JP4950676B2 - 回路基板の製造方法 - Google Patents
回路基板の製造方法 Download PDFInfo
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- JP4950676B2 JP4950676B2 JP2007009568A JP2007009568A JP4950676B2 JP 4950676 B2 JP4950676 B2 JP 4950676B2 JP 2007009568 A JP2007009568 A JP 2007009568A JP 2007009568 A JP2007009568 A JP 2007009568A JP 4950676 B2 JP4950676 B2 JP 4950676B2
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- circuit board
- uncured
- circuit chip
- circuit
- sheet
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- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
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- 238000003780 insertion Methods 0.000 description 1
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- 150000004681 metal hydrides Chemical class 0.000 description 1
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
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- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
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- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
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- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
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- 229920000647 polyepoxide Polymers 0.000 description 1
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- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
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- 238000010526 radical polymerization reaction Methods 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
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- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
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- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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Description
本発明の回路基板の製造に使用する回路基板シートの材料は、回路チップが配置された箇所以外を、回路チップの配置前または配置後に選択的に硬化可能なもので、その表面に配置された回路チップが押圧されると回路チップを回路基板シート内部に埋め込み可能なものであれば、特に制限ないが、選択的に未硬化層が容易に設けられ、回路チップを容易かつ正確に配置し埋め込み可能な活性エネルギー線硬化性樹脂が好適に使用される。この活性エネルギー線硬化性樹脂は、紫外線、電子線等の活性エネルギー線を照射することにより、重合、硬化する樹脂である。
前記活性エネルギー線硬化性樹脂の塗工液を調製し、この塗工液を、剥離基材の片面に剥離剤層が設けられた剥離シート(重剥離型剥離シート)の剥離処理面に、塗布し、溶剤を含む場合、加熱乾燥して、活性エネルギー線硬化性樹脂からなる未硬化層を形成したシートとする。前記塗布方法は、ナイフコーター、ロールコーター、バーコーター、ブレードコーター、グラビアコーターなどの方法で塗布し、室温〜150℃、好ましくは60〜130℃、1〜10分の条件で乾燥させる。また、剥離シートは公知のものが使用でき、ポリエチレンフィルムや、ポリプロピレンフィルム、ポリエチレンテレフタレートフィルム、ポリエチレンナフタレートフィルムなどの剥離基材にシリコーン樹脂、アルキッド樹脂、長鎖アルキル樹脂などの剥離剤を塗布して剥離剤層を設けたものなどが挙げられる。この剥離シートの厚さは、通常、20〜150μm程度である。
図1に示すように、上述のように作製した回路基板シート1の軽剥離型剥離シート(不図示)を未硬化層2から剥がしてソーダライム、石英ガラス等のガラス基板3に貼合する。この時、活性エネルギー線を透過する重剥離型剥離シート4は剥がさずに置く。
図8に示すように、先に説明したように製造した回路基板シート1の軽剥離型剥離シート(不図示)を未硬化層2から剥がしてガラス基板3に貼合する。その後、他方の重剥離型剥離シート(不図示)を剥がし、替わりに孔開き剥離シート20を貼合する。この孔開き剥離シート20には、所要数(図では1つ)の孔20aを所要のパターンで形成してある。
図11に示すように、先に説明したように製造した回路基板シート1の軽剥離型剥離シート(不図示)を未硬化層2から剥がしてガラス基板3に貼合する。その後、重剥離型剥離シート(不図示)を剥がし、露出した未硬化層2の上に所要数(図では1つ)の回路チップ6を所要のパターンで配置する。
(回路基板シートの形成)
アクリル酸ブチル(関東化学社製)80重量部とアクリル酸(関東化学社製)20重量部とを酢酸エチル/メチルエチルケトン混合溶媒(重量比50:50)中で反応させて得たアクリル酸エステル共重合体(固形分濃度35重量%)に、共重合体中のアクリル酸100当量に対し30当量となるように、2−メタクリロイルオキシエチルイソシアナート(国産化学社製)を添加し、窒素雰囲気下、40℃で48時間反応させて、側鎖に活性エネルギー線硬化性基を有する重量平均分子量が85万の活性エネルギー線硬化性官能基が導入されてなるアクリル系共重合体を得た。
前記未硬化層を有する前記回路基板シートの軽剥離型剥離シートを剥がし、5cm×5cmのソーダライムガラス基板に貼合した。この状態で、他方の重剥離型剥離シート上にマスクを貼合し、該マスクを介して回路基板シートに照度400mW/cm2、光量315mJ/cm2の条件で無電極ランプ(フュージョン社製、Hバルブ)を光源とする紫外線を照射した。マスクは、石英ガラス上に紫外線を遮断するためにクロムの薄膜が形成されたもの(遮断箇所のサイズ:縦520μm×横520μm、間隔1740μm)を使用した。前記紫外線をマスク上方側から照射することにより、未硬化層にサイズ縦520μm×横520μmの未硬化部が4箇所形成され、他の部分は硬化部となった。
前記回路基板シートの重剥離型剥離シートを剥がし、前記4箇所の未硬化部の表面に4個の回路チップ(縦500μm×横500μm×厚さ200μm)を配置した。
ガラス基板上の回路チップが配置された回路基板シートの上方に、剥離シート(リンテック社製、商品名「SP−PET3801」)を介して、別に用意した5cm×5cmのガラス基板としてのソーダライムガラス板を押し当て、平面プレス機を用いて0.3MPaの圧力で5分間プレスした。常圧に戻した後、平面プレス機から剥離シート、上方のソーダライムガラス板と下方のガラス基板を付けたままの回路基板シートを取り外し、照度400mW/cm2、光量315mJ/cm2の条件で回路基板シートに無電極ランプ(フュージョン社製、Hバルブ)を光源とする紫外線を下方の回路チップを有しない面のガラス基板側から照射して未硬化部を硬化させた。その後、回路基板上方のソーダライムガラス板と剥離シートを取り除くと、下方のソーダライムガラス基板上に4個の回路チップが所望の配置で埋め込まれている回路基板を得た。
実施例1において、回路基板シートへ紫外線を遮蔽するマスクとして、サイズが縦800μm×横800μm(間隔1740μm)の遮蔽箇所が形成されたマスクを用いた以外は、実施例1と同様な方法で、回路チップの回路基板シートへの埋め込み、および回路基板シートの硬化を行って、回路基板を得た。
実施例1において、回路基板シートの未硬化部と硬化部とを選択形成する工程を以下の通りに変更した以外は、実施例1と同様にして、回路基板を得た。
前記未硬化層を有する前記回路基板シートの軽剥離型剥離シートを剥がし、5cm×5cmのソーダライムガラス基板に貼合した。
実施例1において、回路チップを埋め込む前までの工程を以下の通りに変更した以外は、実施例1と同様にして、回路基板を得た。
前記未硬化層を有する前記回路基板シートの軽剥離型剥離シートを剥がし、露出した未硬化層を5cm×5cmのソーダライムガラス基板に貼合し、他方の表面の重剥離型剥離シートを剥がして未硬化層を露出させた。
実施例1において、回路チップを配置する前に、回路基板シートに紫外線照射を行わずに全面を未硬化粘着領域としたままにした以外は、実施例1と同様な方法により回路基板を得た。
実施例1において、使用するマスクの遮蔽部のサイズを縦1300μm×横1300μm(間隔1740μm)としたこと以外は実施例1と同様にして、回路基板を得た。
前記各実施例における未硬化部の表面サイズと、回路チップの埋め込み開始位置と埋め込み完了位置との水平方向のずれ幅(μm)とを測定した。評価試験は10回実施し(n=10)、その平均値を出した。その結果を、表1に示した。
2 未硬化層
2a 未硬化部
2b 硬化部
3 ガラス基板
4 重剥離型剥離シート
5 マスク
6 回路チップ
10 平面プレス機
11 剥離シート
12 ガラス基板
13 回路基板
20 孔開き剥離シート
20a 孔
Claims (7)
- 回路チップを回路基板シートの内部に埋め込む回路基板の製造方法であって、
前記回路基板シートは硬化可能な未硬化層から構成され、該未硬化層の前記回路チップが配置される箇所以外を前記回路チップが前記箇所に配置される前または後に選択的に硬化し、未硬化部として残された前記箇所の上に配置された前記回路チップを押圧して前記回路基板シートの内部に埋め込む回路基板の製造方法。 - 前記回路基板シートの未硬化層が前記回路チップの厚みを超える厚みに形成されていることを特徴とする請求項1に記載の回路基板の製造方法。
- 前記未硬化層が活性エネルギー線硬化性樹脂から構成されていることを特徴とする請求項1または2に記載の回路基板の製造方法。
- 前記未硬化層の表面に前記回路チップを配置する前に、選択的に活性エネルギー線を遮蔽するマスクを前記未硬化層の表面に貼合し、前記マスクを貼合した側から前記未硬化層に活性エネルギー線を照射することにより、前記未硬化部と硬化部とを選択的に形成し、その後、回路チップを前記未硬化部の表面に配置することを特徴とする請求項3に記載の回路基板の製造方法。
- 前記未硬化層の表面に前記回路チップを配置する前に、選択的に開口部を設けた孔開き剥離シートを前記未硬化層の上に貼合し、活性エネルギー線を前記未硬化層に照射することにより、前記未硬化部と硬化部とを選択的に形成し、その後、回路チップを前記未硬化部の表面に配置することを特徴とする請求項3に記載の回路基板の製造方法。
- 前記未硬化層の表面に前記回路チップを配置した後に、該未硬化層の回路チップが配置された側から該未硬化層に活性エネルギー線を照射することにより、前記未硬化部と硬化部とを選択的に形成し、その後、回路チップを押圧して前記回路チップを前記未硬化層内に埋め込むことを特徴とする請求項3に記載の回路基板の製造方法。
- 請求項1〜6のいずれか1項に記載の回路基板の製造方法により得られた回路基板。
Priority Applications (6)
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JP2007009568A JP4950676B2 (ja) | 2007-01-18 | 2007-01-18 | 回路基板の製造方法 |
KR1020097014180A KR101387206B1 (ko) | 2007-01-18 | 2008-01-17 | 회로 기판의 제조 방법 및 회로 기판 |
PCT/JP2008/050478 WO2008087995A1 (ja) | 2007-01-18 | 2008-01-17 | 回路基板の製造方法および回路基板 |
TW097101782A TWI405512B (zh) | 2007-01-18 | 2008-01-17 | 電路板的製造方法以及電路板 |
US12/523,805 US8298873B2 (en) | 2007-01-18 | 2008-01-17 | Method for producing circuit substrate, and circuit substrate |
CN2008800024352A CN101589655B (zh) | 2007-01-18 | 2008-01-17 | 电路基板的制造方法及电路基板 |
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JP2007009568A JP4950676B2 (ja) | 2007-01-18 | 2007-01-18 | 回路基板の製造方法 |
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JP4950676B2 true JP4950676B2 (ja) | 2012-06-13 |
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US (1) | US8298873B2 (ja) |
JP (1) | JP4950676B2 (ja) |
KR (1) | KR101387206B1 (ja) |
CN (1) | CN101589655B (ja) |
TW (1) | TWI405512B (ja) |
WO (1) | WO2008087995A1 (ja) |
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US7772042B2 (en) * | 2008-09-24 | 2010-08-10 | Eastman Kodak Company | Solvent softening to allow die placement |
US9579868B2 (en) * | 2014-07-01 | 2017-02-28 | Isola Usa Corp. | Prepregs and laminates having a UV curable resin layer |
WO2020214238A1 (en) * | 2019-04-16 | 2020-10-22 | Applied Materials, Inc. | Method of thin film deposition in trenches |
DE102019128088A1 (de) | 2019-10-17 | 2021-04-22 | Rastal Gmbh & Co. Kg | Verfahren zum Verbinden eines Geschirrteils mit einem Informationsträger und Vorrichtung mit einem Geschirrteil und einem Informationsträger |
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US5972807A (en) * | 1990-04-16 | 1999-10-26 | Fujitsu Limited | Photosensitive, heat-resistant resin composition and process for using same to form patterns as well as polymeric composite and production process thereof |
US7356786B2 (en) | 1999-11-30 | 2008-04-08 | Synplicity, Inc. | Method and user interface for debugging an electronic system |
JP4186756B2 (ja) | 2003-08-29 | 2008-11-26 | 松下電器産業株式会社 | 回路基板及びその製造方法 |
JP2003248436A (ja) | 2002-02-27 | 2003-09-05 | Ishikawa Seisakusho Ltd | 大画面平面ディスプレイ装置並びにその製造方法及び製造装置 |
US7218812B2 (en) * | 2003-10-27 | 2007-05-15 | Rpo Pty Limited | Planar waveguide with patterned cladding and method for producing the same |
US20060082002A1 (en) * | 2004-10-06 | 2006-04-20 | Lintec Corporation | Sheet for circuit substrates and sheet of a circuit substrate for displays |
JP2006332094A (ja) * | 2005-05-23 | 2006-12-07 | Seiko Epson Corp | 電子基板の製造方法及び半導体装置の製造方法並びに電子機器の製造方法 |
US8067253B2 (en) * | 2005-12-21 | 2011-11-29 | Avery Dennison Corporation | Electrical device and method of manufacturing electrical devices using film embossing techniques to embed integrated circuits into film |
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TWI405512B (zh) | 2013-08-11 |
US8298873B2 (en) | 2012-10-30 |
CN101589655B (zh) | 2012-11-28 |
TW200843581A (en) | 2008-11-01 |
KR20090099064A (ko) | 2009-09-21 |
KR101387206B1 (ko) | 2014-04-21 |
CN101589655A (zh) | 2009-11-25 |
WO2008087995A1 (ja) | 2008-07-24 |
JP2008177370A (ja) | 2008-07-31 |
US20100044887A1 (en) | 2010-02-25 |
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