JP5211242B2 - 光学検査システムにおける動的照明 - Google Patents
光学検査システムにおける動的照明 Download PDFInfo
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- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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Description
112 周縁部区域
114 アレイ区域
Claims (10)
- 半導体物体を照明するように構成された照明源と、
複数のフレームを用いて照明された前記半導体物体を撮像するように構成された撮像システムと、
前記照明源と前記半導体物体との間の照明経路中に配置された制御可能な空間マスクであって、前記複数のフレームのうちの1つのフレーム内の第1の部分及び第2の部分の照明を、それぞれ第1の照明レベル及び第2の照明レベルに動的に調節するように構成された、前記制御可能な空間マスクと、
を含み、
前記第1の部分と前記第2の部分とは互いに異なり、前記第1の照明レベルと前記第2の照明レベルとは互いに異なり、
前記第1の照明レベルにおいて第1の画像を取得し、前記第2の照明レベルにおいて第2の画像を取得する、検査前設定シーケンスを実行するように構成され、
前記第1の画像及び前記第2の画像に基づいて、前記半導体物体のそれぞれの部分のために前記半導体物体の検査の間に使用される特定の照明レベルを判断するように構成される、
ことを特徴とする光学検査ツール。 - 前記空間マスクは、焦点外の前記半導体物体上に結像されることを特徴とする請求項1に記載の光学検査ツール。
- (i)検査ツールの照明源を用いて、第1の照明レベルで半導体物体の関心ある区域を照明する段階と、
(ii)検査ツールの撮像システムを用いて、前記第1の照明レベルで照明された前記関心ある区域の画像を取得する段階と、
(iii)前記画像の少なくとも1つの品質特性を評価する段階と、
(iv)前記第1の照明レベルに代えて第2の照明レベルで、段階(i)、(ii)、及び(iii)を実行する段階であって、前記第1の照明レベルと前記第2の照明レベルとは異なる、前記段階と、
(v)前記半導体物体の前記関心ある区域を検査する段階と、を含み、
前記検査する段階は、前記照明源と前記半導体物体との間の照明経路中に配置された制御可能な空間マスクを使用して、複数のフレームのうちの1つのフレーム内の第1の部分及び第2の部分の照明レベルを、それぞれ前記第1の照明レベル及び前記第2の照明レベルに動的に調節することを含み、前記第1の部分と前記第2の部分とは互いに異なる、
ことを特徴とする光学検査方法。 - 前記少なくとも1つの品質特性が、前記画像における飽和の量を含み、前記第1の照明レベル及び前記第2の照明レベルは、異なる強度の照明を含むことを特徴とする請求項3に記載の光学検査方法。
- 前記第1の照明レベル及び前記第2の照明レベルでの撮像中に得られた画像から前記関心ある区域のダイナミックレンジ画像を作成する段階を更に含み、
前記ダイナミックレンジ画像は、前記関心ある区域の検査中に用いる照明のレベルを調節するのに用いられる、
ことを特徴とする請求項4に記載の光学検査方法。 - 前記関心ある区域のダイナミックレンジ画像を作成する段階は、
前記得られた画像内の前記関心ある区域の各領域に対して、該画像において飽和状態にない該領域が撮像された最高照明強度を判断する段階、及び
各領域に対して、該領域が飽和状態になかったそれぞれの最高強度値によって該領域に対するピクセル値を分割する段階、
を含む、
ことを特徴とする請求項5に記載の光学検査方法。 - 前記照明を動的に調節する段階は、
前記半導体物体の領域に対して、前記ダイナミックレンジ画像から該領域の最大区域の反射率を判断する段階、及び
前記反射率に基づいて前記領域に対する照明レベルを判断する段階、
を含む、
ことを特徴とする請求項5に記載の光学検査方法。 - 前記関心ある区域は、半導体ウェーハのダイを含み、
前記半導体物体の前記関心ある区域を検査する段階は、前記ダイに対するダイナミックレンジ画像に基づいて複数のダイを検査する段階を含む、
ことを特徴とする請求項3に記載の光学検査方法。 - 前記空間マスクは、同じフレーム内の異なる領域に対する照明を動的に調節するために、ピクセル化されていることを特徴とする請求項1に記載の光学検査ツール。
- 前記空間マスクは、LCDアレイ、マイクロシャッターアレイ、又はマイクロミラーアレイを含むことを特徴とする請求項1に記載の光学検査ツール。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/145,708 | 2008-06-25 | ||
US12/145,708 US7973921B2 (en) | 2008-06-25 | 2008-06-25 | Dynamic illumination in optical inspection systems |
PCT/IL2009/000572 WO2009156981A1 (en) | 2008-06-25 | 2009-06-09 | Dynamic illumination in optical inspection systems |
Publications (3)
Publication Number | Publication Date |
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JP2011525985A JP2011525985A (ja) | 2011-09-29 |
JP2011525985A5 JP2011525985A5 (ja) | 2012-07-26 |
JP5211242B2 true JP5211242B2 (ja) | 2013-06-12 |
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US (1) | US7973921B2 (ja) |
JP (1) | JP5211242B2 (ja) |
KR (1) | KR101258510B1 (ja) |
WO (1) | WO2009156981A1 (ja) |
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-
2008
- 2008-06-25 US US12/145,708 patent/US7973921B2/en active Active
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2009
- 2009-06-09 JP JP2011515725A patent/JP5211242B2/ja active Active
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KR20110034005A (ko) | 2011-04-04 |
WO2009156981A1 (en) | 2009-12-30 |
US7973921B2 (en) | 2011-07-05 |
KR101258510B1 (ko) | 2013-04-26 |
JP2011525985A (ja) | 2011-09-29 |
US20090323052A1 (en) | 2009-12-31 |
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