JP2013202581A - Ultrapure water production apparatus - Google Patents

Ultrapure water production apparatus Download PDF

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JP2013202581A
JP2013202581A JP2012077116A JP2012077116A JP2013202581A JP 2013202581 A JP2013202581 A JP 2013202581A JP 2012077116 A JP2012077116 A JP 2012077116A JP 2012077116 A JP2012077116 A JP 2012077116A JP 2013202581 A JP2013202581 A JP 2013202581A
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production apparatus
pure water
heat exchanger
water production
ultrapure water
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Seiichi Onoda
成一 小野田
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Kurita Water Industries Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide an ultrapure water production apparatus capable of reducing the load of a heat exchanger for cooling, and reducing the heat source cost of a heat exchanger for producing hot ultrapure water by dropping the temperature of the hot ultrapure water introduced in a sub tank.SOLUTION: An ultrapure water production apparatus produces primary pure water by passing raw water to a primary pure water production apparatus 10 having a heat exchanger 15 and a reverse osmosis membrane separator 12, and produces ultrapure water by passing the primary pure water to a secondary pure water production apparatus 20. Secondary pure water from the secondary pure water production apparatus 20 is heated by a second heat exchanger 42 and a third heat exchanger 43, and supplied to a use point 40. The heat source of the second heat exchanger 42 is return water from the use point 40. The heat source of the third heat exchanger 43 is steam.

Description

本発明は超純水製造装置に係り、特に二次純水製造装置からの超純水を熱交換器で加熱してユースポイントへ供給する超純水製造装置に関する。   The present invention relates to an ultrapure water production apparatus, and more particularly to an ultrapure water production apparatus that supplies ultrapure water from a secondary pure water production apparatus to a use point by heating it with a heat exchanger.

半導体洗浄用水として用いられている超純水は、図２に示すように前処理システム１、一次純水製造装置１０、二次純水製造装置（サブシステムと称されることも多い。）２０から構成される超純水製造装置で原水（工業用水、市水、井水等）を処理することにより製造される（特許文献１）。図２において各システムの役割は次の通りである。   As shown in FIG. 2, the ultrapure water used as semiconductor cleaning water is a pretreatment system 1, a primary pure water production apparatus 10, and a secondary pure water production apparatus (often referred to as a subsystem) 20. It is manufactured by treating raw water (industrial water, city water, well water, etc.) with an ultrapure water manufacturing apparatus composed of (Patent Document 1). In FIG. 2, the role of each system is as follows.

凝集、加圧浮上（沈殿）、濾過（膜濾過）装置など（この従来例では凝集濾過装置）よりなる前処理システム１では、原水中の懸濁物質やコロイド物質の除去を行う。また、この過程では高分子系有機物、疎水性有機物などの除去も可能である。   In the pretreatment system 1 comprising agglomeration, pressurized flotation (precipitation), filtration (membrane filtration) apparatus and the like (in this conventional example, agglomeration filtration apparatus), suspended substances and colloidal substances in raw water are removed. In this process, it is also possible to remove high molecular organic substances, hydrophobic organic substances, and the like.

前処理された水のタンク１１、熱交換器１５、逆浸透膜処理装置（ＲＯ装置）１２、タンク１２Ａ、イオン交換装置（混床式又は４床５塔式など）１３及び脱気装置１４を備える一次純水製造装置１０では、原水中のイオンや有機成分の除去を行う。なお、水は温度が高い程、粘性が低下し、ＲＯ膜の透過性が向上する。このため、図２の通り、逆浸透膜処理装置１２の前段に熱交換器１５が設置され、逆浸透膜処理装置１２への供給水の温度が所定温度以上となるように水を加熱する。熱交換器１５の１次側には、熱源流体として蒸気が供給される。逆浸透膜処理装置１２では、塩類を除去すると共に、イオン性、コロイド性のＴＯＣを除去する。イオン交換装置１３では、塩類、無機系炭素（ＩＣ）を除去すると共にイオン交換樹脂によって吸着又はイオン交換されるＴＯＣ成分の除去を行う。脱気装置１４では無機系炭素（ＩＣ）、溶存酸素の除去を行う。   A pretreated water tank 11, a heat exchanger 15, a reverse osmosis membrane treatment device (RO device) 12, a tank 12 A, an ion exchange device (such as a mixed bed type or 4 bed 5 tower type) 13, and a deaeration device 14 In the primary pure water production apparatus 10 provided, ions and organic components in raw water are removed. In addition, as the temperature of water increases, the viscosity decreases and the permeability of the RO membrane improves. For this reason, as shown in FIG. 2, the heat exchanger 15 is installed in the front | former stage of the reverse osmosis membrane processing apparatus 12, and water is heated so that the temperature of the supply water to the reverse osmosis membrane processing apparatus 12 may become more than predetermined temperature. Steam is supplied to the primary side of the heat exchanger 15 as a heat source fluid. The reverse osmosis membrane treatment apparatus 12 removes salts and ionic and colloidal TOC. The ion exchange device 13 removes salts and inorganic carbon (IC) and removes the TOC component adsorbed or ion exchanged by the ion exchange resin. In the deaeration device 14, inorganic carbon (IC) and dissolved oxygen are removed.

一次純水製造装置で製造された一次純水は、配管１９を介して二次純水製造装置２０へ送水される。この二次純水製造装置２０は、サブタンク（純水タンクと称されることもある。）２１、ポンプ２２、熱交換器２３、低圧紫外線酸化装置（ＵＶ装置）２４、イオン交換装置２５及び限外濾過膜（ＵＦ膜）分離装置２６を備えている。熱交換器２３は、二次純水の温度制御のためのものである。一般に二次純水（常温超純水）の供給温度は２３〜２５℃であり、その温度範囲に制御するため、熱交換器２３は冷却器が使用される。冷却器の冷却源として冷水が用いられる。この熱交換器２３はイオン交換装置２５より前に置く必要がある。高温の純水がイオン交換樹脂と接触するとＴＯＣ成分が溶出し、水質が悪化するためである。したがって熱交換器２３で水温を２３〜２５℃まで降温してからイオン交換装置２５に送られるようにする必要がある。低圧紫外線酸化装置２４では、低圧紫外線ランプより出される１８５ｎｍの紫外線によりＴＯＣを有機酸、さらにはＣＯ２まで分解する。分解により生成した有機物及びＣＯ２は後段のイオン交換装置２５で除去される。限外濾過膜分離装置２６では、微粒子が除去され、イオン交換樹脂からの流出粒子も除去される。 The primary pure water produced by the primary pure water production apparatus is sent to the secondary pure water production apparatus 20 via the pipe 19. The secondary pure water production apparatus 20 includes a sub tank (sometimes referred to as a pure water tank) 21, a pump 22, a heat exchanger 23, a low-pressure ultraviolet oxidation apparatus (UV apparatus) 24, an ion exchange apparatus 25, and a limiter. An outer filtration membrane (UF membrane) separation device 26 is provided. The heat exchanger 23 is for temperature control of secondary pure water. In general, the supply temperature of secondary pure water (room temperature ultrapure water) is 23 to 25 ° C., and a cooler is used as the heat exchanger 23 in order to control the temperature range. Cold water is used as a cooling source for the cooler. This heat exchanger 23 needs to be placed before the ion exchange device 25. This is because when high-temperature pure water comes into contact with the ion exchange resin, the TOC component is eluted and the water quality deteriorates. Therefore, it is necessary that the water temperature is lowered to 23 to 25 ° C. by the heat exchanger 23 before being sent to the ion exchange device 25. In the low-pressure ultraviolet oxidizer 24, TOC is decomposed into an organic acid and further to CO 2 by 185 nm ultraviolet rays emitted from a low-pressure ultraviolet lamp. Organic substances and CO 2 produced by the decomposition are removed by the ion exchange device 25 at the subsequent stage. In the ultrafiltration membrane separation device 26, the fine particles are removed, and the outflow particles from the ion exchange resin are also removed.

この二次純水製造装置２０で製造された超純水は、そのまま配管３１を介してユースポイント４０に送られる超純水（常温超純水）と、熱交換器４３で６５〜７５℃程度まで加熱された後、ＵＦ装置３０Ａから配管３０を介してユースポイント４０に送られる超純水（温超純水）と分かれる。未使用の温超純水は配管５０を介してタンク２１に戻される。熱交換器４３の熱源としては蒸気が用いられる。なお、二次純水を加熱してユースポイントへ供給するのは、半導体製造工程等において超純水への被溶解物質の溶解度を高くするためである。   The ultrapure water produced by the secondary pure water production apparatus 20 is ultrapure water (room temperature ultrapure water) that is sent to the use point 40 through the pipe 31 as it is, and is about 65 to 75 ° C. by the heat exchanger 43. After being heated up to the ultrapure water (warm ultrapure water) sent from the UF device 30A to the use point 40 via the pipe 30. Unused warm ultrapure water is returned to the tank 21 via the pipe 50. Steam is used as a heat source for the heat exchanger 43. The reason why the secondary pure water is heated and supplied to the use point is to increase the solubility of the substance to be dissolved in ultrapure water in a semiconductor manufacturing process or the like.

なお、二次純水製造装置からの超純水を分取し、測定器にて水質測定することが行われている。従来、この水質測定後の測定排水は、排水処理設備にて処理された後、放流されていた。   In addition, the ultrapure water from a secondary pure water manufacturing apparatus is fractionated and water quality is measured with a measuring instrument. Conventionally, the measured wastewater after the water quality measurement has been discharged in the wastewater treatment facility.

特開２０１０−１２３８９７JP2010-123897

上記従来の超純水製造装置においては、サブタンク２１に導入されるユースポイントからの戻り水も６５〜７５℃程度の温度の温超純水となっているため、サブタンク２１からポンプ２２へ送り出される水温が高く、冷却用熱交換器２３の負荷が大きなものとなっていた。   In the above-described conventional ultrapure water production apparatus, since the return water from the use point introduced into the sub tank 21 is also an ultra pure water having a temperature of about 65 to 75 ° C., the water temperature sent from the sub tank 21 to the pump 22 is The load on the heat exchanger 23 for cooling was high.

本発明は、サブタンクに導入される温超純水の温度を低下させることにより、冷却用熱交換器の負荷が低減されると共に、ユースポイントに送水される超純水を加温して温超純水とするための熱交換器の熱源コストを低減することができる超純水製造装置を提供することを目的とする。   The present invention reduces the load of the heat exchanger for cooling by reducing the temperature of the warm ultrapure water introduced into the sub tank, and warms the ultrapure water sent to the use point to make warm ultrapure water. An object of the present invention is to provide an ultrapure water production apparatus capable of reducing the heat source cost of a heat exchanger for the purpose.

また、本発明は、測定器の排水を再利用することができる超純水製造装置を提供することを目的とする。   Moreover, an object of this invention is to provide the ultrapure water manufacturing apparatus which can reuse the waste_water | drain of a measuring device.

本発明の超純水製造装置は、一次純水製造装置と、該一次純水製造装置からの一次純水を処理して超純水を製造する二次純水製造装置と、該二次純水製造装置からの超純水を加熱するための熱交換器とを有し、該熱交換器で加熱された超純水をユースポイントに供給する超純水製造装置において、該熱交換器として、ユースポイントからの戻り水を熱源とする前段側熱交換器と、該前段側熱交換器で加熱された超純水をさらに加熱する後段側熱交換器とを備えたことを特徴とするものである。   The ultrapure water production apparatus of the present invention includes a primary pure water production apparatus, a secondary pure water production apparatus for producing ultrapure water by treating primary pure water from the primary pure water production apparatus, and the secondary pure water. A heat exchanger for heating the ultrapure water from the water production apparatus, and the ultrapure water production apparatus for supplying the use point with the ultrapure water heated by the heat exchanger. , Characterized in that it comprises a front-stage heat exchanger that uses the return water from the use point as a heat source, and a rear-stage heat exchanger that further heats the ultrapure water heated by the front-stage heat exchanger. It is.

この前段側熱交換器にて熱交換した後のユースポイント戻り水は、サブタンクに戻されることが望ましい。   The point-of-use return water after heat exchange in the former-stage heat exchanger is preferably returned to the sub tank.

後段側熱交換器としては、蒸気を熱源としたものが好適である。   As the latter-stage heat exchanger, a steam heat source is preferable.

別発明の超純水製造装置は、一次純水製造装置と、該一次純水製造装置からの一次純水を処理して超純水を製造する二次純水製造装置と、該二次純水製造装置からの超純水の一部が導入される水質測定器とを有する超純水製造装置において、該水質測定器からの測定排水を処理して前記一次純水製造装置で利用することを特徴とするものである。   An ultrapure water production apparatus according to another invention includes a primary pure water production apparatus, a secondary pure water production apparatus for producing ultrapure water by treating primary pure water from the primary pure water production apparatus, and the secondary pure water. In an ultrapure water production apparatus having a water quality measuring device into which a part of the ultrapure water from the water production apparatus is introduced, the measurement waste water from the water quality measurement device is processed and used in the primary pure water production apparatus It is characterized by.

本発明の超純水製造装置では、前段側熱交換器において、ユースポイント戻り水が保有する熱によって超純水を加熱するので、ユースポイントに送水する超純水を所定温度にまで加温して温超純水とする後段側熱交換器の熱源コストを低減することができる。また、ユースポイント戻り水が前段側熱交換器を通過することにより奪熱され、サブタンクに流入するユースポイント戻り水の温度が低下する。そのため、サブタンクからの一次純水を冷却するための冷却用熱交換器の負荷が低減される。   In the ultrapure water production apparatus of the present invention, since the ultrapure water is heated by the heat held by the use point return water in the upstream heat exchanger, the ultrapure water fed to the use point is heated to a predetermined temperature. Therefore, it is possible to reduce the cost of the heat source of the latter-stage heat exchanger that uses hot ultrapure water. In addition, the use point return water is deprived by passing through the front-side heat exchanger, and the temperature of the use point return water flowing into the sub tank is lowered. Therefore, the load of the cooling heat exchanger for cooling the primary pure water from the sub tank is reduced.

別発明の超純水製造装置によると、従来は放流されていた測定排水を再利用するので、水の有効利用を図ることができる。また、測定排水を再利用することにより、総合排水処理設備の負荷を低減することができる。   According to the ultrapure water production apparatus of another invention, since the measurement wastewater that has been discharged in the past is reused, the water can be effectively used. In addition, by reusing the measured wastewater, the load on the comprehensive wastewater treatment facility can be reduced.

実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus concerning an embodiment. 従来例に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus which concerns on a prior art example. 別の実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus which concerns on another embodiment.

本発明の超純水製造装置は、一次純水製造装置及び二次純水製造装置並びに超純水を加熱する熱交換器を備えたものにおいて、この熱交換器を前段側熱交換器と後段側熱交換器とで構成し、前段側熱交換器の熱源をユースポイント戻り水としたものである。   The ultrapure water production apparatus of the present invention includes a primary pure water production apparatus, a secondary pure water production apparatus, and a heat exchanger that heats ultrapure water. The heat exchanger includes a front-side heat exchanger and a rear-stage heat exchanger. It is composed of a side heat exchanger, and the heat source of the front side heat exchanger is used as a point-of-use return water.

この一次純水製造装置の前段には、通常の場合、前処理装置が設けられる。前処理装置では、原水の濾過、凝集沈殿、精密濾過膜などによる前処理が施され、主に懸濁物質が除去される。この前処理によって通常、水中の微粒子数は１０３個／ｍＬ以下となる。 In the normal stage of the primary pure water production apparatus, a pretreatment apparatus is usually provided. In the pretreatment device, pretreatment by raw water filtration, coagulation sedimentation, microfiltration membrane or the like is performed, and suspended substances are mainly removed. By this pretreatment, the number of fine particles in water is usually 10 3 / mL or less.

一次純水製造装置は、逆浸透（ＲＯ）膜分離装置、脱気装置、再生型イオン交換装置（混床式又は４床５塔式など）、電気脱イオン装置、紫外線（ＵＶ）照射酸化装置等の酸化装置などを備え、前処理水中の大半の電解質、微粒子、生菌等の除去を行うものである。一次純水製造装置は、例えば、熱交換器、２基以上のＲＯ膜分離装置、混床式イオン交換装置、及び脱気装置で構成される。   Primary pure water production equipment includes reverse osmosis (RO) membrane separators, deaerators, regenerative ion exchangers (such as mixed bed or 4 bed 5 tower type), electrodeionizers, ultraviolet (UV) irradiation oxidizers Etc., and removes most of the electrolytes, fine particles, viable bacteria, etc. in the pretreated water. The primary pure water production apparatus is composed of, for example, a heat exchanger, two or more RO membrane separation apparatuses, a mixed bed ion exchange apparatus, and a deaeration apparatus.

二次純水製造装置は、給水ポンプ、冷却用熱交換器、低圧紫外線酸化装置又は殺菌装置といった紫外線照射装置、非再生型混床式イオン交換装置あるいは電気脱イオン装置、限外濾過（ＵＦ）膜分離装置又は精密濾過（ＭＦ）膜分離装置等の膜濾過装置で構成されるが、更に膜脱気装置、ＲＯ膜分離装置、電気脱イオン装置等の脱塩装置が設けられている場合もある。二次純水製造装置では、低圧紫外線酸化装置を適用し、その後段に混床式イオン交換装置を設け、これによって水中のＴＯＣを紫外線により酸化分解し、酸化分解生成物をイオン交換によって除去する。   Secondary pure water production equipment includes feed water pumps, cooling heat exchangers, UV irradiation equipment such as low pressure UV oxidation equipment or sterilization equipment, non-regenerative mixed bed ion exchange equipment or electrodeionization equipment, ultrafiltration (UF) It is composed of a membrane filtration device such as a membrane separation device or a microfiltration (MF) membrane separation device, but it may also be equipped with a demineralization device such as a membrane deaeration device, RO membrane separation device, or electrodeionization device. is there. In the secondary pure water production apparatus, a low-pressure ultraviolet oxidation apparatus is applied, and a mixed bed type ion exchange apparatus is provided at the subsequent stage, whereby TOC in water is oxidized and decomposed by ultraviolet rays, and oxidation decomposition products are removed by ion exchange. .

なお、二次純水の後段に三次純水装置を設け、この三次純水装置からの超純水を前段側熱交換器及び後段側熱交換器で加熱するようにしてもよい。この三次純水製造装置は、二次純水製造装置と同様の構成を備えるものであり、更に高純度の超純水を製造するものである。   A tertiary pure water device may be provided after the secondary pure water, and ultrapure water from the tertiary pure water device may be heated by the front side heat exchanger and the rear side heat exchanger. This tertiary pure water production apparatus has the same configuration as that of the secondary pure water production apparatus, and produces higher purity ultrapure water.

以下、図１を参照して本発明の実施の形態について説明する。図１は実施の形態に係る超純水製造装置を示す系統図である。   Hereinafter, an embodiment of the present invention will be described with reference to FIG. FIG. 1 is a system diagram showing an ultrapure water production apparatus according to an embodiment.

この実施の形態では、二次純水製造装置２０からの超純水を前段側熱交換器４５と後段側熱交換器４６とで６５〜７５℃程度に加熱し、ユースポイント４０に供給する。このユースポイント４０からの温戻り水を配管５１を介して前段側熱交換器４２の熱源側に流通させる。前段側熱交換器４２の熱源側を通過した戻り水は４５〜５５℃程度に降温しており、配管５２を介してサブタンク２１に戻される。   In this embodiment, the ultrapure water from the secondary pure water production apparatus 20 is heated to about 65 to 75 ° C. by the front stage heat exchanger 45 and the rear stage heat exchanger 46 and supplied to the use point 40. The warm return water from the use point 40 is circulated through the pipe 51 to the heat source side of the upstream heat exchanger 42. The return water that has passed through the heat source side of the pre-stage heat exchanger 42 has been cooled to about 45 to 55 ° C., and is returned to the sub tank 21 via the pipe 52.

図２の場合と同じく、熱交換器２３はポンプ２２を経て送られてくる一次純水を冷却する。後段側熱交換器４６は蒸気を熱源とするものである。   As in the case of FIG. 2, the heat exchanger 23 cools the primary pure water sent through the pump 22. The rear stage heat exchanger 46 uses steam as a heat source.

また、図２と同じく、二次純水製造装置のＵＦ膜２６からの超純水の一部を、熱交換器４５に導入することなく２０〜２５℃程度の温度の超純水として配管３１により需要箇所に送り出す。   Further, as in FIG. 2, a part of the ultrapure water from the UF membrane 26 of the secondary pure water production apparatus is not introduced into the heat exchanger 45, and is supplied as ultrapure water having a temperature of about 20 to 25 ° C. To send it to the demand point.

その他の構成は図２と同一であり、同一符号は同一部分を示している。   Other configurations are the same as those in FIG. 2, and the same reference numerals denote the same parts.

このように構成された超純水製造装置においては、二次純水製造装置２０からの２０〜２５℃程度の超純水が前段側熱交換器４５で３５〜４５℃程度に加熱され、次いで後段側熱交換器４６で６５〜７５℃程度に加熱される。この温超純水が後段側熱交換器４６からユースポイント４０に送られる。ユースポイント４０からの６５〜７５℃の戻り超純水が前段側熱交換器４５の熱源側に流通され、その保有熱量が二次純水製造装置からの超純水の加熱に利用される。従って、二次純水製造装置２０からの超純水を蒸気熱源方式の熱交換器４３によってのみ加熱する従来例（図２）に比べて、後段側熱交換器４６で消費する蒸気量が低減される。   In the ultrapure water production apparatus configured as described above, ultrapure water of about 20 to 25 ° C. from the secondary pure water production apparatus 20 is heated to about 35 to 45 ° C. in the pre-stage side heat exchanger 45, and then It heats at about 65-75 degreeC with the back | latter stage side heat exchanger 46. FIG. This warm ultrapure water is sent from the rear side heat exchanger 46 to the use point 40. The returned ultrapure water at 65 to 75 ° C. from the use point 40 is circulated to the heat source side of the pre-stage heat exchanger 45, and the retained heat amount is used for heating the ultrapure water from the secondary pure water production apparatus. Accordingly, the amount of steam consumed by the rear heat exchanger 46 is reduced as compared with the conventional example (FIG. 2) in which ultrapure water from the secondary pure water production apparatus 20 is heated only by the steam heat source type heat exchanger 43. Is done.

また、ユースポイント４０からの６５〜７５℃程度の戻り超純水が前段側熱交換器４５で４５〜５５℃程度に降温した後、サブタンク２１に導入される。このため、従来例（図２）に比べて、サブタンク２１内の一次純水の温度が低くなり、冷却用熱交換器２３の負荷が低減され、冷水製造に消費されるエネルギー量が低減される。これらの結果、超純水製造装置全体として消費エネルギーを低減することができる。   In addition, the return ultrapure water of about 65 to 75 ° C. from the use point 40 is lowered to about 45 to 55 ° C. by the pre-stage heat exchanger 45 and then introduced into the sub tank 21. For this reason, compared with a prior art example (FIG. 2), the temperature of the primary pure water in the sub tank 21 becomes low, the load of the heat exchanger 23 for cooling is reduced, and the amount of energy consumed for cold water manufacture is reduced. . As a result, energy consumption can be reduced as the whole ultrapure water production apparatus.

図３を参照して別発明の実施の形態について説明する。   An embodiment of another invention will be described with reference to FIG.

この実施の形態では、一次純水製造装置１０からの一次純水の一部（例えば一次純水生産量の０．０３〜０．１％程度）を分岐ラインで分岐し、測定器６１Ａにて水質測定を行う。この測定器としては、ＴＯＣ計、微粒子計、ＤＯ計、ＤＮ（溶存酸素）計、比抵抗計などが例示されるが、これに限定されない。   In this embodiment, a part of the primary pure water from the primary pure water production apparatus 10 (for example, about 0.03 to 0.1% of the primary pure water production amount) is branched by a branch line, and is measured by the measuring device 61A. Measure water quality. Examples of the measuring device include, but are not limited to, a TOC meter, a particle meter, a DO meter, a DN (dissolved oxygen) meter, and a specific resistance meter.

この測定器を通った測定排水は、タンク１２Ａ（脱塩水槽）に戻されて再利用される。   The measurement wastewater that has passed through this measuring device is returned to the tank 12A (demineralized water tank) and reused.

二次純水製造装置２０からの二次純水の一部（例えば一次純水生産量の０．０５〜０．２％程度）を分岐ライン６０で分岐し、測定器６１にて水質測定を行う。この測定器としては、一次純水測定器と同様にＴＯＣ計、微粒子計、ＤＯ計、ＤＮ（溶存窒素）計、比抵抗計などが例示されるが、これに限定されない。   A part of the secondary pure water from the secondary pure water production apparatus 20 (for example, about 0.05 to 0.2% of the primary pure water production amount) is branched at the branch line 60, and the water quality is measured by the measuring device 61. Do. Examples of the measuring device include, but are not limited to, a TOC meter, a fine particle meter, a DO meter, a DN (dissolved nitrogen) meter, a specific resistance meter, and the like, similar to the primary pure water measuring device.

この測定器６１を通った測定排水は、サブタンクの窒素ガスシールのためのシールポット６３用水に再利用された後、排水処理設備６２へ送られる。   The measured waste water that has passed through the measuring device 61 is reused as water for the seal pot 63 for sealing the nitrogen gas in the sub tank, and then sent to the waste water treatment facility 62.

なお、図３では、二次純水製造装置２０からの超純水を加熱することなくユースポイント４０に送水しているが、図１のように超純水を加熱してユースポイントに送水してもよい。図１の超純水製造装置においても図３のように測定器排水を処理して一次純水製造装置に供給するようにしてもよい。   In FIG. 3, the ultrapure water from the secondary pure water production apparatus 20 is sent to the use point 40 without being heated. However, as shown in FIG. 1, the ultrapure water is heated and sent to the use point. May be. Also in the ultrapure water production apparatus of FIG. 1, the measuring device waste water may be processed and supplied to the primary pure water production apparatus as shown in FIG. 3.

１０ 一次純水製造装置
１５ 熱交換器
２０ 二次純水製造装置
２１ サブタンク
４０ ユースポイント
４３ 熱交換器
４５ 前段側熱交換器
４６ 後段側熱交換器
５０，５１，５２ 超純水返送用配管 DESCRIPTION OF SYMBOLS 10 Primary pure water production apparatus 15 Heat exchanger 20 Secondary pure water production apparatus 21 Sub tank 40 Use point 43 Heat exchanger 45 Front side heat exchanger 46 Rear side heat exchanger 50, 51, 52 Ultrapure water return piping

実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus concerning an embodiment. 従来例に係る超純水製造装置の系統図である。 It is a systematic diagram of the ultrapure water manufacturing apparatus which concerns on a prior art example .

Claims (4)

一次純水製造装置と、該一次純水製造装置からの一次純水を処理して超純水を製造する二次純水製造装置と、該二次純水製造装置からの超純水を加熱するための熱交換器とを有し、該熱交換器で加熱された超純水をユースポイントに供給する超純水製造装置において、
該熱交換器として、ユースポイントからの戻り水を熱源とする前段側熱交換器と、該前段側熱交換器で加熱された超純水をさらに加熱する後段側熱交換器とを備えたことを特徴とする超純水製造装置。 A primary pure water production apparatus, a secondary pure water production apparatus that produces primary ultra pure water by processing primary pure water from the primary pure water production apparatus, and heating ultra pure water from the secondary pure water production apparatus An ultrapure water production apparatus for supplying ultrapure water heated by the heat exchanger to a use point,
As the heat exchanger, it was provided with a front-stage side heat exchanger that uses the return water from the use point as a heat source, and a rear-stage side heat exchanger that further heats the ultrapure water heated by the front-stage heat exchanger. Ultrapure water production equipment characterized by 請求項１において、該後段側熱交換器は蒸気を熱源とすることを特徴とする超純水製造装置。   2. The apparatus for producing ultrapure water according to claim 1, wherein the rear heat exchanger uses steam as a heat source. 請求項１又は２において、前記二次純水製造装置は、一次純水を受け入れるサブタンクを備えており、
前記前段側熱交換器を通ったユースポイント戻り水が該サブタンクに導入されることを特徴とする超純水製造装置。 The secondary pure water production apparatus according to claim 1 or 2, comprising a sub-tank that receives primary pure water,
The ultrapure water production apparatus, wherein the use point return water that has passed through the front-side heat exchanger is introduced into the sub tank. 一次純水製造装置と、該一次純水製造装置からの一次純水を処理して超純水を製造する二次純水製造装置と、該二次純水製造装置からの超純水の一部が導入される水質測定器とを有する超純水製造装置において、
該水質測定器からの測定廃水を処理して前記一次純水製造装置で利用することを特徴とする超純水製造装置。 A primary pure water production apparatus, a secondary pure water production apparatus that produces primary ultra pure water by treating primary pure water from the primary pure water production apparatus, and an ultra pure water from the secondary pure water production apparatus In an ultrapure water production apparatus having a water quality measuring instrument into which a part is introduced,
An ultrapure water production apparatus characterized in that measurement wastewater from the water quality measuring device is processed and used in the primary pure water production apparatus.
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