JP4230452B2 - エーロゲルの製造方法 - Google Patents
エーロゲルの製造方法 Download PDFInfo
- Publication number
- JP4230452B2 JP4230452B2 JP2004520409A JP2004520409A JP4230452B2 JP 4230452 B2 JP4230452 B2 JP 4230452B2 JP 2004520409 A JP2004520409 A JP 2004520409A JP 2004520409 A JP2004520409 A JP 2004520409A JP 4230452 B2 JP4230452 B2 JP 4230452B2
- Authority
- JP
- Japan
- Prior art keywords
- xenon
- producing
- airgel
- liquid
- carried out
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/0091—Preparation of aerogels, e.g. xerogels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/02—Making microcapsules or microballoons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
- B01J2/02—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic by dividing the liquid material into drops, e.g. by spraying, and solidifying the drops
- B01J2/06—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic by dividing the liquid material into drops, e.g. by spraying, and solidifying the drops in a liquid medium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
- C01B33/1585—Dehydration into aerogels
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Extraction Or Liquid Replacement (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Colloid Chemistry (AREA)
- Nozzles (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
Description
M(−OR)n+nH2O→ M(OH)n + n ROH (I)
この段階は低いpH値により一般に促進される:典型的には0〜3、好ましくは約1〜2。
M(OH)n + M(OH)n → (OH)n−1 M−O−M(OH)n−1 + H2O (II)
溶液中に当初に存在している全てのM(OH)n種に拡大されるこの反応は、細孔内部で当初に存在しているか又は加水分解の間に生じる全ての溶剤が球状の(inglobating)開放構造を有する無機の酸化物ポリマーをもたらす。こうして製造された無機の酸化物ポリマーはゲルと呼ばれる。
a)前駆物質から出発する加水分解/縮合;
b)キセノンとのゲル中の液体の交換
c)キセノンの超臨界抽出
d)場合によるキセノン回収
を含むエーロゲルの製造である。
X−Me−(OR)n−1
[式中、Meは元素の周期表の第3、第4及び第5族の金属であり;nはMe原子価であり;XはR又はORであり、その際にRは、10個までの炭素原子数を有する線状又は分枝鎖状の酸アルキル基である]を有するアルコキシド又はアルコキシド混合物が使用されてよい。
1 液体キセノンのレザバー、 2 管路、 3 モールド、 4 排出管路、 5 コレクター、 6 レザバー
Claims (9)
- エーロゲルの製造方法において、
−アクアゲルの液相をキセノンと交換し;
−キセノンを抽出し、かつ場合により前記キセノンを回収し、
その際にそのような交換を液体キセノンを用いて実施し、かつ前記キセノンの抽出を超臨界条件下で実施する
ことを特徴とする、エーロゲルの製造方法。 - 適している前駆物質の加水分解/縮合の前段階を含む、請求項1記載のエーロゲルの製造方法。
- 加水分解/縮合反応を、式:
X−Me(OR)n−1
[式中、Meは元素の周期表の第3、第4及び第5族に属している金属であり;nは整数であり、かつMeの原子価を表し;Xは−OR又は−Rであり、ここで−ORはアルコキシド基であり、かつ−Rは10個までの炭素原子数を有する線状又は分枝鎖状の有機基である]で示されるアルコキシド前駆物質から出発して実施する、請求項2記載のエーロゲルの製造方法。 - 適している前駆物質がテトラメトキシシラン、テトラエトキシシランである、請求項3記載のエーロゲルの製造方法。
- 加水分解反応を、塩酸、硝酸又は酢酸の中から選択される酸の存在で実施する、請求項3記載のエーロゲルの製造方法。
- アクアゲル中の液体の交換を液化キセノンを用いて0〜16.6℃の温度で実施する、請求項1記載のエーロゲルの製造方法。
- 湿潤ゲルからのキセノンの超臨界抽出を16.6℃より高い温度で実施する、請求項1記載のエーロゲルの製造方法。
- キセノンの超臨界抽出を58.4barよりも高い圧力で実施する、請求項1記載のエーロゲルの製造方法。
- 請求項1記載のアクアゲル液相をキセノンと交換することを含むエーロゲルの製造方法であって、抽出終了時にキセノンを回収する段階も含むことを特徴とする、エーロゲルの製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2002NO000010A ITNO20020010A1 (it) | 2002-07-12 | 2002-07-12 | "metodo per la preparazione di aerogeli" |
PCT/EP2003/006606 WO2004007368A1 (en) | 2002-07-12 | 2003-06-24 | Method for the preparation of aerogels |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005532896A JP2005532896A (ja) | 2005-11-04 |
JP4230452B2 true JP4230452B2 (ja) | 2009-02-25 |
Family
ID=30012836
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004520409A Expired - Fee Related JP4230452B2 (ja) | 2002-07-12 | 2003-06-24 | エーロゲルの製造方法 |
Country Status (18)
Country | Link |
---|---|
US (1) | US7378072B2 (ja) |
EP (1) | EP1521721B1 (ja) |
JP (1) | JP4230452B2 (ja) |
KR (1) | KR100618936B1 (ja) |
CN (1) | CN1668531A (ja) |
AT (1) | ATE356081T1 (ja) |
AU (1) | AU2003245980B2 (ja) |
DE (1) | DE60312334T2 (ja) |
DK (1) | DK1521721T3 (ja) |
ES (1) | ES2283785T3 (ja) |
HR (1) | HRP20050029B1 (ja) |
IL (1) | IL166212A (ja) |
IT (1) | ITNO20020010A1 (ja) |
NO (1) | NO20050131L (ja) |
PL (1) | PL372625A1 (ja) |
PT (1) | PT1521721E (ja) |
TW (1) | TWI290848B (ja) |
WO (1) | WO2004007368A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102079526B (zh) * | 2009-12-01 | 2013-05-29 | 中国石油天然气股份有限公司 | 一种高纯度大孔硅胶的制备工艺 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3429671A1 (de) * | 1984-08-11 | 1986-02-20 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von aerogelen |
US4610863A (en) | 1985-09-04 | 1986-09-09 | The United States Of America As Represented By The United States Department Of Energy | Process for forming transparent aerogel insulating arrays |
US5207814A (en) * | 1989-02-10 | 1993-05-04 | Enichem S.P.A. | Process for preparing monoliths of aerogels of metal oxides |
IT1251937B (it) * | 1991-10-17 | 1995-05-27 | Donegani Guido Ist | Xerogels di silice ad alta porosita` e processo per la loro preparazione. |
US5565142A (en) * | 1992-04-01 | 1996-10-15 | Deshpande; Ravindra | Preparation of high porosity xerogels by chemical surface modification. |
US5686031A (en) | 1995-01-05 | 1997-11-11 | Regents Of The University Of California | Method for rapidly producing microporous and mesoporous materials |
FR2736342B1 (fr) * | 1995-07-07 | 1999-01-29 | Univ Claude Bernard Lyon | Procede pour la fabrication d'aerogels de silice monolithiques et aerogels de silice ainsi obtenus |
DE19616263A1 (de) * | 1996-04-24 | 1997-10-30 | Solvay Deutschland | Verfahren zur Herstellung von Aerogelen und/oder Xerogelen |
US6315971B1 (en) * | 1997-04-09 | 2001-11-13 | Cabot Corporation | Process for producing low density gel compositions |
CA2389593A1 (en) * | 1999-07-13 | 2001-01-18 | General Atomics | Single crystal tungsten alloy penetrator and method of making |
IT1318617B1 (it) * | 2000-07-10 | 2003-08-27 | Novara Technology Srl | Processo sol-gel per la produzione di geli secchi di grandidimensioni e vetri derivati. |
-
2002
- 2002-07-12 IT IT2002NO000010A patent/ITNO20020010A1/it unknown
-
2003
- 2003-06-24 DE DE60312334T patent/DE60312334T2/de not_active Expired - Fee Related
- 2003-06-24 WO PCT/EP2003/006606 patent/WO2004007368A1/en active IP Right Grant
- 2003-06-24 ES ES03738079T patent/ES2283785T3/es not_active Expired - Lifetime
- 2003-06-24 DK DK03738079T patent/DK1521721T3/da active
- 2003-06-24 AT AT03738079T patent/ATE356081T1/de not_active IP Right Cessation
- 2003-06-24 AU AU2003245980A patent/AU2003245980B2/en not_active Ceased
- 2003-06-24 CN CNA038165597A patent/CN1668531A/zh active Pending
- 2003-06-24 JP JP2004520409A patent/JP4230452B2/ja not_active Expired - Fee Related
- 2003-06-24 KR KR1020057000460A patent/KR100618936B1/ko not_active IP Right Cessation
- 2003-06-24 EP EP03738079A patent/EP1521721B1/en not_active Expired - Lifetime
- 2003-06-24 PL PL03372625A patent/PL372625A1/xx not_active IP Right Cessation
- 2003-06-24 US US10/519,986 patent/US7378072B2/en not_active Expired - Fee Related
- 2003-06-24 PT PT03738079T patent/PT1521721E/pt unknown
- 2003-07-08 TW TW092118627A patent/TWI290848B/zh not_active IP Right Cessation
-
2005
- 2005-01-10 IL IL166212A patent/IL166212A/en active IP Right Grant
- 2005-01-11 NO NO20050131A patent/NO20050131L/no not_active Application Discontinuation
- 2005-01-11 HR HR20050029A patent/HRP20050029B1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
PT1521721E (pt) | 2007-06-18 |
TW200422099A (en) | 2004-11-01 |
ES2283785T3 (es) | 2007-11-01 |
KR100618936B1 (ko) | 2006-09-01 |
JP2005532896A (ja) | 2005-11-04 |
AU2003245980A1 (en) | 2004-02-02 |
IL166212A0 (en) | 2006-01-15 |
KR20050025959A (ko) | 2005-03-14 |
TWI290848B (en) | 2007-12-11 |
WO2004007368A1 (en) | 2004-01-22 |
HRP20050029A2 (en) | 2005-02-28 |
HRP20050029B1 (en) | 2008-06-30 |
DK1521721T3 (da) | 2007-07-02 |
NO20050131L (no) | 2005-01-11 |
CN1668531A (zh) | 2005-09-14 |
IL166212A (en) | 2009-09-22 |
US20050244323A1 (en) | 2005-11-03 |
EP1521721B1 (en) | 2007-03-07 |
US7378072B2 (en) | 2008-05-27 |
EP1521721A1 (en) | 2005-04-13 |
ATE356081T1 (de) | 2007-03-15 |
ITNO20020010A1 (it) | 2004-01-12 |
DE60312334T2 (de) | 2007-11-22 |
DE60312334D1 (de) | 2007-04-19 |
AU2003245980B2 (en) | 2006-10-19 |
PL372625A1 (en) | 2005-07-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5275796A (en) | Method for producing metal oxide aerogels having densities less than 0.02 g/cc | |
US5409683A (en) | Method for producing metal oxide aerogels | |
US6210570B1 (en) | Monolithic silica column | |
Rao et al. | Synthesis and physical properties of TEOS-based silica aerogels prepared by two step (acid–base) sol–gel process | |
US4806328A (en) | Method of manufacturing monolithic glass members | |
AU686871B2 (en) | Subcritical process for drying sol-gel derived porous bodies | |
JPH0859224A (ja) | キセロゲル、及びそれらの調製方法と利用 | |
CN110723738B (zh) | 增强型二氧化硅气凝胶的制备方法、增强型二氧化硅气凝胶及其应用 | |
KR100501759B1 (ko) | 3차원 무수 겔을 제조하기 위한 졸-겔 방법 및 이로부터 제조된 실리카 무수 겔 및 실리카 유리 제품 | |
CA2109715A1 (en) | Process for the preparation of silica aerogel-like material | |
JPH10236817A (ja) | 疎水性エアロゲルの製法 | |
JP2023523283A (ja) | アルカリ安定性の上昇したシリカエアロゲル | |
JP4230452B2 (ja) | エーロゲルの製造方法 | |
US6258305B1 (en) | Method for net-shaping using aerogels | |
JP2006513124A (ja) | ガラス質製品を製造するためのゾル−ゲル法 | |
Kuchta et al. | About the synthesis and thermal stability of SiO 2-aerogel | |
JP3273957B2 (ja) | エアロゲルの製造方法 | |
JP2899080B2 (ja) | 無水シリカの製造方法 | |
KR100975432B1 (ko) | 저밀도의 소수성 실리카 분말의 제조방법 | |
JP3048276B2 (ja) | エアロゲルの製造方法 | |
AU662147C (en) | Process for the preparation of a silica aerogel-like material | |
JPS60151232A (ja) | モノリシックガラス部材の製造方法 | |
JP2002028472A (ja) | 湿潤ゲルの乾燥方法 | |
CN113677622A (zh) | 利用二氧化硅前体“一锅法”式合成疏水性二氧化硅气凝胶的方法 | |
JP2004115352A (ja) | 金属含有炭素材料の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080723 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081022 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20081114 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20081203 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111212 Year of fee payment: 3 |
|
LAPS | Cancellation because of no payment of annual fees |