JP2019523206A - 高エントロピーの窒化物及び/又は酸化物の薄膜を含む被膜を支持する被覆物品、及び/又はその製造方法 - Google Patents
高エントロピーの窒化物及び/又は酸化物の薄膜を含む被膜を支持する被覆物品、及び/又はその製造方法 Download PDFInfo
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- 239000010409 thin film Substances 0.000 title claims abstract description 90
- 238000000576 coating method Methods 0.000 title claims abstract description 49
- 239000011248 coating agent Substances 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 150000004767 nitrides Chemical class 0.000 title abstract description 9
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 11
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 11
- 229910052742 iron Inorganic materials 0.000 claims abstract description 9
- 229910052718 tin Inorganic materials 0.000 claims abstract description 9
- 238000009501 film coating Methods 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 24
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 15
- 229910003087 TiOx Inorganic materials 0.000 claims description 14
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000011701 zinc Substances 0.000 claims description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 229910017052 cobalt Inorganic materials 0.000 claims description 7
- 239000010941 cobalt Substances 0.000 claims description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 239000011135 tin Substances 0.000 claims description 7
- 238000005496 tempering Methods 0.000 claims description 5
- XOFYZVNMUHMLCC-ZPOLXVRWSA-N prednisone Chemical compound O=C1C=C[C@]2(C)[C@H]3C(=O)C[C@](C)([C@@](CC4)(O)C(=O)CO)[C@@H]4[C@@H]3CCC2=C1 XOFYZVNMUHMLCC-ZPOLXVRWSA-N 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 33
- 239000000956 alloy Substances 0.000 abstract description 20
- 229910045601 alloy Inorganic materials 0.000 abstract description 20
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 5
- 229910052735 hafnium Inorganic materials 0.000 abstract description 3
- 239000010936 titanium Substances 0.000 abstract description 3
- 229910052727 yttrium Inorganic materials 0.000 abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 abstract description 3
- 229910052758 niobium Inorganic materials 0.000 abstract description 2
- 229910052715 tantalum Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 239000006117 anti-reflective coating Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- OMOVVBIIQSXZSZ-UHFFFAOYSA-N [6-(4-acetyloxy-5,9a-dimethyl-2,7-dioxo-4,5a,6,9-tetrahydro-3h-pyrano[3,4-b]oxepin-5-yl)-5-formyloxy-3-(furan-3-yl)-3a-methyl-7-methylidene-1a,2,3,4,5,6-hexahydroindeno[1,7a-b]oxiren-4-yl] 2-hydroxy-3-methylpentanoate Chemical compound CC12C(OC(=O)C(O)C(C)CC)C(OC=O)C(C3(C)C(CC(=O)OC4(C)COC(=O)CC43)OC(C)=O)C(=C)C32OC3CC1C=1C=COC=1 OMOVVBIIQSXZSZ-UHFFFAOYSA-N 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910018509 Al—N Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910020286 SiOxNy Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910020923 Sn-O Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
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- C03C2217/00—Coatings on glass
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- C03C2217/00—Coatings on glass
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Abstract
Description
ΔSconfig=−R(XAlnXA+XBlnXB+…)
式中、ΔSconfigは立体配置のエントロピー、Rは理想気体定数、XAは物質Aの量、XBは物質Bの量である。
Claims (28)
- 基板と、
前記基板の上に形成された薄膜被膜と、を含む被覆物品であって、
前記薄膜被膜は少なくとも1つの高エントロピー薄膜層を含み、該高エントロピー薄膜層は、TiOxと、ニッケル、亜鉛、スズ、窒素、鉄、及びコバルトのうちの1つ以上と、を含む、被覆物品。 - 前記高エントロピー薄膜層が、TiOxと、ニッケル、亜鉛、スズ、窒素、鉄、及びコバルトのうちの2つ以上と、を含む、請求項1に記載の被覆物品。
- 前記高エントロピー薄膜層が、TiOx、並びにニッケル、亜鉛、及び/又は窒素を含む、請求項1又は2に記載の被覆物品。
- 前記高エントロピー薄膜層は、ΔHmixが、−5.5kJ/molより小さく、−49kJ/molより大きく、7超過の平均原子サイズ差を有する、請求項1〜3のいずれか1項に記載の被覆物品。
- 前記高エントロピー薄膜層は、ΔSmixが7J/(mol*K)より大きく16J/(mol*K)より小さく、7超過の平均原子サイズ差を有する、請求項1〜4のいずれか1項に記載の被覆物品。
- 前記高エントロピー薄膜層が7〜20の平均原子サイズ差を有する、請求項1〜5のいずれか1項に記載の被覆物品。
- 前記薄膜被膜が、650℃の温度まで最大15分の時間にわたって熱安定性である、請求項1〜6のいずれか1項に記載の被覆物品。
- 前記薄膜被膜を上に有する前記基板が熱強化処理されている、請求項1〜7のいずれか1項に記載の被覆物品。
- 前記薄膜被膜が複数の薄膜層を含み、前記高エントロピー薄膜層が前記薄膜被膜の最外層である、請求項1〜8のいずれか1項に記載の被覆物品。
- 前記薄膜被膜が傷防止被膜である、請求項1〜9のいずれか1項に記載の被覆物品。
- 前記薄膜被膜が、複数の薄膜層を含む低放射率の被膜であり、前記薄膜被膜が、第1及び第2の高エントロピー薄膜層の間に挟まれた赤外線反射層を含む、請求項1〜9のいずれか1項に記載の被覆物品。
- 前記薄膜被膜の最外層が、第3の高エントロピー薄膜層である、請求項11に記載の被覆物品。
- 前記薄膜被膜が、熱処理可能であり、2未満のデルタE*値を有する、請求項1〜12のいずれか1項に記載の被覆物品。
- 前記薄膜被膜が、複数の薄膜層を含む反射防止被膜である、請求項1〜13のいずれか1項に記載の被覆物品。
- 反射防止被膜をさらに含み、前記高エントロピー薄膜層が前記反射防止被膜のためのオーバーコートである、請求項1〜14のいずれか1項に記載の被覆物品。
- 前記薄膜被膜が反射防止被膜であり、前記高エントロピー薄膜層が1.8〜2.4の屈折率を有する、請求項1〜15のいずれか1項に記載の被覆物品。
- 前記高エントロピー薄膜層が、1〜500nmの厚さを有する、請求項1〜16のいずれか1項に記載の被覆物品。
- 前記高エントロピー薄膜層が10〜300nmの厚さを有する、請求項1〜17のいずれか1項に記載の被覆物品。
- 前記薄膜被膜を上に有する前記基板が、少なくとも80%の可視光透過率を有する、請求項1〜18のいずれか1項に記載の被覆物品。
- 前記高エントロピー薄膜層が1.8〜2.4の屈折率を有する、請求項1〜19のいずれか1項に記載の被覆物品。
- 前記基板がガラス基板である、請求項1に記載の被覆物品。
- TiOxを含む前記高エントロピー薄膜層が、少なくともニッケルをさらに含む、請求項1に記載の被覆物品。
- TiOxを含む前記高エントロピー薄膜層が、少なくとも亜鉛をさらに含む、請求項1に記載の被覆物品。
- TiOxを含む前記高エントロピー薄膜層が、少なくともスズをさらに含む、請求項1に記載の被覆物品。
- TiOxを含む前記高エントロピー薄膜層が、少なくとも窒素をさらに含む、請求項1に記載の被覆物品。
- TiOxを含む前記高エントロピー薄膜層が、少なくとも鉄をさらに含む、請求項1に記載の被覆物品。
- TiOxを含む前記高エントロピー薄膜層が、少なくともコバルトをさらに含む、請求項1に記載の被覆物品。
- 基板と、その上に形成された薄膜被膜と、を含む被覆物品を製造する方法であって、該方法は、
前記基板上に直接又は間接的に前記薄膜被膜を形成する工程を含み、
前記薄膜被膜は、少なくとも1つの高エントロピー薄膜層を含み、該高エントロピー薄膜層は、TiOxと、ニッケル、亜鉛、スズ、窒素、鉄、及びコバルトのうちの1つ以上と、を含む、方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/214,932 US20180022929A1 (en) | 2016-07-20 | 2016-07-20 | Coated article supporting high-entropy nitride and/or oxide thin film inclusive coating, and/or method of making the same |
US15/214,932 | 2016-07-20 | ||
PCT/US2017/040829 WO2018017329A2 (en) | 2016-07-20 | 2017-07-06 | Coated article supporting high-entropy nitride and/or oxide thin film inclusive coating, and/or method of making the same |
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JP2019523206A true JP2019523206A (ja) | 2019-08-22 |
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JP2019502605A Pending JP2019523206A (ja) | 2016-07-20 | 2017-07-06 | 高エントロピーの窒化物及び/又は酸化物の薄膜を含む被膜を支持する被覆物品、及び/又はその製造方法 |
Country Status (6)
Country | Link |
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US (1) | US20180022929A1 (ja) |
EP (1) | EP3487827A2 (ja) |
JP (1) | JP2019523206A (ja) |
KR (1) | KR20190030717A (ja) |
CN (1) | CN109715578A (ja) |
WO (1) | WO2018017329A2 (ja) |
Families Citing this family (10)
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TWI607880B (zh) * | 2016-11-04 | 2017-12-11 | 國立清華大學 | 多層膜結構 |
US10287673B2 (en) | 2017-03-07 | 2019-05-14 | Guardian Glass, LLC | Coated article having low-E coating with IR reflecting layer(S) and yttrium inclusive high index nitrided dielectric layer |
KR20210070983A (ko) | 2018-10-09 | 2021-06-15 | 오를리콘 메트코 (유에스) 아이엔씨. | 차열 코팅(tbc) 톱 코트용 고엔트로피 산화물 |
CN109987935B (zh) * | 2019-03-20 | 2021-02-26 | 太原理工大学 | 具有萤石型结构的(ZrHfCeTiZn)O2-δ高熵氧化物陶瓷粉体及块体制备方法 |
CN111362683B (zh) * | 2020-03-10 | 2022-03-29 | 南昌航空大学 | 一种六元尖晶石型铁钴铬锰镁镍系高熵氧化物及其粉体制备方法 |
CN112575327B (zh) * | 2020-12-08 | 2022-11-18 | 镇江四联机电科技有限公司 | 一种应用于阀体表面的高硬度、高耐磨复合涂层、制备方法及阀体 |
CN115595025B (zh) * | 2021-07-08 | 2023-09-08 | 武汉苏泊尔炊具有限公司 | 不粘材料及其制备方法、不粘涂料与烹饪器具 |
CN113354394B (zh) * | 2021-07-15 | 2023-03-24 | 中国科学院兰州化学物理研究所 | 一种具有高太阳能吸收率和红外发射率高熵氧化物的制备方法 |
CN113913748B (zh) * | 2021-09-28 | 2024-05-31 | 武汉大学深圳研究院 | 光热电站集热管用高熵选择性吸收纳米复合涂层材料及其制备方法和设备 |
CN114736010B (zh) * | 2022-04-02 | 2023-05-23 | 郑州航空工业管理学院 | 一种高熵氧化物陶瓷及其制备方法和作为电磁波吸收材料的应用 |
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2017
- 2017-07-06 EP EP17746221.5A patent/EP3487827A2/en not_active Withdrawn
- 2017-07-06 WO PCT/US2017/040829 patent/WO2018017329A2/en unknown
- 2017-07-06 KR KR1020197004470A patent/KR20190030717A/ko active IP Right Grant
- 2017-07-06 JP JP2019502605A patent/JP2019523206A/ja active Pending
- 2017-07-06 CN CN201780057416.9A patent/CN109715578A/zh active Pending
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US20120219821A1 (en) * | 2011-02-24 | 2012-08-30 | Crvc | Coated article including low-emissivity coating, insulating glass unit including coated article, and/or methods of making the same |
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Also Published As
Publication number | Publication date |
---|---|
WO2018017329A3 (en) | 2018-03-01 |
WO2018017329A2 (en) | 2018-01-25 |
CN109715578A (zh) | 2019-05-03 |
EP3487827A2 (en) | 2019-05-29 |
KR20190030717A (ko) | 2019-03-22 |
US20180022929A1 (en) | 2018-01-25 |
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