JP2012199594A - リソグラフィ装置のためのレベルセンサの構成及びデバイス製造方法 - Google Patents
リソグラフィ装置のためのレベルセンサの構成及びデバイス製造方法 Download PDFInfo
- Publication number
- JP2012199594A JP2012199594A JP2012160478A JP2012160478A JP2012199594A JP 2012199594 A JP2012199594 A JP 2012199594A JP 2012160478 A JP2012160478 A JP 2012160478A JP 2012160478 A JP2012160478 A JP 2012160478A JP 2012199594 A JP2012199594 A JP 2012199594A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- radiation
- level sensor
- lithographic apparatus
- grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7034—Leveling
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
【解決手段】レベルセンサはリソグラフィ装置において基板表面高さを測定する。レベルセンサには、検出用の放射を基板に発する光源と、基板から反射された放射を測定するための検出器ユニットと、が設けられている。光源は、リソグラフィ装置において基板を処理するために使用されるレジストが反応する波長域の検出用放射を発する。
【選択図】図4
Description
放射ビームB(例えばUV放射またはDUV放射)を調整するよう構成されている照明光学系(イルミネータ)ILと、
パターニングデバイス(例えばマスク)MAを支持するよう構成され、いくつかのパラメータに従ってパターニングデバイスを正確に位置決めするよう構成されている第1の位置決め装置PMに接続されている支持構造(例えばマスクテーブル)MTと、
基板(例えばレジストでコーティングされたウエーハ)Wを保持するよう構成され、いくつかのパラメータに従って基板を正確に位置決めするよう構成されている第2の位置決め装置PWに接続されている基板テーブル(例えばウエーハテーブル)WTと、
パターニングデバイスMAにより放射ビームBに付与されたパターンを基板Wの(例えば1つまたは複数のダイからなる)目標部分Cに投影するよう構成されている投影系(例えば屈折投影レンズ系)PSと、を備える。
Claims (12)
- リソグラフィ装置における基板の感光層表面の位置を測定するためのレベルセンサであって、
基板からの反射された放射を動作中に測定するための放射検出器を備え、
前記放射検出器は、基板を処理するために使用される感光層に反応する波長範囲の放射を測定し、
前記放射検出器は、三角形格子形状をもつ刻線格子を備え、該刻線格子は、光源の発する放射の波長よりも大きいピッチを有することを特徴とするレベルセンサ。 - 前記光源と基板との間に配置された投影用の格子をさらに備え、前記刻線格子のピッチと前記投影用の格子のピッチとが等しいことを特徴とする請求項1に記載のレベルセンサ。
- 前記放射検出器は、光源波長の関数である分光放射照度プロファイルとは実質的に反比例であり波長の関数である感度プロファイルを有する素子を備えることを特徴とする請求項1または2に記載のレベルセンサ。
- 前記三角形格子形状は、交互に配列された正のくさびと負のくさびとによって形成されていることを特徴とする請求項1から3のいずれかに記載のレベルセンサ。
- 基板を支持するための基板支持部をさらに備え、該基板支持部は、前記光源の放射が前記検出器へと基板により鏡面反射される位置に前記表面を位置決めすることを特徴とする請求項1から4のいずれかに記載のレベルセンサ。
- 前記光源は、500nm未満の広帯域の放射を発するよう構成されていることを特徴とする請求項1から5のいずれかに記載のレベルセンサ。
- 前記波長範囲は400nm未満の放射を含むことを特徴とする請求項1から6のいずれかに記載のレベルセンサ。
- 基板の感光層表面の受光する放射の線量が予め定められた水準を下回ることを特徴とする請求項1から7のいずれかに記載のレベルセンサ。
- 前記予め定められた水準は、1×10−8J/m2であることを特徴とする請求項8に記載のレベルセンサ。
- 基板の感光層表面の位置を測定するよう構成されているリソグラフィ装置であって、
前記リソグラフィ装置は、基板により反射された化学線に基づいて高さを測定するよう構成されており、
前記リソグラフィ装置は、露光放射の放射ビームを調整する照明系を備え、該照明系は、レベルセンサにより与えられる放射の線量を補正するための露光レベルのオフセットを与えるよう構成されていることを特徴とするリソグラフィ装置。 - 請求項1から9のいずれかに記載のレベルセンサを備えることを特徴とする請求項10に記載のリソグラフィ装置。
- 前記リソグラフィ装置は、基板の目標部分に露光放射のパターン付き放射ビームを投影する投影系をさらに備え、基板の感光層表面の受光する放射の線量が予め定められた水準以下であり、該水準は、前記投影系を出射することが許容されている迷光の大きさに依存することを特徴とする請求項10または11に記載のリソグラフィ装置。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16012609P | 2009-03-13 | 2009-03-13 | |
US61/160,126 | 2009-03-13 | ||
US28814909P | 2009-12-18 | 2009-12-18 | |
US61/288,149 | 2009-12-18 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010052645A Division JP5192505B2 (ja) | 2009-03-13 | 2010-03-10 | リソグラフィ装置のためのレベルセンサの構成及びデバイス製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012199594A true JP2012199594A (ja) | 2012-10-18 |
JP5600145B2 JP5600145B2 (ja) | 2014-10-01 |
Family
ID=42174070
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010052645A Active JP5192505B2 (ja) | 2009-03-13 | 2010-03-10 | リソグラフィ装置のためのレベルセンサの構成及びデバイス製造方法 |
JP2012160478A Active JP5600145B2 (ja) | 2009-03-13 | 2012-07-19 | リソグラフィ装置のためのレベルセンサの構成及びデバイス製造方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010052645A Active JP5192505B2 (ja) | 2009-03-13 | 2010-03-10 | リソグラフィ装置のためのレベルセンサの構成及びデバイス製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8842293B2 (ja) |
EP (1) | EP2228685B1 (ja) |
JP (2) | JP5192505B2 (ja) |
KR (1) | KR101198347B1 (ja) |
CN (1) | CN101840166B (ja) |
SG (1) | SG165245A1 (ja) |
TW (1) | TWI431439B (ja) |
Families Citing this family (110)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5162006B2 (ja) * | 2011-06-01 | 2013-03-13 | キヤノン株式会社 | 検出装置、露光装置、および、デバイスの製造方法 |
NL2009004A (en) * | 2011-07-20 | 2013-01-22 | Asml Netherlands Bv | Inspection method and apparatus, and lithographic apparatus. |
NL2009273A (en) | 2011-08-31 | 2013-03-04 | Asml Netherlands Bv | Level sensor arrangement for lithographic apparatus, lithographic apparatus and device manufacturing method. |
WO2015131969A1 (en) | 2014-03-04 | 2015-09-11 | Asml Netherlands B.V. | Lithographic apparatus with data processing apparatus |
EP3155483A1 (en) | 2014-06-12 | 2017-04-19 | ASML Netherlands B.V. | Lithographic apparatus and exposure method |
WO2017005419A1 (en) | 2015-07-03 | 2017-01-12 | Asml Netherlands B.V. | Lithographic apparatus, control method and computer program product |
KR102387289B1 (ko) | 2015-07-20 | 2022-04-14 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치를 제어하는 방법, 리소그래피 장치 및 디바이스 제조 방법 |
NL2017296A (en) | 2015-08-12 | 2017-02-16 | Asml Netherlands Bv | Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method |
JP6540813B2 (ja) | 2015-09-15 | 2019-07-10 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
CN108027572B (zh) | 2015-09-15 | 2020-09-18 | Asml荷兰有限公司 | 用于控制光刻设备的方法、光刻设备以及器件制造方法 |
US10394143B2 (en) * | 2015-10-15 | 2019-08-27 | Asml Netherlands B.V. | Topography measurement system |
JP6600749B2 (ja) | 2015-12-22 | 2019-10-30 | エーエスエムエル ネザーランズ ビー.ブイ. | トポグラフィ測定システム、測定装置、放射ソース、およびリソグラフィ装置 |
US11029614B2 (en) | 2016-07-26 | 2021-06-08 | Asml Netherlands B.V. | Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus |
NL2019719A (en) | 2016-11-02 | 2018-05-23 | Asml Netherlands Bv | Height sensor, lithographic apparatus and method for manufacturing devices |
EP3358415A1 (en) | 2017-02-07 | 2018-08-08 | ASML Netherlands B.V. | Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method |
CN113946105A (zh) | 2017-02-22 | 2022-01-18 | Asml荷兰有限公司 | 计算量测法 |
KR102527672B1 (ko) | 2018-04-06 | 2023-04-28 | 에이에스엠엘 네델란즈 비.브이. | 비선형 광학계를 갖는 검사 장치 |
JP7051193B2 (ja) * | 2018-04-11 | 2022-04-11 | エーエスエムエル ネザーランズ ビー.ブイ. | レベルセンサ及びリソグラフィ装置 |
EP3647874A1 (en) | 2018-11-05 | 2020-05-06 | ASML Netherlands B.V. | Optical fibers and production methods therefor |
SG11202103803QA (en) | 2018-10-24 | 2021-05-28 | Asml Netherlands Bv | Optical fibers and production methods therefor |
WO2020099050A1 (en) | 2018-11-16 | 2020-05-22 | Asml Netherlands B.V. | Method for monitoring lithographic apparatus |
EP3654104A1 (en) | 2018-11-16 | 2020-05-20 | ASML Netherlands B.V. | Method for monitoring lithographic apparatus |
CN109341554B (zh) * | 2018-12-24 | 2020-09-04 | 上海集成电路研发中心有限公司 | 一种测量膜厚的装置及方法 |
EP3696606A1 (en) | 2019-02-15 | 2020-08-19 | ASML Netherlands B.V. | A metrology apparatus with radiation source having multiple broadband outputs |
EP3702840A1 (en) | 2019-03-01 | 2020-09-02 | ASML Netherlands B.V. | Alignment method and associated metrology device |
EP3705942A1 (en) | 2019-03-04 | 2020-09-09 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based optical component for broadband radiation generation |
EP3715944A1 (en) | 2019-03-25 | 2020-09-30 | ASML Netherlands B.V. | Frequency broadening apparatus and method |
EP3715945A1 (en) | 2019-03-25 | 2020-09-30 | ASML Netherlands B.V. | Frequency broadening apparatus and method |
EP3719551A1 (en) | 2019-04-03 | 2020-10-07 | ASML Netherlands B.V. | Optical fiber |
WO2020200637A1 (en) | 2019-04-03 | 2020-10-08 | Asml Netherlands B.V. | Optical fiber |
EP3739389A1 (en) | 2019-05-17 | 2020-11-18 | ASML Netherlands B.V. | Metrology tools comprising aplanatic objective singlet |
EP3767347A1 (en) | 2019-07-17 | 2021-01-20 | ASML Netherlands B.V. | Mounted hollow-core fibre arrangement |
EP3754389A1 (en) | 2019-06-21 | 2020-12-23 | ASML Netherlands B.V. | Mounted hollow-core fibre arrangement |
EP3758168A1 (en) | 2019-06-25 | 2020-12-30 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based optical component for broadband radiation generation |
CN113994265A (zh) | 2019-07-08 | 2022-01-28 | Asml荷兰有限公司 | 用于确定辐射斑的中心的方法、传感器和平台设备 |
EP3796080A1 (en) | 2019-09-18 | 2021-03-24 | ASML Netherlands B.V. | Radiation source |
KR20220024908A (ko) | 2019-07-24 | 2022-03-03 | 에이에스엠엘 네델란즈 비.브이. | 방사선 소스 |
EP3786702A1 (en) | 2019-09-02 | 2021-03-03 | ASML Netherlands B.V. | Mode control of photonic crystal fiber based broadband light sources |
WO2021043593A1 (en) | 2019-09-02 | 2021-03-11 | Asml Netherlands B.V. | Mode control of photonic crystal fiber based broadband light sources |
WO2021052801A1 (en) | 2019-09-18 | 2021-03-25 | Asml Netherlands B.V. | Improved broadband radiation generation in hollow-core fibres |
EP3805857A1 (en) | 2019-10-09 | 2021-04-14 | ASML Netherlands B.V. | Improved broadband radiation generation in hollow-core fibres |
EP3809190A1 (en) | 2019-10-14 | 2021-04-21 | ASML Netherlands B.V. | Method and apparatus for coherence scrambling in metrology applications |
JP2022553545A (ja) | 2019-10-24 | 2022-12-23 | エーエスエムエル ネザーランズ ビー.ブイ. | 広帯域放射発生用の中空コアフォトニック結晶ファイバに基づく光学部品 |
EP3839586A1 (en) | 2019-12-18 | 2021-06-23 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based optical component for broadband radiation generation |
DK3819267T3 (da) | 2019-11-07 | 2022-08-29 | Asml Netherlands Bv | Fremgangsmåde til fremstilling af en kapillar til en fotonisk krystalfiber med hul kerne |
EP3819266A1 (en) | 2019-11-07 | 2021-05-12 | ASML Netherlands B.V. | Method of manufacture of a capillary for a hollow-core photonic crystal fiber |
EP3839635A1 (en) | 2019-12-17 | 2021-06-23 | ASML Netherlands B.V. | Dark field digital holographic microscope and associated metrology method |
WO2021121733A1 (en) | 2019-12-17 | 2021-06-24 | Asml Netherlands B.V. | Dark field digital holographic microscope and associated metrology method |
KR20220103772A (ko) | 2019-12-18 | 2022-07-22 | 에이에스엠엘 네델란즈 비.브이. | 통합 회로 및 관련 장치의 제조 시에 측정값을 보정하기 위한 방법 |
EP3851915A1 (en) | 2020-01-14 | 2021-07-21 | ASML Netherlands B.V. | Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses |
EP3851904B1 (en) | 2020-01-15 | 2023-02-01 | ASML Netherlands B.V. | Method, assembly, and apparatus for improved control of broadband radiation generation |
EP3865931A1 (en) | 2020-02-12 | 2021-08-18 | ASML Netherlands B.V. | Method, assembly, and apparatus for improved control of broadband radiation generation |
EP3876036A1 (en) | 2020-03-04 | 2021-09-08 | ASML Netherlands B.V. | Vibration isolation system and associated applications in lithography |
EP3889681A1 (en) | 2020-03-31 | 2021-10-06 | ASML Netherlands B.V. | An assembly including a non-linear element and a method of use thereof |
KR20220163476A (ko) | 2020-05-04 | 2022-12-09 | 에이에스엠엘 네델란즈 비.브이. | 기판의 표면에 대한 레벨 데이터를 생성하기 위한 시스템 및 방법 |
EP3913429A1 (en) | 2020-05-19 | 2021-11-24 | ASML Netherlands B.V. | A supercontinuum radiation source and associated metrology devices |
IL299122A (en) | 2020-07-08 | 2023-02-01 | Asml Netherlands Bv | Broadband radiation generator based on hollow fibers with extended fiber life |
EP3936936A1 (en) | 2020-07-08 | 2022-01-12 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator with extended fiber lifetime |
EP3964892A1 (en) | 2020-09-02 | 2022-03-09 | Stichting VU | Illumination arrangement and associated dark field digital holographic microscope |
EP3964809A1 (en) | 2020-09-02 | 2022-03-09 | Stichting VU | Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses |
EP3988996A1 (en) | 2020-10-20 | 2022-04-27 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
IL300587A (en) | 2020-09-03 | 2023-04-01 | Asml Netherlands Bv | Photonic crystal radiation generator based on broadband hollow crystal fibers |
EP3978964A1 (en) | 2020-10-01 | 2022-04-06 | ASML Netherlands B.V. | Achromatic optical relay arrangement |
EP4009107A1 (en) | 2020-12-01 | 2022-06-08 | ASML Netherlands B.V. | Method and apparatus for imaging nonstationary object |
EP4012494A1 (en) | 2020-12-10 | 2022-06-15 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
EP4012492A1 (en) | 2020-12-10 | 2022-06-15 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
EP4036619A1 (en) | 2021-01-27 | 2022-08-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber |
WO2022161703A1 (en) | 2021-01-27 | 2022-08-04 | Asml Netherlands B.V. | Hollow-core photonic crystal fiber |
WO2022167179A1 (en) | 2021-02-04 | 2022-08-11 | Asml Netherlands B.V. | Methods and apparatuses for spatially filtering optical pulses |
EP4067968A1 (en) | 2021-03-29 | 2022-10-05 | ASML Netherlands B.V. | Methods and apparatuses for spatially filtering optical pulses |
JP2024509518A (ja) | 2021-03-16 | 2024-03-04 | エーエスエムエル ネザーランズ ビー.ブイ. | 中空コア光ファイバベースの放射源 |
EP4086698A1 (en) | 2021-05-06 | 2022-11-09 | ASML Netherlands B.V. | Hollow-core optical fiber based radiation source |
EP4060403A1 (en) | 2021-03-16 | 2022-09-21 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based multiple wavelength light source device |
EP4105696A1 (en) | 2021-06-15 | 2022-12-21 | ASML Netherlands B.V. | Optical element for generation of broadband radiation |
WO2022233547A1 (en) | 2021-05-03 | 2022-11-10 | Asml Netherlands B.V. | Optical element for generation of broadband radiation |
EP4112572A1 (en) | 2021-06-28 | 2023-01-04 | ASML Netherlands B.V. | Method of producing photonic crystal fibers |
WO2023001463A1 (en) | 2021-07-20 | 2023-01-26 | Asml Netherlands B.V. | Methods and computer programs for data mapping for low dimensional data analysis |
EP4130880A1 (en) | 2021-08-03 | 2023-02-08 | ASML Netherlands B.V. | Methods of data mapping for low dimensional data analysis |
WO2023016773A1 (en) | 2021-08-12 | 2023-02-16 | Asml Netherlands B.V. | Intensity measurements using off-axis illumination |
EP4163715A1 (en) | 2021-10-05 | 2023-04-12 | ASML Netherlands B.V. | Improved broadband radiation generation in photonic crystal or highly non-linear fibres |
IL309622A (en) | 2021-08-25 | 2024-02-01 | Asml Netherlands Bv | Improving broadband radiation generation in photonic crystal or nonlinear fibers |
EP4174568A1 (en) | 2021-11-01 | 2023-05-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
WO2023078619A1 (en) | 2021-11-02 | 2023-05-11 | Asml Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
EP4174567A1 (en) | 2021-11-02 | 2023-05-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
WO2023117393A1 (en) | 2021-12-23 | 2023-06-29 | Asml Netherlands B.V. | Projection unit for a level sensor, method of monitoring height of a substrate, and lithographic system comprising the projection unit |
EP4231090A1 (en) | 2022-02-17 | 2023-08-23 | ASML Netherlands B.V. | A supercontinuum radiation source and associated metrology devices |
WO2023160924A1 (en) | 2022-02-22 | 2023-08-31 | Asml Netherlands B.V. | Method and apparatus for reflecting pulsed radiation |
EP4242744A1 (en) | 2022-03-09 | 2023-09-13 | ASML Netherlands B.V. | Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses |
EP4246232A1 (en) | 2022-03-18 | 2023-09-20 | Stichting VU | Illumination arrangement for a metrology device and associated method |
WO2023174648A1 (en) | 2022-03-18 | 2023-09-21 | Stichting Vu | Illumination arrangement for a metrology device and associated method |
EP4273622A1 (en) | 2022-05-02 | 2023-11-08 | ASML Netherlands B.V. | Hollow-core optical fiber based radiation source |
WO2023194049A1 (en) | 2022-04-08 | 2023-10-12 | Asml Netherlands B.V. | Hollow-core optical fiber based radiation source |
EP4289798A1 (en) | 2022-06-07 | 2023-12-13 | ASML Netherlands B.V. | Method of producing photonic crystal fibers |
WO2023241867A1 (en) | 2022-06-16 | 2023-12-21 | Asml Netherlands B.V. | Calibration method and apparatus |
EP4300183A1 (en) | 2022-06-30 | 2024-01-03 | ASML Netherlands B.V. | Apparatus for broadband radiation generation |
WO2024018038A1 (en) | 2022-07-21 | 2024-01-25 | Asml Netherlands B.V. | System and method for counting particles on a detector during inspection |
EP4312078A1 (en) * | 2022-07-29 | 2024-01-31 | ASML Netherlands B.V. | Contamination determination |
EP4312005A1 (en) | 2022-07-29 | 2024-01-31 | Stichting VU | Method and apparatuses for fourier transform spectrometry |
EP4318131A1 (en) | 2022-08-01 | 2024-02-07 | ASML Netherlands B.V. | Sensor module, illuminator, metrology device and associated metrology method |
EP4332678A1 (en) | 2022-09-05 | 2024-03-06 | ASML Netherlands B.V. | Holographic metrology apparatus and method |
EP4336251A1 (en) | 2022-09-12 | 2024-03-13 | ASML Netherlands B.V. | A multi-pass radiation device |
EP4354200A1 (en) | 2022-10-11 | 2024-04-17 | ASML Netherlands B.V. | An aberration correction optical system |
WO2024078813A1 (en) | 2022-10-11 | 2024-04-18 | Asml Netherlands B.V. | An aberration correction optical system |
EP4361703A1 (en) | 2022-10-27 | 2024-05-01 | ASML Netherlands B.V. | An illumination module for a metrology device |
EP4372462A1 (en) | 2022-11-16 | 2024-05-22 | ASML Netherlands B.V. | A broadband radiation source |
EP4371949A1 (en) | 2022-11-17 | 2024-05-22 | ASML Netherlands B.V. | A fiber manufacturing intermediate product and method of producing photonic crystal fibers |
EP4371951A1 (en) | 2022-11-17 | 2024-05-22 | ASML Netherlands B.V. | A method of producing photonic crystal fibers |
EP4372463A1 (en) | 2022-11-21 | 2024-05-22 | ASML Netherlands B.V. | Method and source modul for generating broadband radiation |
EP4375744A1 (en) | 2022-11-24 | 2024-05-29 | ASML Netherlands B.V. | Photonic integrated circuit for generating broadband radiation |
WO2024120709A1 (en) | 2022-12-07 | 2024-06-13 | Asml Netherlands B.V. | Supercontinuum radiation source |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62223613A (ja) * | 1986-03-26 | 1987-10-01 | Toshiba Corp | 位置測定方法 |
JPH04342111A (ja) * | 1991-05-20 | 1992-11-27 | Hitachi Ltd | 投影露光方法及びその装置 |
JPH06188172A (ja) * | 1991-03-07 | 1994-07-08 | Philips Gloeilampenfab:Nv | 結像装置 |
JPH1068807A (ja) * | 1996-08-27 | 1998-03-10 | Nippon Sheet Glass Co Ltd | 回折型光学素子の製造方法 |
JP2002513166A (ja) * | 1998-04-24 | 2002-05-08 | テンプレックス テクノロジイ インコーポレイテッド | セグメント化された複合回折格子 |
Family Cites Families (65)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3344700A (en) * | 1961-05-23 | 1967-10-03 | British Aircraft Corp Ltd | Displacement measuring system |
DE2527223C2 (de) * | 1975-06-19 | 1985-06-20 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Abtastgitter für einen Schärfedetektor |
JPH07105327B2 (ja) * | 1986-06-27 | 1995-11-13 | キヤノン株式会社 | 面位置検知装置 |
US5079600A (en) * | 1987-03-06 | 1992-01-07 | Schnur Joel M | High resolution patterning on solid substrates |
US4902900A (en) * | 1987-12-21 | 1990-02-20 | Nikon Corporation | Device for detecting the levelling of the surface of an object |
JP2681649B2 (ja) | 1988-04-01 | 1997-11-26 | 株式会社トプコン | 面位置検出装置 |
JPH0237709A (ja) | 1988-07-27 | 1990-02-07 | Nikon Corp | 露光装置 |
JPH0445913A (ja) | 1990-06-14 | 1992-02-14 | Shin Etsu Chem Co Ltd | 鋼板基質用保護積層フィルム |
US5101226A (en) * | 1990-10-22 | 1992-03-31 | General Signal Corporation | Distance and tilt sensing apparatus |
US5241188A (en) * | 1991-02-01 | 1993-08-31 | Nikon Corporation | Apparatus for detecting a focussing position |
US5416562A (en) * | 1992-03-06 | 1995-05-16 | Nikon Corporation | Method of detecting a position and apparatus therefor |
JP3384038B2 (ja) | 1992-06-15 | 2003-03-10 | 株式会社ニコン | 面位置検出光学装置 |
JPH06188173A (ja) * | 1992-12-16 | 1994-07-08 | Nikon Corp | 表面位置検出装置 |
JP2770106B2 (ja) | 1992-12-22 | 1998-06-25 | 住友大阪セメント株式会社 | セメント又はセメント硬化体中の有機物の定性、定量分析法 |
KR100300618B1 (ko) * | 1992-12-25 | 2001-11-22 | 오노 시게오 | 노광방법,노광장치,및그장치를사용하는디바이스제조방법 |
JP3477777B2 (ja) | 1993-01-22 | 2003-12-10 | 株式会社日立製作所 | 投影露光装置およびその方法 |
JPH07106243A (ja) | 1993-03-15 | 1995-04-21 | Nikon Corp | 水平位置検出装置 |
US5461237A (en) * | 1993-03-26 | 1995-10-24 | Nikon Corporation | Surface-position setting apparatus |
US5581348A (en) * | 1993-07-29 | 1996-12-03 | Canon Kabushiki Kaisha | Surface inspecting device using bisected multi-mode laser beam and system having the same |
JP3265504B2 (ja) * | 1993-10-12 | 2002-03-11 | 株式会社ニコン | 露光方法及び装置、並びに半導体素子の製造方法 |
KR970002001Y1 (ko) | 1993-12-08 | 1997-03-17 | 금성일렉트론 주식회사 | 반도체 노광장비의 웨이퍼 수평도 조절장치 |
JPH0868667A (ja) | 1994-08-30 | 1996-03-12 | Canon Inc | 光学式エンコーダ装置 |
JP2771136B2 (ja) * | 1995-10-13 | 1998-07-02 | キヤノン株式会社 | 投影露光装置 |
US5969820A (en) * | 1996-06-13 | 1999-10-19 | Canon Kabushiki Kaisha | Surface position detecting system and exposure apparatus using the same |
AU7552298A (en) * | 1997-06-09 | 1998-12-30 | Nikon Corporation | Sensor and method for sensing the position of the surface of object, aligner provided with the sensor and method of manufacturing the aligner, and method of manufacturing devices by using the aligner |
JP2000082651A (ja) | 1998-09-04 | 2000-03-21 | Nec Corp | 走査露光装置及び走査露光方法 |
EP1037117A3 (en) | 1999-03-08 | 2003-11-12 | ASML Netherlands B.V. | Off-axis levelling in lithographic projection apparatus |
TW490596B (en) | 1999-03-08 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus |
US6369398B1 (en) * | 1999-03-29 | 2002-04-09 | Barry Gelernt | Method of lithography using vacuum ultraviolet radiation |
US6268923B1 (en) * | 1999-10-07 | 2001-07-31 | Integral Vision, Inc. | Optical method and system for measuring three-dimensional surface topography of an object having a surface contour |
TW522287B (en) * | 2000-01-14 | 2003-03-01 | Asml Netherlands Bv | Lithographic projection apparatus, method of calibrating a lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured thereby |
JP3958941B2 (ja) * | 2000-04-28 | 2007-08-15 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ投影装置、基板の整合マークの位置を決定するための方法およびデバイス製造方法 |
JP2002340524A (ja) * | 2001-05-16 | 2002-11-27 | Hitachi Electronics Eng Co Ltd | パターン検出方法及びパターン検出装置 |
JP3780221B2 (ja) * | 2002-03-26 | 2006-05-31 | キヤノン株式会社 | 露光方法及び装置 |
CN100555086C (zh) * | 2003-01-14 | 2009-10-28 | Asml荷兰有限公司 | 用于光刻装置的水平传感器 |
US6874510B2 (en) * | 2003-02-07 | 2005-04-05 | Lsi Logic Corporation | Method to use a laser to perform the edge clean operation on a semiconductor wafer |
JP4280523B2 (ja) | 2003-03-14 | 2009-06-17 | キヤノン株式会社 | 露光装置及び方法、デバイス製造方法 |
KR100555517B1 (ko) * | 2003-09-09 | 2006-03-03 | 삼성전자주식회사 | 스트레이 광 측정 방법 및 이를 위한 측정 시스템 |
US7113256B2 (en) * | 2004-02-18 | 2006-09-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method with feed-forward focus control |
US7265364B2 (en) * | 2004-06-10 | 2007-09-04 | Asml Netherlands B.V. | Level sensor for lithographic apparatus |
US7177012B2 (en) * | 2004-10-18 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR100593751B1 (ko) * | 2004-11-16 | 2006-06-28 | 삼성전자주식회사 | 오토 포커스 시스템, 오토 포커스 방법 및 이를 이용한노광장치 |
US7583362B2 (en) * | 2004-11-23 | 2009-09-01 | Infineon Technologies Ag | Stray light feedback for dose control in semiconductor lithography systems |
US7148494B2 (en) * | 2004-12-29 | 2006-12-12 | Asml Netherlands B.V. | Level sensor, lithographic apparatus and device manufacturing method |
US20060147821A1 (en) * | 2004-12-30 | 2006-07-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7224431B2 (en) * | 2005-02-22 | 2007-05-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7411667B2 (en) * | 2005-06-03 | 2008-08-12 | Asml Netherlands B.V. | Method for correcting disturbances in a level sensor light path |
CA2528791A1 (en) * | 2005-12-01 | 2007-06-01 | Peirong Jia | Full-field three-dimensional measurement method |
US7502096B2 (en) * | 2006-02-07 | 2009-03-10 | Asml Netherlands B.V. | Lithographic apparatus, calibration method, device manufacturing method and computer program product |
JP4315455B2 (ja) * | 2006-04-04 | 2009-08-19 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
US20080079920A1 (en) * | 2006-09-29 | 2008-04-03 | Heiko Hommen | Wafer exposure device and method |
US20080151204A1 (en) * | 2006-12-21 | 2008-06-26 | Asml Netherlands B.V. | Method for positioning a target portion of a substrate with respect to a focal plane of a projection system |
US20090051895A1 (en) * | 2007-08-24 | 2009-02-26 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system |
DE102008004762A1 (de) * | 2008-01-16 | 2009-07-30 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung |
NL1036557A1 (nl) * | 2008-03-11 | 2009-09-14 | Asml Netherlands Bv | Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface. |
EP2128701A1 (en) * | 2008-05-30 | 2009-12-02 | ASML Netherlands BV | Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process |
NL2003673A (en) * | 2008-11-21 | 2010-05-25 | Asml Netherlands Bv | Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determing the effect of thermal loads on a patterning device. |
JP5137879B2 (ja) | 2009-03-04 | 2013-02-06 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
US8488107B2 (en) * | 2009-03-13 | 2013-07-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a level sensor having multiple projection units and detection units |
US8351024B2 (en) * | 2009-03-13 | 2013-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments |
NL2005821A (en) * | 2009-12-23 | 2011-06-27 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate. |
NL2006129A (en) | 2010-03-12 | 2011-09-13 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
JP5792971B2 (ja) * | 2011-03-08 | 2015-10-14 | 任天堂株式会社 | 情報処理システム、情報処理プログラム、および情報処理方法 |
NL2009612A (en) * | 2011-11-21 | 2013-05-23 | Asml Netherlands Bv | Level sensor, a method for determining a height map of a substrate, and a lithographic apparatus. |
NL2009844A (en) * | 2011-12-22 | 2013-06-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
-
2010
- 2010-02-24 EP EP10154577.0A patent/EP2228685B1/en active Active
- 2010-03-03 SG SG201001507-1A patent/SG165245A1/en unknown
- 2010-03-10 JP JP2010052645A patent/JP5192505B2/ja active Active
- 2010-03-11 TW TW099107118A patent/TWI431439B/zh active
- 2010-03-12 US US12/722,955 patent/US8842293B2/en active Active
- 2010-03-12 CN CN2010101360561A patent/CN101840166B/zh active Active
- 2010-03-12 KR KR1020100022284A patent/KR101198347B1/ko active IP Right Grant
-
2012
- 2012-07-19 JP JP2012160478A patent/JP5600145B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62223613A (ja) * | 1986-03-26 | 1987-10-01 | Toshiba Corp | 位置測定方法 |
JPH06188172A (ja) * | 1991-03-07 | 1994-07-08 | Philips Gloeilampenfab:Nv | 結像装置 |
JPH04342111A (ja) * | 1991-05-20 | 1992-11-27 | Hitachi Ltd | 投影露光方法及びその装置 |
JPH1068807A (ja) * | 1996-08-27 | 1998-03-10 | Nippon Sheet Glass Co Ltd | 回折型光学素子の製造方法 |
JP2002513166A (ja) * | 1998-04-24 | 2002-05-08 | テンプレックス テクノロジイ インコーポレイテッド | セグメント化された複合回折格子 |
Also Published As
Publication number | Publication date |
---|---|
TWI431439B (zh) | 2014-03-21 |
JP5192505B2 (ja) | 2013-05-08 |
JP2010219528A (ja) | 2010-09-30 |
TW201042404A (en) | 2010-12-01 |
US8842293B2 (en) | 2014-09-23 |
KR101198347B1 (ko) | 2012-11-06 |
EP2228685A2 (en) | 2010-09-15 |
US20100233600A1 (en) | 2010-09-16 |
JP5600145B2 (ja) | 2014-10-01 |
CN101840166B (zh) | 2012-07-11 |
KR20100103420A (ko) | 2010-09-27 |
CN101840166A (zh) | 2010-09-22 |
EP2228685B1 (en) | 2018-06-27 |
EP2228685A3 (en) | 2014-07-30 |
SG165245A1 (en) | 2010-10-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5600145B2 (ja) | リソグラフィ装置のためのレベルセンサの構成及びデバイス製造方法 | |
JP5412528B2 (ja) | 検査方法、検査システム、基板、およびマスク | |
JP4541374B2 (ja) | 基板計測のための縮小されたスクライブレーンの使用を有するリソグラフィ装置およびデバイス製造方法 | |
JP5323875B2 (ja) | リソグラフィ装置及びデバイス製造方法 | |
JP4815305B2 (ja) | 位置合わせ測定機構及び位置合わせ測定方法 | |
JP4509131B2 (ja) | リソグラフィ装置用アライメントツール | |
JP4578495B2 (ja) | オーバーレイ測定品質表示を使用するリソグラフィ装置およびデバイス製造方法 | |
JP4745292B2 (ja) | 波面センサを含むリソグラフィ装置 | |
US11054754B2 (en) | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | |
JP2008177567A (ja) | 測定方法、検査装置およびリソグラフィ装置 | |
KR20100134113A (ko) | 정렬 타겟들을 위한 회절 요소들 | |
JP4495115B2 (ja) | リソグラフィ装置及びリソグラフィ方法 | |
CN102472979A (zh) | 用于光刻的检验方法 | |
TWI460559B (zh) | 用於微影裝置之位階感測器配置、微影裝置及器件製造方法 | |
US11314174B2 (en) | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | |
JP2006191046A (ja) | 傾斜された焦点合わせを行う方法及び露光装置、並びにそれにしたがって製造されたデバイス | |
US8675210B2 (en) | Level sensor, lithographic apparatus, and substrate surface positioning method | |
KR102668160B1 (ko) | 리소그래피 장치의 포커스 성능을 측정하는 장치들 및 패터닝 디바이스들 및 방법들, 디바이스 제조 방법 | |
EP3454127A1 (en) | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120719 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131023 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131029 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140127 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140729 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140814 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5600145 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |