JP2015211079A - ダイシング・ダイボンドフィルム - Google Patents
ダイシング・ダイボンドフィルム Download PDFInfo
- Publication number
- JP2015211079A JP2015211079A JP2014090452A JP2014090452A JP2015211079A JP 2015211079 A JP2015211079 A JP 2015211079A JP 2014090452 A JP2014090452 A JP 2014090452A JP 2014090452 A JP2014090452 A JP 2014090452A JP 2015211079 A JP2015211079 A JP 2015211079A
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- Prior art keywords
- die
- dicing
- dicing tape
- film
- bonding
- Prior art date
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
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Abstract
Description
(ダイシング・ダイボンドフィルム10)
図1に示すように、ダイシング・ダイボンドフィルム10は、ダイシングテープ1及びダイシングテープ1上に配置されたダイボンドフィルム3を備える。ダイシングテープ1は、基材11及び基材11上に配置された粘着剤層12を備える。ダイボンドフィルム3は、粘着剤層12上に配置されている。
図2に示すように、半導体ウエハの内部に集光点を合わせ、格子状の分割予定ライン4Lに沿ってレーザー光100を照射し、多光子吸収によるアブレーションにより半導体ウエハの内部に改質領域41を形成する。これにより、半導体ウエハ4を得る。半導体ウエハ4は、改質領域(以下、改質部又は脆弱層ともいう)41及び改質領域41の残余の領域である非改質領域(以下、非改質部又は非改質層ともいう)42を備える。すなわち、半導体ウエハ4は、非改質領域42及び分割予定ライン4Lに沿って設けられた改質領域41を備える。
(A)レーザー光100
レーザー光源 半導体レーザー励起Nd:YAGレーザー
波長 1064nm
レーザー光スポット断面積 3.14×10−8cm2
発振形態 Qスイッチパルス
繰り返し周波数 100kHz以下
パルス幅 1μs以下
出力 1mJ以下
レーザー光品質 TEM00
偏光特性 直線偏光
(B)集光用レンズ
倍率 100倍以下
NA 0.55
レーザー光波長に対する透過率 100%以下
(C)半導体ウエハが載置される裁置台の移動速度 280mm/秒以下
エキスパンドを解いた後に、ダイシングテープ1を25℃で10分間保持する。保持後にダイボンド用チップ2同士の間隔を測定する。保持後における間隔が1μm以上であると、ダイシングテープ1が降伏したと判断できる。
加圧雰囲気の圧力は、好ましくは0.5kg/cm2(4.9×10−2MPa)以上、より好ましくは1kg/cm2(9.8×10−2MPa)以上、さらに好ましくは5kg/cm2(4.9×10−1MPa)以上である。0.5kg/cm2以上であると、ダイボンド剤22と被着体6との間に存在するボイドを容易に消滅させることができる。加圧雰囲気の圧力は、好ましくは20kg/cm2(1.96MPa)以下、より好ましくは18kg/cm2(1.77MPa)以下、さらに好ましくは15kg/cm2(1.47MPa)以下である。20kg/cm2以下であると、過度な加圧によるダイボンド剤22のはみ出しを抑制できる。
なお、実施形態1で説明した半導体装置の製造方法は、ステルスダイシングビフォアグラインドと呼ばれることがある。
実施形態1では、改質領域41を備える半導体ウエハ4をダイシング・ダイボンドフィルム10上に圧着する。変形例1では、ダイシング・ダイボンドフィルム10に半導体ウエハを圧着する。次いで、ダイシング・ダイボンドフィルム10上に配置された半導体ウエハの内部に改質領域41を形成して、半導体ウエハ4を得る。
(実施例1)
三菱化学製のゼラス5053Yを、Tダイ成形機にて、設定温度230℃で製膜し、厚み80μm、幅400mmの基材Aを作製した。
ダイシング・ダイボンドフィルムを用いて下記の評価を行った。結果を表1に示す。
ダイシング・ダイボンドフィルムからダイボンドフィルムを取り除いてダイシングテープを得た。
ダイシングテープから、長さ100mm、TD方向の幅10mmの短冊状の試験片を切り出した。引張試験機のチャック間隔を10mmに設定し、測定温度−15±2℃の環境下で、50mm/minでMD方向に試験片を引っ張った。破断するまで試験片を引っ張り、応力を測定した。応力が極大となる点を降伏点とし、そのときの伸びを、降伏点における伸び率とした。下記式において、チャック間距離の単位は「mm」である。
降伏点における伸び率(%)=((降伏点におけるチャック間距離―10mm)/10mm)×100
測定温度を0±2℃に変更した以外は、測定温度−15℃試験と同様の方法で降伏点における伸び率を測定した。
測定温度を23±2℃に変更した以外は、測定温度−15℃試験と同様の方法で降伏点における伸び率を測定した。
ダイシング・ダイボンドフィルムからダイボンドフィルムを取り除いてダイシングテープを得た。
ダイシングテープから、長さ100mm、TD方向の幅10mmの短冊状の試験片を切り出した。引張試験機のチャック間隔を10mmに設定し、温度23±2℃、湿度55±5%の環境下で、50mm/minでMD方向に試験片を引っ張った。破断するまで試験片を引っ張り、応力を測定した。試験片が破断したときの伸びから、破断伸び率を求めた。下記式において、チャック間距離の単位は「mm」である。
破断伸び率(%)=((試験片が破断したときのチャック間距離―10mm)/10mm)×100
ダイボンドフィルムに、レーザーで脆弱層を形成したシリコンミラーウエハを貼り合わせて、ダイシング・ダイボンドフィルム及びダイシング・ダイボンドフィルム上に配置されたシリコンミラーウエハを備える積層体を得た。積層体をダイシングフレームに設置し、ディスコ製ダイセパレータDDS2300を用いて積層体をエキスパンドし、シリコンミラーウエハ及びダイボンドフィルムを分断した。エキスパンドを解いた後、ダイシングテープの周辺部をドライヤーで加熱し、周辺部を収縮させた。加熱後に、ダイシングテープの弛み、ダイシングテープの破れ、すべてのチップが個片化されているか、及びダイボンドフィルムは個片化されているかについて確認した。
「割断条件」
ウエハ厚み:50μm
チップサイズ:10mm×10mm
冷却温度:−15℃
エキスパンド量:15mm
エキスパンド速度:100mm/sec
「加熱条件」
エキスパンド量:8mm
ドライヤーとワークの距離:20mm
ドライヤーの温度:250℃
ドライヤーの回転速度:5°/sec
1 ダイシングテープ
1a 積層部
1b 周辺部
1c 接触区画
1d 非接触区画
2 ダイボンド用チップ
3 ダイボンドフィルム
4 半導体ウエハ
4L 分割予定ライン
5 半導体チップ
6 被着体
7 ボンディングワイヤー
8 封止樹脂
11 基材
12 粘着剤層
21 積層体
22 ダイボンド剤
31 ダイシングリング
32 ウエハ拡張装置
33 突き上げ部
41 改質領域
42 非改質領域
61 半導体チップ付き被着体
100 レーザー光
201a 積層部
201b 周辺部
201c 接触区画
201d 非接触区画
202 ダイボンド用チップ
205 半導体チップ
222 ダイボンド剤
Claims (4)
- ダイシングテープ及び前記ダイシングテープ上に配置されたダイボンドフィルムを備え、
前記ダイシングテープは、−15℃で伸ばしたときに伸び率1%〜200%に降伏点を持つダイシング・ダイボンドフィルム。 - 前記ダイシングテープは、23℃で伸ばしたときに伸び率1%〜200%に降伏点を持つ請求項1に記載のダイシング・ダイボンドフィルム。
- 前記ダイシングテープの23℃における破断伸び率が500%以上である請求項1又は2に記載のダイシング・ダイボンドフィルム。
- 前記ダイシング・ダイボンドフィルム及び前記ダイボンドフィルム上に配置された半導体ウエハを備える積層体の前記ダイシングテープをエキスパンドすることにより、前記ダイボンドフィルム及び前記半導体ウエハを分断して、半導体チップ及び前記半導体チップ上に配置されたダイボンド剤を備えるダイボンド用チップを形成する工程を含む半導体装置の製造方法に使用するための請求項1〜3のいずれかに記載のダイシング・ダイボンドフィルム。
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190004655A (ko) * | 2017-07-04 | 2019-01-14 | 닛토덴코 가부시키가이샤 | 다이싱 테이프, 다이싱 다이 본드 필름, 및 반도체 장치의 제조 방법 |
WO2019054237A1 (ja) * | 2017-09-15 | 2019-03-21 | リンテック株式会社 | フィルム状焼成材料、及び支持シート付フィルム状焼成材料 |
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US11404398B2 (en) | 2018-12-27 | 2022-08-02 | Nichia Corporation | Method of mounting semiconductor elements and method of manufacturing semiconductor device using a stretched film |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005019962A (ja) * | 2003-06-06 | 2005-01-20 | Hitachi Chem Co Ltd | 接着シート |
WO2005112091A1 (ja) * | 2004-05-18 | 2005-11-24 | Hitachi Chemical Co., Ltd. | 粘接着シート並びにそれを用いた半導体装置及びその製造方法 |
JP2006095875A (ja) * | 2004-09-29 | 2006-04-13 | Mitsubishi Chem Mkv Co | ポリオレフィン系積層フィルム及び粘着フィルム |
JP2007005436A (ja) * | 2005-06-22 | 2007-01-11 | Nitto Denko Corp | ダイシング用粘着シート |
JP2007016074A (ja) * | 2005-07-05 | 2007-01-25 | Hitachi Chem Co Ltd | 粘接着シート、粘接着シートの製造方法及び半導体装置の製造方法 |
JP2011505706A (ja) * | 2007-12-03 | 2011-02-24 | エルジー・ケム・リミテッド | ダイシング・ダイボンディングフィルム及びダイシング方法 |
JP2011171588A (ja) * | 2010-02-19 | 2011-09-01 | Nitto Denko Corp | ダイシング・ダイボンドフィルム |
JP2012028598A (ja) * | 2010-07-26 | 2012-02-09 | Furukawa Electric Co Ltd:The | ウエハ加工用テープ |
JP2012079936A (ja) * | 2010-10-01 | 2012-04-19 | Nitto Denko Corp | ダイシング・ダイボンドフィルム、及び、半導体装置の製造方法 |
JP2012222002A (ja) * | 2011-04-04 | 2012-11-12 | Nitto Denko Corp | ダイシング・ダイボンドフィルム、及び、半導体装置の製造方法 |
JP2015185584A (ja) * | 2014-03-20 | 2015-10-22 | 日立化成株式会社 | ウエハ加工用テープ |
-
2014
- 2014-04-24 JP JP2014090452A patent/JP6295132B2/ja active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005019962A (ja) * | 2003-06-06 | 2005-01-20 | Hitachi Chem Co Ltd | 接着シート |
WO2005112091A1 (ja) * | 2004-05-18 | 2005-11-24 | Hitachi Chemical Co., Ltd. | 粘接着シート並びにそれを用いた半導体装置及びその製造方法 |
JP2006095875A (ja) * | 2004-09-29 | 2006-04-13 | Mitsubishi Chem Mkv Co | ポリオレフィン系積層フィルム及び粘着フィルム |
JP2007005436A (ja) * | 2005-06-22 | 2007-01-11 | Nitto Denko Corp | ダイシング用粘着シート |
JP2007016074A (ja) * | 2005-07-05 | 2007-01-25 | Hitachi Chem Co Ltd | 粘接着シート、粘接着シートの製造方法及び半導体装置の製造方法 |
JP2011505706A (ja) * | 2007-12-03 | 2011-02-24 | エルジー・ケム・リミテッド | ダイシング・ダイボンディングフィルム及びダイシング方法 |
JP2011171588A (ja) * | 2010-02-19 | 2011-09-01 | Nitto Denko Corp | ダイシング・ダイボンドフィルム |
JP2012028598A (ja) * | 2010-07-26 | 2012-02-09 | Furukawa Electric Co Ltd:The | ウエハ加工用テープ |
JP2012079936A (ja) * | 2010-10-01 | 2012-04-19 | Nitto Denko Corp | ダイシング・ダイボンドフィルム、及び、半導体装置の製造方法 |
JP2012222002A (ja) * | 2011-04-04 | 2012-11-12 | Nitto Denko Corp | ダイシング・ダイボンドフィルム、及び、半導体装置の製造方法 |
JP2015185584A (ja) * | 2014-03-20 | 2015-10-22 | 日立化成株式会社 | ウエハ加工用テープ |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022051746A (ja) * | 2017-01-30 | 2022-04-01 | グンゼ株式会社 | ダイシング用基体フィルム |
JP7252380B2 (ja) | 2017-01-30 | 2023-04-04 | グンゼ株式会社 | ダイシング用基体フィルム |
KR102489355B1 (ko) | 2017-07-04 | 2023-01-18 | 닛토덴코 가부시키가이샤 | 다이싱 테이프, 다이싱 다이 본드 필름, 및 반도체 장치의 제조 방법 |
KR20190004655A (ko) * | 2017-07-04 | 2019-01-14 | 닛토덴코 가부시키가이샤 | 다이싱 테이프, 다이싱 다이 본드 필름, 및 반도체 장치의 제조 방법 |
JP7080721B2 (ja) | 2017-09-15 | 2022-06-06 | リンテック株式会社 | フィルム状焼成材料、及び支持シート付フィルム状焼成材料 |
CN111066137A (zh) * | 2017-09-15 | 2020-04-24 | 琳得科株式会社 | 膜状烧成材料及带支撑片的膜状烧成材料 |
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WO2019054237A1 (ja) * | 2017-09-15 | 2019-03-21 | リンテック株式会社 | フィルム状焼成材料、及び支持シート付フィルム状焼成材料 |
US11267992B2 (en) | 2017-09-15 | 2022-03-08 | Lintec Corporation | Film-shaped firing material and film-shaped firing material with support sheet |
JP2019052366A (ja) * | 2017-09-15 | 2019-04-04 | リンテック株式会社 | フィルム状焼成材料、及び支持シート付フィルム状焼成材料 |
JP7126829B2 (ja) | 2018-01-17 | 2022-08-29 | 株式会社ディスコ | テープ特性の評価方法及び拡張装置 |
KR102562873B1 (ko) | 2018-01-17 | 2023-08-02 | 가부시기가이샤 디스코 | 테이프 특성의 평가 방법 및 확장 장치 |
JP2019125719A (ja) * | 2018-01-17 | 2019-07-25 | 株式会社ディスコ | テープ特性の評価方法及び拡張装置 |
KR20190088015A (ko) * | 2018-01-17 | 2019-07-25 | 가부시기가이샤 디스코 | 테이프 특성의 평가 방법 및 확장 장치 |
JP7080725B2 (ja) | 2018-05-22 | 2022-06-06 | リンテック株式会社 | 支持シート付フィルム状焼成材料、及び半導体装置の製造方法 |
JP2019204850A (ja) * | 2018-05-22 | 2019-11-28 | リンテック株式会社 | 支持シート付フィルム状焼成材料、及び半導体装置の製造方法 |
US11404398B2 (en) | 2018-12-27 | 2022-08-02 | Nichia Corporation | Method of mounting semiconductor elements and method of manufacturing semiconductor device using a stretched film |
JP2020145263A (ja) * | 2019-03-05 | 2020-09-10 | 株式会社ディスコ | ウェーハの加工方法 |
JP7277019B2 (ja) | 2019-03-05 | 2023-05-18 | 株式会社ディスコ | ウェーハの加工方法 |
JP7277021B2 (ja) | 2019-03-05 | 2023-05-18 | 株式会社ディスコ | ウェーハの加工方法 |
JP7277020B2 (ja) | 2019-03-05 | 2023-05-18 | 株式会社ディスコ | ウェーハの加工方法 |
JP2020145261A (ja) * | 2019-03-05 | 2020-09-10 | 株式会社ディスコ | ウェーハの加工方法 |
TWI812847B (zh) * | 2019-03-05 | 2023-08-21 | 日商迪思科股份有限公司 | 晶圓的加工方法 |
JP2020145262A (ja) * | 2019-03-05 | 2020-09-10 | 株式会社ディスコ | ウェーハの加工方法 |
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