JP2018043190A - Ultrapure water manufacturing device - Google Patents

Ultrapure water manufacturing device Download PDF

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JP2018043190A
JP2018043190A JP2016179640A JP2016179640A JP2018043190A JP 2018043190 A JP2018043190 A JP 2018043190A JP 2016179640 A JP2016179640 A JP 2016179640A JP 2016179640 A JP2016179640 A JP 2016179640A JP 2018043190 A JP2018043190 A JP 2018043190A
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water
heat exchanger
heat
medium
ultrapure water
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JP6149992B1 (en
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重希 堀井
Shigeki Horii
重希 堀井
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Kurita Water Industries Ltd
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Kurita Water Industries Ltd
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Priority to JP2016179640A priority Critical patent/JP6149992B1/en
Priority to PCT/JP2017/010616 priority patent/WO2018051551A1/en
Priority to KR1020187034316A priority patent/KR102107924B1/en
Priority to CN201780046995.7A priority patent/CN109562959B/en
Priority to TW106111921A priority patent/TWI691687B/en
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H1/00—Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H1/00—Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters
    • F24H1/10—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium
    • F24H1/12—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H4/00—Fluid heaters characterised by the use of heat pumps
    • F24H4/02—Water heaters
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Hydrology & Water Resources (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Instantaneous Water Boilers, Portable Hot-Water Supply Apparatuses, And Control Of Portable Hot-Water Supply Apparatuses (AREA)
  • Heat-Pump Type And Storage Water Heaters (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an ultrapure water manufacturing device that can reduce the heat source cost of a heat exchanger, the heat exchanger being for heating ultrapure water to produce warm ultrapure water.SOLUTION: Secondary pure water from a subsystem 4 is heated with a heat exchanger 6 and a heat exchanger 10, and is sent to a use point. A heat source of the heat exchanger 6 is returning warm ultrapure water from the use point. A heat source fluid of the heat exchanger 10 is warm water that has been heated with a heat pump 20 and a vapor-type heat exchanger 15. Heat sources of the heat pump 20 are warm discharge water from the use point and a retentate of a UF membrane separation device 11A.SELECTED DRAWING: Figure 1

Description

本発明は超純水製造装置に係り、特に二次純水製造装置からの超純水を熱交換器で加熱して温超純水としてユースポイントへ供給する超純水製造装置に関する。   The present invention relates to an ultrapure water production apparatus, and more particularly to an ultrapure water production apparatus that heats ultrapure water from a secondary pure water production apparatus with a heat exchanger and supplies the ultrapure water as warm ultrapure water to a use point.

半導体洗浄用水として用いられている超純水は、図７に示すように前処理システム５０、一次純水製造装置６０、二次純水製造装置（サブシステムと称されることも多い。）７０から構成される超純水製造装置で原水（工業用水、市水、井水等）を処理することにより製造される（特許文献１）。図７において各システムの役割は次の通りである。   As shown in FIG. 7, the ultrapure water used as the semiconductor cleaning water is a pretreatment system 50, a primary pure water production apparatus 60, and a secondary pure water production apparatus (often referred to as a subsystem) 70. It is manufactured by treating raw water (industrial water, city water, well water, etc.) with an ultrapure water manufacturing apparatus composed of (Patent Document 1). In FIG. 7, the role of each system is as follows.

凝集、加圧浮上（沈殿）、濾過（膜濾過）装置など（この従来例では凝集濾過装置）よりなる前処理システム５０では、原水中の懸濁物質やコロイド物質の除去を行う。また、この過程では高分子系有機物、疎水性有機物などの除去も可能である。   In the pretreatment system 50 comprising agglomeration, pressurized flotation (precipitation), filtration (membrane filtration) apparatus, etc. (in this conventional example, agglomeration filtration apparatus), suspended substances and colloidal substances in raw water are removed. In this process, it is also possible to remove high molecular organic substances, hydrophobic organic substances, and the like.

前処理された水のタンク６１、熱交換器６５、逆浸透膜処理装置（ＲＯ装置）６２、イオン交換装置（混床式又は４床５塔式など）６３、タンク６３Ａ、イオン交換装置６３Ｂ、及び脱気装置６４を備える一次純水製造装置６０では、原水中のイオンや有機成分の除去を行う。なお、水は温度が高い程、粘性が低下し、ＲＯ膜の透過性が向上する。このため、図７の通り、逆浸透膜処理装置６２の前段に熱交換器６５が設置され、逆浸透膜処理装置６２への供給水の温度が所定温度以上となるように水を加熱する。熱交換器６５の１次側には、熱源流体として蒸気が供給される。逆浸透膜処理装置６２では、塩類を除去すると共に、イオン性、コロイド性のＴＯＣを除去する。イオン交換装置６３，６３Ｂでは、塩類、無機系炭素（ＩＣ）を除去すると共にイオン交換樹脂によって吸着又はイオン交換されるＴＯＣ成分の除去を行う。脱気装置６４では無機系炭素（ＩＣ）、溶存酸素の除去を行う。   Pre-treated water tank 61, heat exchanger 65, reverse osmosis membrane treatment device (RO device) 62, ion exchange device (mixed bed type or 4 bed 5 tower type etc.) 63, tank 63A, ion exchange device 63B, And in the primary pure water manufacturing apparatus 60 provided with the deaeration apparatus 64, the ion and organic component in raw | natural water are removed. In addition, as the temperature of water increases, the viscosity decreases and the permeability of the RO membrane improves. For this reason, as shown in FIG. 7, a heat exchanger 65 is installed in the front stage of the reverse osmosis membrane treatment device 62, and the water is heated so that the temperature of the water supplied to the reverse osmosis membrane treatment device 62 becomes a predetermined temperature or higher. Steam is supplied to the primary side of the heat exchanger 65 as a heat source fluid. The reverse osmosis membrane treatment device 62 removes salts and removes ionic and colloidal TOC. The ion exchange devices 63 and 63B remove salts and inorganic carbon (IC) and remove TOC components adsorbed or ion exchanged by an ion exchange resin. In the deaerator 64, inorganic carbon (IC) and dissolved oxygen are removed.

一次純水製造装置６０で製造された一次純水は、配管６９を介して温超純水製造用の二次純水製造装置７０へ送水される。この二次純水製造装置７０は、サブタンク（純水タンクと称されることもある。）７１、ポンプ７２、低圧紫外線酸化装置（ＵＶ装置）７４、イオン交換装置７５を備えている。低圧紫外線酸化装置７４では、低圧紫外線ランプより出される１８５ｎｍの紫外線によりＴＯＣを有機酸、さらにはＣＯ２まで分解する。分解により生成した有機物及びＣＯ２は後段のイオン交換装置７５で除去される。 The primary pure water produced by the primary pure water production apparatus 60 is sent through a pipe 69 to a secondary pure water production apparatus 70 for producing warm ultrapure water. The secondary pure water production apparatus 70 includes a sub tank (sometimes referred to as a pure water tank) 71, a pump 72, a low-pressure ultraviolet oxidation apparatus (UV apparatus) 74, and an ion exchange apparatus 75. In the low-pressure ultraviolet oxidizer 74, the TOC is decomposed to an organic acid and further to CO 2 by 185 nm ultraviolet rays emitted from a low-pressure ultraviolet lamp. Organic substances and CO 2 produced by the decomposition are removed by the ion exchange device 75 in the subsequent stage.

二次純水製造装置７０からの超純水を前段側熱交換器８５と後段側熱交換器８６とで７０〜８０℃程度に加熱し、ユースポイント９０に供給する。このユースポイント９０からの温戻り水を配管９１を介して前段側熱交換器８５の熱源側に流通させる。前段側熱交換器８５の熱源側を通過した戻り水は４０℃程度に降温しており、配管９２を介してサブタンク７１に戻される。後段側熱交換器８６は蒸気を熱源とするものである。   The ultrapure water from the secondary pure water production apparatus 70 is heated to about 70 to 80 ° C. by the front side heat exchanger 85 and the rear side heat exchanger 86 and supplied to the use point 90. The warm return water from this use point 90 is circulated through the pipe 91 to the heat source side of the pre-stage side heat exchanger 85. The return water that has passed through the heat source side of the pre-stage heat exchanger 85 has dropped to about 40 ° C. and is returned to the sub tank 71 via the pipe 92. The rear stage heat exchanger 86 uses steam as a heat source.

一次純水製造装置６０からの一次純水の一部は、常温超純水製造用の二次純水製造装置７０’へ送水される。この二次純水製造装置７０’は、サブタンク（純水タンクと称されることもある。）７１’、ポンプ７２’、熱交換器７３’低圧紫外線酸化装置（ＵＶ装置）７４’、イオン交換装置７５’及び限外濾過膜（ＵＦ膜）分離装置７６’を備えている。限外濾過膜分離装置７６’から配管８８’を介して常温超純水がユースポイント９０’に送られる。このユースポイント９０’からの戻り水は、配管９２’を介してサブタンク７１’に戻される。   A part of the primary pure water from the primary pure water production apparatus 60 is sent to a secondary pure water production apparatus 70 ′ for producing room temperature ultrapure water. The secondary pure water production apparatus 70 ′ includes a sub tank (sometimes referred to as a pure water tank) 71 ′, a pump 72 ′, a heat exchanger 73 ′, a low-pressure ultraviolet oxidation apparatus (UV apparatus) 74 ′, and an ion exchange. A device 75 ′ and an ultrafiltration membrane (UF membrane) separation device 76 ′ are provided. Normal temperature ultrapure water is sent from the ultrafiltration membrane separator 76 'to the use point 90' via the pipe 88 '. The return water from the use point 90 'is returned to the sub tank 71' via the pipe 92 '.

図６は参考例に係る超純水製造装置を示す系統図である。なお、以下の説明では水温を例示しているが、各水温は一例であり、本発明を何ら限定するものではない。   FIG. 6 is a system diagram showing an ultrapure water production apparatus according to a reference example. In addition, although the water temperature is illustrated in the following description, each water temperature is an example and does not limit this invention at all.

約２５℃の一次純水は、配管１、サブタンク２、配管３を介してサブシステム４に導入され、約３０℃の超純水が製造される。製造された超純水は、配管５、熱交換器６、配管９及び熱交換器１０の順に流れ、熱交換器６によって約４２℃に加熱され、熱交換器１０によって約７５℃に加熱され、温超純水として配管１１によりユースポイントへ送水される。配管１１には、ユースポイントの直前にＵＦ膜分離装置１１Ａが設置されている。   Primary pure water at about 25 ° C. is introduced into the subsystem 4 via the pipe 1, the subtank 2, and the pipe 3, and ultrapure water at about 30 ° C. is produced. The produced ultrapure water flows in the order of the pipe 5, the heat exchanger 6, the pipe 9 and the heat exchanger 10, heated to about 42 ° C. by the heat exchanger 6, and heated to about 75 ° C. by the heat exchanger 10. Then, the water is sent to the use point through the pipe 11 as warm ultrapure water. In the pipe 11, a UF membrane separation device 11A is installed immediately before the use point.

熱交換器６の熱源流体流路へは、配管７を介してユースポイントからの約７５℃の戻り温超純水（戻り水）が導入される。この戻り温超純水は、熱交換器６でサブシステム４からの超純水と熱交換して約４０℃に降温した後、配管８によって、サブタンク２に送られる。   About 75 ° C. return temperature ultrapure water (return water) from the use point is introduced into the heat source fluid flow path of the heat exchanger 6 through the pipe 7. The return temperature ultrapure water is heat-exchanged with the ultrapure water from the subsystem 4 by the heat exchanger 6 and cooled to about 40 ° C., and then sent to the sub tank 2 through the pipe 8.

熱交換器１０の熱源流体流路には、熱交換器１３，１５によって約８０℃に加熱された第１媒体水（伝熱媒体としての水）が循環流通される。即ち、熱交換器１０の熱源流体流路出口から流出した約４７℃の第１媒体水は、配管１２から熱交換器１３を通り約４９℃に加熱された後、配管１４、熱交換器１５、配管１６を流れて熱交換器１０の熱源流体流路入口に戻る。   A first medium water (water as a heat transfer medium) heated to about 80 ° C. by the heat exchangers 13 and 15 is circulated through the heat source fluid flow path of the heat exchanger 10. That is, about 47 degreeC 1st medium water which flowed out from the heat source fluid flow-path exit of the heat exchanger 10 passes the heat exchanger 13 from the piping 12, and is heated to about 49 degreeC, Then, the piping 14 and the heat exchanger 15 Then, it flows through the pipe 16 and returns to the heat source fluid flow path inlet of the heat exchanger 10.

熱交換器１３の熱源流体流路には、配管１７を介して約５６℃の温排水が導入される。熱交換器１３で約５３℃に降温した温排水は、配管１８を介して流出し、回収水として回収される。   About 56 ° C. warm wastewater is introduced into the heat source fluid flow path of the heat exchanger 13 through the pipe 17. The warm waste water cooled to about 53 ° C. by the heat exchanger 13 flows out through the pipe 18 and is recovered as recovered water.

熱交換器１５の熱源流体流路には、ボイラ等からの蒸気（水蒸気）が流通される。   Steam (water vapor) from a boiler or the like is circulated through the heat source fluid flow path of the heat exchanger 15.

図示は省略するが、配管１２，１４又は１６に循環用のポンプが設けられている。   Although not shown, a circulation pump is provided in the pipe 12, 14 or 16.

この図６の超純水製造装置にあっては、熱交換器１３において、温排水が保有する熱によっても第１媒体水が加熱されるので、熱交換器６からの超純水を蒸気式熱交換器のみで加熱する場合に比べて、所定温度の温超純水を得るための熱源コストが安価となる。しかしながら、戻り超純水の熱の回収が十分ではなく、熱源コストの更なる低下が望まれる。   In the ultrapure water production apparatus of FIG. 6, in the heat exchanger 13, the first medium water is also heated by the heat held by the hot waste water, so the ultrapure water from the heat exchanger 6 is converted into a steam type. Compared with the case of heating only with a heat exchanger, the heat source cost for obtaining warm ultrapure water at a predetermined temperature is reduced. However, the heat recovery of the return ultrapure water is not sufficient, and further reduction of the heat source cost is desired.

特開２０１３−２０２５８１JP2013-202581A

本発明は、ユースポイントに送水される超純水を加温して温超純水とするための熱交換器の熱源コストを低減することができる超純水製造装置を提供することを目的とする。   An object of this invention is to provide the ultrapure water manufacturing apparatus which can reduce the heat-source cost of the heat exchanger for heating the ultrapure water sent to a use point into warm ultrapure water.

本発明の一態様の超純水製造装置は、一次純水製造装置と、該一次純水製造装置からの一次純水を処理して超純水を製造する二次純水製造装置と、該二次純水製造装置からの超純水を加熱するための、ユースポイントからの戻り水を熱源とする第１熱交換器と、該第１熱交換器で加熱された超純水をさらに加熱する加熱手段とを有し、加熱された超純水をユースポイントに供給する超純水製造装置において、前記加熱手段は、前記第１熱交換器で加熱された超純水が被加熱流体流路に通水される第２熱交換器と、該第２熱交換器の熱源流体流路に伝熱媒体としての第１媒体水を循環流通させる第１循環流路と、該第１循環流路を流れる第１媒体水を、温排水の熱によって加熱する第１媒体水加熱装置と、該第１媒体水加熱装置で加熱された第１媒体水を蒸気によって加熱する第３熱交換器とを備える。   An ultrapure water production apparatus according to an aspect of the present invention includes a primary pure water production apparatus, a secondary pure water production apparatus that processes primary pure water from the primary pure water production apparatus to produce ultrapure water, A first heat exchanger for heating the ultrapure water from the secondary pure water production apparatus using the return water from the use point as a heat source, and further heating the ultrapure water heated by the first heat exchanger And heating means for supplying the heated ultrapure water to the use point, wherein the heating means is configured to cause the ultrapure water heated by the first heat exchanger to flow into the fluid to be heated. A second heat exchanger that is passed through the passage, a first circulation passage that circulates and circulates the first medium water as a heat transfer medium in the heat source fluid passage of the second heat exchanger, and the first circulation flow The first medium water heating device that heats the first medium water flowing through the path by the heat of the warm waste water, and the first medium water heating device heated by the first medium water heating device The medium water and a third heat exchanger for heating by steam.

本発明の一態様では、前記第１媒体水加熱装置は、凝縮器、蒸発器、ポンプ及び膨張弁を備えたヒートポンプを有しており、該凝縮器は、該第１媒体水を加熱するように前記第１循環流路に設置されており、該蒸発器は、第２媒体水が循環される第２循環流路に設置されており、該第２循環流路には、前記温排水の熱によって第２媒体水を加熱するための第２媒体水加熱装置が設けられている。   In one aspect of the present invention, the first medium water heating device includes a heat pump including a condenser, an evaporator, a pump, and an expansion valve, and the condenser heats the first medium water. Installed in the first circulation channel, and the evaporator is installed in a second circulation channel through which the second medium water is circulated. A second medium water heating device is provided for heating the second medium water by heat.

本発明の一態様では、前記第２媒体水加熱装置は、前記温排水が熱源流体流路に通水される第５熱交換器である。   In one aspect of the present invention, the second medium water heating device is a fifth heat exchanger in which the hot waste water is passed through a heat source fluid flow path.

本発明の一態様では、前記第１熱交換器と第２熱交換器との間に、前記超純水を加熱するための第６熱交換器が設置されており、前記温排水を、第６熱交換器に通水させてから第５熱交換器の熱源流体流路に通水させるための温排水流路が設けられている。   In one aspect of the present invention, a sixth heat exchanger for heating the ultrapure water is installed between the first heat exchanger and the second heat exchanger, A warm drainage channel is provided for passing water through the heat exchanger fluid channel of the fifth heat exchanger after passing through the 6 heat exchanger.

本発明の一態様では、前記温排水を前記第６熱交換器を経て第５熱交換器に通水させる第１の流路選択と、温排水を前記第６熱交換器を迂回して第５熱交換器に通水させる第２の流路選択とを切り替えるための流路切替手段が設けられている。   In one aspect of the present invention, a first flow path selection for passing the warm wastewater through the sixth heat exchanger to the fifth heat exchanger, and the warm wastewater bypassing the sixth heat exchanger A flow path switching means for switching between selection of the second flow path for passing water through the 5 heat exchanger is provided.

本発明の一態様では、前記温排水の水質を測定する水質センサを設け、該水質センサの検出水質が所定値よりも良好な場合には前記第１の流路選択とし、検出水質が該所定値よりも不良である場合には前記第２の流路選択とする制御手段を備える。   In one aspect of the present invention, a water quality sensor for measuring the quality of the warm waste water is provided, and when the detected water quality of the water quality sensor is better than a predetermined value, the first flow path is selected, and the detected water quality is the predetermined water quality. Control means for selecting the second flow path when the value is lower than the value is provided.

本発明の一態様では、前記第２媒体水加熱装置は、第３媒体水が熱源流体流路に通水される第５熱交換器であり、該第５熱交換器の熱源流体流路に第３媒体水を循環流通させるための第３循環流路が設けられており、該第３循環流路に、前記温排水によって第３媒体水を加熱する第７熱交換器が設置されている。   In one aspect of the present invention, the second medium water heating device is a fifth heat exchanger in which the third medium water is passed through the heat source fluid flow path, and the heat source fluid flow path of the fifth heat exchanger is provided. A third circulation channel for circulating and circulating the third medium water is provided, and a seventh heat exchanger for heating the third medium water by the warm waste water is installed in the third circulation channel. .

本発明の一態様では、前記第１熱交換器と第２熱交換器との間に、前記超純水を加熱するための第６熱交換器が設置されており、前記第３循環流路は、前記第７熱交換器で加熱された第３媒体水を該第６熱交換器の熱源流体流路を経て第５熱交換器の熱源流体流路に通水させるように設けられている。   In one aspect of the present invention, a sixth heat exchanger for heating the ultrapure water is installed between the first heat exchanger and the second heat exchanger, and the third circulation channel is provided. Is provided so that the third medium water heated by the seventh heat exchanger passes through the heat source fluid flow path of the sixth heat exchanger and the heat source fluid flow path of the fifth heat exchanger. .

本発明の超純水製造装置では、第１熱交換器において、ユースポイント戻り水が保有する熱によって超純水を加熱する。また、温排水の熱と蒸気によって加熱された第１媒体水を熱源流体とする第２熱交換器によって、この超純水をさらに加熱する。この結果、ユースポイントに送水する超純水を所定温度にまで加温して温超純水とする熱源コストを低減することができる。   In the ultrapure water production apparatus of the present invention, the ultrapure water is heated by the heat held by the use point return water in the first heat exchanger. Moreover, this ultrapure water is further heated by the 2nd heat exchanger which uses the 1st medium water heated with the heat | fever and steam of warm wastewater as a heat source fluid. As a result, it is possible to reduce the heat source cost of heating the ultrapure water to be sent to the use point to a predetermined temperature to obtain the warm ultrapure water.

なお、ユースポイント戻り水の水温は、通常７０〜８０℃例えば約７５℃である。   In addition, the water temperature of a use point return water is 70-80 degreeC normally, for example, about 75 degreeC.

本発明において、温排水とは、ユースポイントで洗浄に使用された排水である。ユースポイント直前に設置されたＵＦ膜分離装置の濃縮水も温排水に含めてもよい。温排水の温度は、通常５０〜６０℃例えば約５６℃である。   In the present invention, warm waste water is waste water used for cleaning at a use point. Concentrated water from a UF membrane separator installed just before the use point may be included in the warm waste water. The temperature of the hot waste water is usually 50 to 60 ° C., for example, about 56 ° C.

実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus concerning an embodiment. 実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus concerning an embodiment. 実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus concerning an embodiment. 実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus concerning an embodiment. 実施の形態に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus concerning an embodiment. 参考例に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus which concerns on a reference example. 従来例に係る超純水製造装置の系統図である。It is a systematic diagram of the ultrapure water manufacturing apparatus which concerns on a prior art example.

本発明の超純水製造装置は、一次純水製造装置及び二次純水製造装置並びに超純水を加熱する加熱手段を備える。   The ultrapure water production apparatus of the present invention includes a primary pure water production apparatus, a secondary pure water production apparatus, and heating means for heating the ultrapure water.

この一次純水製造装置の前段には、通常の場合、前処理装置が設けられる。前処理装置では、原水の濾過、凝集沈殿、精密濾過膜などによる前処理が施され、主に懸濁物質が除去される。この前処理によって通常、水中の微粒子数は１０３個／ｍＬ以下となる。 In the normal stage of the primary pure water production apparatus, a pretreatment apparatus is usually provided. In the pretreatment device, pretreatment by raw water filtration, coagulation sedimentation, microfiltration membrane or the like is performed, and suspended substances are mainly removed. Usually this pre-treatment, number of fine particles in water is less than 10 3 / mL.

一次純水製造装置は、逆浸透（ＲＯ）膜分離装置、脱気装置、再生型イオン交換装置（混床式又は４床５塔式など）、電気脱イオン装置、紫外線（ＵＶ）照射酸化装置等の酸化装置などを備え、前処理水中の大半の電解質、微粒子、生菌等の除去を行うものである。一次純水製造装置は、例えば、熱交換器、２基以上のＲＯ膜分離装置、混床式イオン交換装置、及び脱気装置で構成される。   Primary pure water production equipment includes reverse osmosis (RO) membrane separators, deaerators, regenerative ion exchangers (such as mixed bed or 4 bed 5 tower type), electrodeionizers, ultraviolet (UV) irradiation oxidizers Etc., and removes most of the electrolytes, fine particles, viable bacteria, etc. in the pretreated water. The primary pure water production apparatus is composed of, for example, a heat exchanger, two or more RO membrane separation apparatuses, a mixed bed ion exchange apparatus, and a deaeration apparatus.

二次純水製造装置は、サブタンク、給水ポンプ、冷却用熱交換器、低圧紫外線酸化装置又は殺菌装置といった紫外線照射装置、非再生型混床式イオン交換装置あるいは電気脱イオン装置、限外濾過（ＵＦ）膜分離装置又は精密濾過（ＭＦ）膜分離装置等の膜濾過装置で構成されるが、更に膜脱気装置、ＲＯ膜分離装置、電気脱イオン装置等の脱塩装置が設けられている場合もある。二次純水製造装置では、低圧紫外線酸化装置を適用し、その後段に混床式イオン交換装置を設け、これによって水中のＴＯＣを紫外線により酸化分解し、酸化分解生成物をイオン交換によって除去する。本明細書では、以下、二次純水製造装置のうち、サブタンクよりも後段側をサブシステムと称する。   Secondary pure water production equipment includes subtanks, feed water pumps, cooling heat exchangers, low-pressure ultraviolet oxidizers or sterilizers, UV irradiation equipment, non-regenerative mixed bed ion exchange equipment or electrodeionization equipment, ultrafiltration ( (UF) Membrane filtration device such as membrane separation device or microfiltration (MF) membrane separation device, but also equipped with demineralization devices such as membrane deaeration device, RO membrane separation device, and electro-deionization device In some cases. In the secondary pure water production apparatus, a low-pressure ultraviolet oxidation apparatus is applied, and a mixed bed type ion exchange apparatus is provided at the subsequent stage, whereby TOC in water is oxidized and decomposed by ultraviolet rays, and oxidation decomposition products are removed by ion exchange. . Hereinafter, in the secondary pure water production apparatus, the downstream side of the sub tank is referred to as a subsystem.

なお、二次純水製造装置の後段に三次純水製造装置を設け、この三次純水製造装置からの超純水を加熱するようにしてもよい。この三次純水製造装置は、二次純水製造装置と同様の構成を備えるものであり、更に高純度の超純水を製造するものである。   A tertiary pure water production apparatus may be provided after the secondary pure water production apparatus, and the ultrapure water from the tertiary pure water production apparatus may be heated. This tertiary pure water production apparatus has the same configuration as that of the secondary pure water production apparatus, and produces higher purity ultrapure water.

以下、図面を参照して本発明の実施の形態について説明する。図２は第１の実施の形態に係る超純水製造装置を示す系統図である。なお、以下の説明では水温を例示しているが、各水温は一例であり、本発明を何ら限定するものではない。   Embodiments of the present invention will be described below with reference to the drawings. FIG. 2 is a system diagram showing the ultrapure water production apparatus according to the first embodiment. In addition, although the water temperature is illustrated in the following description, each water temperature is an example and does not limit this invention at all.

約２５℃の一次純水は、配管１、サブタンク２、配管３を介してサブシステム４に導入され、約３０℃の超純水が製造される。製造された超純水は、配管５、熱交換器６、配管９及び熱交換器１０の順に流れ、熱交換器６によって約４２℃に加熱され、熱交換器１０によって約７５℃に加熱され、温超純水として配管１１によりユースポイントへ送水される。配管１１には、ユースポイントの直前にＵＦ膜分離装置１１Ａが設置されている。   Primary pure water at about 25 ° C. is introduced into the subsystem 4 via the pipe 1, the subtank 2, and the pipe 3, and ultrapure water at about 30 ° C. is produced. The produced ultrapure water flows in the order of the pipe 5, the heat exchanger 6, the pipe 9 and the heat exchanger 10, heated to about 42 ° C. by the heat exchanger 6, and heated to about 75 ° C. by the heat exchanger 10. Then, the water is sent to the use point through the pipe 11 as warm ultrapure water. In the pipe 11, a UF membrane separation device 11A is installed immediately before the use point.

熱交換器６の熱源流体流路へは、配管７を介してユースポイントからの約７５℃の戻り温超純水（戻り水）が導入される。この戻り温超純水は、熱交換器６でサブシステム４からの超純水と熱交換して約４０℃に降温した後、配管８によって、サブタンク２に送られる。   About 75 ° C. return temperature ultrapure water (return water) from the use point is introduced into the heat source fluid flow path of the heat exchanger 6 through the pipe 7. The return temperature ultrapure water is heat-exchanged with the ultrapure water from the subsystem 4 by the heat exchanger 6 and cooled to about 40 ° C., and then sent to the sub tank 2 through the pipe 8.

熱交換器１０の熱源流体流路には、ヒートポンプ２０及び蒸気式熱交換器１５によって加熱された第１媒体水（伝熱媒体としての水）が循環流通される。即ち、熱交換器１０から流出した約６０℃の第１媒体水を第１循環流路のヒートポンプ２０の凝縮器２３で約７０℃に加熱した後、蒸気式熱交換器１５で約８５℃に加熱して熱交換器１０に流入させる。   The first medium water (water as the heat transfer medium) heated by the heat pump 20 and the steam heat exchanger 15 is circulated through the heat source fluid flow path of the heat exchanger 10. That is, after the first medium water at about 60 ° C. flowing out from the heat exchanger 10 is heated to about 70 ° C. by the condenser 23 of the heat pump 20 in the first circulation channel, it is heated to about 85 ° C. by the steam heat exchanger 15. Heat to flow into heat exchanger 10.

熱交換器１５の熱源流体流路には、ボイラ等からの蒸気（水蒸気）が流通される。   Steam (water vapor) from a boiler or the like is circulated through the heat source fluid flow path of the heat exchanger 15.

ヒートポンプ２０は、蒸発器２１からの代替フロン等の熱媒体をポンプ２２で圧縮して凝縮器２３に導入し、凝縮器２３からの熱媒体を膨張弁２４を介して蒸発器２１に導入するように構成されている。   The heat pump 20 compresses the heat medium such as CFC substitute from the evaporator 21 by the pump 22 and introduces it into the condenser 23, and introduces the heat medium from the condenser 23 into the evaporator 21 through the expansion valve 24. It is configured.

第１循環流路（高温側流路）の凝縮器２３に熱交換器１０からの第１媒体水が配管１２を介して導入され、凝縮器２３で加熱された第１媒体水が配管１４を介して熱交換器１５に送水される。なお、凝縮器２３からの第１媒体水の一部は、バイパス配管１９を介して配管１２に返送される。これにより、凝縮器２３に導入される第１媒体水の水温は約６５℃となる。バイパス配管１９には、流量調節弁（図示略）が設けられている。   The first medium water from the heat exchanger 10 is introduced into the condenser 23 of the first circulation channel (high temperature side channel) through the pipe 12, and the first medium water heated by the condenser 23 passes through the pipe 14. Then, the water is fed to the heat exchanger 15. A part of the first medium water from the condenser 23 is returned to the pipe 12 via the bypass pipe 19. As a result, the temperature of the first medium water introduced into the condenser 23 becomes approximately 65 ° C. The bypass pipe 19 is provided with a flow rate adjustment valve (not shown).

図示は省略するが、配管１２，１４又は１６に循環用のポンプが設けられている。後述の図２〜５の超純水製造装置も同様である。   Although not shown, a circulation pump is provided in the pipe 12, 14 or 16. The same applies to the ultrapure water production apparatus shown in FIGS.

蒸発器２１の熱源流体流路（低温側流路）に第２媒体水を循環通水するために、配管２５、熱交換器２６及び配管２７よりなる循環流路が設けられている。なお、配管２５，２７間にバイパス配管２８が設けられている。   In order to circulate the second medium water through the heat source fluid flow path (low temperature side flow path) of the evaporator 21, a circulation flow path including a pipe 25, a heat exchanger 26 and a pipe 27 is provided. A bypass pipe 28 is provided between the pipes 25 and 27.

熱交換器２６の熱源流体流路には、配管２９を介して約５６℃の温排水が導入される。第２媒体水と熱交換して約２５℃に降温した温排水は、配管３０から流出し、回収水として回収される。   A hot waste water of about 56 ° C. is introduced into the heat source fluid flow path of the heat exchanger 26 through a pipe 29. The warm waste water that has been subjected to heat exchange with the second medium water and has fallen to about 25 ° C. flows out of the pipe 30 and is recovered as recovered water.

熱交換器２６で約３０℃に加熱された第２媒体水が蒸発器２１の熱源流体流路に導入され、ヒートポンプ２０の熱媒体と熱交換して約２０℃に降温した後、配管２５を介して熱交換器２６へ送水される。一部の第２媒体水は、バイパス配管２８を介して配管２５から配管２７へ流れる。これにより、蒸発器２１に流入する第２媒体水の水温は約２５℃となる。バイパス配管２８には流量調節弁（図示略）が設けられている。   The second medium water heated to about 30 ° C. by the heat exchanger 26 is introduced into the heat source fluid flow path of the evaporator 21, exchanges heat with the heat medium of the heat pump 20 and drops the temperature to about 20 ° C. Then, the water is sent to the heat exchanger 26. A part of the second medium water flows from the pipe 25 to the pipe 27 via the bypass pipe 28. As a result, the temperature of the second medium water flowing into the evaporator 21 is about 25 ° C. The bypass pipe 28 is provided with a flow rate adjustment valve (not shown).

ヒートポンプ２０の運転方法としては、例えば、第１媒体水および第２媒体水の出口温度がそれぞれ一定温度になるように、ヒートポンプ圧縮機の入力電力および循環水流量を調整する。ヒートポンプを複数系列とし、熱負荷に応じて台数制御を行ってもよい。また、図示のように、高温側および（または）低温側の循環系に熱交換器をバイパスする配管と流量制御バルブを設け、ヒートポンプ入口温度を制御するような運転を行ってもよい。   As an operation method of the heat pump 20, for example, the input power and the circulating water flow rate of the heat pump compressor are adjusted so that the outlet temperatures of the first medium water and the second medium water are constant. A plurality of heat pumps may be used, and the number control may be performed according to the heat load. Further, as shown in the figure, piping for bypassing the heat exchanger and a flow rate control valve may be provided in the high-temperature side and / or low-temperature side circulation system so as to control the heat pump inlet temperature.

図２は、第２の実施の形態に係る超純水製造装置を示している。この超純水製造装置は、図１の超純水製造装置において、熱交換器６，１０を結ぶ超純水配管９の途中に熱交換器３１を設け、超純水を熱交換器３１の被加熱流路に流し、熱交換器３１の熱源流体流路に約５６℃の温排水を配管３２を介して導入するようにしたものである。   FIG. 2 shows an ultrapure water production apparatus according to the second embodiment. This ultrapure water production apparatus is the same as the ultrapure water production apparatus shown in FIG. 1 except that a heat exchanger 31 is provided in the middle of the ultrapure water pipe 9 connecting the heat exchangers 6 and 10. The hot waste water of about 56 ° C. is introduced into the heat source fluid flow path of the heat exchanger 31 through the pipe 32 through the heated flow path.

約５６℃の温排水は、熱交換器３１で配管９の超純水を加熱することにより約４７℃に降温した後、配管２９によって熱交換器２６に供給される。   The hot waste water of about 56 ° C. is cooled to about 47 ° C. by heating the ultrapure water in the pipe 9 with the heat exchanger 31 and then supplied to the heat exchanger 26 through the pipe 29.

図２のその他の構成は図１と同様である。   The other configuration of FIG. 2 is the same as that of FIG.

図２の超純水製造装置によれば、図１の場合よりも蒸気使用量を削減することができる。ただし、温排水の水質によっては、追加した熱交換器３１の伝熱面が汚れ、伝熱性能が低下することが考えられる。温超純水の製造プロセスでは、温超純水の品質維持のため熱交換器３１の分解洗浄は不可であるため、図２のフローは、温排水に汚れが無い（または熱交換器の洗浄・汚れ除去が容易である）場合に適用できる。熱交換器３１としては、不純物のリークまたは溶出を完全に防止するため、全溶接または片側溶接タイプのチタン製プレート熱交換器を用いることが望ましい。   According to the ultrapure water production apparatus of FIG. 2, the amount of steam used can be reduced as compared with the case of FIG. However, the heat transfer surface of the added heat exchanger 31 may be soiled depending on the quality of the warm waste water, and the heat transfer performance may be reduced. In the production process of warm ultrapure water, the heat exchanger 31 cannot be disassembled and washed in order to maintain the quality of the warm ultrapure water. Therefore, the flow shown in FIG. Easy to apply). As the heat exchanger 31, in order to completely prevent leakage or elution of impurities, it is desirable to use a titanium plate heat exchanger of full welding or one side welding type.

図３は、図２において、温排水を直接に熱交換器２６に通水させる流路選択と、温排水を熱交換器３１を介して熱交換器２６に通水させる流路選択とを切り替えることができるように構成したものである。   FIG. 3 switches between the flow path selection in which the hot waste water is directly passed through the heat exchanger 26 and the flow path selection in which the warm waste water is passed through the heat exchanger 31 in FIG. It is comprised so that it can do.

即ち、温排水用配管３３は、バルブ３４、配管３５を介して配管２９に接続されている。また、配管３３は、該配管３３から分岐した配管３６、バルブ３７及び配管３８を介して熱交換器３１に接続されている。バルブ３４を開、バルブ３７を閉とすることにより、配管３３からの温排水は熱交換器２６に直接に通水される。   That is, the hot drain pipe 33 is connected to the pipe 29 via the valve 34 and the pipe 35. The pipe 33 is connected to the heat exchanger 31 through a pipe 36, a valve 37 and a pipe 38 branched from the pipe 33. By opening the valve 34 and closing the valve 37, the warm waste water from the pipe 33 is directly passed through the heat exchanger 26.

バルブ３４を閉、バルブ３７を開とすることにより、配管３３からの温排水は、熱交換器３１に通水された後、熱交換器２６に通水される。   By closing the valve 34 and opening the valve 37, the hot waste water from the pipe 33 is passed through the heat exchanger 31 and then through the heat exchanger 26.

なお、配管３３にＴＯＣ計や比抵抗計などの水質センサ３９を設け、この検出値をバルブ制御装置（図示略）に入力し、温排水の水質が良好である（例えばＴＯＣが所定濃度よりも低い）ときには、温排水を熱交換器３１，２６の順に通水し、水質が良好ではない（例えばＴＯＣ濃度が所定値よりも高い）ときには、温排水を熱交換器２６に直接に通水するようにバルブ３４，３７を制御することが好ましい。   The pipe 33 is provided with a water quality sensor 39 such as a TOC meter or a specific resistance meter, and the detected value is input to a valve control device (not shown) so that the quality of the hot waste water is good (for example, the TOC is lower than a predetermined concentration). When the water quality is low (for example, the TOC concentration is higher than a predetermined value), the warm water is directly passed through the heat exchanger 26. Thus, the valves 34 and 37 are preferably controlled.

また、配管３３に洗浄水用配管４０をバルブ４１を介して接続し、必要に応じ熱交換器３１，２６や配管を薬品や水で洗浄するようにしてもよい。   Further, the washing water pipe 40 may be connected to the pipe 33 via the valve 41, and the heat exchangers 31 and 26 and the pipe may be washed with chemicals or water as necessary.

図３のその他の構成は図２と同様である。   Other configurations in FIG. 3 are the same as those in FIG.

図３の超純水製造装置によれば、超純水の効率的な加熱と、熱交換器の汚れ防止（抑制）とを図ることができる。   According to the ultrapure water production apparatus of FIG. 3, it is possible to efficiently heat ultrapure water and prevent (suppress) contamination of the heat exchanger.

図４は、熱交換器２６の熱源流体流路に第３媒体水を循環通水するように、熱交換器４４、配管４５、熱交換器３１、配管２９、熱交換器２６、配管４６よりなる循環流路を設け、熱交換器４４の熱源流体流路に配管４７を介して約５６℃の温排水を通水し、その約２５℃の流出水を配管４８によって回収水として回収するようにしたものである。   FIG. 4 illustrates the heat exchanger 44, the pipe 45, the heat exchanger 31, the pipe 29, the heat exchanger 26, and the pipe 46 so that the third medium water is circulated through the heat source fluid flow path of the heat exchanger 26. A circulating flow path is provided, and warm drainage of about 56 ° C. is passed through the heat source fluid flow path of the heat exchanger 44 through the pipe 47, and the outflow water of about 25 ° C. is recovered as recovered water by the pipe 48. It is a thing.

熱交換器４４の被加熱流体流路を流れることにより約５１℃に加熱された第３媒体水は、配管４５を介して熱交換器３１の熱源流体流路に通水され、配管９を流れる超純水を加熱する。熱交換器３１を通過して約４７℃に降温した温排水は、配管２９を介して熱交換器２６の熱源流体流路に通水され、約２０℃に降温し、次いで配管４６を介して熱交換器４４の被加熱流体流路に戻る。熱交換器２６では約１５℃の第２媒体水を約２５℃に加熱する。   The third medium water heated to about 51 ° C. by flowing through the heated fluid flow path of the heat exchanger 44 is passed through the pipe 45 through the heat source fluid flow path of the heat exchanger 31 and flows through the pipe 9. Heat ultrapure water. The warm waste water that has passed through the heat exchanger 31 and has been cooled to about 47 ° C. is passed through the pipe 29 to the heat source fluid flow path of the heat exchanger 26, and is cooled to about 20 ° C. Return to the heated fluid flow path of the heat exchanger 44. In the heat exchanger 26, the second medium water at about 15 ° C. is heated to about 25 ° C.

この図４の超純水製造装置は、超純水の加熱効率が良く、また超純水用配管９の熱交換器３１に清浄な第３媒体水が通水されるので、該熱交換器３１の汚れ付着リスクが抑制される。   The ultrapure water production apparatus of FIG. 4 has good heating efficiency of ultrapure water, and clean third medium water is passed through the heat exchanger 31 of the pipe 9 for ultrapure water. 31 dirt adhesion risk is suppressed.

図５は、図１において、複数台のヒートポンプによって第１媒体水を加熱するよう構成すると共に、ユースポイント直前に設置されたＵＦ膜分離装置１１Ａの濃縮水も温排水として利用するよう構成した実施の形態を示している。   FIG. 5 shows an embodiment in which the first medium water is heated by a plurality of heat pumps in FIG. 1 and the concentrated water of the UF membrane separation device 11A installed immediately before the use point is also used as a hot waste water. The form of is shown.

この実施の形態では、熱交換器１０の熱源流体流路出口から流出した約５１℃の第１媒体水は、配管１２を介して中継タンク１２ａに導入される。中継タンク１２ａには、ＵＦ膜分離装置１１Ａからの濃縮水も導入される。この濃縮水は、清浄度が高い。中継タンク１２ａ内の第１媒体水は、配管１２ｂを介して第１ヒートポンプ２０Ａの凝縮器２３に流通されて約６０℃に加熱された後、配管１２ｃを介して第２ヒートポンプ２０Ｂの凝縮器２３に流通されて約６７℃に加熱され、次いで、配管１４を介して蒸気式熱交換器１５に流通されて約７５〜７６℃に加熱された後、配管１６を介して熱交換器１０の熱源流体流路入口に循環される。   In this embodiment, the first medium water at about 51 ° C. flowing out from the heat source fluid flow path outlet of the heat exchanger 10 is introduced into the relay tank 12 a via the pipe 12. Concentrated water from the UF membrane separation device 11A is also introduced into the relay tank 12a. This concentrated water is highly clean. The first medium water in the relay tank 12a is circulated to the condenser 23 of the first heat pump 20A through the pipe 12b and heated to about 60 ° C., and then the condenser 23 of the second heat pump 20B through the pipe 12c. And then heated to about 67 ° C., then passed to the steam heat exchanger 15 via the pipe 14 and heated to about 75 to 76 ° C., and then the heat source of the heat exchanger 10 via the pipe 16. Circulated to the fluid flow path inlet.

ヒートポンプ２０Ａ，２０Ｂの構成は、ヒートポンプ２０と同一である。各ヒートポンプ２０Ａ，２０Ｂの蒸発器２１には、熱交換器２６で加熱された第２媒体水が流通される。熱交換器２６の被加熱流体流路を通ることにより約４０℃に加熱された第２媒体水は、配管２７及びそれから分岐した配管２７ａ，２７ｂによって各凝縮器２１に流通され、ヒートポンプ２０Ａ，２０Ｂの熱媒体と熱交換して降温する。各凝縮器２１から流出した約３０℃の第２媒体水は、配管２５ａ，２５ｂを介して合流タンク２５ｃに導入される。合流タンク２５ｃ内の第２媒体水は、ポンプ２５ｄ及び配管２５ｅを介して熱交換器２６の被加熱流体流路に戻る。   The configuration of the heat pumps 20A and 20B is the same as that of the heat pump 20. The second medium water heated by the heat exchanger 26 is circulated through the evaporator 21 of each heat pump 20A, 20B. The second medium water heated to about 40 ° C. by passing through the heated fluid flow path of the heat exchanger 26 is circulated to each condenser 21 through the pipe 27 and the pipes 27a and 27b branched therefrom, and the heat pumps 20A and 20B. The temperature is lowered by exchanging heat with the heat medium. About 30 degreeC 2nd medium water which flowed out from each condenser 21 is introduce | transduced into the confluence | merging tank 25c via piping 25a, 25b. The second medium water in the merging tank 25c returns to the heated fluid flow path of the heat exchanger 26 via the pump 25d and the pipe 25e.

熱交換器２６の熱源流体流路には、温排水タンク９５からの約５６℃の温排水が配管２９を介して導入される。熱交換器２６で熱交換して約３２℃に降温した排水は、配管３０を介して回収水として回収される。   About 56 ° C. warm drainage from the warm drainage tank 95 is introduced into the heat source fluid flow path of the heat exchanger 26 through the pipe 29. Waste water that has been heat-exchanged by the heat exchanger 26 and has been cooled to about 32 ° C. is recovered as recovered water via the pipe 30.

温排水タンク９５へは、ユースポイント９０から排出される温排水が導入される。また、この実施の形態では、前記中継タンク１２ａからのオーバーフロー水も温排水タンク９５へ導入される。   The warm drainage discharged from the use point 90 is introduced into the warm drainage tank 95. In this embodiment, the overflow water from the relay tank 12 a is also introduced into the warm drainage tank 95.

図５のその他の構成は図１と同様であり、同一符号は同一部分を示している。   Other configurations in FIG. 5 are the same as those in FIG. 1, and the same reference numerals denote the same parts.

なお、図１〜６の各超純水製造装置において、一次純水温度２５℃、サブシステム４からの超純水温度３０℃、温超純水温度６０℃、温排水温度５６℃、回収水温度２５℃、蒸気式熱交換器１５からの第１媒体水温度８５℃の温度条件とし、種々の流量条件でシミュレーションを行った。その結果、図６の超純水製造装置の熱源コストを１００％とした場合、図１の超純水製造装置の熱源コストは７５％、図２の超純水製造装置の熱源コストは６３％、図４の熱源コストは６５％であった。   1 to 6, the primary pure water temperature is 25 ° C., the ultra pure water temperature from the subsystem 4 is 30 ° C., the warm ultra pure water temperature is 60 ° C., the hot waste water temperature is 56 ° C., and the recovered water temperature is 25 ° C. The simulation was performed under various flow conditions under the condition that the temperature of the first medium water temperature from the steam heat exchanger 15 was 85 ° C. As a result, when the heat source cost of the ultrapure water production apparatus of FIG. 6 is 100%, the heat source cost of the ultrapure water production apparatus of FIG. 1 is 75%, and the heat source cost of the ultrapure water production apparatus of FIG. The heat source cost in FIG. 4 was 65%.

上記実施の形態は本発明の一例であり、本発明は図示以外の形態とされてもよい。例えば、熱交換器１０で加熱された超純水を加熱するように配管１１に蒸気式熱交換器が設けられてもよい。   The above-described embodiment is an example of the present invention, and the present invention may be configured other than illustrated. For example, a steam heat exchanger may be provided in the pipe 11 so as to heat ultrapure water heated by the heat exchanger 10.

２ サブタンク
４ サブシステム
６，１０，１３，１５，２６，３１，４４ 熱交換器
２０，２０Ａ，２０Ｂ ヒートポンプ
２１ 蒸発器
２２ ポンプ
２３ 凝縮器
２４ 膨張弁
３９ 水質センサ 2 Sub tank 4 Sub system 6, 10, 13, 15, 26, 31, 44 Heat exchanger 20, 20A, 20B Heat pump 21 Evaporator 22 Pump 23 Condenser 24 Expansion valve 39 Water quality sensor

Claims (8)

一次純水製造装置と、
該一次純水製造装置からの一次純水を処理して超純水を製造する二次純水製造装置と、
該二次純水製造装置からの超純水を加熱するための、ユースポイントからの戻り水を熱源とする第１熱交換器と、
該第１熱交換器で加熱された超純水をさらに加熱する加熱手段とを有し、加熱された超純水をユースポイントに供給する超純水製造装置において、
前記加熱手段は、
前記第１熱交換器で加熱された超純水が被加熱流体流路に通水される第２熱交換器と、
該第２熱交換器の熱源流体流路に伝熱媒体としての第１媒体水を循環流通させる第１循環流路と、
該第１循環流路を流れる第１媒体水を、温排水の熱によって加熱する第１媒体水加熱装置と、
該第１媒体水加熱装置で加熱された第１媒体水を蒸気によって加熱する第３熱交換器とを備えたことを特徴とする超純水製造装置。 Primary pure water production equipment,
A secondary pure water production apparatus for producing ultrapure water by treating primary pure water from the primary pure water production apparatus;
A first heat exchanger for heating the ultrapure water from the secondary pure water production apparatus using the return water from the use point as a heat source;
In the ultrapure water production apparatus that has heating means for further heating the ultrapure water heated by the first heat exchanger and supplies the heated ultrapure water to the use point,
The heating means includes
A second heat exchanger in which ultrapure water heated by the first heat exchanger is passed through the heated fluid channel;
A first circulation channel for circulating the first medium water as a heat transfer medium in the heat source fluid channel of the second heat exchanger;
A first medium water heating device for heating the first medium water flowing through the first circulation flow path by the heat of the warm waste water;
An ultrapure water production apparatus comprising: a third heat exchanger that heats the first medium water heated by the first medium water heating apparatus with steam. 請求項１において、前記第１媒体水加熱装置は、凝縮器、蒸発器、ポンプ及び膨張弁を備えたヒートポンプを有しており、
該凝縮器は、該第１媒体水を加熱するように前記第１循環流路に設置されており、
該蒸発器は、第２媒体水が循環される第２循環流路に設置されており、
該第２循環流路には、前記温排水の熱によって第２媒体水を加熱するための第２媒体水加熱装置が設けられていることを特徴とする超純水製造装置。 In Claim 1, the 1st medium water heating device has a heat pump provided with a condenser, an evaporator, a pump, and an expansion valve,
The condenser is installed in the first circulation channel so as to heat the first medium water,
The evaporator is installed in a second circulation channel through which the second medium water is circulated,
The ultrapure water production apparatus, wherein the second circulation channel is provided with a second medium water heating device for heating the second medium water by the heat of the warm waste water. 請求項２において、前記第２媒体水加熱装置は、前記温排水が熱源流体流路に通水される第５熱交換器であることを特徴とする超純水製造装置。   3. The ultrapure water production apparatus according to claim 2, wherein the second medium water heating device is a fifth heat exchanger in which the hot waste water is passed through a heat source fluid flow path. 請求項３において、前記第１熱交換器と第２熱交換器との間に、前記超純水を加熱するための第６熱交換器が設置されており、
前記温排水を、第６熱交換器の熱源流体流路に通水させてから第５熱交換器の熱源流体流路に通水させるための温排水流路が設けられていることを特徴とする超純水製造装置。 In Claim 3, the 6th heat exchanger for heating the ultra-pure water is installed between the 1st heat exchanger and the 2nd heat exchanger,
A hot drainage channel is provided for allowing the hot drainage to pass through the heat source fluid passage of the sixth heat exchanger and then to the heat source fluid passage of the fifth heat exchanger. Ultrapure water production equipment. 請求項４において、前記温排水を前記第６熱交換器を経て第５熱交換器に通水させる第１の流路選択と、温排水を前記第６熱交換器を迂回して第５熱交換器に通水させる第２の流路選択とを切り替えるための流路切替手段が設けられていることを特徴とする超純水製造装置。   In Claim 4, 5th heat bypassing the said 6th heat exchanger and the 1st flow path selection which makes the said 5th heat exchanger pass the said warm wastewater through the 6th heat exchanger, and 5th heat An ultrapure water production apparatus, characterized in that a flow path switching means for switching between selection of a second flow path for passing water through the exchanger is provided. 請求項５において、前記温排水の水質を測定する水質センサを設け、該水質センサの検出水質が所定値よりも良好な場合には前記第１の流路選択とし、検出水質が該所定値よりも不良である場合には前記第２の流路選択とする制御手段を備えたことを特徴とする超純水製造装置。   6. The water quality sensor according to claim 5, wherein a water quality sensor for measuring the quality of the warm waste water is provided, and when the water quality detected by the water quality sensor is better than a predetermined value, the first flow path is selected, and the detected water quality is higher than the predetermined value. If it is also defective, an ultrapure water production apparatus comprising control means for selecting the second flow path. 請求項２において、前記第２媒体水加熱装置は、第３媒体水が熱源流体流路に通水される第５熱交換器であり、
該第５熱交換器の熱源流体流路に第３媒体水を循環流通させるための第３循環流路が設けられており、
該第３循環流路に、前記温排水によって第３媒体水を加熱する第７熱交換器が設置されていることを特徴とする超純水製造装置。 In Claim 2, the second medium water heating device is a fifth heat exchanger in which the third medium water is passed through the heat source fluid flow path,
A third circulation channel for circulating the third medium water in the heat source fluid channel of the fifth heat exchanger is provided;
The apparatus for producing ultrapure water, wherein a seventh heat exchanger for heating the third medium water by the warm waste water is installed in the third circulation channel. 請求項７において、前記第１熱交換器と第２熱交換器との間に、前記超純水を加熱するための第６熱交換器が設置されており、
前記第３循環流路は、前記第７熱交換器で加熱された第３媒体水を該第６熱交換器の熱源流体流路を経て第５熱交換器の熱源流体流路に通水させるように設けられていることを特徴とする超純水製造装置。 In Claim 7, the 6th heat exchanger for heating the ultrapure water is installed between the 1st heat exchanger and the 2nd heat exchanger,
The third circulation channel causes the third medium water heated by the seventh heat exchanger to pass through the heat source fluid channel of the sixth heat exchanger and the heat source fluid channel of the fifth heat exchanger. An ultrapure water production apparatus characterized by being provided.
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