FR2339881A1 - Composition photosensible non argentique - Google Patents

Composition photosensible non argentique

Info

Publication number
FR2339881A1
FR2339881A1 FR7702845A FR7702845A FR2339881A1 FR 2339881 A1 FR2339881 A1 FR 2339881A1 FR 7702845 A FR7702845 A FR 7702845A FR 7702845 A FR7702845 A FR 7702845A FR 2339881 A1 FR2339881 A1 FR 2339881A1
Authority
FR
France
Prior art keywords
argentic
photosensitive composition
photosensitive
composition
argentic photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7702845A
Other languages
English (en)
French (fr)
Other versions
FR2339881B1 (nl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2339881A1 publication Critical patent/FR2339881A1/fr
Application granted granted Critical
Publication of FR2339881B1 publication Critical patent/FR2339881B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/0085Azides characterised by the non-macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D311/00Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/16Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted in position 7
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/695Compositions containing azides as the photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60Processes for obtaining vesicular images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Materials For Photolithography (AREA)
FR7702845A 1976-02-02 1977-02-02 Composition photosensible non argentique Granted FR2339881A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65448576A 1976-02-02 1976-02-02
US68866476A 1976-05-21 1976-05-21

Publications (2)

Publication Number Publication Date
FR2339881A1 true FR2339881A1 (fr) 1977-08-26
FR2339881B1 FR2339881B1 (nl) 1979-03-02

Family

ID=27096757

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7702845A Granted FR2339881A1 (fr) 1976-02-02 1977-02-02 Composition photosensible non argentique

Country Status (10)

Country Link
JP (1) JPS5942684B2 (nl)
AU (1) AU513012B2 (nl)
BR (1) BR7700555A (nl)
DE (1) DE2704368A1 (nl)
ES (1) ES455588A1 (nl)
FI (1) FI770367A (nl)
FR (1) FR2339881A1 (nl)
GB (1) GB1578662A (nl)
IT (1) IT1076960B (nl)
NL (1) NL185872C (nl)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0277915A2 (de) * 1987-02-02 1988-08-10 Ciba-Geigy Ag Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin
EP0304136A2 (en) * 1987-08-19 1989-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Novel photosensitive composition
EP0425440A1 (de) * 1989-10-27 1991-05-02 Ciba-Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS6088005A (ja) * 1983-10-21 1985-05-17 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPH0676444B2 (ja) * 1986-05-08 1994-09-28 ユニチカ株式会社 光重合性組成物
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH02144539A (ja) * 1988-11-28 1990-06-04 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH02281895A (ja) * 1989-04-24 1990-11-19 Nissin Electric Co Ltd ビル管理システム
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
US5738974A (en) 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
EP0780731B1 (en) 1995-12-22 2002-04-17 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid crystal display device
DE19620747A1 (de) * 1996-05-23 1997-11-27 Hoechst Ag Verfahren zur Herstellung von 3-(7-Diethylamino-2-oxo-2H-chromen-3-yl)-3- oxopropionsäure-(1-methoxy-2-propylester)
ATE212451T1 (de) * 1997-06-30 2002-02-15 Siemens Ag Initiatoren für die kationische polymerisation
US7830472B2 (en) 2004-04-26 2010-11-09 Mitsubishi Chemical Corporation Blue color composition for color filter, color filter, and color image display device
JP2006065074A (ja) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd 感光性平版印刷版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
EP1826250B1 (en) 2005-06-13 2010-01-20 Toshiba Tec Kabushiki Kaisha Inkjet ink, method of inkjet recording, method of evaluating inkjet ink, and process for producing inkjet ink
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
ES2322908T3 (es) * 2005-11-18 2009-07-01 Agfa Graphics N.V. Metodo de fabricacion de una plancha de impresion litografica.
WO2007057347A1 (en) * 2005-11-18 2007-05-24 Agfa Graphics Nv Method of making a lithographic printing plate
WO2007057346A2 (en) * 2005-11-18 2007-05-24 Agfa Graphics Nv Method of making a lithographic printing plate
ATE426191T1 (de) * 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithographischen druckplatte
TW200807104A (en) 2006-04-19 2008-02-01 Mitsubishi Chem Corp Color image display device
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
KR101592836B1 (ko) 2008-02-07 2016-02-05 미쓰비시 가가꾸 가부시키가이샤 반도체 발광 장치, 백라이트, 컬러 화상 표시 장치, 및 그들에 사용하는 형광체
JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
JP5228631B2 (ja) 2008-05-29 2013-07-03 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5248203B2 (ja) 2008-05-29 2013-07-31 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
US20110146516A1 (en) 2008-08-22 2011-06-23 Fujifilm Corporation Method of preparing lithographic printing plate
JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
JP5171483B2 (ja) 2008-08-29 2013-03-27 富士フイルム株式会社 平版印刷版の作製方法
JP5714544B2 (ja) 2011-09-15 2015-05-07 富士フイルム株式会社 製版処理廃液のリサイクル方法
CN103907062B (zh) 2011-11-04 2017-11-28 富士胶片株式会社 制版处理废液的再循环方法
ITVA20120041A1 (it) * 2012-10-22 2014-04-23 Lamberti Spa 3-chetocumarine per fotopolimerizzazioni tramite led
EP3147335A1 (en) 2015-09-23 2017-03-29 BYK-Chemie GmbH Colorant compositions containing wettting and/or dispersing agents with low amine number
US20200347171A1 (en) 2017-11-15 2020-11-05 Byk-Chemie Gmbh Block co-polymer
US20210179764A1 (en) 2017-11-15 2021-06-17 Byk-Chemie Gmbh Block co-polymer
CN118271269A (zh) * 2022-12-30 2024-07-02 常州强力先端电子材料有限公司 香豆素类增感剂、其制备方法、包含其的感光性树脂组合物和应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
US3615452A (en) * 1968-09-09 1971-10-26 Gaf Corp Dye-sensitized photopolymerization process
DE1949010C3 (de) * 1969-09-27 1979-11-29 Bayer Ag, 5090 Leverkusen Verwendung von halogenmethylierten Benzophenonen als Photopolymerisationsinitiatoren
GB1310936A (en) * 1970-03-17 1973-03-21 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0277915A2 (de) * 1987-02-02 1988-08-10 Ciba-Geigy Ag Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin
EP0277915A3 (en) * 1987-02-02 1989-03-22 Ciba-Geigy Ag Photoinitiator mixture containing a titanocene and a 3-ketocoumarin
EP0304136A2 (en) * 1987-08-19 1989-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Novel photosensitive composition
EP0304136A3 (en) * 1987-08-19 1990-01-17 Asahi Kasei Kogyo Kabushiki Kaisha Novel photosensitive composition
EP0425440A1 (de) * 1989-10-27 1991-05-02 Ciba-Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen

Also Published As

Publication number Publication date
DE2704368A1 (de) 1977-08-11
DE2704368C2 (nl) 1988-05-11
NL7701089A (nl) 1977-08-04
ES455588A1 (es) 1978-07-16
AU513012B2 (en) 1980-11-06
NL185872C (nl) 1990-08-01
FR2339881B1 (nl) 1979-03-02
JPS5942684B2 (ja) 1984-10-17
JPS52112681A (en) 1977-09-21
GB1578662A (en) 1980-11-05
IT1076960B (it) 1985-04-27
AU2187177A (en) 1978-08-10
NL185872B (nl) 1990-03-01
BR7700555A (pt) 1977-10-04
FI770367A (nl) 1977-08-03

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