JP5347267B2 - 固体撮像素子用カバーガラス及びその製造方法 - Google Patents
固体撮像素子用カバーガラス及びその製造方法 Download PDFInfo
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- JP5347267B2 JP5347267B2 JP2007334787A JP2007334787A JP5347267B2 JP 5347267 B2 JP5347267 B2 JP 5347267B2 JP 2007334787 A JP2007334787 A JP 2007334787A JP 2007334787 A JP2007334787 A JP 2007334787A JP 5347267 B2 JP5347267 B2 JP 5347267B2
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- coating film
- film
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- TYIZUJNEZNBXRS-UHFFFAOYSA-K trifluorogadolinium Chemical compound F[Gd](F)F TYIZUJNEZNBXRS-UHFFFAOYSA-K 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
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Description
(7)また本発明の固体撮像素子用カバーガラスは、固体撮像素子が、CCDまたはCMOSであるならば、情報携帯機器等に搭載されるために必要となる薄型の固体撮像素子に搭載される板厚寸法の小さい固体撮像素子用カバーガラスにも対応できる機械的性能について安定した品位を有するものである。
2、 板ガラスの端面
3、11 板ガラスの第一透光面
4、12 板ガラスの第二透光面
5、13 第一加工面
6、14 第二加工面
20 薄板ガラス
30 ライン状ヘッド
C1 板ガラスの第一透光面に成膜された被膜
C2 板ガラスの第二透光面に成膜された被膜
G 板ガラス
M 作動方向
W 板ガラス端面の窪みの稜線方向長さ寸法
H 板ガラス端面の窪みの板ガラス厚み方向の深さ寸法
L 板ガラス端面の窪みの板ガラス透光面方向の深さ寸法
Claims (9)
- 無機酸化物ガラス製の薄板状の固体撮像素子用カバーガラスであって、
板厚方向に対向する2つの透光面の少なくとも一方の面に被覆膜を有し、カバーガラスの外周端面が被覆膜と透光面とを照射するレーザーを用いて切断された面よりなり、被覆膜がレーザー切断以前に成膜されており、
前記被覆膜の外周端が被覆膜に照射されたレーザーによる加熱により前記被覆膜のエッジ部が溶けることによって、前記被覆膜が剥がれにくく強固に透光面に接合した状態となっていることを特徴とする固体撮像素子用カバーガラス。 - 被覆膜が反射防止膜であることを特徴とする請求項1に記載の固体撮像素子用カバーガラス。
- 被覆膜が光学薄膜であって、膜厚が0.01μmから100μmの範囲にあることを特徴とする請求項1または2に記載の固体撮像素子用カバーガラス。
- カバーガラスの外周端面の窪み深さが、30μm以下で、かつ窪み長さが500μm以下であることを特徴とする請求項1から請求項3の何れかに記載の固体撮像素子用カバーガラス。
- 固体撮像素子が、CCDまたはCMOSであることを特徴とする請求項1から請求項4の何れかに記載の固体撮像素子用カバーガラス。
- 無機酸化物ガラス製の薄板状ガラスの組成が、酸化物換算の質量百分率表示でSiO2 56〜70%、Al2O3 0.5〜18%、B2O3 5〜20%、RO 0.1〜20%(RO=MgO+CaO+ZnO+SrO+BaO)、ZnO 0〜9%、M2O 1〜18%(M2O=Li2O+Na2O+K2O)を含有することを特徴とする請求項1から請求項5の何れかに記載の固体撮像素子用カバーガラス。
- ガラス原料混合物を耐熱性容器内で熔融する工程と、得られた熔融ガラスを板ガラスに成形する工程と、該板ガラスの2つの透光面の少なくとも一方の面に被覆膜を形成する成膜工程と、2つの透光面の少なくとも一方の面に被覆膜を有する被覆膜付き板ガラスの被覆膜と透光面とにレーザーを照射する射出工程と、射出工程後の板ガラスを小片のガラスに分割する工程とを有し、前記射出工程において、被覆膜が外周端部で被覆膜に照射されたレーザーによる加熱により被覆膜のエッジ部が溶けることによって、被覆膜が剥がれにくく強固に透光面に接合していることを特徴とする固体撮像素子用カバーガラスの製造方法。
- 熔融ガラスを板ガラスに成形する工程が、熔融ガラスを下方に延伸成形して板ガラスを冷却固化することを特徴とする請求項7に記載の固体撮像素子用カバーガラスの製造方法。
- 小片のガラスに分割する工程が折り割り工程であることを特徴とする請求項7または請求項8に記載の固体撮像素子用カバーガラスの製造方法。
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JP5445197B2 (ja) * | 2010-02-12 | 2014-03-19 | 旭硝子株式会社 | 近赤外線カットフィルタガラスおよび近赤外線カットフィルタガラスの製造方法 |
JP5754332B2 (ja) * | 2011-09-30 | 2015-07-29 | 日本電気硝子株式会社 | 膜付フィルム状ガラスの製造方法、膜付フィルム状ガラス、ガラス材接合体の製造方法及びガラス材接合体 |
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