JP2007311722A - 露光装置及びケミカルフィルタ寿命検知方法 - Google Patents
露光装置及びケミカルフィルタ寿命検知方法 Download PDFInfo
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- JP2007311722A JP2007311722A JP2006142035A JP2006142035A JP2007311722A JP 2007311722 A JP2007311722 A JP 2007311722A JP 2006142035 A JP2006142035 A JP 2006142035A JP 2006142035 A JP2006142035 A JP 2006142035A JP 2007311722 A JP2007311722 A JP 2007311722A
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- chemical filter
- exposure apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
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- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
【解決手段】本発明の一形態の露光装置は、空調系に備えられ気中の不純物濃度を下げるためのケミカルフィルター(31)と、前記ケミカルフィルタの下流の気体に曝されるよう配置された光学部品(7)と、前記光学部品に露光工程と同じ波長の光を照射する照射手段(5)と、前記照射手段から照射された光が前記光学部品を透過する透過率を測定する測定手段(10)と、を具備する。
【選択図】図1
Description
Claims (5)
- 空調系に備えられ気中の不純物濃度を下げるためのケミカルフィルタと、
前記ケミカルフィルタの下流の気体に曝されるよう配置された光学部品と、
前記光学部品に露光工程と同じ波長の光を照射する照射手段と、
前記照射手段から照射された光が前記光学部品を透過する透過率を測定する測定手段と、
を具備することを特徴とする露光装置。 - 前記ケミカルフィルタの下流にさらに他のケミカルフィルタを備えたことを特徴とする請求項1に記載の露光装置。
- 空調系に備えられ気中の不純物濃度を下げるための複数のケミカルフィルタと、
前記各ケミカルフィルタの下流の気体に曝されるようそれぞれ配置された複数の光学部品と、
前記複数の光学部品に露光工程と同じ波長の光を照射する照射手段と、
前記照射手段から照射された光が前記複数の光学部品を透過する各透過率を測定する測定手段と、
を具備することを特徴とする露光装置。 - 前記ケミカルフィルタの下流の気体を前記光学部品の表面に導く手段を備えたことを特徴とする請求項1乃至3のいずれかに記載の露光装置。
- 露光装置の空調系に備えられ気中の不純物濃度を下げるためのケミカルフィルタの下流の気体に曝されるよう配置された光学部品に露光工程と同じ波長の光を照射し、
前記光が前記光学部品を透過する透過率を測定することで前記ケミカルフィルタの寿命を検知することを特徴とするケミカルフィルタ寿命検知方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006142035A JP5305568B2 (ja) | 2006-05-22 | 2006-05-22 | 露光装置及びケミカルフィルタ寿命検知方法 |
US11/802,291 US20070268467A1 (en) | 2006-05-22 | 2007-05-22 | Exposure apparatus and semiconductor device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006142035A JP5305568B2 (ja) | 2006-05-22 | 2006-05-22 | 露光装置及びケミカルフィルタ寿命検知方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007311722A true JP2007311722A (ja) | 2007-11-29 |
JP5305568B2 JP5305568B2 (ja) | 2013-10-02 |
Family
ID=38711665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006142035A Expired - Fee Related JP5305568B2 (ja) | 2006-05-22 | 2006-05-22 | 露光装置及びケミカルフィルタ寿命検知方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20070268467A1 (ja) |
JP (1) | JP5305568B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019186257A (ja) * | 2018-04-02 | 2019-10-24 | キヤノン株式会社 | インプリント装置の管理方法、インプリント装置、平坦化層形成装置の管理方法、および、物品製造方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110001952A1 (en) * | 2008-09-25 | 2011-01-06 | Eran & Jan, Inc | Resist exposure and contamination testing apparatus for EUV lithography |
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JPH0855774A (ja) * | 1994-08-10 | 1996-02-27 | Nikon Corp | 露光装置用のフィルタ装置 |
JP2002158170A (ja) * | 2000-09-08 | 2002-05-31 | Nikon Corp | 露光装置及びデバイス製造方法 |
JP2005072076A (ja) * | 2003-08-28 | 2005-03-17 | Nikon Corp | 露光装置及びケミカルフィルタ並びにデバイスの製造方法 |
JP2005101018A (ja) * | 2001-02-19 | 2005-04-14 | Nikon Corp | 露光システム、露光装置及びデバイス製造方法 |
Family Cites Families (30)
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JP3448670B2 (ja) * | 1993-09-02 | 2003-09-22 | 株式会社ニコン | 露光装置及び素子製造方法 |
JP3365571B2 (ja) * | 1993-11-10 | 2003-01-14 | 株式会社ニコン | 光学式計測装置及び露光装置 |
US5685895A (en) * | 1994-08-10 | 1997-11-11 | Nikon Corporation | Air cleaning apparatus used for an exposure apparatus |
KR100542414B1 (ko) * | 1996-03-27 | 2006-05-10 | 가부시키가이샤 니콘 | 노광장치및공조장치 |
JPH09270385A (ja) * | 1996-03-29 | 1997-10-14 | Nikon Corp | 露光装置の環境制御装置 |
EP1014429A4 (en) * | 1997-04-18 | 2000-07-19 | Nikon Corp | EXPOSURE CONTROL METHOD AND DEVICE, EXPOSURE METHOD AND DEVICE, AND MANUFACTURING METHOD THEREOF |
EP1039509A4 (en) * | 1997-04-18 | 2005-01-12 | Nikon Corp | ALIGNER, EXPOSURE METHOD USING THE SAME, AND METHOD OF MANUFACTURING CIRCUIT DEVICE |
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JPH1131647A (ja) * | 1997-07-11 | 1999-02-02 | Oki Electric Ind Co Ltd | 投影露光装置 |
AU8885198A (en) * | 1997-08-26 | 1999-03-16 | Nikon Corporation | Aligner, exposure method, method of pressure adjustment of projection optical system, and method of assembling aligner |
WO1999027568A1 (fr) * | 1997-11-21 | 1999-06-03 | Nikon Corporation | Graveur de motifs a projection et procede de sensibilisation a projection |
JPH11204396A (ja) * | 1998-01-08 | 1999-07-30 | Canon Inc | 半導体製造システムおよびデバイス製造方法 |
AU2962099A (en) * | 1998-04-07 | 1999-10-25 | Nikon Corporation | Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same |
AU3957599A (en) * | 1998-05-29 | 1999-12-20 | Nikon Corporation | Laser-excited plasma light source, exposure apparatus and its manufacturing method, and device manufacturing method |
AU4779700A (en) * | 1999-05-27 | 2000-12-18 | Nikon Corporation | Exposure system, method of manufacturing device, and method of environmental control of exposure system |
JP2000346817A (ja) * | 1999-06-07 | 2000-12-15 | Nikon Corp | 測定装置、照射装置および露光方法 |
US6571057B2 (en) * | 2000-03-27 | 2003-05-27 | Nikon Corporation | Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
JP3869999B2 (ja) * | 2000-03-30 | 2007-01-17 | キヤノン株式会社 | 露光装置および半導体デバイス製造方法 |
JP2001345263A (ja) * | 2000-03-31 | 2001-12-14 | Nikon Corp | 露光装置及び露光方法、並びにデバイス製造方法 |
JP2002217095A (ja) * | 2000-11-14 | 2002-08-02 | Canon Inc | 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置 |
JP3595791B2 (ja) * | 2001-11-19 | 2004-12-02 | キヤノン株式会社 | 半導体製造装置 |
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-
2006
- 2006-05-22 JP JP2006142035A patent/JP5305568B2/ja not_active Expired - Fee Related
-
2007
- 2007-05-22 US US11/802,291 patent/US20070268467A1/en not_active Abandoned
Patent Citations (4)
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JPH0855774A (ja) * | 1994-08-10 | 1996-02-27 | Nikon Corp | 露光装置用のフィルタ装置 |
JP2002158170A (ja) * | 2000-09-08 | 2002-05-31 | Nikon Corp | 露光装置及びデバイス製造方法 |
JP2005101018A (ja) * | 2001-02-19 | 2005-04-14 | Nikon Corp | 露光システム、露光装置及びデバイス製造方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019186257A (ja) * | 2018-04-02 | 2019-10-24 | キヤノン株式会社 | インプリント装置の管理方法、インプリント装置、平坦化層形成装置の管理方法、および、物品製造方法 |
JP7093214B2 (ja) | 2018-04-02 | 2022-06-29 | キヤノン株式会社 | インプリント装置の管理方法、インプリント装置、平坦化層形成装置の管理方法、および、物品製造方法 |
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