JP2008544575A - Euv光源集光器寿命の改善 - Google Patents
Euv光源集光器寿命の改善 Download PDFInfo
- Publication number
- JP2008544575A JP2008544575A JP2008519425A JP2008519425A JP2008544575A JP 2008544575 A JP2008544575 A JP 2008544575A JP 2008519425 A JP2008519425 A JP 2008519425A JP 2008519425 A JP2008519425 A JP 2008519425A JP 2008544575 A JP2008544575 A JP 2008544575A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- source material
- deposition
- plasma source
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- High Energy & Nuclear Physics (AREA)
- Theoretical Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- General Physics & Mathematics (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Cleaning In General (AREA)
Abstract
【解決手段】プラズマ原料物質化合物を水素と反応させて、集光光学器械上にプラズマ原料物質化合物内に含まれたプラズマ原料物質からプラズマ原料物質の水素化物を形成する段階を含むことができる、プラズマ原料物質化合物をプラズマ生成EUV光源集光光学器械から除去するための装置及び方法。本方法は、集光光学器械を収容するプラズマ形成チャンバ内に水素を導入することによって反応させる段階を開始する段階を更に含むことができ、更に、例えば、清浄化プラズマ作用及び/又はプラズマ原料物質スパッタリングによって、又は有効と判断することができる他の手段によって水素化物を集光光学器械から除去する段階を含むことができる。プラズマ生成EUV光源集光器コーティング層の有効寿命を延長する装置及び方法は、コーティング層上へのコーティング層材料の堆積によるコーティング層の材料の原位置置換を含むことができる。
【選択図】図3
Description
関連出願への相互参照
本出願は、2005年6月27日出願の「EUV光源集光器寿命改善」という名称の米国特許出願出願番号第11/168、190号に対する優先権を請求するものであり、かつ代理人整理番号第2002−0049−01号であり、かつ現在は代理人整理番号第2002−0030−01号である、2002年10月31日出願の「デブリシールドを有するプラズマ焦点光源」という名称の米国特許出願出願番号第60/422、808号、及び代理人整理番号第2003−0083−01号である、2004年3月10日出願の「EUV光源のための集光器」という名称の米国特許出願出願番号第10/798、740号、及び代理人整理番号第2003−0099−01号である、2003年12月18日出願の「放電生成プラズマEUV光源」という名称の米国特許出願出願番号第10/742、233号、及び代理人整理番号第2003−0125−01号である、2004年3月17日出願の「高繰返し数レーザ生成プラズマEUV光源」という名称の米国特許出願出願番号第10/803、526号、及び代理人整理番号第2003−0132−01号である、2003年3月21日出願の「高密度プラズマ焦点放射線源」という名称の米国特許出願出願番号第10/442、544号に関連するものであり、これらの各特許の開示内容は、この記述により引用により組み込まれる。
撮像器72は、例えば、ターゲット液滴94の望ましい軌跡経路に整列した撮像線75に沿ってターゲット送出機構92から望ましい点火サイト28に向けることができ、撮像器74及び76は、例えば、望ましい点火サイト28の前の経路に沿った何らかの地点80で、例えば単独で、望ましい軌跡経路に沿って交差する交差撮像線76及び78に沿って向けることができる。
また、中間焦点40又は中間焦点40近くでのEUV光源検出器100は、例えば、レーザパルスのタイミング及び焦点のような事柄における誤差を示すことができるシステムコントローラ60にフィードバックを行い、有効かつ効率的なLPP、EUV光生成に適正な場所及び時間でターゲット液滴を確実に途中で捕捉することができる。
プラズマ原料物質によるスパッタリング、例えば、Liスパッタリングも提案されているが、収率は、表面上のリチウムの化学的形態に依存し、すなわち、例えば、リチウムの酸化物及び炭酸塩の方がプラズマ原料物質、例えばLi自体よりも集光器表面からスパッタリング処理し難い。
224 放電チャンバ
226 電極
Claims (26)
- プラズマ原料物質化合物をプラズマ生成EUV光源集光光学器械から除去する方法であって、
プラズマ原料物質化合物を水素と反応させて、集光光学器械上に、該プラズマ原料物質化合物に含有されているプラズマ原料物質から該プラズマ原料物質の水素化物を形成する段階、
を含むことを特徴とする方法。 - 前記集光光学器械を収容するプラズマ形成チャンバ内に水素を導入することによって前記反応させる段階を開始する段階、
を更に含むことを特徴とする請求項1に記載の方法。 - 前記水素化物を前記集光光学器械から除去する段階、
を更に含むことを特徴とする請求項1に記載の方法。 - 前記水素化物を前記集光光学器械から除去する段階、
を更に含むことを特徴とする請求項2に記載の方法。 - 清浄化プラズマ作用及び/又はプラズマ原料物質スパッタリングにより、前記水素化物を前記集光器から除去する段階、
を更に含むことを特徴とする請求項3に記載の方法。 - 清浄化プラズマ作用及び/又はプラズマ原料物質スパッタリングにより、前記水素化物を前記集光器から除去する段階、
を更に含むことを特徴とする請求項4に記載の方法。 - 前記プラズマ原料物質は、リチウムを含み、前記プラズマ原料物質化合物は、リチウムと酸素の化合物、及び/又はリチウムと炭素の化合物を含む、
ことを更に含むことを特徴とする請求項3に記載の方法。 - 前記プラズマ原料物質は、リチウムを含み、前記プラズマ原料物質化合物は、リチウムと酸素の化合物、及び/又はリチウムと炭素の化合物を含む、
ことを更に含むことを特徴とする請求項4に記載の方法。 - 前記プラズマ原料物質は、リチウムを含み、前記プラズマ原料物質化合物は、リチウムと酸素の化合物、及び/又はリチウムと炭素の化合物を含む、
ことを更に含むことを特徴とする請求項5に記載の方法。 - 前記プラズマ原料物質は、リチウムを含み、前記プラズマ原料物質化合物は、リチウムと酸素の化合物、及び/又はリチウムと炭素の化合物を含む、
ことを更に含むことを特徴とする請求項6に記載の方法。 - プラズマ生成EUV光源集光器コーティング層の有効寿命を延長する方法であって、
コーティング層上へのコーティング層材料の堆積によるコーティング層の材料の原位置置換、
を含むことを特徴とする方法。 - 前記堆積処理は飽和限界を有し、該処理は正確な割合を感知しない、
ことを更に含むことを特徴とする請求項11に記載の方法。 - 前記堆積処理は、サイクルが反復可能であるように補足的である、
ことを更に含むことを特徴とする請求項11に記載の方法。 - 前記堆積処理は、サイクルが反復可能であるように補足的である、
ことを更に含むことを特徴とする請求項12に記載の方法。 - 前記コーティング層の前記材料は、ルテニウムを含む、
ことを更に含むことを特徴とする請求項11に記載の方法。 - 前記コーティング層の前記材料は、ルテニウムを含む、
ことを更に含むことを特徴とする請求項12に記載の方法。 - 前記コーティング層の前記材料は、ルテニウムを含む、
ことを更に含むことを特徴とする請求項13に記載の方法。 - 前記コーティング層の前記材料は、ルテニウムを含む、
ことを更に含むことを特徴とする請求項14に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項11に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項12に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項13に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項14に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項15に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項16に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項17に記載の方法。 - 前記堆積は、原子層堆積によって行われる、
ことを更に含むことを特徴とする請求項18に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/168,190 US7365349B2 (en) | 2005-06-27 | 2005-06-27 | EUV light source collector lifetime improvements |
US11/168,190 | 2005-06-27 | ||
PCT/US2006/024463 WO2007002386A2 (en) | 2005-06-27 | 2006-06-23 | Euv light source collector lifetime improvements |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008544575A true JP2008544575A (ja) | 2008-12-04 |
JP2008544575A5 JP2008544575A5 (ja) | 2009-08-06 |
JP5091130B2 JP5091130B2 (ja) | 2012-12-05 |
Family
ID=37595868
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008519459A Expired - Fee Related JP5156625B2 (ja) | 2005-06-27 | 2006-06-23 | Euv光源集光器の侵食の緩和 |
JP2008519425A Expired - Fee Related JP5091130B2 (ja) | 2005-06-27 | 2006-06-23 | Euv光源集光器寿命の改善 |
JP2008519423A Pending JP2008544574A (ja) | 2005-06-27 | 2006-06-23 | Euv光源集光器の侵食の緩和 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008519459A Expired - Fee Related JP5156625B2 (ja) | 2005-06-27 | 2006-06-23 | Euv光源集光器の侵食の緩和 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008519423A Pending JP2008544574A (ja) | 2005-06-27 | 2006-06-23 | Euv光源集光器の侵食の緩和 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7365349B2 (ja) |
EP (1) | EP1899697B1 (ja) |
JP (3) | JP5156625B2 (ja) |
WO (1) | WO2007002386A2 (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7856044B2 (en) | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
JP4807560B2 (ja) * | 2005-11-04 | 2011-11-02 | 国立大学法人 宮崎大学 | 極端紫外光発生方法および極端紫外光発生装置 |
NL1032674C2 (nl) * | 2006-10-13 | 2008-04-15 | Stichting Fund Ond Material | Stralingsbron voor elektromagnetische straling met een golflengte in het extreem ultraviolet (XUV) golflengtegebied. |
US7696492B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
JP5086664B2 (ja) * | 2007-03-02 | 2012-11-28 | ギガフォトン株式会社 | 極端紫外光源装置 |
JP5001055B2 (ja) * | 2007-04-20 | 2012-08-15 | 株式会社小松製作所 | 極端紫外光源装置 |
US9110390B2 (en) * | 2007-06-12 | 2015-08-18 | Koninklijke Philps N.V. | Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity |
US8901521B2 (en) * | 2007-08-23 | 2014-12-02 | Asml Netherlands B.V. | Module and method for producing extreme ultraviolet radiation |
KR101495208B1 (ko) * | 2007-08-23 | 2015-02-25 | 에이에스엠엘 네델란즈 비.브이. | 극자외 방사선을 생성하는 방법 및 모듈 |
US7812329B2 (en) * | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
US7655925B2 (en) * | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
US7760341B2 (en) * | 2007-09-04 | 2010-07-20 | Sematech, Inc. | Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes |
WO2009059614A1 (en) | 2007-11-06 | 2009-05-14 | Carl Zeiss Smt Ag | Method for removing a contamination layer from an optical surface, method for generating a cleaning gas, and corresponding cleaning and cleaning... |
ATE528694T1 (de) * | 2008-07-18 | 2011-10-15 | Koninkl Philips Electronics Nv | Vorrichtung zur erzeugung von extremer uv- strahlung mit einem kontaminationsfänger und verfahren zur reinigung von zinn in einer solchen vorrichtung |
US8519366B2 (en) * | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
KR101052922B1 (ko) * | 2008-12-22 | 2011-07-29 | 주식회사 하이닉스반도체 | 극자외선 광원 장치 |
JP5559562B2 (ja) | 2009-02-12 | 2014-07-23 | ギガフォトン株式会社 | 極端紫外光光源装置 |
JP5687488B2 (ja) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
US8368039B2 (en) | 2010-04-05 | 2013-02-05 | Cymer, Inc. | EUV light source glint reduction system |
US9029797B2 (en) * | 2013-07-25 | 2015-05-12 | Agilent Technologies, Inc. | Plasma-based photon source, ion source, and related systems and methods |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040007246A1 (en) * | 2002-07-15 | 2004-01-15 | Michael Chan | In-situ cleaning of light source collector optics |
WO2004104707A2 (de) * | 2003-05-22 | 2004-12-02 | Philips Intellectual Property & Standards Gmbh | Verfahren und vorrichtung zum reinigen mindestens einer optischen komponente |
JP2005159364A (ja) * | 2003-11-25 | 2005-06-16 | Air Products & Chemicals Inc | 蒸着チェンバーから誘電率が大きな材料を除去する方法 |
WO2006136967A2 (en) * | 2005-06-21 | 2006-12-28 | Philips Intellectual Property & Standards Gmbh | Method of cleaning optical surfaces of an irradiation unit in a two-step process |
WO2006137014A1 (en) * | 2005-06-21 | 2006-12-28 | Philips Intellectual Property & Standards Gmbh | Method of cleaning and after treatment of optical surfaces in an irradiation unit |
Family Cites Families (152)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2740963A (en) * | 1951-01-29 | 1956-04-03 | Gilfillan Bros Inc | Automatic amplitude cancellation in moving target indicator |
US2759106A (en) | 1951-05-25 | 1956-08-14 | Wolter Hans | Optical image-forming mirror system providing for grazing incidence of rays |
US3279176A (en) | 1959-07-31 | 1966-10-18 | North American Aviation Inc | Ion rocket engine |
US3150483A (en) | 1962-05-10 | 1964-09-29 | Aerospace Corp | Plasma generator and accelerator |
US3232046A (en) * | 1962-06-06 | 1966-02-01 | Aerospace Corp | Plasma generator and propulsion exhaust system |
US3746870A (en) * | 1970-12-21 | 1973-07-17 | Gen Electric | Coated light conduit |
US3969628A (en) | 1974-04-04 | 1976-07-13 | The United States Of America As Represented By The Secretary Of The Army | Intense, energetic electron beam assisted X-ray generator |
US4042848A (en) | 1974-05-17 | 1977-08-16 | Ja Hyun Lee | Hypocycloidal pinch device |
US3946332A (en) * | 1974-06-13 | 1976-03-23 | Samis Michael A | High power density continuous wave plasma glow jet laser system |
US4009391A (en) * | 1974-06-25 | 1977-02-22 | Jersey Nuclear-Avco Isotopes, Inc. | Suppression of unwanted lasing in laser isotope separation |
US3961197A (en) * | 1974-08-21 | 1976-06-01 | The United States Of America As Represented By The United States Energy Research And Development Administration | X-ray generator |
US3960473A (en) * | 1975-02-06 | 1976-06-01 | The Glastic Corporation | Die structure for forming a serrated rod |
US4223279A (en) | 1977-07-18 | 1980-09-16 | Mathematical Sciences Northwest, Inc. | Pulsed electric discharge laser utilizing water dielectric blumlein transmission line |
US4162160A (en) | 1977-08-25 | 1979-07-24 | Fansteel Inc. | Electrical contact material and method for making the same |
US4143275A (en) * | 1977-09-28 | 1979-03-06 | Battelle Memorial Institute | Applying radiation |
US4203393A (en) * | 1979-01-04 | 1980-05-20 | Ford Motor Company | Plasma jet ignition engine and method |
US4329664A (en) * | 1980-06-09 | 1982-05-11 | Ali Javan | Generation of stable frequency radiation at an optical frequency |
JPS5756668A (en) * | 1980-09-18 | 1982-04-05 | Nissan Motor Co Ltd | Plasma igniter |
US4364342A (en) | 1980-10-01 | 1982-12-21 | Ford Motor Company | Ignition system employing plasma spray |
US4550408A (en) | 1981-02-27 | 1985-10-29 | Heinrich Karning | Method and apparatus for operating a gas laser |
US4538291A (en) | 1981-11-09 | 1985-08-27 | Kabushiki Kaisha Suwa Seikosha | X-ray source |
US4455658A (en) * | 1982-04-20 | 1984-06-19 | Sutter Jr Leroy V | Coupling circuit for use with a transversely excited gas laser |
US4504964A (en) * | 1982-09-20 | 1985-03-12 | Eaton Corporation | Laser beam plasma pinch X-ray system |
US4536884A (en) | 1982-09-20 | 1985-08-20 | Eaton Corporation | Plasma pinch X-ray apparatus |
US4618971A (en) | 1982-09-20 | 1986-10-21 | Eaton Corporation | X-ray lithography system |
US4633492A (en) | 1982-09-20 | 1986-12-30 | Eaton Corporation | Plasma pinch X-ray method |
US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
US4534035A (en) | 1983-08-09 | 1985-08-06 | Northrop Corporation | Tandem electric discharges for exciting lasers |
DE3332711A1 (de) * | 1983-09-10 | 1985-03-28 | Fa. Carl Zeiss, 7920 Heidenheim | Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich |
JPS60175351A (ja) * | 1984-02-14 | 1985-09-09 | Nippon Telegr & Teleph Corp <Ntt> | X線発生装置およびx線露光法 |
US4561406A (en) | 1984-05-25 | 1985-12-31 | Combustion Electromagnetics, Inc. | Winged reentrant electromagnetic combustion chamber |
US4837794A (en) * | 1984-10-12 | 1989-06-06 | Maxwell Laboratories Inc. | Filter apparatus for use with an x-ray source |
US4626193A (en) | 1985-08-02 | 1986-12-02 | Itt Corporation | Direct spark ignition system |
US4774914A (en) | 1985-09-24 | 1988-10-04 | Combustion Electromagnetics, Inc. | Electromagnetic ignition--an ignition system producing a large size and intense capacitive and inductive spark with an intense electromagnetic field feeding the spark |
CA1239487A (en) * | 1985-10-03 | 1988-07-19 | National Research Council Of Canada | Multiple vacuum arc derived plasma pinch x-ray source |
CA1239486A (en) * | 1985-10-03 | 1988-07-19 | Rajendra P. Gupta | Gas discharge derived annular plasma pinch x-ray source |
US4891820A (en) * | 1985-12-19 | 1990-01-02 | Rofin-Sinar, Inc. | Fast axial flow laser circulating system |
US5315611A (en) * | 1986-09-25 | 1994-05-24 | The United States Of America As Represented By The United States Department Of Energy | High average power magnetic modulator for metal vapor lasers |
US5189678A (en) * | 1986-09-29 | 1993-02-23 | The United States Of America As Represented By The United States Department Of Energy | Coupling apparatus for a metal vapor laser |
US5023884A (en) * | 1988-01-15 | 1991-06-11 | Cymer Laser Technologies | Compact excimer laser |
US4959840A (en) | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
WO1989007353A1 (en) | 1988-01-27 | 1989-08-10 | Kabushiki Kaisha Komatsu Seisakusho | Method and apparatus for controlling narrow-band oscillation excimer laser |
US5025446A (en) * | 1988-04-01 | 1991-06-18 | Laserscope | Intra-cavity beam relay for optical harmonic generation |
US4928020A (en) * | 1988-04-05 | 1990-05-22 | The United States Of America As Represented By The United States Department Of Energy | Saturable inductor and transformer structures for magnetic pulse compression |
IT1231783B (it) | 1989-05-12 | 1992-01-14 | Enea | Testa laser per eccitazione a scarica trasversa con tre elettrodi |
DE3927089C1 (ja) * | 1989-08-17 | 1991-04-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
US5005180A (en) * | 1989-09-01 | 1991-04-02 | Schneider (Usa) Inc. | Laser catheter system |
US5022033A (en) * | 1989-10-30 | 1991-06-04 | The United States Of America As Represented By The United States Department Of Energy | Ring laser having an output at a single frequency |
US5102776A (en) * | 1989-11-09 | 1992-04-07 | Cornell Research Foundation, Inc. | Method and apparatus for microlithography using x-pinch x-ray source |
US5025445A (en) * | 1989-11-22 | 1991-06-18 | Cymer Laser Technologies | System for, and method of, regulating the wavelength of a light beam |
US5027076A (en) * | 1990-01-29 | 1991-06-25 | Ball Corporation | Open cage density sensor |
US5175755A (en) | 1990-10-31 | 1992-12-29 | X-Ray Optical System, Inc. | Use of a kumakhov lens for x-ray lithography |
US5091778A (en) * | 1990-12-21 | 1992-02-25 | Kaman Aerospace Corporation | Imaging lidar systems and K-meters employing tunable and fixed frequency laser transmitters |
US5181135A (en) * | 1990-12-21 | 1993-01-19 | Kaman Aerospace Corporation | Optical underwater communications systems employing tunable and fixed frequency laser transmitters |
US5471965A (en) | 1990-12-24 | 1995-12-05 | Kapich; Davorin D. | Very high speed radial inflow hydraulic turbine |
US5126638A (en) * | 1991-05-13 | 1992-06-30 | Maxwell Laboratories, Inc. | Coaxial pseudospark discharge switch |
US5142166A (en) | 1991-10-16 | 1992-08-25 | Science Research Laboratory, Inc. | High voltage pulsed power source |
US5157684A (en) | 1991-10-23 | 1992-10-20 | United Technologies Corporation | Optically pulsed laser |
US5425922A (en) * | 1991-12-27 | 1995-06-20 | Vicor Company Of Japan, Ltd. | Apparatus for manufacturing microcrystal particles and manufacturing method for the microcrystal particles |
JPH0816720B2 (ja) * | 1992-04-21 | 1996-02-21 | 日本航空電子工業株式会社 | 軟x線多層膜反射鏡 |
US5463650A (en) | 1992-07-17 | 1995-10-31 | Kabushiki Kaisha Komatsu Seisakusho | Apparatus for controlling output of an excimer laser device |
US5359620A (en) | 1992-11-12 | 1994-10-25 | Cymer Laser Technologies | Apparatus for, and method of, maintaining a clean window in a laser |
US5450436A (en) | 1992-11-20 | 1995-09-12 | Kabushiki Kaisha Komatsu Seisakusho | Laser gas replenishing apparatus and method in excimer laser system |
US5534824A (en) | 1993-03-26 | 1996-07-09 | The Boeing Company | Pulsed-current electron beam method and apparatus for use in generating and amplifying electromagnetic energy |
US5411224A (en) * | 1993-04-08 | 1995-05-02 | Dearman; Raymond M. | Guard for jet engine |
US5313481A (en) * | 1993-09-29 | 1994-05-17 | The United States Of America As Represented By The United States Department Of Energy | Copper laser modulator driving assembly including a magnetic compression laser |
US5448580A (en) | 1994-07-05 | 1995-09-05 | The United States Of America As Represented By The United States Department Of Energy | Air and water cooled modulator |
US6016323A (en) * | 1995-06-06 | 2000-01-18 | Spectra Physics Lasers, Inc. | Broadly tunable single longitudinal mode output produced from multi-longitudinal mode seed source |
US5504795A (en) * | 1995-02-06 | 1996-04-02 | Plex Corporation | Plasma X-ray source |
DE69628514T2 (de) * | 1995-02-17 | 2004-04-29 | Cymer, Inc., San Diego | Leistungspulsgenerator mit energierückgewinnung |
US5830336A (en) * | 1995-12-05 | 1998-11-03 | Minnesota Mining And Manufacturing Company | Sputtering of lithium |
US5863017A (en) * | 1996-01-05 | 1999-01-26 | Cymer, Inc. | Stabilized laser platform and module interface |
US5867305A (en) | 1996-01-19 | 1999-02-02 | Sdl, Inc. | Optical amplifier with high energy levels systems providing high peak powers |
US6031241A (en) * | 1997-03-11 | 2000-02-29 | University Of Central Florida | Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications |
US5963616A (en) | 1997-03-11 | 1999-10-05 | University Of Central Florida | Configurations, materials and wavelengths for EUV lithium plasma discharge lamps |
US6128323A (en) | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
US5936988A (en) | 1997-12-15 | 1999-08-10 | Cymer, Inc. | High pulse rate pulse power system |
US5982800A (en) | 1997-04-23 | 1999-11-09 | Cymer, Inc. | Narrow band excimer laser |
US5991324A (en) * | 1998-03-11 | 1999-11-23 | Cymer, Inc. | Reliable. modular, production quality narrow-band KRF excimer laser |
US6172324B1 (en) * | 1997-04-28 | 2001-01-09 | Science Research Laboratory, Inc. | Plasma focus radiation source |
US5866871A (en) * | 1997-04-28 | 1999-02-02 | Birx; Daniel | Plasma gun and methods for the use thereof |
US6815700B2 (en) * | 1997-05-12 | 2004-11-09 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
US6586757B2 (en) * | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
US5763930A (en) * | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
US6064072A (en) * | 1997-05-12 | 2000-05-16 | Cymer, Inc. | Plasma focus high energy photon source |
US6566667B1 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
US6566668B2 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with tandem ellipsoidal mirror units |
US5856991A (en) * | 1997-06-04 | 1999-01-05 | Cymer, Inc. | Very narrow band laser |
US6094448A (en) | 1997-07-01 | 2000-07-25 | Cymer, Inc. | Grating assembly with bi-directional bandwidth control |
US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
US6018537A (en) * | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
USRE38054E1 (en) * | 1997-07-18 | 2003-04-01 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
US5852621A (en) | 1997-07-21 | 1998-12-22 | Cymer, Inc. | Pulse laser with pulse energy trimmer |
US6757316B2 (en) * | 1999-12-27 | 2004-06-29 | Cymer, Inc. | Four KHz gas discharge laser |
US6529531B1 (en) * | 1997-07-22 | 2003-03-04 | Cymer, Inc. | Fast wavelength correction technique for a laser |
US6671294B2 (en) * | 1997-07-22 | 2003-12-30 | Cymer, Inc. | Laser spectral engineering for lithographic process |
US6721340B1 (en) * | 1997-07-22 | 2004-04-13 | Cymer, Inc. | Bandwidth control technique for a laser |
US6067306A (en) * | 1997-08-08 | 2000-05-23 | Cymer, Inc. | Laser-illuminated stepper or scanner with energy sensor feedback |
US5953360A (en) | 1997-10-24 | 1999-09-14 | Synrad, Inc. | All metal electrode sealed gas laser |
US6151346A (en) | 1997-12-15 | 2000-11-21 | Cymer, Inc. | High pulse rate pulse power system with fast rise time and low current |
US6151349A (en) | 1998-03-04 | 2000-11-21 | Cymer, Inc. | Automatic fluorine control system |
US5978406A (en) * | 1998-01-30 | 1999-11-02 | Cymer, Inc. | Fluorine control system for excimer lasers |
US6240117B1 (en) * | 1998-01-30 | 2001-05-29 | Cymer, Inc. | Fluorine control system with fluorine monitor |
JP2897005B1 (ja) * | 1998-02-27 | 1999-05-31 | 工業技術院長 | レーザプラズマ光源及びこれを用いた輻射線発生方法 |
US6219360B1 (en) * | 1998-04-24 | 2001-04-17 | Trw Inc. | High average power solid-state laser system with phase front control |
US6016325A (en) * | 1998-04-27 | 2000-01-18 | Cymer, Inc. | Magnetic modulator voltage and temperature timing compensation circuit |
US6618421B2 (en) * | 1998-07-18 | 2003-09-09 | Cymer, Inc. | High repetition rate gas discharge laser with precise pulse timing control |
US6208675B1 (en) * | 1998-08-27 | 2001-03-27 | Cymer, Inc. | Blower assembly for a pulsed laser system incorporating ceramic bearings |
US6067311A (en) * | 1998-09-04 | 2000-05-23 | Cymer, Inc. | Excimer laser with pulse multiplier |
US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
JP2000088999A (ja) * | 1998-09-14 | 2000-03-31 | Nikon Corp | X線装置 |
US6208674B1 (en) * | 1998-09-18 | 2001-03-27 | Cymer, Inc. | Laser chamber with fully integrated electrode feedthrough main insulator |
US6031598A (en) * | 1998-09-25 | 2000-02-29 | Euv Llc | Extreme ultraviolet lithography machine |
US6181719B1 (en) * | 1998-11-24 | 2001-01-30 | Universal Laser Systems, Inc. | Gas laser RF power source apparatus and method |
US6219368B1 (en) * | 1999-02-12 | 2001-04-17 | Lambda Physik Gmbh | Beam delivery system for molecular fluorine (F2) laser |
US6104735A (en) | 1999-04-13 | 2000-08-15 | Cymer, Inc. | Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly |
US6164116A (en) | 1999-05-06 | 2000-12-26 | Cymer, Inc. | Gas module valve automated test fixture |
US6370174B1 (en) * | 1999-10-20 | 2002-04-09 | Cymer, Inc. | Injection seeded F2 lithography laser |
US6549551B2 (en) * | 1999-09-27 | 2003-04-15 | Cymer, Inc. | Injection seeded laser with precise timing control |
US6381257B1 (en) * | 1999-09-27 | 2002-04-30 | Cymer, Inc. | Very narrow band injection seeded F2 lithography laser |
US6535531B1 (en) * | 2001-11-29 | 2003-03-18 | Cymer, Inc. | Gas discharge laser with pulse multiplier |
US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US6359922B1 (en) * | 1999-10-20 | 2002-03-19 | Cymer, Inc. | Single chamber gas discharge laser with line narrowed seed beam |
US6377651B1 (en) * | 1999-10-11 | 2002-04-23 | University Of Central Florida | Laser plasma source for extreme ultraviolet lithography using a water droplet target |
US6831963B2 (en) * | 2000-10-20 | 2004-12-14 | University Of Central Florida | EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions |
US6532247B2 (en) * | 2000-02-09 | 2003-03-11 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
TW508980B (en) * | 1999-12-23 | 2002-11-01 | Koninkl Philips Electronics Nv | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
US6392743B1 (en) * | 2000-02-29 | 2002-05-21 | Cymer, Inc. | Control technique for microlithography lasers |
US6195272B1 (en) * | 2000-03-16 | 2001-02-27 | Joseph E. Pascente | Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses |
US6647086B2 (en) * | 2000-05-19 | 2003-11-11 | Canon Kabushiki Kaisha | X-ray exposure apparatus |
US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
US7180081B2 (en) * | 2000-06-09 | 2007-02-20 | Cymer, Inc. | Discharge produced plasma EUV light source |
US6584132B2 (en) * | 2000-11-01 | 2003-06-24 | Cymer, Inc. | Spinodal copper alloy electrodes |
TW548524B (en) * | 2000-09-04 | 2003-08-21 | Asm Lithography Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
US6664554B2 (en) * | 2001-01-03 | 2003-12-16 | Euv Llc | Self-cleaning optic for extreme ultraviolet lithography |
US6576912B2 (en) * | 2001-01-03 | 2003-06-10 | Hugo M. Visser | Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window |
US6538737B2 (en) * | 2001-01-29 | 2003-03-25 | Cymer, Inc. | High resolution etalon-grating spectrometer |
US6396900B1 (en) * | 2001-05-01 | 2002-05-28 | The Regents Of The University Of California | Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application |
US6567499B2 (en) * | 2001-06-07 | 2003-05-20 | Plex Llc | Star pinch X-ray and extreme ultraviolet photon source |
JP4461652B2 (ja) * | 2001-07-31 | 2010-05-12 | 株式会社ニコン | 多層膜反射鏡及び多層膜反射鏡の製造方法 |
US6714624B2 (en) * | 2001-09-18 | 2004-03-30 | Euv Llc | Discharge source with gas curtain for protecting optics from particles |
DE10151080C1 (de) * | 2001-10-10 | 2002-12-05 | Xtreme Tech Gmbh | Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung |
JP2003168642A (ja) * | 2001-12-04 | 2003-06-13 | Toyota Central Res & Dev Lab Inc | 極紫外光露光装置 |
JP3564104B2 (ja) * | 2002-01-29 | 2004-09-08 | キヤノン株式会社 | 露光装置及びその制御方法、これを用いたデバイスの製造方法 |
JP2004151285A (ja) * | 2002-10-30 | 2004-05-27 | Nikon Corp | 極短紫外線ミラー作成方法および極短紫外線露光装置 |
US7217940B2 (en) * | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Collector for EUV light source |
JP2005019485A (ja) * | 2003-06-24 | 2005-01-20 | Nikon Corp | 光学素子の形状修正方法、光学素子及び露光装置 |
JP2005032510A (ja) * | 2003-07-10 | 2005-02-03 | Nikon Corp | Euv光源、露光装置及び露光方法 |
DE602004003015T2 (de) * | 2003-10-06 | 2007-02-08 | Asml Netherlands B.V. | Verfahren und Gerät zur Herstellung einer Schutzschicht auf einem Spiegel |
US7116405B2 (en) * | 2003-12-04 | 2006-10-03 | Johnson Kenneth C | Maskless, microlens EUV lithography system with grazing-incidence illumination optics |
US7196342B2 (en) * | 2004-03-10 | 2007-03-27 | Cymer, Inc. | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source |
JP2005268358A (ja) * | 2004-03-17 | 2005-09-29 | Nikon Corp | ミラーの洗浄装置及び照明光学装置 |
-
2005
- 2005-06-27 US US11/168,190 patent/US7365349B2/en active Active
-
2006
- 2006-06-23 EP EP06785428A patent/EP1899697B1/en not_active Expired - Fee Related
- 2006-06-23 JP JP2008519459A patent/JP5156625B2/ja not_active Expired - Fee Related
- 2006-06-23 JP JP2008519425A patent/JP5091130B2/ja not_active Expired - Fee Related
- 2006-06-23 JP JP2008519423A patent/JP2008544574A/ja active Pending
- 2006-06-23 WO PCT/US2006/024463 patent/WO2007002386A2/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040007246A1 (en) * | 2002-07-15 | 2004-01-15 | Michael Chan | In-situ cleaning of light source collector optics |
WO2004104707A2 (de) * | 2003-05-22 | 2004-12-02 | Philips Intellectual Property & Standards Gmbh | Verfahren und vorrichtung zum reinigen mindestens einer optischen komponente |
JP2005159364A (ja) * | 2003-11-25 | 2005-06-16 | Air Products & Chemicals Inc | 蒸着チェンバーから誘電率が大きな材料を除去する方法 |
WO2006136967A2 (en) * | 2005-06-21 | 2006-12-28 | Philips Intellectual Property & Standards Gmbh | Method of cleaning optical surfaces of an irradiation unit in a two-step process |
WO2006137014A1 (en) * | 2005-06-21 | 2006-12-28 | Philips Intellectual Property & Standards Gmbh | Method of cleaning and after treatment of optical surfaces in an irradiation unit |
Also Published As
Publication number | Publication date |
---|---|
US7365349B2 (en) | 2008-04-29 |
WO2007002386A3 (en) | 2008-03-13 |
JP2008544474A (ja) | 2008-12-04 |
JP2008544574A (ja) | 2008-12-04 |
JP5156625B2 (ja) | 2013-03-06 |
JP5091130B2 (ja) | 2012-12-05 |
EP1899697A2 (en) | 2008-03-19 |
EP1899697B1 (en) | 2012-05-30 |
US20070023705A1 (en) | 2007-02-01 |
WO2007002386A2 (en) | 2007-01-04 |
EP1899697A4 (en) | 2011-02-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5091130B2 (ja) | Euv光源集光器寿命の改善 | |
KR101343805B1 (ko) | Euv 광원용 대체 연료 | |
US9000404B2 (en) | Systems and methods for optics cleaning in an EUV light source | |
JP5593554B2 (ja) | 極紫外線光源 | |
EP1047288B1 (en) | Plasma focus high energy photon source | |
JP5597885B2 (ja) | Lpp、euv光源駆動レーザシステム | |
JP5335269B2 (ja) | 極端紫外光源装置 | |
TWI402628B (zh) | 控管極遠紫外線(euv)光微影裝置腔室間之氣體流動的系統 | |
US20090127479A1 (en) | Extreme ultraviolet light source device and a method for generating extreme ultraviolet radiation | |
WO2019103648A1 (en) | High-brightness lpp source and methods for generating radiation and mitigating debris | |
US20100032590A1 (en) | Debris protection system having a magnetic field for an EUV light source | |
KR20060085568A (ko) | 극단 자외광 광원장치 및 극단 자외광 광원장치에서발생하는 디브리의 제거방법 | |
JP2008108945A (ja) | 極端紫外光光源装置 | |
JP2014160670A (ja) | Lpp、euv光源駆動レーザシステム | |
JP2008532231A (ja) | Euv光源の内部構成要素をプラズマ生成デブリから保護するためのシステム | |
US20080237501A1 (en) | Extreme ultraviolet light source device and extreme ultraviolet radiation generating method | |
JP5489457B2 (ja) | Euv光源のための代替燃料 | |
EP2211594B1 (en) | Extreme ultraviolet light source device | |
KR20190034257A (ko) | 잔해물 경감 시스템, 방사선 소스 및 리소그래피 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090619 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090619 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110523 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110817 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110824 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111121 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120820 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120913 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150921 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D02 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |