JP4476042B2 - Rotary cup applicator - Google Patents

Rotary cup applicator Download PDF

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Publication number
JP4476042B2
JP4476042B2 JP2004190202A JP2004190202A JP4476042B2 JP 4476042 B2 JP4476042 B2 JP 4476042B2 JP 2004190202 A JP2004190202 A JP 2004190202A JP 2004190202 A JP2004190202 A JP 2004190202A JP 4476042 B2 JP4476042 B2 JP 4476042B2
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Japan
Prior art keywords
cup
inner cup
tray
drain
drain guide
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JP2004190202A
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JP2006013243A (en
Inventor
和伸 山口
勉 佐保田
芳明 升
夕記 山本
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Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
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Priority to JP2004190202A priority Critical patent/JP4476042B2/en
Priority to TW094121009A priority patent/TWI388377B/en
Priority to KR1020050055582A priority patent/KR101204065B1/en
Priority to CNA2005100810419A priority patent/CN1714944A/en
Publication of JP2006013243A publication Critical patent/JP2006013243A/en
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Publication of JP4476042B2 publication Critical patent/JP4476042B2/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mathematical Physics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials For Photolithography (AREA)
  • Nozzles (AREA)

Description

本発明はＳＯＧ（Spin-On-Glass：珪素化合物を有機溶媒に溶解した溶液、及びこの溶液を塗布・焼成することで形成される酸化珪素膜）やレジスト液等の塗布液からなる膜をガラス基板等の板状被処理物の表面に形成する回転カップ式塗布装置に関する。   In the present invention, a film made of a coating solution such as SOG (Spin-On-Glass: a solution in which a silicon compound is dissolved in an organic solvent and a silicon oxide film formed by applying and baking this solution) or a resist solution is made of glass. The present invention relates to a rotating cup type coating apparatus formed on the surface of a plate-like object to be processed such as a substrate.

アウターカップ内にスピンナーによって回転せしめられるインナーカップを配置した回転カップ式塗布装置は、従来から知られており、この回転カップ式塗布装置では、板状被処理物（ガラス基板や半導体ウェーハ）とインナーカップ内周面との隙間が大きすぎ、乱流が生じやすくまた圧力変動も起きるため塗布液の飛散を十分に防止できない。   2. Description of the Related Art A rotating cup type coating apparatus in which an inner cup that is rotated by a spinner is disposed in an outer cup has been conventionally known. In this rotating cup type coating apparatus, a plate-shaped workpiece (glass substrate or semiconductor wafer) and an inner cup are used. Since the gap with the inner peripheral surface of the cup is too large, turbulent flow is likely to occur, and pressure fluctuations also occur, so that the coating liquid cannot be sufficiently prevented from scattering.

そこで、本出願人は特許文献１として、インナーカップ内に板状被処理物の形状に合わせた形状のトレイを設置し、このトレイ内に板状被処理物をセットして回転せしめて塗布するとともに、トレイの四隅からドレイン誘導管を導出し、このドレイン誘導管を介してインナーカップの内底部周縁に形成した貯留部に板状被処理物から飛散した塗布液を排出する提案を行なっている。   In view of this, the present applicant, as Patent Document 1, installs a tray having a shape corresponding to the shape of the plate-like object to be processed in the inner cup, sets the plate-like object to be processed in this tray, and rotates and applies it. At the same time, a drain guide pipe is led out from the four corners of the tray, and a proposal is made to discharge the coating solution scattered from the plate-like object to be processed through the drain guide pipe to a storage part formed at the inner bottom peripheral edge of the inner cup. .

特開平０９−１２２５６１号公報Japanese Patent Laid-Open No. 09-122561

特許文献１にあっては、ドレイン誘導管が水平に導出されているため、ドレイン誘導管から排出される塗布液はインナーカップの内周壁に垂直に衝突し、その一部は斜め上方に跳ね上がって再びインナーカップの内方に戻されることがある。戻された塗布液は微細なパーティクルとなって板状被処理物の表面に付着し、歩留り低下の原因になる。   In Patent Document 1, since the drain guide tube is led out horizontally, the coating liquid discharged from the drain guide tube collides vertically with the inner peripheral wall of the inner cup, and a part of it jumps up obliquely upward. It may be returned to the inside of the inner cup again. The returned coating liquid becomes fine particles and adheres to the surface of the plate-like object to be processed, causing a decrease in yield.

上記課題を解決するため本発明は、アウターカップ内にスピンナーによって回転せしめられるインナーカップが設けられ、前記インナーカップ内にはインナーカップと一体的に回転するトレイが設けられ、このトレイの中央部には板状被処理物を保持する手段が配置され、トレイからはドレイン誘導管が導出された回転カップ式塗布装置において、前記ドレイン誘導管の先部をインナーカップの内底部周縁に形成した貯留部に臨ませるとともに、当該先部は外側に向かって斜め下方に傾斜した形状にした。   In order to solve the above problems, the present invention provides an inner cup that is rotated by a spinner in an outer cup, and a tray that rotates integrally with the inner cup is provided in the inner cup. In the rotary cup type coating apparatus in which means for holding the plate-like object to be processed is arranged and the drain guide pipe is led out from the tray, the storage part in which the tip of the drain guide pipe is formed on the inner bottom edge of the inner cup And the tip portion was inclined obliquely downward toward the outside.

このような構成にすることで、ドレイン誘導管から排出される塗布液は、インナーカップ内周壁に斜め下向きに当たることになり、インナーカップの内方に戻される塗布液が殆どなくなる。   With such a configuration, the coating liquid discharged from the drain guide pipe strikes the inner peripheral wall of the inner cup obliquely downward, and there is almost no coating liquid returned to the inner side of the inner cup.

また、ドレイン誘導管の先部の最外部分の下端をインナーカップの底面よりも低く設定することで、ドレイン誘導管の先部から水平方向に飛び出す塗布液がなくなり、確実に貯留部に排出することができる。   In addition, by setting the lower end of the outermost part of the front part of the drain guide pipe lower than the bottom surface of the inner cup, there is no coating liquid jumping out from the front part of the drain guide pipe in the horizontal direction, and the liquid is surely discharged to the storage part. be able to.

本発明に係る回転カップ式塗布装置によれば、回転中の乱流および圧力変動による塗布液の飛散は勿論のこと、トレイのドレイン誘導管から排出される塗布液のほぼ全量を飛散させることなく、インナーカップの内底部周縁に形成した貯留部に回収することができる。   According to the rotating cup type coating apparatus according to the present invention, not only the coating liquid is scattered due to turbulent flow and pressure fluctuation during rotation, but also almost all of the coating liquid discharged from the drain guide tube of the tray is not scattered. , And can be collected in the reservoir formed on the inner bottom edge of the inner cup.

以下に本発明の実施の形態を添付図面に基づいて説明する。図１は本発明に係る回転カップ式塗布装置の待機状態の断面図、図２は同回転カップ式塗布装置のインナーカップを蓋体で閉じた状態の拡大断面図、図３はトレイの全体平面図である。   Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a sectional view of a rotating cup type coating apparatus according to the present invention in a standby state, FIG. 2 is an enlarged sectional view of an inner cup of the rotating cup type coating apparatus closed with a lid, and FIG. FIG.

回転カップ式塗布装置１はベース等に固定されたアウターカップ２内にインナーカップ３を配置し、このインナーカップ３をアウターカップ２を貫通するスピンナー４にて回転せしめるようにしている。   The rotating cup type coating apparatus 1 has an inner cup 3 disposed in an outer cup 2 fixed to a base or the like, and the inner cup 3 is rotated by a spinner 4 penetrating the outer cup 2.

インナーカップ３は内底部周縁に環状のドレイン回収通路３ａが形成され、中央部にはガラス基板や半導体ウェーハ等の板状被処理物Ｗを保持する保持手段として真空チャック５を配置している。尚、保持手段はこれに限定されるものではなく、メカチャックや静電チャック等板状被処理物Ｗを固定できる保持手段であればどのようなものでも用いることができる。   The inner cup 3 is formed with an annular drain recovery passage 3a at the periphery of the inner bottom portion, and a vacuum chuck 5 is disposed at the center as a holding means for holding a plate-like workpiece W such as a glass substrate or a semiconductor wafer. The holding means is not limited to this, and any holding means that can fix the plate-like workpiece W such as a mechanical chuck or an electrostatic chuck can be used.

また、インナーカップ３上にはトレイ７を固定している。このトレイ７は外形が平面視で略四角形状をなし、中央には前記真空チャック５が臨む開口８が形成され、周縁部には内方に折れ曲がった庇状壁部９が設けられ、更にトレイ７の各隅部からはドレイン誘導管１０が導出されている。   A tray 7 is fixed on the inner cup 3. The tray 7 has a substantially quadrangular outer shape in plan view, an opening 8 facing the vacuum chuck 5 is formed at the center, a bowl-shaped wall portion 9 bent inward is provided at the peripheral portion, and the tray 7 A drain guide tube 10 is led out from each corner 7.

ドレイン誘導管１０の導出方向はトレイの回転方向を基準として先行する辺と平行となっている。一例を示すと、ドレイン誘導管１０ａの導出方向と、トレイ７の辺７ａとが平行となっている。   The lead-out direction of the drain guide tube 10 is parallel to the preceding side with reference to the tray rotation direction. For example, the lead-out direction of the drain guide tube 10a and the side 7a of the tray 7 are parallel.

ドレイン誘導管１０は先部１１が前記ドレイン回収通路３ａの底部に向かうように外側に向かって斜め下方に傾斜している。そして、先部１１の下端１１ａはインナーカップ３の底面３ｂよりも低くなっている。このためインナーカップ３とトレイ７を一体的に回転することで、板状被処理物Ｗの表面に供給された塗布液は遠心力で、庇状壁部９に形成した穴、ドレイン誘導管１０内の流路およびドレイン誘導管１０の先部１１を通って排出される際に、インナーカップ３の内周壁に直接衝突することがない。   The drain guide tube 10 is inclined obliquely downward toward the outside so that the tip 11 faces the bottom of the drain recovery passage 3a. The lower end 11 a of the tip portion 11 is lower than the bottom surface 3 b of the inner cup 3. For this reason, by rotating the inner cup 3 and the tray 7 integrally, the coating liquid supplied to the surface of the plate-like workpiece W is subjected to centrifugal force, and the holes formed in the bowl-shaped wall portion 9, the drain guide tube 10. When discharged through the inner flow path and the tip 11 of the drain guide tube 10, it does not directly collide with the inner peripheral wall of the inner cup 3.

また、前記トレイ７の上面にはカバー１２が着脱自在とされている。このカバー１２はネジや他の係止具にてトレイ７に止着され、中央部には板状被処理物Ｗよりも若干大きめの開口が形成されている。このカバー１２はドレイン誘導管１０の回転によって発生する乱流を低減する効果がある。   A cover 12 is detachable on the upper surface of the tray 7. The cover 12 is fastened to the tray 7 with screws or other locking tools, and an opening slightly larger than the plate-like workpiece W is formed in the center. This cover 12 has an effect of reducing turbulence generated by the rotation of the drain guide tube 10.

一方、インナーカップ３及びアウターカップ３の上方には直線動、回転動、上下動或いはこれらを合成した動きが可能なアーム１３が臨み、このアーム１３の先端には下方に伸びる軸１４を取り付けている。この軸１４を介してチッ素ガス等を供給する構成とすることもできる。例えば、塗布後インナーカップ内は減圧状態なっているので、いきなり蓋体を外すと外部の埃などを巻き込むおそれがある。そこで、チッ素ガス等を供給してインナーカップ内の減圧を解除するのが好ましい。   On the other hand, above the inner cup 3 and the outer cup 3, an arm 13 capable of linear motion, rotational motion, vertical motion or a combination of these faces, and a shaft 14 extending downward is attached to the tip of the arm 13. Yes. A configuration in which nitrogen gas or the like is supplied through the shaft 14 can also be adopted. For example, since the inside of the inner cup is in a reduced pressure state after application, there is a risk that external dust may be trapped if the lid is removed suddenly. Therefore, it is preferable to release the pressure reduction in the inner cup by supplying nitrogen gas or the like.

また、前記軸１４にはベアリング及び磁気シールを介してボス部１５を回転自在に嵌合し、このボス部１５にインナーカップ３の上面開口を閉塞するための円板状蓋体１６を取り付け、この蓋体１６の下面にインナーカップ３内の乱流を防止する整流板１７を取り付けている。この整流板１７はガラス基板Ｗより若干大きな寸法でガラス基板と相似形或いは円形をしている。   Further, a boss portion 15 is rotatably fitted to the shaft 14 via a bearing and a magnetic seal, and a disc-like lid body 16 for closing the upper surface opening of the inner cup 3 is attached to the boss portion 15. A rectifying plate 17 for preventing turbulent flow in the inner cup 3 is attached to the lower surface of the lid body 16. The rectifying plate 17 has a size slightly larger than that of the glass substrate W and is similar to or circular with the glass substrate.

また、インナーカップ用の蓋体１６の上面にはアングル状をなす爪部材１８が固着され、一方、インナーカップ３の外周面で前記爪部材１８に対応する箇所には爪受け部材１９が取り付けられ、蓋体１６でインナーカップ３を閉じる際に決まった位置に固定できるようにしている。尚、本実施例では爪受け部材１９の取り付け位置を調整することで、蓋体１６でインナーカップ３の上面開口を閉じた状態で、インナーカップの上面開口とインナーカップ用蓋体との間に、１０ｍｍ以下、好ましくは０．５〜２ｍｍの隙間を形成するようにしている。このように若干の隙間を形成することで、圧力変動を抑制しつつ外部からのミストの流入を防ぎ、良好な膜を形成することができる。 An angled claw member 18 is fixed to the upper surface of the inner cup lid 16, while a claw receiving member 19 is attached to the outer peripheral surface of the inner cup 3 corresponding to the claw member 18. The lid 16 can be fixed at a fixed position when the inner cup 3 is closed. In this embodiment, by adjusting the attachment position of the claw receiving member 19, the lid 16 closes the top opening of the inner cup 3 with the lid 16 between the top opening of the inner cup and the lid for the inner cup. A gap of 10 mm or less, preferably 0.5 to 2 mm is formed. By forming a slight gap in this way, it is possible to prevent the inflow of mist from the outside while suppressing pressure fluctuations and form a good film.

また、アーム１３の先端には保持ブロック２０を設け、この保持ブロック２０には上下方向のガイドロッド２１を取り付け、このガイドロッド２１にアウターカップ２の上面開口を閉塞する蓋体２２を上下方向にフリーの状態で支持している。このように、アウターカップ用の蓋体２２を上下方向にフリーの状態とすることで、インナーカップ用の蓋体１６でインナーカップ３上面を閉じた際に、アウターカップ用の蓋体２２でアウターカップ２上面を隙間なく確実に閉じることができる。   A holding block 20 is provided at the tip of the arm 13, and a vertical guide rod 21 is attached to the holding block 20, and a lid 22 that closes the upper surface opening of the outer cup 2 is attached to the guide rod 21 in the vertical direction. Support in a free state. In this way, by setting the outer cup lid 22 in a free state in the vertical direction, when the inner cup 3 upper surface is closed by the inner cup lid 16, the outer cup lid 22 is used as an outer cup. The upper surface of the cup 2 can be reliably closed without a gap.

以上において、ガラス基板等の板状被処理物Ｗ表面にレジスト液等を均一に塗布するには、アウターカップ２及びインナーカップ３の上面を開放して真空チャック５上に板状被処理物Ｗを受け渡し、吸引固着し、次いで板状被処理物Ｗの表面にノズルからレジスト液等の塗布液を滴下し、この後、アウターカップ２及びインナーカップ３上にアーム１３を回動させて蓋体１６，２２を臨ませる。   In the above, in order to uniformly apply the resist solution or the like to the surface of the plate-like workpiece W such as a glass substrate, the upper surfaces of the outer cup 2 and the inner cup 3 are opened and the plate-like workpiece W is placed on the vacuum chuck 5. Then, a coating solution such as a resist solution is dropped from the nozzle onto the surface of the plate-like workpiece W, and then the arm 13 is rotated on the outer cup 2 and the inner cup 3 to close the lid. 16 and 22 are faced.

そして、アーム１３を下降することで蓋体１６によりインナーカップ３の上面を閉塞し、蓋体２２によりアウターカップ２の上面開口を閉塞したならば、スピンナーによってチャック５とインナーカップ３を一体的に回転せしめ、遠心力により塗布液を板状被処理物Ｗの表面に均一に拡散塗布する。   Then, when the arm 13 is lowered, the upper surface of the inner cup 3 is closed by the lid body 16, and the upper surface opening of the outer cup 2 is closed by the lid body 22, and the chuck 5 and the inner cup 3 are integrally integrated by the spinner. The coating liquid is uniformly spread and applied to the surface of the plate-like workpiece W by centrifugal force.

板状被処理物Ｗの表面から飛散したレジスト液等は、遠心力でトレイ７の壁部内側に集り、壁部内側を回転方向に沿って伝い、ドレイン誘導管１０から、インナーカップのドレイン回収通路３ａに排出される。そして、この排出されたドレインは蓋を開けた後に、吸引パイプ２３によって回収される。   The resist solution or the like scattered from the surface of the plate-like workpiece W gathers inside the wall of the tray 7 by centrifugal force, travels along the inside of the wall along the rotation direction, and recovers the drain of the inner cup from the drain guide tube 10. It is discharged into the passage 3a. The discharged drain is recovered by the suction pipe 23 after the lid is opened.

本発明に係る回転カップ式塗布装置は、半導体チップや液晶表示装置の製造工程に利用することができる。   The rotary cup type coating apparatus according to the present invention can be used in a manufacturing process of a semiconductor chip or a liquid crystal display device.

本発明に係る回転カップ式塗布装置の待機状態の断面図Sectional drawing of the standby state of the rotation cup type coating device which concerns on this invention 同回転カップ式塗布装置のインナーカップを蓋体で閉じた状態の拡大断面図Enlarged sectional view of the inner cup of the same rotating cup type coating device closed with a lid トレイの全体平面図Overall plan view of the tray

符号の説明Explanation of symbols

１…回転カップ式塗布装置、２…アウターカップ、３…インナーカップ、３ａ…ドレイン回収通路、３ｂ…インナーカップの底面、４…スピンナー、５…真空チャック、７…トレイ、７ａ…トレイの辺、８…開口、９…庇状壁部、１０，１０ａ…ドレイン誘導管、１１…ドレイン誘導管の先部、１１ａ…ドレイン誘導管の先部の下端、１２…カバー、１３…アーム、１４…軸、１５…ボス部、１６…インナーカップ用の蓋体、１７…整流板、１８…爪部材、１９…爪受け部材、２０…保持ブロック、２１…ガイドロッド、２２…アウターカップ用の蓋体、２３…吸引パイプ。   DESCRIPTION OF SYMBOLS 1 ... Rotary cup type coating device, 2 ... Outer cup, 3 ... Inner cup, 3a ... Drain collection path, 3b ... Bottom surface of inner cup, 4 ... Spinner, 5 ... Vacuum chuck, 7 ... Tray, 7a ... Side of tray, DESCRIPTION OF SYMBOLS 8 ... Opening, 9 ... Saddle-shaped wall part, 10, 10a ... Drain induction tube, 11 ... The tip part of a drain induction tube, 11a ... The lower end of the front part of a drain induction tube, 12 ... Cover, 13 ... Arm, 14 ... Axis , 15 ... boss part, 16 ... lid for inner cup, 17 ... current plate, 18 ... claw member, 19 ... claw receiving member, 20 ... holding block, 21 ... guide rod, 22 ... lid for outer cup, 23 ... Suction pipe.

Claims (1)

アウターカップ内にスピンナーによって回転せしめられるインナーカップが設けられ、このインナーカップは内底部周縁に環状のドレイン回収通路が形成されると共にインナーカップ内にはインナーカップと一体的に回転するトレイが設けられ、このトレイの中央部には板状被処理物を保持する手段が配置され、トレイからはドレイン誘導管が導出され、このドレイン誘導管のインナーカップの内底部周縁に形成した貯留部に臨む先部は、前記ドレイン回収通路の底部に向かうように外側に向かって斜め下方に傾斜し、更に前記ドレイン誘導管の先部の最外部分の下端はインナーカップの底面よりも低く設定されていることを特徴とする回転カップ式塗布装置。 An inner cup that is rotated by a spinner is provided in the outer cup. The inner cup is provided with an annular drain recovery passage at the periphery of the inner bottom , and a tray that rotates integrally with the inner cup is provided in the inner cup. A means for holding the plate-like object to be processed is arranged at the center of the tray, a drain guide pipe is led out from the tray, and the tip of the drain guide pipe faces a storage part formed on the inner bottom edge of the inner cup. The portion is inclined obliquely downward toward the outside so as to go to the bottom of the drain recovery passage, and the lower end of the outermost portion of the tip of the drain guide pipe is set lower than the bottom of the inner cup A rotating cup type coating apparatus characterized by the above.
JP2004190202A 2004-06-28 2004-06-28 Rotary cup applicator Expired - Lifetime JP4476042B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004190202A JP4476042B2 (en) 2004-06-28 2004-06-28 Rotary cup applicator
TW094121009A TWI388377B (en) 2004-06-28 2005-06-23 Spin-cup coating apparatus
KR1020050055582A KR101204065B1 (en) 2004-06-28 2005-06-27 Spin-cup coating apparatus
CNA2005100810419A CN1714944A (en) 2004-06-28 2005-06-28 Rotary cup type coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004190202A JP4476042B2 (en) 2004-06-28 2004-06-28 Rotary cup applicator

Publications (2)

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JP2006013243A JP2006013243A (en) 2006-01-12
JP4476042B2 true JP4476042B2 (en) 2010-06-09

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KR (1) KR101204065B1 (en)
CN (1) CN1714944A (en)
TW (1) TWI388377B (en)

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Publication number Priority date Publication date Assignee Title
CN100450640C (en) * 2006-07-17 2009-01-14 友达光电股份有限公司 Rotary spraying system and its liquid recovering method
JP4750724B2 (en) * 2007-01-25 2011-08-17 東京応化工業株式会社 Overlay unit and bonding apparatus
CN114472090B (en) * 2022-02-10 2023-06-02 华能新能源股份有限公司 Film growth equipment and film growth method

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JP3388628B2 (en) 1994-03-24 2003-03-24 東京応化工業株式会社 Rotary chemical processing equipment

Also Published As

Publication number Publication date
KR20060048544A (en) 2006-05-18
JP2006013243A (en) 2006-01-12
CN1714944A (en) 2006-01-04
KR101204065B1 (en) 2012-11-22
TW200607574A (en) 2006-03-01
TWI388377B (en) 2013-03-11

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