JP2012058728A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
JP2012058728A
JP2012058728A JP2011166840A JP2011166840A JP2012058728A JP 2012058728 A JP2012058728 A JP 2012058728A JP 2011166840 A JP2011166840 A JP 2011166840A JP 2011166840 A JP2011166840 A JP 2011166840A JP 2012058728 A JP2012058728 A JP 2012058728A
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Japan
Prior art keywords
meth
acrylate
group
copolymer
resin
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Pending
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JP2011166840A
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English (en)
Japanese (ja)
Inventor
Ryuichi Matsuura
龍一 松浦
Kazuo Takebe
和男 武部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2011166840A priority Critical patent/JP2012058728A/ja
Publication of JP2012058728A publication Critical patent/JP2012058728A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
JP2011166840A 2010-08-10 2011-07-29 感光性樹脂組成物 Pending JP2012058728A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011166840A JP2012058728A (ja) 2010-08-10 2011-07-29 感光性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010179527 2010-08-10
JP2010179527 2010-08-10
JP2011166840A JP2012058728A (ja) 2010-08-10 2011-07-29 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
JP2012058728A true JP2012058728A (ja) 2012-03-22

Family

ID=45794143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011166840A Pending JP2012058728A (ja) 2010-08-10 2011-07-29 感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP2012058728A (zh)
KR (1) KR20120023546A (zh)
CN (1) CN102375337A (zh)
TW (1) TW201214038A (zh)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012113104A (ja) * 2010-11-24 2012-06-14 Fujifilm Corp 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
JP2012145721A (ja) * 2011-01-12 2012-08-02 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物およびカラーフィルタ
JP2012189997A (ja) * 2011-02-22 2012-10-04 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP2012220794A (ja) * 2011-04-11 2012-11-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、プリント配線板の製造方法、及びプリント配線
JP2013033221A (ja) * 2011-06-30 2013-02-14 Jsr Corp 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
JP2013083932A (ja) * 2011-09-28 2013-05-09 Jsr Corp 着色組成物、カラーフィルタ及び表示素子
JP2013242551A (ja) * 2012-04-25 2013-12-05 Sumitomo Chemical Co Ltd 感光性樹脂組成物
WO2014024951A1 (ja) * 2012-08-08 2014-02-13 旭化成イーマテリアルズ株式会社 感光性フィルム積層体、フレキシブルプリント配線板、及び、その製造方法
KR20140102145A (ko) 2013-02-13 2014-08-21 도쿄 오카 고교 가부시키가이샤 감방사선성 수지 조성물, 절연막 및 표시 장치
KR20140111940A (ko) 2013-03-12 2014-09-22 도쿄 오카 고교 가부시키가이샤 감방사선성 수지 조성물
KR20150010555A (ko) * 2013-07-19 2015-01-28 동우 화인켐 주식회사 투명화소 형성용 감광성 수지조성물
JP2016527329A (ja) * 2013-05-20 2016-09-08 常州強力先端電子材料有限公司Ｃｈａｎｇｚｈｏｕ Ｔｒｏｎｌｙ Ａｄｖａｎｃｅｄ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ Ｃｏ．，Ｌｔｄ． アクリレート系光硬化性組成物
KR20160138355A (ko) 2015-05-25 2016-12-05 도쿄 오카 고교 가부시키가이샤 감광성 조성물, 패턴 형성 방법, 경화막, 절연막, 및 표시장치
KR20170026258A (ko) 2015-08-27 2017-03-08 도쿄 오카 고교 가부시키가이샤 감광성 조성물, 패턴 형성 방법, 경화물, 및 표시 장치
JPWO2017170473A1 (ja) * 2016-03-29 2019-02-07 株式会社Adeka 光重合開始剤組成物及び感光性組成物
KR20200064933A (ko) 2018-11-29 2020-06-08 도쿄 오카 고교 가부시키가이샤 감광성 수지 조성물, 패턴화된 경화막의 제조 방법, 및 패턴화된 경화막
KR20210116281A (ko) 2020-03-12 2021-09-27 도쿄 오카 고교 가부시키가이샤 감광성 조성물, 투명체 및 투명체의 제조 방법

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102854743A (zh) * 2011-06-30 2013-01-02 Jsr株式会社 感放射线性树脂组成物、显示元件用硬化膜、显示元件用硬化膜的形成方法及显示元件
KR101877992B1 (ko) * 2012-07-30 2018-07-13 동우 화인켐 주식회사 착색 감광성 수지 조성물
JP2014048428A (ja) * 2012-08-30 2014-03-17 Jsr Corp 感放射線性組成物、表示素子用硬化膜の形成方法、表示素子用硬化膜及び表示素子
KR101968510B1 (ko) * 2013-02-06 2019-04-12 동우 화인켐 주식회사 적색 화소 패턴 형성용 감광성 수지 조성물
KR20140100261A (ko) * 2013-02-06 2014-08-14 동우 화인켐 주식회사 착색 감광성 수지 조성물
CN103130919B (zh) * 2013-02-08 2015-02-25 常州强力先端电子材料有限公司 一种咔唑酮肟酯类高感光度光引发剂
KR101359470B1 (ko) * 2013-03-08 2014-02-12 동우 화인켐 주식회사 감광성 수지 조성물 및 이로부터 제조된 스페이서
KR101852509B1 (ko) * 2013-03-15 2018-04-26 동우 화인켐 주식회사 착색 감광성 수지 조성물
CN104298074B (zh) * 2013-07-19 2019-11-01 东友精细化工有限公司 透明像素形成用感光性树脂组合物及使用其形成的滤色器
CN108485448B (zh) * 2017-02-21 2022-02-22 住友化学株式会社 树脂组合物、膜及共聚物
CN109991808A (zh) * 2018-01-02 2019-07-09 东友精细化工有限公司 绿色感光性树脂组合物、彩色滤光片和图像显示装置
KR102441365B1 (ko) * 2018-02-14 2022-09-06 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
KR102136357B1 (ko) * 2018-07-06 2020-07-21 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이를 이용하는 컬러 필터
TWI747600B (zh) * 2020-11-09 2021-11-21 立大化工股份有限公司 紫外光硬化性樹脂組成物

Citations (7)

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Publication number Priority date Publication date Assignee Title
JP2004534797A (ja) * 2001-06-11 2004-11-18 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 組み合わされた構造を有するオキシムエステルの光開始剤
JP2005215147A (ja) * 2004-01-28 2005-08-11 Fuji Photo Film Co Ltd 重合性組成物
JP2005220097A (ja) * 2004-02-06 2005-08-18 Asahi Denka Kogyo Kk チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2008003164A (ja) * 2006-06-20 2008-01-10 Fujifilm Corp 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法
JP2008181087A (ja) * 2006-12-22 2008-08-07 Sumitomo Chemical Co Ltd 感光性樹脂組成物
CN101565472A (zh) * 2009-05-19 2009-10-28 常州强力电子新材料有限公司 酮肟酯类光引发剂
WO2009131189A1 (ja) * 2008-04-25 2009-10-29 三菱化学株式会社 ケトオキシムエステル系化合物及びその利用

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JP2002122987A (ja) * 2000-10-16 2002-04-26 Kansai Paint Co Ltd ネガ型感光性樹脂組成物、ネガ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法
CN101206402A (zh) * 2006-12-22 2008-06-25 住友化学株式会社 感光性树脂组合物
TWI464189B (zh) * 2008-11-14 2014-12-11 Sumitomo Chemical Co Hardened resin composition

Patent Citations (7)

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Publication number Priority date Publication date Assignee Title
JP2004534797A (ja) * 2001-06-11 2004-11-18 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 組み合わされた構造を有するオキシムエステルの光開始剤
JP2005215147A (ja) * 2004-01-28 2005-08-11 Fuji Photo Film Co Ltd 重合性組成物
JP2005220097A (ja) * 2004-02-06 2005-08-18 Asahi Denka Kogyo Kk チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2008003164A (ja) * 2006-06-20 2008-01-10 Fujifilm Corp 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法
JP2008181087A (ja) * 2006-12-22 2008-08-07 Sumitomo Chemical Co Ltd 感光性樹脂組成物
WO2009131189A1 (ja) * 2008-04-25 2009-10-29 三菱化学株式会社 ケトオキシムエステル系化合物及びその利用
CN101565472A (zh) * 2009-05-19 2009-10-28 常州强力电子新材料有限公司 酮肟酯类光引发剂

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012113104A (ja) * 2010-11-24 2012-06-14 Fujifilm Corp 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
JP2012145721A (ja) * 2011-01-12 2012-08-02 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物およびカラーフィルタ
JP2012189997A (ja) * 2011-02-22 2012-10-04 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP2012220794A (ja) * 2011-04-11 2012-11-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、プリント配線板の製造方法、及びプリント配線
JP2013033221A (ja) * 2011-06-30 2013-02-14 Jsr Corp 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
JP2013083932A (ja) * 2011-09-28 2013-05-09 Jsr Corp 着色組成物、カラーフィルタ及び表示素子
JP2013242551A (ja) * 2012-04-25 2013-12-05 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5903164B2 (ja) * 2012-08-08 2016-04-13 旭化成イーマテリアルズ株式会社 感光性フィルム積層体、及び、フレキシブルプリント配線の製造方法
WO2014024951A1 (ja) * 2012-08-08 2014-02-13 旭化成イーマテリアルズ株式会社 感光性フィルム積層体、フレキシブルプリント配線板、及び、その製造方法
JPWO2014024951A1 (ja) * 2012-08-08 2016-07-25 旭化成イーマテリアルズ株式会社 感光性フィルム積層体、及び、フレキシブルプリント配線の製造方法
KR20140102145A (ko) 2013-02-13 2014-08-21 도쿄 오카 고교 가부시키가이샤 감방사선성 수지 조성물, 절연막 및 표시 장치
JP2014153687A (ja) * 2013-02-13 2014-08-25 Tokyo Ohka Kogyo Co Ltd 感放射線性樹脂組成物、絶縁膜、及び表示装置
KR20140111940A (ko) 2013-03-12 2014-09-22 도쿄 오카 고교 가부시키가이샤 감방사선성 수지 조성물
JP2016527329A (ja) * 2013-05-20 2016-09-08 常州強力先端電子材料有限公司Ｃｈａｎｇｚｈｏｕ Ｔｒｏｎｌｙ Ａｄｖａｎｃｅｄ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ Ｃｏ．，Ｌｔｄ． アクリレート系光硬化性組成物
JP2015022308A (ja) * 2013-07-19 2015-02-02 東友ファインケム株式会社 透明画素形成用感光性樹脂組成物
KR20150010555A (ko) * 2013-07-19 2015-01-28 동우 화인켐 주식회사 투명화소 형성용 감광성 수지조성물
KR102093759B1 (ko) * 2013-07-19 2020-03-26 동우 화인켐 주식회사 투명화소 형성용 감광성 수지조성물
KR20160138355A (ko) 2015-05-25 2016-12-05 도쿄 오카 고교 가부시키가이샤 감광성 조성물, 패턴 형성 방법, 경화막, 절연막, 및 표시장치
KR20170026258A (ko) 2015-08-27 2017-03-08 도쿄 오카 고교 가부시키가이샤 감광성 조성물, 패턴 형성 방법, 경화물, 및 표시 장치
JPWO2017170473A1 (ja) * 2016-03-29 2019-02-07 株式会社Adeka 光重合開始剤組成物及び感光性組成物
KR20200064933A (ko) 2018-11-29 2020-06-08 도쿄 오카 고교 가부시키가이샤 감광성 수지 조성물, 패턴화된 경화막의 제조 방법, 및 패턴화된 경화막
KR20210116281A (ko) 2020-03-12 2021-09-27 도쿄 오카 고교 가부시키가이샤 감광성 조성물, 투명체 및 투명체의 제조 방법

Also Published As

Publication number Publication date
TW201214038A (en) 2012-04-01
CN102375337A (zh) 2012-03-14
KR20120023546A (ko) 2012-03-13

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