JP2018041896A - 積層ウェーハの加工方法 - Google Patents
積層ウェーハの加工方法 Download PDFInfo
- Publication number
- JP2018041896A JP2018041896A JP2016176373A JP2016176373A JP2018041896A JP 2018041896 A JP2018041896 A JP 2018041896A JP 2016176373 A JP2016176373 A JP 2016176373A JP 2016176373 A JP2016176373 A JP 2016176373A JP 2018041896 A JP2018041896 A JP 2018041896A
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- Prior art keywords
- silicon substrate
- cutting
- laminated wafer
- glass substrate
- cutting blade
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- 238000003672 processing method Methods 0.000 title abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 151
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 114
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 114
- 239000010703 silicon Substances 0.000 claims abstract description 114
- 238000005520 cutting process Methods 0.000 claims abstract description 97
- 239000011521 glass Substances 0.000 claims abstract description 39
- 230000002093 peripheral effect Effects 0.000 claims abstract description 26
- 230000001681 protective effect Effects 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 239000002184 metal Substances 0.000 description 18
- 238000009966 trimming Methods 0.000 description 7
- 230000002950 deficient Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 235000014443 Pyrus communis Nutrition 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/50—Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Dicing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
12 シリコン基板の裏面
13 樹脂
14 不透過層
15 金属膜(不透過層)
17 梨地面(不透過層)
23 シリコン基板の溝
32 トリミング用の切削ブレード
36 赤外線カメラ
37 シリコン基板用の第1切削ブレード
38 ガラス基板用の第2切削ブレード
A1 デバイス領域
A2 外周余剰領域
D デバイス
L 分割予定ライン
T 保護テープ
W 積層ウェーハ
W1 シリコン基板
W2 ガラス基板
Claims (1)
- シリコン基板の表面に複数の分割予定ラインによって区画されたデバイスが複数形成されたシリコン基板の該表面側に樹脂でガラス基板が接着された積層ウェーハの加工方法であって、
シリコン基板の裏面には赤外線が透過しにくい不透過層が形成され、
該ガラス基板側に保護テープが貼着された積層ウェーハの該保護テープを介して該ガラス基板側を切削装置のチャックテーブル上面に載置する載置ステップと、
該載置ステップを実施した後に、該切削装置の切削ブレードで該複数のデバイスが形成されていない外周余剰領域の該不透過層を切削して除去しシリコン基板を露出させる外周余剰領域シリコン基板露出ステップと、
該外周余剰領域シリコン基板露出ステップを実施した後に、該外周余剰領域の露出したシリコン基板上に赤外線カメラを位置づけて該シリコン基板を透過して該表面側の分割予定ラインを検出してアライメントを行うアライメントステップと、
該アライメントステップを実施した後に、該積層ウェーハの該シリコン基板側から第1切削ブレードを該樹脂の途中まで切り込み、該シリコン基板を該分割予定ラインに沿って分割する第1切削ステップと、
該第1切削ステップを実施した後に、該第1切削ステップで切削した溝に沿って、第2切削ブレードを該保護テープの途中まで切り込み、該ガラス基板を該分割予定ラインに沿って分割する第2切削ステップと、
を備える積層ウェーハの加工方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016176373A JP6716403B2 (ja) | 2016-09-09 | 2016-09-09 | 積層ウェーハの加工方法 |
TW106126224A TWI729180B (zh) | 2016-09-09 | 2017-08-03 | 積層晶圓的加工方法 |
CN201710769441.1A CN107808821B (zh) | 2016-09-09 | 2017-08-31 | 层叠晶片的加工方法 |
KR1020170111223A KR102333519B1 (ko) | 2016-09-09 | 2017-08-31 | 적층 웨이퍼의 가공 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016176373A JP6716403B2 (ja) | 2016-09-09 | 2016-09-09 | 積層ウェーハの加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018041896A true JP2018041896A (ja) | 2018-03-15 |
JP6716403B2 JP6716403B2 (ja) | 2020-07-01 |
Family
ID=61569799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016176373A Active JP6716403B2 (ja) | 2016-09-09 | 2016-09-09 | 積層ウェーハの加工方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6716403B2 (ja) |
KR (1) | KR102333519B1 (ja) |
CN (1) | CN107808821B (ja) |
TW (1) | TWI729180B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020113614A (ja) * | 2019-01-10 | 2020-07-27 | 株式会社ディスコ | ウェーハの加工方法 |
KR20240003712A (ko) | 2022-07-01 | 2024-01-09 | 가부시기가이샤 디스코 | 가공 방법 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7313805B2 (ja) * | 2018-08-15 | 2023-07-25 | 株式会社ディスコ | 切削装置 |
DE102019204457B4 (de) * | 2019-03-29 | 2024-01-25 | Disco Corporation | Substratbearbeitungsverfahren |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007081264A (ja) * | 2005-09-16 | 2007-03-29 | Disco Abrasive Syst Ltd | 切削方法および切削装置 |
JP2012227251A (ja) * | 2011-04-18 | 2012-11-15 | Disco Abrasive Syst Ltd | ウェーハの加工方法 |
JP2015159241A (ja) * | 2014-02-25 | 2015-09-03 | 株式会社ディスコ | ウエーハの加工方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003173986A (ja) * | 2001-12-04 | 2003-06-20 | Disco Abrasive Syst Ltd | 2スピンドル切削装置における切削方法 |
JP2005129830A (ja) * | 2003-10-27 | 2005-05-19 | Tokyo Seimitsu Co Ltd | ダイシング方法 |
JP2009021476A (ja) * | 2007-07-13 | 2009-01-29 | Disco Abrasive Syst Ltd | ウエーハの分割方法 |
JP5091066B2 (ja) * | 2008-09-11 | 2012-12-05 | 富士フイルム株式会社 | 固体撮像装置の製造方法 |
JP5259336B2 (ja) * | 2008-10-23 | 2013-08-07 | ルネサスエレクトロニクス株式会社 | 半導体装置及び半導体装置の製造方法 |
JP2011187659A (ja) * | 2010-03-08 | 2011-09-22 | Renesas Electronics Corp | 半導体装置及び半導体装置の製造方法 |
JP5495876B2 (ja) * | 2010-03-23 | 2014-05-21 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
JP2014070191A (ja) * | 2012-09-28 | 2014-04-21 | Fujifilm Corp | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法。 |
JP6325279B2 (ja) * | 2014-02-21 | 2018-05-16 | 株式会社ディスコ | ウエーハの加工方法 |
JP2015170675A (ja) * | 2014-03-06 | 2015-09-28 | 株式会社ディスコ | 板状物の加工方法 |
TWI667311B (zh) * | 2014-06-13 | 2019-08-01 | 日商富士軟片股份有限公司 | Temporary fixing of the adhesive, adhesive film, adhesive support, laminate and adhesive kit |
-
2016
- 2016-09-09 JP JP2016176373A patent/JP6716403B2/ja active Active
-
2017
- 2017-08-03 TW TW106126224A patent/TWI729180B/zh active
- 2017-08-31 KR KR1020170111223A patent/KR102333519B1/ko active IP Right Grant
- 2017-08-31 CN CN201710769441.1A patent/CN107808821B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007081264A (ja) * | 2005-09-16 | 2007-03-29 | Disco Abrasive Syst Ltd | 切削方法および切削装置 |
JP2012227251A (ja) * | 2011-04-18 | 2012-11-15 | Disco Abrasive Syst Ltd | ウェーハの加工方法 |
JP2015159241A (ja) * | 2014-02-25 | 2015-09-03 | 株式会社ディスコ | ウエーハの加工方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020113614A (ja) * | 2019-01-10 | 2020-07-27 | 株式会社ディスコ | ウェーハの加工方法 |
KR20240003712A (ko) | 2022-07-01 | 2024-01-09 | 가부시기가이샤 디스코 | 가공 방법 |
Also Published As
Publication number | Publication date |
---|---|
CN107808821B (zh) | 2023-04-18 |
CN107808821A (zh) | 2018-03-16 |
KR102333519B1 (ko) | 2021-12-01 |
TWI729180B (zh) | 2021-06-01 |
JP6716403B2 (ja) | 2020-07-01 |
TW201826358A (zh) | 2018-07-16 |
KR20180028923A (ko) | 2018-03-19 |
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