JPS51131461A - A vacuum treatment chamber apparatus - Google Patents

A vacuum treatment chamber apparatus

Info

Publication number
JPS51131461A
JPS51131461A JP5544075A JP5544075A JPS51131461A JP S51131461 A JPS51131461 A JP S51131461A JP 5544075 A JP5544075 A JP 5544075A JP 5544075 A JP5544075 A JP 5544075A JP S51131461 A JPS51131461 A JP S51131461A
Authority
JP
Japan
Prior art keywords
treatment chamber
chamber apparatus
vacuum treatment
vacuum
leakage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5544075A
Other languages
Japanese (ja)
Other versions
JPS5410350B2 (en
Inventor
Chikara Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP5544075A priority Critical patent/JPS51131461A/en
Publication of JPS51131461A publication Critical patent/JPS51131461A/en
Publication of JPS5410350B2 publication Critical patent/JPS5410350B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:A vacuum treatment chamber apparatus which prevents deterioration in vacuum intensity and leakage of operating gas.
JP5544075A 1975-05-13 1975-05-13 A vacuum treatment chamber apparatus Granted JPS51131461A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5544075A JPS51131461A (en) 1975-05-13 1975-05-13 A vacuum treatment chamber apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5544075A JPS51131461A (en) 1975-05-13 1975-05-13 A vacuum treatment chamber apparatus

Publications (2)

Publication Number Publication Date
JPS51131461A true JPS51131461A (en) 1976-11-15
JPS5410350B2 JPS5410350B2 (en) 1979-05-04

Family

ID=12998643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5544075A Granted JPS51131461A (en) 1975-05-13 1975-05-13 A vacuum treatment chamber apparatus

Country Status (1)

Country Link
JP (1) JPS51131461A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5385741A (en) * 1977-01-07 1978-07-28 Nippon Steel Corp Continuous evaporation plating method of steel band
JPS54153740A (en) * 1978-05-25 1979-12-04 Ulvac Corp Continuous vacuum treatment apparatus
JPS5511083A (en) * 1978-04-07 1980-01-25 Varian Associates Spatter coating system and vacuum vale* transporter and spatter source arranging device for said system
JPS5572028A (en) * 1978-11-24 1980-05-30 Ckd Corp Device for dipping electrolyte of condenser
EP0076426A2 (en) * 1981-09-28 1983-04-13 Energy Conversion Devices, Inc. Multiple chamber deposition and isolation system and method
US5562800A (en) * 1993-09-20 1996-10-08 Hitachi, Ltd. Wafer transport method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5385741A (en) * 1977-01-07 1978-07-28 Nippon Steel Corp Continuous evaporation plating method of steel band
JPS5511083A (en) * 1978-04-07 1980-01-25 Varian Associates Spatter coating system and vacuum vale* transporter and spatter source arranging device for said system
JPS54153740A (en) * 1978-05-25 1979-12-04 Ulvac Corp Continuous vacuum treatment apparatus
JPS6144947B2 (en) * 1978-05-25 1986-10-06 Ulvac Corp
JPS5572028A (en) * 1978-11-24 1980-05-30 Ckd Corp Device for dipping electrolyte of condenser
EP0076426A2 (en) * 1981-09-28 1983-04-13 Energy Conversion Devices, Inc. Multiple chamber deposition and isolation system and method
US5562800A (en) * 1993-09-20 1996-10-08 Hitachi, Ltd. Wafer transport method
US5601686A (en) * 1993-09-20 1997-02-11 Hitachi, Ltd. Wafer transport method

Also Published As

Publication number Publication date
JPS5410350B2 (en) 1979-05-04

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