JP2008187170A - 固体撮像素子用カバーガラス及びその製造方法 - Google Patents
固体撮像素子用カバーガラス及びその製造方法 Download PDFInfo
- Publication number
- JP2008187170A JP2008187170A JP2007334787A JP2007334787A JP2008187170A JP 2008187170 A JP2008187170 A JP 2008187170A JP 2007334787 A JP2007334787 A JP 2007334787A JP 2007334787 A JP2007334787 A JP 2007334787A JP 2008187170 A JP2008187170 A JP 2008187170A
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- Prior art keywords
- glass
- solid
- cover glass
- plate
- coating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- 238000000034 method Methods 0.000 title description 62
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- TYIZUJNEZNBXRS-UHFFFAOYSA-K trifluorogadolinium Chemical compound F[Gd](F)F TYIZUJNEZNBXRS-UHFFFAOYSA-K 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
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- 238000007740 vapor deposition Methods 0.000 description 1
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- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
-
- H—ELECTRICITY
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Abstract
【解決手段】固体撮像素子用カバーガラス10は、無機酸化物ガラス製の薄板状で、板厚方向に対向する2つの透光面11、12の少なくとも一方の面に被覆膜C1、C2を有し、カバーガラス10の外周端面がレーザーにより切断された面13、14よりなり、被覆膜C1、C2がレーザー切断以前に成膜されてなることを特徴とする。
【選択図】図2
Description
(7)また本発明の固体撮像素子用カバーガラスは、固体撮像素子が、CCDまたはCMOSであるならば、情報携帯機器等に搭載されるために必要となる薄型の固体撮像素子に搭載される板厚寸法の小さい固体撮像素子用カバーガラスにも対応できる機械的性能について安定した品位を有するものである。
2、 板ガラスの端面
3、11 板ガラスの第一透光面
4、12 板ガラスの第二透光面
5、13 第一加工面
6、14 第二加工面
20 薄板ガラス
30 ライン状ヘッド
C1 板ガラスの第一透光面に成膜された被膜
C2 板ガラスの第二透光面に成膜された被膜
G 板ガラス
M 作動方向
W 板ガラス端面の窪みの稜線方向長さ寸法
H 板ガラス端面の窪みの板ガラス厚み方向の深さ寸法
L 板ガラス端面の窪みの板ガラス透光面方向の深さ寸法
Claims (11)
- 無機酸化物ガラス製の薄板状の固体撮像素子用カバーガラスであって、
板厚方向に対向する2つの透光面の少なくとも一方の面に被覆膜を有し、カバーガラスの外周端面がレーザーにより切断された面よりなり、被覆膜がレーザー切断以前に成膜されてなることを特徴とする固体撮像素子用カバーガラス。 - 無機酸化物ガラス製の薄板状の固体撮像素子用カバーガラスであって、
板厚方向に対向する2つの透光面の少なくとも一方の面に被覆膜を有し、被覆膜の外周端が、透光面に固着してなることを特徴とする固体撮像素子用カバーガラス。 - 被覆膜が反射防止膜であることを特徴とする請求項1または請求項2に記載の固体撮像素子用カバーガラス。
- 被覆膜の外周端がレーザー切断による加熱によって、透光面に固着してなることを特徴とする請求項1から請求項3に記載の固体撮像素子用カバーガラス。
- 被覆膜が光学薄膜であって、膜厚が0.01μmから100μmの範囲にあることを特徴とする請求項1から請求項4の何れかに記載の固体撮像素子用カバーガラス。
- カバーガラスの外周端面の窪み深さが、30μm以下で、かつ窪み長さが500μm以下であることを特徴とする請求項1から請求項5の何れかに記載の固体撮像素子用カバーガラス。
- 固体撮像素子が、CCDまたはCMOSであることを特徴とする請求項1から請求項6の何れかに記載の固体撮像素子用カバーガラス。
- 無機酸化物ガラス製の薄板状ガラスの組成が、酸化物換算の質量百分率表示でSiO2 56〜70%、Al2O3 0.5〜18%、B2O3 5〜20%、RO 0.1〜20%(RO=MgO+CaO+ZnO+SrO+BaO)、ZnO 0〜9%、M2O 1〜18%(M2O=Li2O+Na2O+K2O)を含有することを特徴とする請求項1から請求項7の何れかに記載の固体撮像素子用カバーガラス。
- ガラス原料混合物を耐熱性容器内で熔融する工程と、得られた熔融ガラスを板ガラスに成形する工程と、該板ガラスの2つの透光面の少なくとも一方の面に被覆膜を形成する成膜工程と、2つの透光面の少なくとも一方の面に被覆膜を有する被覆膜付き板ガラスにレーザーを射出する射出工程と、射出工程後の板ガラスを小片のガラスに分割する工程とを有することを特徴とする固体撮像素子用カバーガラスの製造方法。
- 熔融ガラスを板ガラスに成形する工程が、熔融ガラスを下方に延伸成形して板ガラスを冷却固化することを特徴とする請求項9に記載の固体撮像素子用カバーガラスの製造方法。
- 小片のガラスに分割する工程が折り割り工程であることを特徴とする請求項9に記載の固体撮像素子用カバーガラスの製造方法。
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JP2013075779A (ja) * | 2011-09-30 | 2013-04-25 | Nippon Electric Glass Co Ltd | 膜付フィルム状ガラスの製造方法、膜付フィルム状ガラス、ガラス材接合体の製造方法及びガラス材接合体 |
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