HK1057584A1 - Thick single crystal diamond layer, method for making it and gemstones produced from the layer - Google Patents

Thick single crystal diamond layer, method for making it and gemstones produced from the layer

Info

Publication number
HK1057584A1
HK1057584A1 HK04100293A HK04100293A HK1057584A1 HK 1057584 A1 HK1057584 A1 HK 1057584A1 HK 04100293 A HK04100293 A HK 04100293A HK 04100293 A HK04100293 A HK 04100293A HK 1057584 A1 HK1057584 A1 HK 1057584A1
Authority
HK
Hong Kong
Prior art keywords
layer
single crystal
making
crystal diamond
thick single
Prior art date
Application number
HK04100293A
Other languages
English (en)
Inventor
Geoffrey Alan Scarsbrook
Philip Maurice Martineau
Barbel Susanne Charlotte Dorn
Andrew Michael Cooper
John Lloyd Collins
Andrew John Whitehead
Daniel James Twitchen
Ricardo Simon Sussmann
Original Assignee
Element Six Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0014690A external-priority patent/GB0014690D0/en
Priority claimed from GB0106929A external-priority patent/GB0106929D0/en
Application filed by Element Six Pty Ltd filed Critical Element Six Pty Ltd
Publication of HK1057584A1 publication Critical patent/HK1057584A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/10Heating of the reaction chamber or the substrate
    • C30B25/105Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CPERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C17/00Gems or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/06Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/18Epitaxial-layer growth characterised by the substrate
    • C30B25/20Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/04Diamond
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2203/00Processes utilising sub- or super atmospheric pressure
    • B01J2203/06High pressure synthesis
    • B01J2203/0605Composition of the material to be processed
    • B01J2203/062Diamond
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2203/00Processes utilising sub- or super atmospheric pressure
    • B01J2203/06High pressure synthesis
    • B01J2203/065Composition of the material produced
    • B01J2203/0655Diamond
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/30Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Drying Of Semiconductors (AREA)
  • Inorganic Insulating Materials (AREA)
HK04100293A 2000-06-15 2004-01-15 Thick single crystal diamond layer, method for making it and gemstones produced from the layer HK1057584A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0014690A GB0014690D0 (en) 2000-06-15 2000-06-15 Diamond
GB0106929A GB0106929D0 (en) 2001-03-20 2001-03-20 Diamond
PCT/IB2001/001040 WO2001096634A1 (en) 2000-06-15 2001-06-14 Thick single crystal diamond layer method for making it and gemstones produced from the layer

Publications (1)

Publication Number Publication Date
HK1057584A1 true HK1057584A1 (en) 2004-04-08

Family

ID=26244496

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04100293A HK1057584A1 (en) 2000-06-15 2004-01-15 Thick single crystal diamond layer, method for making it and gemstones produced from the layer

Country Status (17)

Country Link
US (3) US7128974B2 (cs)
EP (2) EP1290251B8 (cs)
JP (1) JP4469552B2 (cs)
KR (1) KR100839707B1 (cs)
CN (1) CN1210445C (cs)
AT (1) ATE311486T1 (cs)
AU (2) AU6624601A (cs)
CA (1) CA2412855C (cs)
CZ (1) CZ302229B6 (cs)
DE (1) DE60115435T2 (cs)
ES (1) ES2252244T3 (cs)
GB (1) GB2379451B (cs)
HK (1) HK1057584A1 (cs)
IL (2) IL153381A0 (cs)
RU (1) RU2287028C2 (cs)
TW (1) TWI250231B (cs)
WO (1) WO2001096634A1 (cs)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6582513B1 (en) 1998-05-15 2003-06-24 Apollo Diamond, Inc. System and method for producing synthetic diamond
US6858080B2 (en) 1998-05-15 2005-02-22 Apollo Diamond, Inc. Tunable CVD diamond structures
US8591856B2 (en) 1998-05-15 2013-11-26 SCIO Diamond Technology Corporation Single crystal diamond electrochemical electrode
DE60135653D1 (de) * 2000-06-15 2008-10-16 Element Six Pty Ltd Einkristalldiamant hergestellt durch cvd
WO2003014427A1 (en) 2001-08-08 2003-02-20 Apollo Diamond, Inc. System and method for producing synthetic diamond
DE10153310A1 (de) * 2001-10-29 2003-05-22 Infineon Technologies Ag Photolithographisches Strukturierungsverfahren mit einer durch ein plasmaunterstützes Abscheideeverfahren hergestellten Kohlenstoff-Hartmaskenschicht diamantartiger Härte
GB0130004D0 (en) 2001-12-14 2002-02-06 Diamanx Products Ltd Coloured diamond
GB0130005D0 (en) * 2001-12-14 2002-02-06 Diamanx Products Ltd Boron doped diamond
GB0220772D0 (en) * 2002-09-06 2002-10-16 Diamanx Products Ltd Coloured diamond
GB0220767D0 (en) * 2002-09-06 2002-10-16 Diamanx Products Ltd Diamond radiation detector
KR101052395B1 (ko) * 2002-09-06 2011-07-28 엘리멘트 식스 리미티드 유색 다이아몬드
GB0221949D0 (en) * 2002-09-20 2002-10-30 Diamanx Products Ltd Single crystal diamond
GB0227261D0 (en) * 2002-11-21 2002-12-31 Element Six Ltd Optical quality diamond material
FR2849867B1 (fr) 2003-01-10 2005-03-25 Centre Nat Rech Scient Croissance diamant a grande vitesse par plasma micro-onde en regime pulse.
GB0303860D0 (en) * 2003-02-19 2003-03-26 Element Six Ltd CVD diamond in wear applications
CN1914126B (zh) * 2003-12-12 2010-09-29 六号元素有限公司 在cvd金刚石中引入标记的方法
US7481879B2 (en) 2004-01-16 2009-01-27 Sumitomo Electric Industries, Ltd. Diamond single crystal substrate manufacturing method and diamond single crystal substrate
JP4697514B2 (ja) * 2004-01-16 2011-06-08 住友電気工業株式会社 ダイヤモンド単結晶基板の製造方法およびダイヤモンド単結晶基板
US7918293B1 (en) 2005-03-09 2011-04-05 Us Synthetic Corporation Method and system for perceiving a boundary between a first region and a second region of a superabrasive volume
JP5002982B2 (ja) * 2005-04-15 2012-08-15 住友電気工業株式会社 単結晶ダイヤモンドの製造方法
GB0508889D0 (en) * 2005-04-29 2005-06-08 Element Six Ltd Diamond transistor and method of manufacture thereof
EP2253733B1 (en) 2005-06-22 2012-03-21 Element Six Limited High colour diamond
US9133566B2 (en) 2005-12-09 2015-09-15 Element Six Technologies Limited High crystalline quality synthetic diamond
GB0622695D0 (en) 2006-11-14 2006-12-27 Element Six Ltd Robust radiation detector comprising diamond
JP5341774B2 (ja) 2007-01-22 2013-11-13 エレメント シックス リミテッド ダイヤモンド表面のプラズマエッチング
JP5514552B2 (ja) * 2007-01-29 2014-06-04 カーネギー インスチチューション オブ ワシントン 単結晶cvdダイヤモンドの新規なレーザー用途
JP5223201B2 (ja) * 2007-01-29 2013-06-26 日本電気株式会社 電界効果トランジスタ
JP5504565B2 (ja) * 2008-02-07 2014-05-28 独立行政法人物質・材料研究機構 ダイヤモンド紫外線センサー素子とその製造方法、並びに紫外線センサー装置
WO2009114130A2 (en) * 2008-03-13 2009-09-17 Michigan State University Process and apparatus for diamond synthesis
US20090260396A1 (en) * 2008-04-16 2009-10-22 Eitan Broukman Methods for processing ornamental diamonds and corresponding ornamental diamonds
US8342164B2 (en) * 2008-05-09 2013-01-01 SCIO Diamond Technology Corporation Gemstone production from CVD diamond plate
GB0813490D0 (en) 2008-07-23 2008-08-27 Element Six Ltd Solid state material
GB0813491D0 (en) * 2008-07-23 2008-08-27 Element Six Ltd Diamond Material
GB0819001D0 (en) 2008-10-16 2008-11-26 Diamond Detectors Ltd Contacts on diamond
CN102575379B (zh) * 2009-06-26 2015-06-03 六号元素有限公司 用于制备鲜艳橙色着色的单晶cvd金刚石的方法及其获得的产品
US9255009B2 (en) 2009-06-26 2016-02-09 Element Six Technologies Limited Diamond material
KR101130049B1 (ko) * 2009-09-08 2012-03-28 김일천 다이아몬드상 카본 박막 코팅 피스톤 및 그 제조방법
GB201000768D0 (en) 2010-01-18 2010-03-03 Element Six Ltd CVD single crystal diamond material
US9017633B2 (en) 2010-01-18 2015-04-28 Element Six Technologies Limited CVD single crystal diamond material
TW201204863A (en) * 2010-05-17 2012-02-01 Carnegie Inst Of Washington Production of large, high purity single crystal CVD diamond
GB201013112D0 (en) * 2010-08-04 2010-09-22 Element Six Ltd A diamond optical element
US9277792B2 (en) * 2010-08-24 2016-03-08 Board Of Trustees Of Michigan State University Multicolored single crystal diamond gemstones and methods for forming the same
GB201015260D0 (en) 2010-09-14 2010-10-27 Element Six Ltd A microfluidic cell and a spin resonance device for use therewith
GB201021985D0 (en) 2010-12-24 2011-02-02 Element Six Ltd Dislocation engineering in single crystal synthetic diamond material
GB201104579D0 (en) * 2011-03-18 2011-05-04 Element Six Ltd Diamond based electrochemical sensors
GB201107730D0 (en) 2011-05-10 2011-06-22 Element Six Ltd Diamond sensors, detectors and quantum devices
US20130026492A1 (en) * 2011-07-30 2013-01-31 Akhan Technologies Inc. Diamond Semiconductor System and Method
US8969833B1 (en) 2011-12-16 2015-03-03 Us Synthetic Corporation Method and system for perceiving a boundary between a first region and a second region of a superabrasive volume
GB201121642D0 (en) 2011-12-16 2012-01-25 Element Six Ltd Single crtstal cvd synthetic diamond material
US8933462B2 (en) * 2011-12-21 2015-01-13 Akhan Semiconductor, Inc. Method of fabricating diamond semiconductor and diamond semiconductor formed according to the method
WO2013103929A1 (en) * 2012-01-06 2013-07-11 Akhan Technologies, Inc. Diamond semiconductor system and method
GB201216697D0 (en) * 2012-09-19 2012-10-31 Element Six Ltd Single crystal chemical vapour deposited synthetic diamond materials having uniform colour
CN103305807B (zh) * 2013-05-07 2015-06-24 大连理工大学 一种制备氮掺杂纳米金刚石的方法及其电催化应用
GB201320304D0 (en) * 2013-11-18 2014-01-01 Element Six Ltd Methods of fabricating synthetic diamond materials using microwave plasma actived chemical vapour deposition techniques and products obtained using said
US10697058B2 (en) 2014-07-22 2020-06-30 Sumitomo Electric Industries, Ltd. Single-crystal diamond, method of producing same, tool including single-crystal diamond, and component including single-crystal diamond
CN114655953B (zh) 2014-08-08 2024-07-23 住友电气工业株式会社 制造金刚石的方法、金刚石、金刚石复合基板、金刚石接合基板和工具
PT3045570T (pt) 2015-01-14 2019-09-27 Iia Tech Pte Ltd Diamantes de cristal único de grau de dispositivo eletrónico e respetivo método de produção
SG10201505413VA (en) * 2015-01-14 2016-08-30 Iia Technologies Pte Ltd Electronic device grade single crystal diamonds and method of producing the same
CN104911702B (zh) * 2015-04-29 2017-07-28 西安交通大学 基于自组装工艺的高质量单晶金刚石生长方法
GB201516814D0 (en) 2015-09-23 2015-11-04 Element Six Technologies Ltd Method of fabricating a plurality of single crystal CVD synthetic diamonds
WO2017126561A1 (ja) 2016-01-22 2017-07-27 住友電気工業株式会社 単結晶ダイヤモンド、単結晶ダイヤモンドの製造方法およびそれに用いられる化学気相堆積装置
GB201610053D0 (en) * 2016-06-09 2016-07-27 Element Six Tech Ltd Synthetic diamond heat spreaders
US9922823B1 (en) * 2016-09-07 2018-03-20 Euclid Techlabs, Llc CVD reactor and method for nanometric delta doping of diamond
GB201620413D0 (en) 2016-12-01 2017-01-18 Element Six Tech Ltd Single crystal synthetic diamond material via chemical vapour deposition
ES2724214B2 (es) 2018-03-01 2020-01-15 Business Res And Diamonds S L Procedimiento para la obtencion de diamantes sinteticos a partir de la sacarosa y equipo para llevar a cabo dicho procedimiento
GB201904435D0 (en) 2019-03-29 2019-05-15 Element Six Tech Ltd Single crystal synthetic diamond material
CN109911894A (zh) * 2019-03-31 2019-06-21 河北地质大学 微波等离子体化学气相沉积法生长多晶金刚石片的方法
GB202003310D0 (en) * 2020-03-06 2020-04-22 Element Six Tech Ltd Method for forming diamond product
US11185139B1 (en) 2021-03-04 2021-11-30 Oujie Kevin Tong Coating compositions and method for jewelries
GB2614521A (en) 2021-10-19 2023-07-12 Element Six Tech Ltd CVD single crystal diamond
GB2614068B (en) 2021-12-21 2024-05-22 Element Six Tech Ltd Sensor device
GB2614530A (en) 2021-12-23 2023-07-12 Element Six Tech Ltd Diamond sensor
CN114941173B (zh) * 2022-05-26 2023-10-10 曲阜师范大学 一种高相干金刚石氮空穴及金刚石压砧的制备与应用
GB202219497D0 (en) 2022-12-22 2023-02-08 Element Six Tech Ltd Single crystal diamond

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US246762A (en) * 1881-09-06 Preserving wood
US248810A (en) * 1881-10-25 Ttorney
US2317176A (en) * 1941-05-14 1943-04-20 Marie A Byrd Container bag and outer garment
JP2571795B2 (ja) 1987-11-17 1997-01-16 住友電気工業株式会社 紫色ダイヤモンドおよびその製造方法
JP2691219B2 (ja) 1988-10-17 1997-12-17 並木精密宝石株式会社 ダイヤモンドの合成法
JP2730145B2 (ja) * 1989-03-07 1998-03-25 住友電気工業株式会社 単結晶ダイヤモンド層の形成法
JP2730144B2 (ja) * 1989-03-07 1998-03-25 住友電気工業株式会社 単結晶ダイヤモンド層形成法
US6007916A (en) * 1989-04-06 1999-12-28 Sumitomo Electric Industries, Ltd. Synthetic single crystal diamond for wiring drawing dies and process for producing the same
US5127983A (en) * 1989-05-22 1992-07-07 Sumitomo Electric Industries, Ltd. Method of producing single crystal of high-pressure phase material
AU634601B2 (en) * 1989-12-11 1993-02-25 General Electric Company Single-crystal diamond of very high thermal conductivity
US5360479A (en) * 1990-07-02 1994-11-01 General Electric Company Isotopically pure single crystal epitaxial diamond films and their preparation
US5704976A (en) * 1990-07-06 1998-01-06 The United States Of America As Represented By The Secretary Of The Navy High temperature, high rate, epitaxial synthesis of diamond in a laminar plasma
CA2049673A1 (en) * 1990-11-26 1992-05-27 James F. Fleischer Cvd diamond by alternating chemical reactions
JPH04305096A (ja) * 1991-04-01 1992-10-28 Sumitomo Electric Ind Ltd 高品質気相合成ダイヤモンドの低温形成法
US5614019A (en) * 1992-06-08 1997-03-25 Air Products And Chemicals, Inc. Method for the growth of industrial crystals
US5443032A (en) * 1992-06-08 1995-08-22 Air Products And Chemicals, Inc. Method for the manufacture of large single crystals
EP0582397A3 (en) * 1992-08-05 1995-01-25 Crystallume CVD diamond material for radiation detector and method for manufacturing the same.
US5334283A (en) * 1992-08-31 1994-08-02 The University Of North Carolina At Chapel Hill Process for selectively etching diamond
US5474021A (en) 1992-09-24 1995-12-12 Sumitomo Electric Industries, Ltd. Epitaxial growth of diamond from vapor phase
JPH06107494A (ja) 1992-09-24 1994-04-19 Sumitomo Electric Ind Ltd ダイヤモンドの気相成長法
JP3314444B2 (ja) 1993-03-15 2002-08-12 住友電気工業株式会社 赤色ダイヤモンドおよび桃色ダイヤモンド
CA2127832C (en) * 1993-07-20 2001-02-20 Grant Lu Cvd diamond radiation detector
US5390409A (en) * 1993-08-27 1995-02-21 General Electric Co. Methods of manufacturing of generator stator frames
JP3484749B2 (ja) 1994-04-04 2004-01-06 住友電気工業株式会社 ダイヤモンドの合成法
EP0688026A1 (en) * 1994-06-17 1995-12-20 General Electric Company Resistor coated on diamond substrate
US5587210A (en) * 1994-06-28 1996-12-24 The United States Of America As Represented By The Secretary Of The Navy Growing and releasing diamonds
JP4291886B2 (ja) 1994-12-05 2009-07-08 住友電気工業株式会社 低欠陥ダイヤモンド単結晶及びその合成方法
GB9616043D0 (en) * 1996-07-31 1996-09-11 De Beers Ind Diamond Diamond
JP4032482B2 (ja) 1997-04-18 2008-01-16 住友電気工業株式会社 単結晶ダイヤモンドの製造方法
JPH11107596A (ja) 1997-10-07 1999-04-20 Osamu Ito 地震揺れを検知して作動する自動解錠装置
JP3125046B2 (ja) * 1997-11-21 2001-01-15 工業技術院長 ダイヤモンド単結晶薄膜製造方法
US6582513B1 (en) * 1998-05-15 2003-06-24 Apollo Diamond, Inc. System and method for producing synthetic diamond
DE60135653D1 (de) * 2000-06-15 2008-10-16 Element Six Pty Ltd Einkristalldiamant hergestellt durch cvd
GB0130004D0 (en) * 2001-12-14 2002-02-06 Diamanx Products Ltd Coloured diamond
GB0130005D0 (en) * 2001-12-14 2002-02-06 Diamanx Products Ltd Boron doped diamond
KR101052395B1 (ko) * 2002-09-06 2011-07-28 엘리멘트 식스 리미티드 유색 다이아몬드
GB0221949D0 (en) * 2002-09-20 2002-10-30 Diamanx Products Ltd Single crystal diamond
GB0227261D0 (en) * 2002-11-21 2002-12-31 Element Six Ltd Optical quality diamond material

Also Published As

Publication number Publication date
AU2001266246B2 (en) 2004-10-07
US20070148079A1 (en) 2007-06-28
ES2252244T3 (es) 2006-05-16
KR100839707B1 (ko) 2008-06-19
US7128974B2 (en) 2006-10-31
EP1290251A1 (en) 2003-03-12
DE60115435T2 (de) 2006-08-31
TWI250231B (en) 2006-03-01
CZ20024228A3 (cs) 2003-12-17
CA2412855A1 (en) 2001-12-20
GB2379451A (en) 2003-03-12
JP4469552B2 (ja) 2010-05-26
EP1632590A2 (en) 2006-03-08
US20080044339A1 (en) 2008-02-21
CA2412855C (en) 2009-10-20
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