GB9917305D0 - Method and apparatus for anisotropic etching - Google Patents

Method and apparatus for anisotropic etching

Info

Publication number: GB9917305D0
Authority: GB; United Kingdom
Prior art keywords: anisotropic etching; anisotropic; etching
Prior art date: 1999-07-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

GBGB9917305.6A

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Surface Technology Systems Ltd

Original Assignee

Surface Technology Systems Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-07-23

Filing date

1999-07-23

Publication date

1999-09-22

1999-07-23 Application filed by Surface Technology Systems Ltd filed Critical Surface Technology Systems Ltd

1999-07-23 Priority to GBGB9917305.6A priority Critical patent/GB9917305D0/en

1999-09-22 Publication of GB9917305D0 publication Critical patent/GB9917305D0/en

2000-07-24 Priority to PCT/GB2000/002786 priority patent/WO2001008207A1/en

Status Ceased legal-status Critical Current

Links

GBGB9917305.6A 1999-07-23 1999-07-23 Method and apparatus for anisotropic etching Ceased GB9917305D0 (en)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
GBGB9917305.6A GB9917305D0 (en)	1999-07-23	1999-07-23	Method and apparatus for anisotropic etching
PCT/GB2000/002786 WO2001008207A1 (en)	1999-07-23	2000-07-24	Method and apparatus for anisotropic etching

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GBGB9917305.6A GB9917305D0 (en)	1999-07-23	1999-07-23	Method and apparatus for anisotropic etching

Publications (1)

Publication Number	Publication Date
GB9917305D0 true GB9917305D0 (en)	1999-09-22

Family

ID=10857802

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GBGB9917305.6A Ceased GB9917305D0 (en)	1999-07-23	1999-07-23	Method and apparatus for anisotropic etching

Country Status (2)

Country	Link
GB (1)	GB9917305D0 (en)
WO (1)	WO2001008207A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6284666B1 (en) *	2000-05-31	2001-09-04	International Business Machines Corporation	Method of reducing RIE lag for deep trench silicon etching
JP2012521075A (en) *	2009-03-17	2012-09-10	ロートウントラウアーゲー	Substrate processing apparatus and substrate processing method
JP2022519724A (en) *	2019-02-08	2022-03-24	コーニングインコーポレイテッド	A method for laser machining transparent workpieces using a pulsed laser beam focal lens and steam etching

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4749440A (en) *	1985-08-28	1988-06-07	Fsi Corporation	Gaseous process and apparatus for removing films from substrates
DE4241045C1 (en) *	1992-12-05	1994-05-26	Bosch Gmbh Robert	Process for anisotropic etching of silicon
EP1357584A3 (en) *	1996-08-01	2005-01-12	Surface Technology Systems Plc	Method of surface treatment of semiconductor substrates
US5899741A (en) *	1998-03-18	1999-05-04	Taiwan Semiconductor Manufacturing Company Ltd.	Method of manufacturing low resistance and low junction leakage contact

1999
- 1999-07-23 GB GBGB9917305.6A patent/GB9917305D0/en not_active Ceased
2000
- 2000-07-24 WO PCT/GB2000/002786 patent/WO2001008207A1/en active Application Filing

Also Published As

Publication number	Publication date
WO2001008207A1 (en)	2001-02-01
WO2001008207A8 (en)	2001-07-12

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Legal Events

Date	Code	Title	Description
2000-11-01	AT	Applications terminated before publication under section 16(1)