | 2020-03-12 | 住友重機械工業株式会社 | クライオポンプおよびクライオポンプの監視方法 |
JP2019173756A (ja) * | 2019-06-14 | 2019-10-10 | 住友重機械工業株式会社 | クライオポンプシステム、クライオポンプシステムの運転方法、冷凍機システム、および冷凍機システムの運転方法 |
WO2021181513A1 (ja) * | 2020-03-10 | 2021-09-16 | Atsジャパン株式会社 | 冷媒制御システム、及び冷却システム |
JP2021063508A (ja) * | 2021-01-20 | 2021-04-22 | 住友重機械工業株式会社 | クライオポンプシステム、クライオポンプシステムの運転方法、冷凍機システム、および冷凍機システムの運転方法 |
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JPH062658A (ja) * | 1991-05-30 | 1994-01-11 | Ulvac Kuraio Kk | クライオポンプ装置 |
US5291740A (en) * | 1992-07-02 | 1994-03-08 | Schnurer Steven D | Defrosting tool for cryostat cold head interface |
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JP2567369B2 (ja) * | 1993-07-17 | 1996-12-25 | アネルバ株式会社 | クライオポンプ |
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JPH08135570A (ja) * | 1994-11-11 | 1996-05-28 | Ebara Corp | クライオポンプ及びコールドトラップ |
EP0919722B1 (en) * | 1994-04-28 | 2003-07-16 | Ebara Corporation | Regeneration of a cryopump |
JPH08232839A (ja) * | 1995-02-27 | 1996-09-10 | Daikin Ind Ltd | 極低温冷凍機 |
JPH10184541A (ja) * | 1996-12-27 | 1998-07-14 | Anelva Corp | 真空排気装置 |
JP2000249056A (ja) * | 1999-02-26 | 2000-09-12 | Suzuki Shokan:Kk | クライオポンプの運転制御方法および運転制御装置 |
JP2001317457A (ja) * | 2000-04-28 | 2001-11-16 | Ulvac Kuraio Kk | クライオポンプの運転方法 |
JP4445187B2 (ja) | 2002-04-18 | 2010-04-07 | 住友重機械工業株式会社 | 極低温冷凍機 |
KR20050058363A (ko) * | 2002-08-20 | 2005-06-16 | 스미도모쥬기가이고교 가부시키가이샤 | 극저온 냉동기 |
JP4150745B2 (ja) * | 2006-05-02 | 2008-09-17 | 住友重機械工業株式会社 | クライオポンプ及びその再生方法 |
WO2009028450A1 (ja) * | 2007-08-28 | 2009-03-05 | Canon Anelva Technix Corporation | クライオポンプシステム |
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2009
- 2009-09-29 CN CN200980137529.5A patent/CN102165192B/zh active Active
- 2009-09-29 WO PCT/JP2009/004967 patent/WO2010038415A1/ja active Application Filing
- 2009-09-29 KR KR1020117009218A patent/KR101279184B1/ko active IP Right Grant
- 2009-09-29 JP JP2010513558A patent/JP4642156B2/ja active Active
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2010
- 2010-11-29 JP JP2010265405A patent/JP5307785B2/ja active Active
-
2011
- 2011-03-01 US US13/037,819 patent/US20110147198A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20110147198A1 (en) | 2011-06-23 |
KR20110073540A (ko) | 2011-06-29 |
KR101279184B1 (ko) | 2013-06-26 |
JP2011043164A (ja) | 2011-03-03 |
JPWO2010038415A1 (ja) | 2012-03-01 |
CN102165192A (zh) | 2011-08-24 |
JP4642156B2 (ja) | 2011-03-02 |
WO2010038415A1 (ja) | 2010-04-08 |
CN102165192B (zh) | 2014-03-12 |
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