GB1295465A - - Google Patents
Info
- Publication number
- GB1295465A GB1295465A GB1295465DA GB1295465A GB 1295465 A GB1295465 A GB 1295465A GB 1295465D A GB1295465D A GB 1295465DA GB 1295465 A GB1295465 A GB 1295465A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrode
- ion beam
- extractor
- beam apparatus
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
1295465 Electron beam apparatus; ion beam apparatus ELEKTROMAT VEB 11 Nov 1969 55639/69 Heading H1D [Also in Division C7] A multi-beam ion source or electron gun for ion beam or plasma sputtering apparatus comprises four arrangements as described in Specification 1,294,697 combined in a single system. The system comprises four ionization chambers 10, each having a heated gathode 11, and a cylindrical anode 12 in a double-walled aluminium alloy cylinder 14 which is cooled and has a magnetic coil 15. A removable extractor unit is positioned downstream of each ionization chamber and comprises a counter cathode 13, control electrode 18, extraction electrode 19, protection electrode 20 and spacing rings 21. The electrodes of the extractor system have parts in the form of grids which may be relatively adjustable and they may be flat or concave.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB5503969 | 1969-11-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1295465A true GB1295465A (en) | 1972-11-08 |
Family
ID=10472776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1295465D Expired GB1295465A (en) | 1969-11-11 | 1969-11-11 |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1295465A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5296122A (en) * | 1989-03-29 | 1994-03-22 | Teruaki Katsube | Apparatus for forming thin film |
US5741404A (en) * | 1996-05-24 | 1998-04-21 | Micron Technology, Inc. | Multi-planar angulated sputtering target and method of use for filling openings |
WO2002048424A1 (en) * | 2000-12-14 | 2002-06-20 | Nordiko Limited | Ion beam sputtering apparatus |
WO2008009898A1 (en) * | 2006-07-20 | 2008-01-24 | Aviza Technology Limited | Ion sources |
US8400063B2 (en) | 2006-07-20 | 2013-03-19 | Aviza Technology Limited | Plasma sources |
US8425741B2 (en) | 2006-07-20 | 2013-04-23 | Aviza Technology Limited | Ion deposition apparatus having rotatable carousel for supporting a plurality of targets |
-
1969
- 1969-11-11 GB GB1295465D patent/GB1295465A/en not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5296122A (en) * | 1989-03-29 | 1994-03-22 | Teruaki Katsube | Apparatus for forming thin film |
US5741404A (en) * | 1996-05-24 | 1998-04-21 | Micron Technology, Inc. | Multi-planar angulated sputtering target and method of use for filling openings |
WO2002048424A1 (en) * | 2000-12-14 | 2002-06-20 | Nordiko Limited | Ion beam sputtering apparatus |
WO2008009898A1 (en) * | 2006-07-20 | 2008-01-24 | Aviza Technology Limited | Ion sources |
CN101490789B (en) * | 2006-07-20 | 2011-04-13 | 阿维扎技术有限公司 | Ion sources |
US8354652B2 (en) | 2006-07-20 | 2013-01-15 | Aviza Technology Limited | Ion source including separate support systems for accelerator grids |
US8400063B2 (en) | 2006-07-20 | 2013-03-19 | Aviza Technology Limited | Plasma sources |
US8425741B2 (en) | 2006-07-20 | 2013-04-23 | Aviza Technology Limited | Ion deposition apparatus having rotatable carousel for supporting a plurality of targets |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |