JP2012502810A - 立方晶窒化ホウ素セラミック複合体およびその製造方法 - Google Patents
立方晶窒化ホウ素セラミック複合体およびその製造方法 Download PDFInfo
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- JP2012502810A JP2012502810A JP2011527426A JP2011527426A JP2012502810A JP 2012502810 A JP2012502810 A JP 2012502810A JP 2011527426 A JP2011527426 A JP 2011527426A JP 2011527426 A JP2011527426 A JP 2011527426A JP 2012502810 A JP2012502810 A JP 2012502810A
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- silicon nitride
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- 239000000919 ceramic Substances 0.000 title claims abstract description 29
- 229910052582 BN Inorganic materials 0.000 title claims abstract description 13
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000002131 composite material Substances 0.000 title abstract description 19
- 239000006104 solid solution Substances 0.000 claims abstract description 10
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 40
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 38
- 239000000203 mixture Substances 0.000 claims description 36
- 239000000843 powder Substances 0.000 claims description 25
- 239000011153 ceramic matrix composite Substances 0.000 claims description 22
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 21
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical class [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 20
- 238000005520 cutting process Methods 0.000 claims description 19
- 239000000654 additive Substances 0.000 claims description 16
- 230000000996 additive effect Effects 0.000 claims description 15
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 14
- 229910052727 yttrium Inorganic materials 0.000 claims description 11
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 11
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 10
- 150000002602 lanthanoids Chemical class 0.000 claims description 10
- 238000005245 sintering Methods 0.000 claims description 9
- 229910052706 scandium Inorganic materials 0.000 claims description 6
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 6
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- HJGMWXTVGKLUAQ-UHFFFAOYSA-N oxygen(2-);scandium(3+) Chemical class [O-2].[O-2].[O-2].[Sc+3].[Sc+3] HJGMWXTVGKLUAQ-UHFFFAOYSA-N 0.000 claims 3
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 claims 1
- 239000011159 matrix material Substances 0.000 abstract description 14
- 150000004767 nitrides Chemical class 0.000 abstract description 6
- 238000003754 machining Methods 0.000 abstract description 5
- -1 ferrous metals Chemical class 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 description 15
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- 229910010271 silicon carbide Inorganic materials 0.000 description 8
- 229910001018 Cast iron Inorganic materials 0.000 description 7
- 238000003801 milling Methods 0.000 description 7
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 6
- 239000010439 graphite Substances 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical group [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- RUDFQVOCFDJEEF-UHFFFAOYSA-N oxygen(2-);yttrium(3+) Chemical group [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000006187 pill Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 2
- 229910001208 Crucible steel Inorganic materials 0.000 description 1
- 229910001141 Ductile iron Inorganic materials 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910005091 Si3N Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 description 1
- 229910001562 pearlite Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical group C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 229910003454 ytterbium oxide Inorganic materials 0.000 description 1
- 229940075624 ytterbium oxide Drugs 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
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Abstract
【選択図】なし
Description
本願は、2008年9月17日付け米国仮特許出願番号61/097,777に関連しその利益を請求する。
5.7グラムのSi3N4、21.0グラムのAl2O3、8.4グラムのAlN、9.0グラムのcBNと、0.75グラムのY2O3を、30グラムのイソプロパノール、400グラムのWCミルメディア(1 / 4インチ径の球)と一緒に、遊星ボールミル(レッチェのPM400)の500 mLのミル粉砕ボウルで、20分間200 rpmで、5分ごとに回転方向を逆転させながら、ミル粉砕した。スラリーは約2時間、室温で、空気中で乾燥させ、その後、ふるい(50メッシュのふるい)にかけてミルメディアから粉体を分離した。粉末を窒素を流しながら1時間1000℃まで加熱し、その後高圧セルに入れた。次に、粉末を炭化物基板上に置き、約30分1200℃50キロバールでプレスした。
8グラムのSi3N4、68グラムのAl2O3、23グラムのcBNと、1グラムのY2O3を、WCミルメディアと一緒にイソプロパノール中で、4時間ボールミル粉砕した。スラリーは、約100℃で乾燥し、粉末を顆粒40メッシュスクリーンを通して篩にかけ、粉砕媒体を除去して、粒状化(granulate)した。粉末は、炭化物基板上に置いて、上記のようにプレスした。上記のように、工具を作製し、テストした。約10分の工具寿命と、0.008"までの側面摩耗を測定した。
市販の工具を、上記のように黒鉛鋳鉄成型体の機械加工で試験した。これらの工具の材料は一般的に、それぞれのメーカーが黒鉛鋳鉄成型体の機械加工用に推奨しているものである。ベータ相Si3Nで構成された工具は、約2.5分の工具寿命を示した。約60%のCBN- 40%のTiCを有するcBNのベースの工具は、約2分の工具寿命であった。
その他の切削工具を、表1に示す組成で調製した。
9.0グラムのSiCウィスカを、50mLプロパノールおよび400グラムWCのミルメディア(1 / 4インチ径の球)と一緒に、遊星ボールミルの500 mLのミル粉砕ボウルで、約1分間約100 rpmでミル粉砕した。次に、4.3グラムのSi2O3, 4.3グラムのSi3N4, 10 グラムのcBN (2.6 マイクロメートルメッシュ), および2.4グラムのAl (粉末)をミル粉砕ボウルに加え、約20分間100 rpmで、5分ごとに回転方向を逆転させながら、ミル粉砕した。スラリーは約12時間室温で、空気中で乾燥させ、その後、篩(20メッシュのふるい)にかけ、ミルメディアから粉体を分離した。セラミック粉末は、グラフォイルライナーのついたソルトチューブ(1インチの内径、1.5インチの外径)に入れ、2つのグラファイトピルの間で、約50キロバール、30分1200℃でプレスした。次に、試料を研磨し、光学顕微鏡下で観察し、図2に示すようにマトリックス中にSiCウィスカが存在することを確認した。スケールバーは10μmである。右の画像は、偏光光学系で撮影し、左の画像は、拡張機能なしで撮影した。ウィスカを容易に観察することができる。この本発明の材料から作られた工具は例1で説明した方法でテストし、窒化チタンコーティングがないことを除きKY3400と同じ工具材料である、市販の工具(KY3500)の性能と比較した。本発明の工具の工具寿命は、KY3500工具の5倍超であった。
表2に示す組成物を、例1に記載の手順に従って、ミル粉砕し、焼結した。得られた焼結材料について、ビッカースインデンター(Instron製Wilson-Wolpert Tukon 2100B装置)を使用し、5キロの負荷を使用して、硬さを表わした。結果を、Design Expertソフトウェアパッケージを用いて分析し、組成物と硬さの関係を得た。
本発明が特定の実施形態との関連で記載されているが、上記の詳細な説明と一貫性をもって、開示された発明に多くの代替、修正、変形をすることができることは当業者に明らかである。また、様々な開示された例示的な実施形態の一態様は、他の開示された実施形態または代替となるものと組み合わせて用いられ、ここでは明示的には記載されていない追加的な実施形態を生じることができ、それは請求の範囲の発明を組み入れ、且つ意図される用途または性能要求により適合したものであることも、当業者に明らかである。したがって、本発明の精神に含まれる、そのようなすべての代替、修正、および変形が特許請求の範囲内に包含されることを意図している。
Claims (20)
- 立方晶窒化ホウ素(cBN);
酸化アルミニウム、および
窒化ケイ素、を含む焼結したセラミックマトリックス複合体。 - 窒化アルミニウムをさらに含む、請求項1に記載のセラミックマトリックス複合体。
- 窒化ケイ素および酸化アルミニウムの固溶体をさらに含む、請求項1に記載のセラミックマトリックス複合体。
- シリコンアルミニウム酸窒化物の固溶体をさらに含む、請求項1に記載のセラミックマトリックス複合体。
- シリコンアルミニウム酸窒化物の固溶体をさらに含む、請求項2に記載のセラミックマトリックス複合体。
- 窒化ケイ素、酸化アルミニウムおよび窒化アルミニウムの固溶体をさらに含む、請求項2に記載のセラミックマトリックス複合体。
- ランタノイド、イットリウムまたはスカンジウムの酸化物をさらに含む、請求項1に記載のセラミックマトリックス複合体。
- 約10 wt%から約20 wt%のcBN、約40 wt%から約80 wt%の酸化アルミニウム、および約10 wt%から約50 wt%の窒化ケイ素を含む、請求項1に記載のセラミックマトリックス複合体。
- 約15 wt%までのセラミックウィスカをさらに含む、請求項8に記載のセラミックマトリックス複合体。
- ランタノイド、イットリウムまたはスカンジウムの酸化物から選択される約5 wt%以下の添加物をさらに含む、請求項9に記載のセラミックマトリックス複合体。
- 約10 wt%から約20 wt%の立方晶窒化ホウ素(cBN)、
約40 wt%から約80 wt%の酸化アルミニウム、
約10 wt%から約50 wt%の窒化ケイ素、および
ランタノイド、イットリウムまたはスカンジウムの酸化物から選択される約5 wt%以下の添加物、を含む、焼結したセラミックマトリックス複合体。 - cBN、酸化アルミニウム、および窒化ケイ素を含む粉末を提供し、
粉末を配合して混合物を形成し、および
該混合物を少なくとも約1200℃の温度と少なくとも40 kbarの圧力で焼結して焼結体を形成する工程を含む、セラミックマトリックス複合体の製造方法。 - 窒化アルミニウムを添加する工程をさらに含む、請求項12に記載の方法。
- ランタノイド、イットリウムまたはスカンジウムの酸化物を添加する工程をさらに含む、請求項12に記載の方法。
- 該焼結体を切削工具へ製造する工程をさらに含む、請求項12に記載の方法。
- 該粉末に炭化ケイ素ウィスカを添加する工程をさらに含む、請求項12に記載の方法。
- 該粉末に窒化ケイ素ウィスカを添加する工程をさらに含む、請求項12に記載の方法。
- 該粉末にセラミックウィスカを添加する工程をさらに含む、請求項12に記載の方法。
- 請求項12に記載の方法から製造された、約10 wt%から約20 wt%の立方晶窒化ホウ素(cBN)、約40 wt%から約80 wt%の酸化アルミニウム、約10 wt%から約50 wt%の窒化ケイ素、およびランタノイド、イットリウムまたはスカンジウムの酸化物から選択される約5 wt%以下の添加物、を含む、焼結したセラミックマトリックス複合体。
- 請求項12に記載の方法から製造された、工具。
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