JP3690807B2 - 薄膜太陽電池の製法 - Google Patents

薄膜太陽電池の製法 Download PDF

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JP3690807B2
JP3690807B2 JP51383596A JP51383596A JP3690807B2 JP 3690807 B2 JP3690807 B2 JP 3690807B2 JP 51383596 A JP51383596 A JP 51383596A JP 51383596 A JP51383596 A JP 51383596A JP 3690807 B2 JP3690807 B2 JP 3690807B2
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ボデガルド,マリカ
ヘドストロム,ヨナス
ストルト,ラルス
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ノルディック ソーラー エナジイ アクチボラゲット
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    • H01L31/0749Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
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    • H01L31/03923Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIBIIICVI compound materials, e.g. CIS, CIGS
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
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Description

本発明は薄膜太陽電池の製法に関する。
CuInSe2(セレン化銅インジウム)薄膜太陽電池は通常モリブデン(Mo)バック接点を基体、例えばガラス基体上に付着させて製造する。次いで、銅と、インジウムと、セレン化物とをバック接点(back contact)上に付着させてCuInSe2層を形成する。このCuInSe2はセレン含有雰囲気内での化学反応で生成する。この製造段階でこの構造体は350°〜600℃の範囲の温度にさらされる。
このCuInSe2層はp型半導体である。n型半導体をこのCuInSe2層上に付着させてpn接合を形成し、事実上の太陽電池が形成される。n型半導体はCaSの薄い層とZnOの厚い層から成ることが一番多い。このZnO層は同時に前面接点となる。
この種の太陽電池は効率を向上させることが望ましい。
本発明は太陽電池の製法を提供し、太陽電池製品の効率を大きく向上させる。
従って、本発明は太陽電池内に電気的バック接点をなす金属層を含む構造体に1つの製造段階でセレン化銅インジウム(CuInSe2)の層を被覆し、上記バック接点を基体に被覆した薄膜太陽電池の製法に関し、CuInSe2層の被覆前に構造体をアルカリ金属層で被覆することを特徴とする。
本発明の特に好ましい態様では、CuInSe2層被覆前に構造体に被覆するアルカリ金属はナトリウム(Na)又はカリウム(K)である。
本明細書と請求項で用いた「セレン化銅インジウム層」は各種合金物質、主にガリウムと硫黄とを含有する各種組成のセレン化銅インジウムを意味する。ここで使用する用語「セレン化銅インジウム」は主にCuInSe2、CuInxGa1-xSex、CuInxGa1-xySe2-yの化合物に関する。
本発明を式CuInSe2のセレン化銅インジウム層について以下説明する。
太陽電池を示す単一図である添付図面に図示の本発明の例示態様を部分的に参照しながら本発明を詳述する。
本発明はCuInSe2層を形成させる面、例えばモリブデン層に単体カリウム又はナトリウム又はこれらの基本的物質が存在する化合物の形で単体ナトリウム又はカリウムを被覆するときは、多結晶性CuInSe2膜中の粒子は柱状構造で配向することが多い。又、これらの粒子は寸法が一層大きく、その構造はより緻密である。又、CuInSe2層の抵抗率は低下する。これはより効果的なpドーピングが得られること、これにより電池電圧が高くなることを意味する。
ナトリウムとカリウム以外のアルカリ金属も同一の効果を与える。少くとも原子量が低いリチウムが該当する。
図1は薄膜太陽電池の概略断面図である。薄膜太陽電池がその上に形成される基体は寸法が大きく、例えば1×0.4mの大きさである。基体表面は電気的に互に接続された多数の電池を担持する。図1はかかる1つの電池の部分を示すもので、基体上に多数の独立した、但し電気的に接続した電池を形成することは技術的に公知であり、本明細書では詳述しない。
本発明が適用される太陽電池は次のようにして構成する。基体1は通常適切な厚さ、例えば2.0mmの厚さのガラスシートの形状である、はじめに、モリブデン(Mo)層2をこのガラスシート上にスパッターして付着させる。このモリブデン層はバック接点となり、最終電池の正端子となる。モリブデン層の厚さは1,000nmである。次いで、CuInSe2層3を被覆し、これは厚さが例えば2,500nmである。この層3に硫化カドミウム(CaS)層4を被覆し、これは厚さが例えば50nmであり、次いで透明なドーピング処理した酸化亜鉛(ZnO)層5の形で電気接点層を被覆する、この層厚は例えば500nmである。
太陽光が電池に当ると、電圧が負の端子である電気接点5(ZnO)と電気的バック接点2との間に生ずる。
1例としてナトリウムを用いたものについて本発明を以下に説明するが、他のアルカリ金属も使用することができ、同等の効果が得られる。図示の太陽電池の層6はナトリウムであるが、ナトリウム以外のアルカリ金属を用いるときは、この層6はかかるアルカリ金属からなる。
本発明ではアルカリ金属(この場合ナトリウム(Na)である)を含有する層6はCuInSe2層3被覆前に金属層2の表面に即ち例示の実施例ではモリブデン層であるが、この表面に形成する。
本発明の1つの好ましい態様ではナトリウムを電気的バック接点即ち金属層の上にセレン化ナトリウム(Na2Se)を蒸着させて被覆する。
本発明の別の好ましい態様では、カリウムをバック接点即ち金属層の上にセレン化カリウム(K2Se)を蒸着させて被覆する。
別の好ましい態様では、電気的バック接点がモリブデンから成るとき、アルカリ金属(この場合ナトリウム)をこの電気的バック接点と同時に被覆する。
本発明の別の好ましい態様ではアルカリ金属(この場合ナトリウム)を含む層は50〜500nmの厚さに被覆する。
別の態様では、この層は酸素(O)をも含有する。
CuInSe2層をナトリウム又はカリウム含有層の表面上に被覆したときは、ナトリウム又はカリウムは金属接点の表面から本質的に消失することが判った。CuInSe2層を被覆したときは、ナトリウム又はカリウムはCuInSe2層内の粒界とこの層の表面上に再び見出される。次いでCaS層を湿式法で被覆するときはこのナトリウム又はカリウム化合物はこの湿式法で用いる液に可溶性のときはこのナトリウム又はカリウム化合物はその表面から消失する。
本方法により、実施例として説明し図示した太陽電池の効率が極めて驚異的に即ち約25%向上する。本発明を適用しなかったこの種の太陽電池の典型的な効率は12%である。本発明を適用したとき、この効率は15%に向上する。
本発明と特定の太陽電池構造体について記載してきたが、本発明は電気的バック接点がモリブデンでなく、いくつかのその他の適切な金属、例えばタングステン、ニッケル、チタン又はクロムから成るその他の構造体に適用できる。
更に、ナトリウム含有ガラス以外の基体も使用できる。例えばナトリウムを含有しないガラスが使用でき、ナトリウムを含有し電気的バック接点を形成する表面上に抗ナトリウム拡散障壁を有するガラスも使用できる。
本発明は以下の請求の範囲内で改変が可能であり、従って本発明は上記の本発明の例示態様に限定されるものではない。

Claims (6)

  1. 太陽電池の電気的バック接点をなす金属層(2)を含む構造体にセレン化銅インジウム(CuInSe2)(3)を1回の製造工程で被覆し、このバック接点が基体(1)上に被覆されている薄膜太陽電池の製法において、
    CuInSe2層(3)を被覆する前にナトリウム又はカリウムの層(6)を電気的バック接点上に形成することを特徴とする、上記製法。
  2. バック接点がモリブデンから成るときスパッターリングでナトリウム又はカリウムをバック接点と同時に被覆する、請求項1に記載の製法。
  3. ナトリウム又はカリウムの層は厚さ50〜500nmに被覆する、請求項1又は2に記載の製法。
  4. ナトリウム又はカリウムの層が酸素(O)をも含有する、請求項1〜3のいずれか1項に記載の製法。
  5. バック接点がモリブデン(Mo)から成る、請求項1〜4のいずれか1項に記載の製法。
  6. セレン化銅インジウム層表面上に硫化カドミウム(CdS)を被覆し、硫化カドミウム層の表面上に電気的接点層を被覆し、この電気的接点層は好ましくはドープした酸化亜鉛(ZnO)の層である、請求項1〜5のいずれか1項に記載の製法。
JP51383596A 1994-10-21 1995-10-20 薄膜太陽電池の製法 Expired - Lifetime JP3690807B2 (ja)

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SE9403609A SE508676C2 (sv) 1994-10-21 1994-10-21 Förfarande för framställning av tunnfilmssolceller
SE9403609-2 1994-10-21
PCT/SE1995/001242 WO1996013063A1 (en) 1994-10-21 1995-10-20 A method of manufacturing thin-film solar cells

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ES (1) ES2191716T3 (ja)
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Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4447866B4 (de) * 1994-11-16 2005-05-25 Zentrum für Sonnenenergie- und Wasserstoff-Forschung Baden-Württemberg Verfahren zur Herstellung einer Verbindungshalbleiter-Dünnschichtsolarzelle
JP3519543B2 (ja) * 1995-06-08 2004-04-19 松下電器産業株式会社 半導体薄膜形成用前駆体及び半導体薄膜の製造方法
US7053294B2 (en) * 2001-07-13 2006-05-30 Midwest Research Institute Thin-film solar cell fabricated on a flexible metallic substrate
WO2003007386A1 (en) * 2001-07-13 2003-01-23 Midwest Research Institute Thin-film solar cell fabricated on a flexible metallic substrate
EP1475841A4 (en) * 2002-02-14 2008-08-27 Honda Motor Co Ltd METHOD FOR PRODUCING A LIGHT ABSORPTION LAYER
US20060057766A1 (en) * 2003-07-08 2006-03-16 Quanxi Jia Method for preparation of semiconductive films
SE525704C2 (sv) * 2003-08-12 2005-04-05 Sandvik Ab Belagd stålprodukt av metallbandsmaterial innefattande ett elektriskt isolerande skikt dopat med en eller flera alkalimetaller
US20050056863A1 (en) * 2003-09-17 2005-03-17 Matsushita Electric Industrial Co., Ltd. Semiconductor film, method for manufacturing the semiconductor film, solar cell using the semiconductor film and method for manufacturing the solar cell
US7604843B1 (en) 2005-03-16 2009-10-20 Nanosolar, Inc. Metallic dispersion
US8846141B1 (en) 2004-02-19 2014-09-30 Aeris Capital Sustainable Ip Ltd. High-throughput printing of semiconductor precursor layer from microflake particles
US8372734B2 (en) 2004-02-19 2013-02-12 Nanosolar, Inc High-throughput printing of semiconductor precursor layer from chalcogenide nanoflake particles
US7605328B2 (en) 2004-02-19 2009-10-20 Nanosolar, Inc. Photovoltaic thin-film cell produced from metallic blend using high-temperature printing
US7306823B2 (en) 2004-09-18 2007-12-11 Nanosolar, Inc. Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells
US8309163B2 (en) * 2004-02-19 2012-11-13 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer by use of chalcogen-containing vapor and inter-metallic material
US8623448B2 (en) * 2004-02-19 2014-01-07 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from chalcogenide microflake particles
US7663057B2 (en) * 2004-02-19 2010-02-16 Nanosolar, Inc. Solution-based fabrication of photovoltaic cell
US8329501B1 (en) 2004-02-19 2012-12-11 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic microflake particles
US7700464B2 (en) 2004-02-19 2010-04-20 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from nanoflake particles
US20060060237A1 (en) * 2004-09-18 2006-03-23 Nanosolar, Inc. Formation of solar cells on foil substrates
US20090032108A1 (en) * 2007-03-30 2009-02-05 Craig Leidholm Formation of photovoltaic absorber layers on foil substrates
US7732229B2 (en) * 2004-09-18 2010-06-08 Nanosolar, Inc. Formation of solar cells with conductive barrier layers and foil substrates
US7838868B2 (en) 2005-01-20 2010-11-23 Nanosolar, Inc. Optoelectronic architecture having compound conducting substrate
US8541048B1 (en) 2004-09-18 2013-09-24 Nanosolar, Inc. Formation of photovoltaic absorber layers on foil substrates
US8927315B1 (en) 2005-01-20 2015-01-06 Aeris Capital Sustainable Ip Ltd. High-throughput assembly of series interconnected solar cells
US20080053516A1 (en) 2006-08-30 2008-03-06 Richard Allen Hayes Solar cell modules comprising poly(allyl amine) and poly (vinyl amine)-primed polyester films
US8197928B2 (en) 2006-12-29 2012-06-12 E. I. Du Pont De Nemours And Company Intrusion resistant safety glazings and solar cell modules
US8771419B2 (en) * 2007-10-05 2014-07-08 Solopower Systems, Inc. Roll to roll evaporation tool for solar absorber precursor formation
AT10578U1 (de) * 2007-12-18 2009-06-15 Plansee Metall Gmbh Dunnschichtsolarzelle mit molybdan-haltiger ruckelektrodenschicht
US8197885B2 (en) * 2008-01-11 2012-06-12 Climax Engineered Materials, Llc Methods for producing sodium/molybdenum power compacts
EP2257431A1 (en) * 2008-03-26 2010-12-08 E. I. du Pont de Nemours and Company High performance anti-spall laminate article
JP2011517096A (ja) * 2008-04-04 2011-05-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 高メルトフローのポリ(ビニルブチラール)封止材を含む太陽電池モジュール
JP4384237B2 (ja) * 2008-05-19 2009-12-16 昭和シェル石油株式会社 Cis系薄膜太陽電池の製造方法
US20090288701A1 (en) * 2008-05-23 2009-11-26 E.I.Du Pont De Nemours And Company Solar cell laminates having colored multi-layer encapsulant sheets
EP2286465B1 (en) 2008-06-02 2019-08-14 E. I. du Pont de Nemours and Company Solar cell module having a low haze encapsulant layer
CA2744774C (en) 2008-07-17 2017-05-23 Uriel Solar, Inc. High power efficiency, large substrate, polycrystalline cdte thin film semiconductor photovoltaic cell structures grown by molecular beam epitaxy at high deposition rate for use in solar electricity generation
US20100101647A1 (en) * 2008-10-24 2010-04-29 E.I. Du Pont De Nemours And Company Non-autoclave lamination process for manufacturing solar cell modules
WO2010051522A1 (en) 2008-10-31 2010-05-06 E. I. Du Pont De Nemours And Company Solar cells modules comprising low haze encapsulants
US8080727B2 (en) 2008-11-24 2011-12-20 E. I. Du Pont De Nemours And Company Solar cell modules comprising an encapsulant sheet of a blend of ethylene copolymers
US8084129B2 (en) * 2008-11-24 2011-12-27 E. I. Du Pont De Nemours And Company Laminated articles comprising a sheet of a blend of ethylene copolymers
US20100154867A1 (en) 2008-12-19 2010-06-24 E. I. Du Pont De Nemours And Company Mechanically reliable solar cell modules
KR101629532B1 (ko) * 2008-12-31 2016-06-13 이 아이 듀폰 디 네모아 앤드 캄파니 낮은 탁도 및 높은 내습성을 갖는 봉지제 시트를 포함하는 태양 전지 모듈
KR20110122121A (ko) * 2009-01-22 2011-11-09 이 아이 듀폰 디 네모아 앤드 캄파니 태양 전지 모듈에 대한 킬레이트제를 포함하는 폴리(비닐 부티랄) 밀봉제
US8709856B2 (en) * 2009-03-09 2014-04-29 Zetta Research and Development LLC—AQT Series Enhancement of semiconducting photovoltaic absorbers by the addition of alkali salts through solution coating techniques
JP5229901B2 (ja) * 2009-03-09 2013-07-03 富士フイルム株式会社 光電変換素子、及び太陽電池
JP4629151B2 (ja) * 2009-03-10 2011-02-09 富士フイルム株式会社 光電変換素子及び太陽電池、光電変換素子の製造方法
US7785921B1 (en) * 2009-04-13 2010-08-31 Miasole Barrier for doped molybdenum targets
US8247243B2 (en) 2009-05-22 2012-08-21 Nanosolar, Inc. Solar cell interconnection
US9284639B2 (en) * 2009-07-30 2016-03-15 Apollo Precision Kunming Yuanhong Limited Method for alkali doping of thin film photovoltaic materials
KR20120052360A (ko) * 2009-07-31 2012-05-23 이 아이 듀폰 디 네모아 앤드 캄파니 광전지용 가교결합성 봉지제
KR101306913B1 (ko) * 2009-09-02 2013-09-10 한국전자통신연구원 태양 전지
US20110162696A1 (en) * 2010-01-05 2011-07-07 Miasole Photovoltaic materials with controllable zinc and sodium content and method of making thereof
US20110203655A1 (en) * 2010-02-22 2011-08-25 First Solar, Inc. Photovoltaic device protection layer
DE102010017246A1 (de) * 2010-06-04 2011-12-08 Solibro Gmbh Solarzellenmodul und Herstellungsverfahren hierfür
US8609980B2 (en) 2010-07-30 2013-12-17 E I Du Pont De Nemours And Company Cross-linkable ionomeric encapsulants for photovoltaic cells
TWI538235B (zh) 2011-04-19 2016-06-11 弗里松股份有限公司 薄膜光伏打裝置及製造方法
US20130000702A1 (en) * 2011-06-30 2013-01-03 Miasole Photovoltaic device with resistive cigs layer at the back contact
WO2014100309A1 (en) 2012-12-19 2014-06-26 E. I. Du Pont De Nemours And Company Cross-linkable acid copolymer composition and its use in glass laminates
US9837565B2 (en) 2012-12-21 2017-12-05 Flison Ag Fabricating thin-film optoelectronic devices with added potassium
US20150207011A1 (en) * 2013-12-20 2015-07-23 Uriel Solar, Inc. Multi-junction photovoltaic cells and methods for forming the same
US20150325729A1 (en) 2014-05-09 2015-11-12 E. I. Du Pont De Nemours And Company Encapsulant composition comprising a copolymer of ethylene, vinyl acetate and a third comonomer
TWI677105B (zh) 2014-05-23 2019-11-11 瑞士商弗里松股份有限公司 製造薄膜光電子裝置之方法及可藉由該方法獲得的薄膜光電子裝置
TWI661991B (zh) 2014-09-18 2019-06-11 瑞士商弗里松股份有限公司 用於製造薄膜裝置之自組裝圖案化
WO2016114895A1 (en) 2015-01-12 2016-07-21 Dow Global Technologies Llc High rate sputter deposition of alkali metal-containing precursor films useful to fabricate chalcogenide semiconductors
WO2017137268A1 (en) 2016-02-11 2017-08-17 Flisom Ag Fabricating thin-film optoelectronic devices with added rubidium and/or cesium
US10651324B2 (en) 2016-02-11 2020-05-12 Flisom Ag Self-assembly patterning for fabricating thin-film devices
WO2017147037A1 (en) 2016-02-26 2017-08-31 Dow Global Technologies Llc Method for improving stability of photovoltaic articles incorporating chalcogenide semiconductors
US20210115239A1 (en) 2018-03-08 2021-04-22 Performance Materials Na, Inc. Photovoltaic module and encapsulant composition having improved resistance to potential induced degradation

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4623601A (en) * 1985-06-04 1986-11-18 Atlantic Richfield Company Photoconductive device containing zinc oxide transparent conductive layer
US4915745A (en) * 1988-09-22 1990-04-10 Atlantic Richfield Company Thin film solar cell and method of making
US4873118A (en) * 1988-11-18 1989-10-10 Atlantic Richfield Company Oxygen glow treating of ZnO electrode for thin film silicon solar cell
US5028274A (en) * 1989-06-07 1991-07-02 International Solar Electric Technology, Inc. Group I-III-VI2 semiconductor films for solar cell application
DE4442824C1 (de) * 1994-12-01 1996-01-25 Siemens Ag Solarzelle mit Chalkopyrit-Absorberschicht
US5730852A (en) * 1995-09-25 1998-03-24 Davis, Joseph & Negley Preparation of cuxinygazsen (X=0-2, Y=0-2, Z=0-2, N=0-3) precursor films by electrodeposition for fabricating high efficiency solar cells

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WO1996013063A1 (en) 1996-05-02
EP0787354A1 (en) 1997-08-06
AU3820595A (en) 1996-05-15
US5994163A (en) 1999-11-30
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ES2191716T3 (es) 2003-09-16
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