JP2006032962A - 緩和SiGe層の形成方法 - Google Patents
緩和SiGe層の形成方法 Download PDFInfo
- Publication number
- JP2006032962A JP2006032962A JP2005204182A JP2005204182A JP2006032962A JP 2006032962 A JP2006032962 A JP 2006032962A JP 2005204182 A JP2005204182 A JP 2005204182A JP 2005204182 A JP2005204182 A JP 2005204182A JP 2006032962 A JP2006032962 A JP 2006032962A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- relaxed sige
- energy
- alloy layer
- strained
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910000577 Silicon-germanium Inorganic materials 0.000 title claims abstract description 90
- 238000000034 method Methods 0.000 title claims abstract description 43
- 230000007547 defect Effects 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 61
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 46
- 239000000956 alloy Substances 0.000 claims abstract description 46
- 150000002500 ions Chemical class 0.000 claims abstract description 32
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 238000010438 heat treatment Methods 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 24
- 229910052760 oxygen Inorganic materials 0.000 claims description 22
- 239000001301 oxygen Substances 0.000 claims description 18
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 238000005468 ion implantation Methods 0.000 claims description 14
- 230000008569 process Effects 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000007789 gas Substances 0.000 claims description 6
- 238000009792 diffusion process Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000012212 insulator Substances 0.000 abstract description 12
- 230000003247 decreasing effect Effects 0.000 abstract 3
- 238000002513 implantation Methods 0.000 description 21
- 238000000137 annealing Methods 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 6
- -1 oxygen ions Chemical class 0.000 description 5
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910003811 SiGeC Inorganic materials 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 229910003465 moissanite Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000000038 ultrahigh vacuum chemical vapour deposition Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000013068 control sample Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 238000011534 incubation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02694—Controlling the interface between substrate and epitaxial layer, e.g. by ion implantation followed by annealing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2658—Bombardment with radiation with high-energy radiation producing ion implantation of a molecular ion, e.g. decaborane
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Recrystallisation Techniques (AREA)
- Physical Vapour Deposition (AREA)
Abstract
【解決手段】 平面欠陥密度を低下させた、実質的に緩和したSiGe合金層を製造する方法を開示する。本発明の方法は、Si含有基板の表面上に歪みGe含有層を形成するステップと、Ge含有層/Si含有基板の界面にまたは界面の下にイオンを注入するステップと、加熱を行って、平面欠陥密度が低下した、実質的に緩和したSiGe合金層を形成するステップと、を含む。また、平面欠陥密度が低下したSiGe層を有する実質的に緩和したSiGe−オン−インシュレータおよびこれを含むヘテロ構造も提供する。
【選択図】 図2
Description
Si含有基板の表面上に歪みを有するGe含有層を形成するステップと、
イオンを注入して、前記Ge含有層と前記Si含有基板との間の界面にまたは該界面の下に損傷領域を生成するステップと、
前記損傷領域を含む前記Ge含有層および前記Si含有基板を、少なくとも実質的に緩和したSiGe合金層を形成する温度で加熱するステップと、
を有し、前記損傷領域が前記加熱ステップの間に平面欠陥の形成を抑制する。
12 界面
14 歪みGe含有層
15 損傷領域
16 イオン
20 実質的に緩和したSiGe合金層
22 バリア層
24 表面酸化物層
26 Si含有層
Claims (19)
- 緩和SiGe合金層を製造する方法であって、
Si含有基板の表面上に歪みを有するGe含有層を形成するステップと、
イオンを注入して、前記Ge含有層と前記Si含有基板との間の界面にまたは該界面の下に損傷領域を生成するステップと、
前記損傷領域を含む前記Ge含有層および前記Si含有基板を、少なくとも実質的に緩和したSiGe合金層を形成する温度で加熱するステップと、
を有し、前記損傷領域が前記加熱ステップの間に平面欠陥の形成を抑制する、方法。 - 前記イオンが、He、Ne、C、O、F、B、P、Si、またはその混合物および同位体を含む、請求項1に記載の方法。
- 前記損傷領域が前記界面の約0から約500Å下の位置にある、請求項1に記載の方法。
- 前記イオン注入がブランケットまたはマスク・イオン注入プロセスを用いて実行される、請求項1に記載の方法。
- 前記損傷領域が、前記加熱の間に前記平面欠陥を抑えることができる充分な閾値エネルギを有する、請求項1に記載の方法。
- 前記閾値エネルギが、フォノンを形成するためのエネルギおよび反跳原子に移動するエネルギを含む、請求項5に記載の方法。
- 前記フォノンを形成するためのエネルギが、平方センチメートル当たり(オングストローム当たり電子ボルト)2.5×1015より大きい、請求項6に記載の方法。
- 前記反跳原子に移動するエネルギが、平方センチメートル当たり(オングストローム当たり電子ボルト)2.5×1015より大きい、請求項6に記載の方法。
- 前記注入イオンが有するエネルギが、前記界面におけるまたは前記界面近傍の格子原子に移動し、前記フォノン形成に対するエネルギ損失および反跳原子に移動するエネルギの和に等しい、請求項9に記載の方法。
- 前記注入イオンの前記エネルギが、平方センチメートル当たり(オングストローム当たり電子ボルト)5×1015より大きく、平方センチメートル当たり(オングストローム当たり電子ボルト)15×1015より小さい、請求項9に記載の方法。
- 前記加熱が、少なくとも1つの酸素含有ガスを含む酸化雰囲気において行われる、請求項1に記載の方法。
- 前記加熱の間、前記実質的に緩和したSiGe合金層の下に、Ge拡散に対する抵抗性がある絶縁層を形成する、請求項1に記載の方法。
- 前記実質的に緩和したSiGe合金層の上に追加のSiGe層を成長させるステップを更に有する、請求項1に記載の方法。
- 前記追加のSiGe層の上に歪みSi層を形成するステップを更に有する、請求項13に記載の方法。
- 前記実質的に緩和したSiGe合金層の上に歪みSi層を形成するステップを更に有する、請求項1に記載の方法。
- 基板材料であって、
Si含有基板と、
前記Si含有基板の上に存在するGe拡散に対して抵抗性がある絶縁領域と、
前記絶縁領域の上に存在する実質的に緩和したSiGe合金層と、
を有し、前記実質的に緩和したSiGe合金層が約5000個以下の欠陥/cm2の平面欠陥密度を有する、基板材料。 - ヘテロ構造であって、
前記Si含有基板の上に存在するGe拡散に対して抵抗性がある絶縁領域と、
前記絶縁領域の上に存在する実質的に緩和したSiGe合金層と、
を有し、前記実質的に緩和したSiGe合金層が約5000個以下の欠陥/cm2の平面欠陥密度を有し、更に、
前記実質的に緩和したSiGe合金層の上に形成された歪みSi層と、
を有する、ヘテロ構造。 - 前記歪みSi層の上に緩和SiGeおよび歪みSiの交互の層を形成する、請求項17に記載のヘテロ構造。
- 前記歪みSi層が、GaAsおよびGaPから成る群から選択される格子不整合化合物によって置換される、請求項17に記載のヘテロ構造。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/890,765 US20060011906A1 (en) | 2004-07-14 | 2004-07-14 | Ion implantation for suppression of defects in annealed SiGe layers |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006032962A true JP2006032962A (ja) | 2006-02-02 |
Family
ID=35598530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005204182A Pending JP2006032962A (ja) | 2004-07-14 | 2005-07-13 | 緩和SiGe層の形成方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US20060011906A1 (ja) |
JP (1) | JP2006032962A (ja) |
CN (1) | CN100397571C (ja) |
TW (1) | TWI357097B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007227887A (ja) * | 2006-01-17 | 2007-09-06 | Soi Tec Silicon On Insulator Technologies Sa | 半導体材料で作られた基板の表面上または基板内の歪みを調節するプロセス |
JP2014216555A (ja) * | 2013-04-26 | 2014-11-17 | 株式会社豊田自動織機 | 半導体基板の製造方法 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006140447A (ja) * | 2004-10-14 | 2006-06-01 | Renesas Technology Corp | 半導体装置およびその製造方法 |
US20080050883A1 (en) * | 2006-08-25 | 2008-02-28 | Atmel Corporation | Hetrojunction bipolar transistor (hbt) with periodic multilayer base |
US8530934B2 (en) | 2005-11-07 | 2013-09-10 | Atmel Corporation | Integrated circuit structures containing a strain-compensated compound semiconductor layer and methods and systems related thereto |
US7550758B2 (en) * | 2006-10-31 | 2009-06-23 | Atmel Corporation | Method for providing a nanoscale, high electron mobility transistor (HEMT) on insulator |
US7732309B2 (en) * | 2006-12-08 | 2010-06-08 | Applied Materials, Inc. | Plasma immersed ion implantation process |
US20080153271A1 (en) * | 2006-12-18 | 2008-06-26 | Applied Materials, Inc. | Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafers |
US7524740B1 (en) | 2008-04-24 | 2009-04-28 | International Business Machines Corporation | Localized strain relaxation for strained Si directly on insulator |
CN101958270B (zh) * | 2010-07-09 | 2012-09-26 | 中国科学院上海微***与信息技术研究所 | 一种绝缘体上超薄应变材料的制备方法 |
US10833194B2 (en) | 2010-08-27 | 2020-11-10 | Acorn Semi, Llc | SOI wafers and devices with buried stressor |
US20170323973A1 (en) * | 2010-08-27 | 2017-11-09 | Acorn Technologies, Inc. | Soi wafers and devices with buried stressor |
CN102201364A (zh) * | 2011-05-26 | 2011-09-28 | 北京大学 | 一种绝缘体上锗衬底的制备方法 |
US9876110B2 (en) * | 2014-01-31 | 2018-01-23 | Stmicroelectronics, Inc. | High dose implantation for ultrathin semiconductor-on-insulator substrates |
US9905425B2 (en) | 2014-04-24 | 2018-02-27 | Halliburton Energy Services, Inc. | Engineering the optical properties of an integrated computational element by ion implantation |
US20170179127A1 (en) * | 2015-12-18 | 2017-06-22 | Globalfoundries Inc. | Semiconductor structure having silicon germanium fins and method of fabricating same |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000286413A (ja) * | 1999-03-12 | 2000-10-13 | Internatl Business Mach Corp <Ibm> | 電界効果デバイス用高速複合pチャネルSi/SiGeヘテロ構造 |
JP2002539613A (ja) * | 1999-03-12 | 2002-11-19 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 電界効果デバイス用高速Geチャネル・ヘテロ構造 |
JP2002368230A (ja) * | 2001-05-14 | 2002-12-20 | Sharp Corp | 絶縁体上シリコン基板上に歪Si/SiGe層を用いた良好な移動度を有するNMOSおよびPMOSトランジスタ |
JP2003124476A (ja) * | 1994-09-13 | 2003-04-25 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2003128494A (ja) * | 2001-10-22 | 2003-05-08 | Sharp Corp | 半導体装置の製造方法及び半導体装置 |
JP2003151987A (ja) * | 2001-11-19 | 2003-05-23 | Mitsubishi Heavy Ind Ltd | 半導体基板、及び、半導体基板の製造方法 |
JP2003347399A (ja) * | 2002-05-23 | 2003-12-05 | Sharp Corp | 半導体基板の製造方法 |
JP2004040122A (ja) * | 2002-07-16 | 2004-02-05 | Internatl Business Mach Corp <Ibm> | SiGeオンインシュレータ基板材料及びその製造方法 |
JP2004146472A (ja) * | 2002-10-22 | 2004-05-20 | Sharp Corp | 半導体装置及び半導体装置製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6593625B2 (en) * | 2001-06-12 | 2003-07-15 | International Business Machines Corporation | Relaxed SiGe layers on Si or silicon-on-insulator substrates by ion implantation and thermal annealing |
US6703293B2 (en) * | 2002-07-11 | 2004-03-09 | Sharp Laboratories Of America, Inc. | Implantation at elevated temperatures for amorphization re-crystallization of Si1-xGex films on silicon substrates |
JP4856350B2 (ja) * | 2002-12-16 | 2012-01-18 | Hoya株式会社 | ダイオード |
US6903384B2 (en) * | 2003-01-15 | 2005-06-07 | Sharp Laboratories Of America, Inc. | System and method for isolating silicon germanium dislocation regions in strained-silicon CMOS applications |
EP1647046A2 (en) * | 2003-07-23 | 2006-04-19 | ASM America, Inc. | DEPOSITION OF SiGE ON SILICON-ON-INSULATOR STRUCTURES AND BULK SUBSTRATES |
-
2004
- 2004-07-14 US US10/890,765 patent/US20060011906A1/en not_active Abandoned
-
2005
- 2005-07-04 TW TW094122582A patent/TWI357097B/zh not_active IP Right Cessation
- 2005-07-08 CN CNB2005100832812A patent/CN100397571C/zh not_active Expired - Fee Related
- 2005-07-13 JP JP2005204182A patent/JP2006032962A/ja active Pending
-
2009
- 2009-08-11 US US12/539,248 patent/US8053759B2/en not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003124476A (ja) * | 1994-09-13 | 2003-04-25 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2000286413A (ja) * | 1999-03-12 | 2000-10-13 | Internatl Business Mach Corp <Ibm> | 電界効果デバイス用高速複合pチャネルSi/SiGeヘテロ構造 |
JP2002539613A (ja) * | 1999-03-12 | 2002-11-19 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 電界効果デバイス用高速Geチャネル・ヘテロ構造 |
JP2002368230A (ja) * | 2001-05-14 | 2002-12-20 | Sharp Corp | 絶縁体上シリコン基板上に歪Si/SiGe層を用いた良好な移動度を有するNMOSおよびPMOSトランジスタ |
JP2003128494A (ja) * | 2001-10-22 | 2003-05-08 | Sharp Corp | 半導体装置の製造方法及び半導体装置 |
JP2003151987A (ja) * | 2001-11-19 | 2003-05-23 | Mitsubishi Heavy Ind Ltd | 半導体基板、及び、半導体基板の製造方法 |
JP2003347399A (ja) * | 2002-05-23 | 2003-12-05 | Sharp Corp | 半導体基板の製造方法 |
JP2004040122A (ja) * | 2002-07-16 | 2004-02-05 | Internatl Business Mach Corp <Ibm> | SiGeオンインシュレータ基板材料及びその製造方法 |
JP2004146472A (ja) * | 2002-10-22 | 2004-05-20 | Sharp Corp | 半導体装置及び半導体装置製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007227887A (ja) * | 2006-01-17 | 2007-09-06 | Soi Tec Silicon On Insulator Technologies Sa | 半導体材料で作られた基板の表面上または基板内の歪みを調節するプロセス |
JP2014216555A (ja) * | 2013-04-26 | 2014-11-17 | 株式会社豊田自動織機 | 半導体基板の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1722365A (zh) | 2006-01-18 |
US8053759B2 (en) | 2011-11-08 |
TWI357097B (en) | 2012-01-21 |
CN100397571C (zh) | 2008-06-25 |
US20060011906A1 (en) | 2006-01-19 |
US20100032684A1 (en) | 2010-02-11 |
TW200618077A (en) | 2006-06-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2006032962A (ja) | 緩和SiGe層の形成方法 | |
JP4582487B2 (ja) | SiGeオンインシュレータ基板材料 | |
JP4701181B2 (ja) | 半導体基板材料を製造する方法 | |
US6855436B2 (en) | Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal | |
US7067400B2 (en) | Method for preventing sidewall consumption during oxidation of SGOI islands | |
JP4452132B2 (ja) | シリコンの酸化による欠陥低減 | |
US20050221591A1 (en) | Method of forming high-quality relaxed SiGe alloy layers on bulk Si substrates | |
JP2005516395A (ja) | ひずみ緩和されたSiGeオン・インシュレータ及びその製造方法 | |
US20060057403A1 (en) | Use of thin SOI to inhibit relaxation of SiGe layers | |
US6825102B1 (en) | Method of improving the quality of defective semiconductor material | |
TW201628051A (zh) | 在應變鬆弛緩衝層上方形成具應變之磊晶半導體材料的方法 | |
KR102382500B1 (ko) | 반도체 에피택셜 웨이퍼의 제조 방법 및 반도체 디바이스의 제조 방법 | |
JP2005093797A (ja) | 半導体基板及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080530 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20090206 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110926 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111004 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111213 |
|
RD12 | Notification of acceptance of power of sub attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7432 Effective date: 20111213 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20111214 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120313 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120925 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121211 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20130212 |