JP4861448B2 - ニッケルシリサイドナノワイヤの製造方法 - Google Patents
ニッケルシリサイドナノワイヤの製造方法 Download PDFInfo
- Publication number
- JP4861448B2 JP4861448B2 JP2009095205A JP2009095205A JP4861448B2 JP 4861448 B2 JP4861448 B2 JP 4861448B2 JP 2009095205 A JP2009095205 A JP 2009095205A JP 2009095205 A JP2009095205 A JP 2009095205A JP 4861448 B2 JP4861448 B2 JP 4861448B2
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- silicon substrate
- nickel silicide
- nanowire
- titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002070 nanowire Substances 0.000 title claims description 57
- 229910021334 nickel silicide Inorganic materials 0.000 title claims description 51
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 title claims description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 61
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 53
- 229910052710 silicon Inorganic materials 0.000 claims description 53
- 239000010703 silicon Substances 0.000 claims description 53
- 239000000758 substrate Substances 0.000 claims description 45
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 43
- 229910052759 nickel Inorganic materials 0.000 claims description 30
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 24
- 239000010936 titanium Substances 0.000 claims description 24
- 229910052719 titanium Inorganic materials 0.000 claims description 24
- 235000012239 silicon dioxide Nutrition 0.000 claims description 23
- 239000000377 silicon dioxide Substances 0.000 claims description 20
- 229910021341 titanium silicide Inorganic materials 0.000 claims description 18
- 238000004544 sputter deposition Methods 0.000 claims description 14
- 150000002815 nickel Chemical class 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910021332 silicide Inorganic materials 0.000 description 4
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 4
- 239000010453 quartz Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003746 solid phase reaction Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910008484 TiSi Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/06—Metal silicides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
Description
302 スパッタ室
304 反応室
306 四重極質量分析計
308 ニッケル粒子
310 ニッケルクラスター
312 シリコン基板
314 チタンシリサイドの島状構造
316 ニッケルシリサイドナノワイヤ
320 二酸化珪素層
322 チタン層
Claims (6)
- 表面に二酸化珪素層が形成されたシリコン基板を提供する第一ステップと、
前記シリコン基板に形成された二酸化珪素層の表面にチタン層を形成する第二ステップと、
生長装置を提供し、前記チタン層が形成されたシリコン基板を前記生長装置に置き、該生長装置を500℃〜1000℃に加熱する第三ステップと、
前記シリコン基板の表面にニッケルクラスターを形成し、ニッケルシリサイドナノワイヤを生長させる第四ステップと、
を含むことを特徴とするニッケルシリサイドナノワイヤの製造方法。 - 前記第三ステップにおいて、該生長装置を加熱した後、2〜10分間保持することを特徴とする請求項1に記載のニッケルシリサイドナノワイヤの製造方法。
- 前記第三ステップにおいて、
前記チタン層が形成されたシリコン基板を、500℃〜1000℃に加熱させると、該シリコン基板の表面に複数のチタンシリサイドの島状構造が形成されることを特徴とする請求項1に記載のニッケルシリサイドナノワイヤの製造方法。 - 前記第四ステップは、
スパッタリング法により、ニッケルクラスターを形成する第一サブステップと、
前記ニッケルクラスターを選択的に利用する第二サブステップと、
選択された前記ニッケルクラスターを前記シリコン基板の表面に堆積する第三サブステップと、
を含むことを特徴とする請求項1から4のいずれか一項に記載のニッケルシリサイドナノワイヤの製造方法。 - 前記第四ステップの第一サブステップにおいて、
マグネトロンスパッタリング法でニッケルクラスターを形成することを特徴とする請求項4に記載のニッケルシリサイドナノワイヤの製造方法。 - 前記第四ステップの第二サブステップにおいて、
四重極質量分析計で前記ニッケルクラスターを選択することを特徴とする請求項4又は5に記載のニッケルシリサイドナノワイヤの製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008100665226A CN101555016B (zh) | 2008-04-09 | 2008-04-09 | 硅化镍纳米线的制备方法 |
CN200810066522.6 | 2008-04-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009249285A JP2009249285A (ja) | 2009-10-29 |
JP4861448B2 true JP4861448B2 (ja) | 2012-01-25 |
Family
ID=41164230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009095205A Active JP4861448B2 (ja) | 2008-04-09 | 2009-04-09 | ニッケルシリサイドナノワイヤの製造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US8349146B2 (ja) |
JP (1) | JP4861448B2 (ja) |
CN (1) | CN101555016B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8575391B2 (en) | 2004-07-26 | 2013-11-05 | Chugai Seiyaku Kabushiki Kaisha | 5-substituted-2-phenylamino benzamides as MEK inhibitors |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101956181B (zh) * | 2010-06-30 | 2012-01-04 | 长春理工大学 | 过渡金属镍、钴氧化物纳米线阵列制备方法 |
CN102897851B (zh) * | 2012-06-01 | 2015-11-25 | 长春理工大学 | 一种基于扩散限制凝聚(dla)原理制备镍、钴及其氧化物纳米结构的方法 |
US10388533B2 (en) * | 2017-06-16 | 2019-08-20 | Applied Materials, Inc. | Process integration method to tune resistivity of nickel silicide |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0459086A (ja) * | 1990-06-25 | 1992-02-25 | Hitachi Ltd | 洗浄装置 |
TW290592B (ja) * | 1993-07-08 | 1996-11-11 | Asahi Seiko Co Ltd | |
KR19980024663A (ko) * | 1996-09-18 | 1998-07-06 | 윌리엄 비. 켐플러 | 규화물 영역 형성 방법 |
JP2004362895A (ja) * | 2003-06-03 | 2004-12-24 | Sony Corp | 負極材料およびそれを用いた電池 |
JP2005277182A (ja) * | 2004-03-25 | 2005-10-06 | Sharp Corp | ナノワイヤ及びその製造方法、半導体装置 |
KR100612853B1 (ko) | 2004-07-21 | 2006-08-14 | 삼성전자주식회사 | 와이어 형태의 실리사이드를 포함하는 Si 계열 물질층및 그 제조방법 |
CN100423245C (zh) * | 2005-12-07 | 2008-10-01 | 中国科学院物理研究所 | 金属硅化物纳米线及其制作方法 |
-
2008
- 2008-04-09 CN CN2008100665226A patent/CN101555016B/zh active Active
- 2008-11-06 US US12/291,299 patent/US8349146B2/en active Active
-
2009
- 2009-04-09 JP JP2009095205A patent/JP4861448B2/ja active Active
-
2012
- 2012-08-17 US US13/588,222 patent/US8603304B2/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8575391B2 (en) | 2004-07-26 | 2013-11-05 | Chugai Seiyaku Kabushiki Kaisha | 5-substituted-2-phenylamino benzamides as MEK inhibitors |
Also Published As
Publication number | Publication date |
---|---|
US8603304B2 (en) | 2013-12-10 |
US8349146B2 (en) | 2013-01-08 |
CN101555016A (zh) | 2009-10-14 |
US20090258163A1 (en) | 2009-10-15 |
CN101555016B (zh) | 2011-06-08 |
US20120315761A1 (en) | 2012-12-13 |
JP2009249285A (ja) | 2009-10-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5065336B2 (ja) | カーボンナノチューブフィルムの製造方法 | |
US8865577B2 (en) | Method for making epitaxial structure | |
Dawood et al. | Interference lithographically defined and catalytically etched, large-area silicon nanocones from nanowires | |
JP2007186413A5 (ja) | ||
JP2009184906A (ja) | カーボンナノチューブ構造体及びその製造方法 | |
WO2006133949A2 (en) | Formation of metal-containing nanoparticles for use as catalysts in carbon nanotube synthysis | |
JP4861448B2 (ja) | ニッケルシリサイドナノワイヤの製造方法 | |
JP2012025004A (ja) | グラフェンシート付き基材及びグラフェンシートの製造方法 | |
JP5578639B2 (ja) | グラファイト膜製造方法 | |
US8574679B2 (en) | Substrate structure and manufacturing method of the same | |
TWI573892B (zh) | 一奈米管膜的製備方法 | |
JP5343324B2 (ja) | 基板構造及びその製造方法 | |
TWI312380B (ja) | ||
JP2006069817A (ja) | 炭素元素からなる線状構造物質の形成体及び形成方法 | |
KR101151424B1 (ko) | 금속 나노입자를 표면에 형성한 1차원 나노구조물의 제조방법 | |
CN103172059B (zh) | 石墨烯的制备方法 | |
CN102689897B (zh) | 一种原子尺度石墨烯沟槽的制备方法 | |
JP2018532039A (ja) | 金属酸化物ナノワイヤのin−situ成長及び触媒ナノ粒子装飾 | |
TWI385259B (zh) | 矽化鎳奈米線的製備方法 | |
JP6031146B2 (ja) | ナノチューブフィルム及びその製造方法 | |
JP2004196631A (ja) | ナノカーボンの製造方法 | |
US10207920B2 (en) | Structure for holding catalyst particles for carbon nanotube production and method for producing same | |
CN109867276A (zh) | 在衬底上直接制备石墨烯的方法 | |
TWI474972B (zh) | 製作奈米碳管之方法、用以成長奈米碳管之試片以及奈米碳管元件 | |
TWI290592B (en) | Single crystal metallic silicide-nanowire and method producing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110921 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20111004 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111104 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4861448 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141111 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |