JPS5016476A - - Google Patents

Info

Publication number
JPS5016476A
JPS5016476A JP49046715A JP4671574A JPS5016476A JP S5016476 A JPS5016476 A JP S5016476A JP 49046715 A JP49046715 A JP 49046715A JP 4671574 A JP4671574 A JP 4671574A JP S5016476 A JPS5016476 A JP S5016476A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49046715A
Other versions
JPS5314464B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5016476A publication Critical patent/JPS5016476A/ja
Publication of JPS5314464B2 publication Critical patent/JPS5314464B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/006—Apparatus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/065—Gp III-V generic compounds-processing

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP4671574A 1973-04-27 1974-04-26 Expired JPS5314464B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7315461A FR2227640B1 (ja) 1973-04-27 1973-04-27

Publications (2)

Publication Number Publication Date
JPS5016476A true JPS5016476A (ja) 1975-02-21
JPS5314464B2 JPS5314464B2 (ja) 1978-05-17

Family

ID=9118616

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4671574A Expired JPS5314464B2 (ja) 1973-04-27 1974-04-26

Country Status (9)

Country Link
US (1) US3922467A (ja)
JP (1) JPS5314464B2 (ja)
AU (1) AU6831374A (ja)
BE (1) BE814192A (ja)
DE (1) DE2418662A1 (ja)
FR (1) FR2227640B1 (ja)
GB (1) GB1460758A (ja)
IT (1) IT1010097B (ja)
NL (1) NL7405442A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53126271A (en) * 1977-04-11 1978-11-04 Kokusai Electric Co Ltd Reduced pressure gaseous growing method and boarding jig
JPS5588321A (en) * 1978-12-21 1980-07-04 Philips Nv Method of fabricating semiconductor device
JPS5950722U (ja) * 1982-06-16 1984-04-04 「ちゅ」　利順 遮水用マツト
JPS6223983A (ja) * 1985-07-25 1987-01-31 Anelva Corp 真空化学反応装置
JPS63162862U (ja) * 1988-03-16 1988-10-24
JP2015145317A (ja) * 2014-01-31 2015-08-13 ヤマハ株式会社 カーボンナノチューブの製造装置

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5242075A (en) * 1975-09-29 1977-04-01 Nippon Denso Co Ltd Device for controlling gas atmosphere in semiconductor producing equip ment
US4279947A (en) * 1975-11-25 1981-07-21 Motorola, Inc. Deposition of silicon nitride
US4179326A (en) * 1976-04-22 1979-12-18 Fujitsu Limited Process for the vapor growth of a thin film
FR2354810A1 (fr) * 1976-06-14 1978-01-13 Anvar Couches monocristallines, procedes de fabrication de telles couches, et structures comportant une couche monocristalline
US4062318A (en) * 1976-11-19 1977-12-13 Rca Corporation Apparatus for chemical vapor deposition
US4225647B1 (en) * 1977-12-02 1995-05-09 Richard A Parent Articles having thin, continuous, impervious coatings
US4220116A (en) * 1978-10-30 1980-09-02 Burroughs Corporation Reactant gas flow structure for a low pressure chemical vapor deposition system
US4401689A (en) * 1980-01-31 1983-08-30 Rca Corporation Radiation heated reactor process for chemical vapor deposition on substrates
US4263872A (en) * 1980-01-31 1981-04-28 Rca Corporation Radiation heated reactor for chemical vapor deposition on substrates
US4355974A (en) * 1980-11-24 1982-10-26 Asq Boats, Inc. Wafer boat
US4574093A (en) * 1983-12-30 1986-03-04 At&T Bell Laboratories Deposition technique
US4640223A (en) * 1984-07-24 1987-02-03 Dozier Alfred R Chemical vapor deposition reactor
US4834022A (en) * 1985-11-08 1989-05-30 Focus Semiconductor Systems, Inc. CVD reactor and gas injection system
FR2604297B1 (fr) * 1986-09-19 1989-03-10 Pauleau Yves Reacteur de depot de silicium dope
US4993358A (en) * 1989-07-28 1991-02-19 Watkins-Johnson Company Chemical vapor deposition reactor and method of operation
TWI322462B (en) * 2001-09-29 2010-03-21 Cree Inc Apparatus for inverted multi-wafer mocvd fabrication
JP2012004408A (ja) * 2010-06-18 2012-01-05 Tokyo Electron Ltd 支持体構造及び処理装置
JP2015185750A (ja) * 2014-03-25 2015-10-22 東京エレクトロン株式会社 真空処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3409483A (en) * 1964-05-01 1968-11-05 Texas Instruments Inc Selective deposition of semiconductor materials
US3816166A (en) * 1970-03-11 1974-06-11 Philips Corp Vapor depositing method
US3678893A (en) * 1970-05-01 1972-07-25 Stewart Warner Corp Improved device for supporting semiconductor wafers

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53126271A (en) * 1977-04-11 1978-11-04 Kokusai Electric Co Ltd Reduced pressure gaseous growing method and boarding jig
JPS5588321A (en) * 1978-12-21 1980-07-04 Philips Nv Method of fabricating semiconductor device
JPS5950722U (ja) * 1982-06-16 1984-04-04 「ちゅ」　利順 遮水用マツト
JPS6223983A (ja) * 1985-07-25 1987-01-31 Anelva Corp 真空化学反応装置
JPS63162862U (ja) * 1988-03-16 1988-10-24
JP2015145317A (ja) * 2014-01-31 2015-08-13 ヤマハ株式会社 カーボンナノチューブの製造装置

Also Published As

Publication number Publication date
AU6831374A (en) 1975-10-30
BE814192A (fr) 1974-10-25
US3922467A (en) 1975-11-25
NL7405442A (ja) 1974-10-29
DE2418662A1 (de) 1974-11-21
FR2227640B1 (ja) 1977-12-30
FR2227640A1 (ja) 1974-11-22
IT1010097B (it) 1977-01-10
JPS5314464B2 (ja) 1978-05-17
GB1460758A (en) 1977-01-06

Similar Documents

Publication Publication Date Title
AR201758A1 (ja)
AU465372B2 (ja)
AR201235Q (ja)
AR201231Q (ja)
AU474593B2 (ja)
AU474511B2 (ja)
FR2227640B1 (ja)
AU465453B2 (ja)
AU465434B2 (ja)
AU471343B2 (ja)
AU450229B2 (ja)
AR201229Q (ja)
AU466283B2 (ja)
AU472848B2 (ja)
AR199451A1 (ja)
AR197627A1 (ja)
AU447540B2 (ja)
AR195311A1 (ja)
AR195948A1 (ja)
AR200885A1 (ja)
AU471461B2 (ja)
AR196382A1 (ja)
AR200256A1 (ja)
AR201432A1 (ja)
AU461342B2 (ja)