IT1010097B - Metodo e dispositivo per deposi zione da fase vapore - Google Patents

Metodo e dispositivo per deposi zione da fase vapore

Info

Publication number: IT1010097B
Authority: IT; Italy
Prior art keywords: phase method; steam phase; steam; phase
Prior art date: 1973-04-27

Application number

IT21909/74A

Other languages

English (en)

Italian (it)

Original Assignee

Philips Nv

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1973-04-27

Filing date

1974-04-24

Publication date

1977-01-10

1974-04-24 Application filed by Philips Nv filed Critical Philips Nv

1977-01-10 Application granted granted Critical

1977-01-10 Publication of IT1010097B publication Critical patent/IT1010097B/it

Links

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/006—Apparatus
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/065—Gp III-V generic compounds-processing

Landscapes

Chemical & Material Sciences (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Chemical Vapour Deposition (AREA)
Crystals, And After-Treatments Of Crystals (AREA)

IT21909/74A 1973-04-27 1974-04-24 Metodo e dispositivo per deposi zione da fase vapore IT1010097B (it)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR7315461A FR2227640B1 (ja)	1973-04-27	1973-04-27

Publications (1)

Publication Number	Publication Date
IT1010097B true IT1010097B (it)	1977-01-10

Family

ID=9118616

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IT21909/74A IT1010097B (it)	1973-04-27	1974-04-24	Metodo e dispositivo per deposi zione da fase vapore

Country Status (9)

Country	Link
US (1)	US3922467A (ja)
JP (1)	JPS5314464B2 (ja)
AU (1)	AU6831374A (ja)
BE (1)	BE814192A (ja)
DE (1)	DE2418662A1 (ja)
FR (1)	FR2227640B1 (ja)
GB (1)	GB1460758A (ja)
IT (1)	IT1010097B (ja)
NL (1)	NL7405442A (ja)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5242075A (en) *	1975-09-29	1977-04-01	Nippon Denso Co Ltd	Device for controlling gas atmosphere in semiconductor producing equip ment
US4279947A (en) *	1975-11-25	1981-07-21	Motorola, Inc.	Deposition of silicon nitride
US4179326A (en) *	1976-04-22	1979-12-18	Fujitsu Limited	Process for the vapor growth of a thin film
FR2354810A1 (fr) *	1976-06-14	1978-01-13	Anvar	Couches monocristallines, procedes de fabrication de telles couches, et structures comportant une couche monocristalline
US4062318A (en) *	1976-11-19	1977-12-13	Rca Corporation	Apparatus for chemical vapor deposition
JPS53126271A (en) *	1977-04-11	1978-11-04	Kokusai Electric Co Ltd	Reduced pressure gaseous growing method and boarding jig
US4225647B1 (en) *	1977-12-02	1995-05-09	Richard A Parent	Articles having thin, continuous, impervious coatings
US4220116A (en) *	1978-10-30	1980-09-02	Burroughs Corporation	Reactant gas flow structure for a low pressure chemical vapor deposition system
NL7812388A (nl) *	1978-12-21	1980-06-24	Philips Nv	Werkwijze voor het vervaardigen van een halfgeleider- inrichting en halfgeleiderinrichting vervaardigd met behulp van de werkwijze.
US4401689A (en) *	1980-01-31	1983-08-30	Rca Corporation	Radiation heated reactor process for chemical vapor deposition on substrates
US4263872A (en) *	1980-01-31	1981-04-28	Rca Corporation	Radiation heated reactor for chemical vapor deposition on substrates
US4355974A (en) *	1980-11-24	1982-10-26	Asq Boats, Inc.	Wafer boat
KR830002904Y1 (ko) *	1982-06-16	1983-12-13	채이순	차수용(遵水用)매드
US4574093A (en) *	1983-12-30	1986-03-04	At&T Bell Laboratories	Deposition technique
US4640223A (en) *	1984-07-24	1987-02-03	Dozier Alfred R	Chemical vapor deposition reactor
JPS6223983A (ja) *	1985-07-25	1987-01-31	Anelva Corp	真空化学反応装置
US4834022A (en) *	1985-11-08	1989-05-30	Focus Semiconductor Systems, Inc.	CVD reactor and gas injection system
FR2604297B1 (fr) *	1986-09-19	1989-03-10	Pauleau Yves	Reacteur de depot de silicium dope
JPS63162862U (ja) *	1988-03-16	1988-10-24
US4993358A (en) *	1989-07-28	1991-02-19	Watkins-Johnson Company	Chemical vapor deposition reactor and method of operation
KR20040047874A (ko) *	2001-09-29	2004-06-05	크리, 인코포레이티드	반전(反轉)된 화학 증착(ｃｖｄ)용 장치
JP2012004408A (ja) *	2010-06-18	2012-01-05	Tokyo Electron Ltd	支持体構造及び処理装置
JP2015145317A (ja) *	2014-01-31	2015-08-13	ヤマハ株式会社	カーボンナノチューブの製造装置
JP2015185750A (ja) *	2014-03-25	2015-10-22	東京エレクトロン株式会社	真空処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3409483A (en) *	1964-05-01	1968-11-05	Texas Instruments Inc	Selective deposition of semiconductor materials
US3816166A (en) *	1970-03-11	1974-06-11	Philips Corp	Vapor depositing method
US3678893A (en) *	1970-05-01	1972-07-25	Stewart Warner Corp	Improved device for supporting semiconductor wafers

1973
- 1973-04-27 FR FR7315461A patent/FR2227640B1/fr not_active Expired
1974
- 1974-04-18 DE DE2418662A patent/DE2418662A1/de active Pending
- 1974-04-23 NL NL7405442A patent/NL7405442A/xx not_active Application Discontinuation
- 1974-04-24 IT IT21909/74A patent/IT1010097B/it active
- 1974-04-24 GB GB1788974A patent/GB1460758A/en not_active Expired
- 1974-04-25 BE BE143618A patent/BE814192A/xx unknown
- 1974-04-26 US US464574A patent/US3922467A/en not_active Expired - Lifetime
- 1974-04-26 JP JP4671574A patent/JPS5314464B2/ja not_active Expired
- 1974-04-26 AU AU68313/74A patent/AU6831374A/en not_active Expired

Also Published As

Publication number	Publication date
JPS5016476A (ja)	1975-02-21
US3922467A (en)	1975-11-25
DE2418662A1 (de)	1974-11-21
BE814192A (fr)	1974-10-25
FR2227640B1 (ja)	1977-12-30
GB1460758A (en)	1977-01-06
FR2227640A1 (ja)	1974-11-22
NL7405442A (ja)	1974-10-29
JPS5314464B2 (ja)	1978-05-17
AU6831374A (en)	1975-10-30

Publication	Publication Date	Title
IT1010097B (it)	1977-01-10	Metodo e dispositivo per deposi zione da fase vapore
IT1040536B (it)	1979-12-20	Dispositivo generatore
IS2193A7 (is)	1974-08-29	Gufuhárliðunartæki
AR202489A1 (es)	1975-06-13	Aparato electroquirurgico
NO145019C (no)	1981-12-28	Vandige blandinger for belegning av papir og papp
SE397208B (sv)	1977-10-24	Tetningsanordning
BR7405108D0 (pt)	1975-01-07	Dispositivo empanque aperfeicoado
IT975413B (it)	1974-07-20	Apparecchio disgregatore omogeneiz zatore particolarmente per pigmenti
NO142370C (no)	1980-08-13	Fremgangsmaate og apparat til frembringelse av en virkelig noeytronkarakteristikk for en jordformasjon
AT335243B (de)	1977-02-25	Dichtungsvorrichtung
AT356144B (de)	1980-04-10	Dampferzeuger
BE819418A (fr)	1974-12-16	Generateur de vapeur
NO137576C (no)	1978-03-21	Fremgangsmaate og innretning til toerking av berme
AT336044B (de)	1977-04-12	Dampferzeuger
AR194454A1 (es)	1973-07-13	Un aparato plegador
BE815873A (fr)	1974-09-30	Generateur a vapeur
IT1028204B (it)	1979-01-30	Metodo di deposizione da fase vapore
AT365761B (de)	1982-02-10	Dampferzeuger
AT353292B (de)	1979-11-12	Dampferzeuger
BE815814A (fr)	1974-09-16	Generateur de vapeur
IT998640B (it)	1976-02-20	Dispositivo per imballaggio
AR200816A1 (es)	1974-12-13	Metodo de embalaje
AT340036B (de)	1977-11-25	Abdichtungsvorrichtung
SE405399B (sv)	1978-12-04	Synkroniseringsanordning
BE798390A (fr)	1973-10-18	Pigments azoiques quinazoloniques